TW504739B - Developing processing apparatus and developing processing method - Google Patents

Abstract

Developing processing apparatus 24a to 24c comprising a spin chuck 41 which is one of holding means for holding a substrate G and a developing liquid supply mechanism for supplying the predetermined developing liquid to the substrate G held by the spin chuck 41, wherein the developing liquid supply mechanism includes a plurality of developing liquid spurting nozzles for spurting the predetermined developing liquid, for example, the nozzles 80a, 80b for the developing paddle forming, a single nozzle holding arm 51 for holding the plurality of developing liquid spurting nozzles and lift mechanisms 58a, 58b capable of adjusting the height of each of the nozzles 80a, 80b.

Description

Zhichong 504739 V. Description of the Invention (1 < Technical Field to which the Invention belongs and Known Technology in the Field > The present invention relates to a development processing device and a development processing method, such as an exposure-treated liquid crystal For display (LCD) glass substrates and substrates such as semiconductor wafers, a certain amount of developing liquid is supplied for development processing. In the process of photolithography of liquid crystal displays (LCD) and semiconductor wafers, the LCD substrates are cleaned and processed. Applying a photoresistor to a substrate such as a semiconductor wafer to form a protective film, exposing the protective film in a fixed pattern, and subjecting these to a so-called developing process, which includes a cleaning process, a protective film coating process, and a developing process It is a liquid processing device generally called a rotary type, which supplies a certain processing liquid while rotating the substrate in the plane. For example, in the development process of the LCD substrate, the substrate subjected to the exposure processing is fixed to the rotation. Suction cups, etc., are filled with a developing solution on the substrate to form an immersion solution to perform a developing reaction. After a certain period of time elapses, the substrate is rotated at the same time as the approximate disk. Start the supply of the rinse solution, shake off the developer solution and rinse ^, and then stop the supply of the rinse solution, and then rotate the substrate at high speed to perform the so-called spin-drying method. In such a development process, the development processing unit There are only one developing liquid discharge nozzle and one washing nozzle used to supply the developing solution. / However, in recent years, the type of the simple film used to cope with the quilt must be diversified. The concentration of the developing solution is gradually increased. Therefore, in the conventional 1 developing processing unit q, the developing solution ejection nozzle is changed, and the use of the developing solution ejection nozzle washing must be performed every time the imaging solution is changed. Processing becomes difficult to reduce productivity. In addition, due to the obvious size of the paper, the paper size is suitable for money_ 家 标准 (哪) 格 （2 欢 297 公公

Order — (Please read the precautions on the back before filling out this page) 4 504739 V. Description of the Invention (The liquid ejection nozzle handles most of the imaging liquid, so I am worried that the solid content and characteristics will be reduced due to the mixing of heterogeneous imaging liquids. In this way, the adhesion of fine particles and poor development of the image occur. Furthermore, as the material to be formed becomes finer and more complicated in the silk, the development process can be more uniformly performed to reduce the residue of the developing solution. The development requirements of a development processing device and a development processing method that form a good type are gradually increasing. ≪ Problems to be Solved by the Invention > The present invention has few of the above matters, and its purpose is to provide a development processing device and a development processing device. In the image processing method, even in the case of using a large number of developing liquids, continuous processing can be made to improve the processing efficiency. In addition, it can be made into a uniform developing processing, which can not only reduce the residue of the developing liquid, but also obtain high quality. According to the first aspect of the present invention, there is provided a developing and processing device including: a holding device for holding the substrate; and a developing liquid supply mechanism. Is used to supply a certain developing solution to the substrate held by the holding device; and the aforementioned developing solution supply mechanism further includes: most of the developing solution ejection nozzles are used to eject a certain developing solution; The nozzle holding arm is used to hold the majority of the developer discharge nozzles; and the lifting mechanism is capable of individually adjusting the height of the majority of the developer discharge nozzles. According to the second aspect of the present invention, a development is provided. The processing device includes a "holding device" for holding the substrate; a developing liquid supply mechanism for supplying a certain developing liquid to the substrate held by the holding device; and a washing liquid supply device for Supply the rinsing liquid to be coated (please read the precautions on the back before filling out this page) • Order · 5 V. Description of the invention (3) on the substrate of the imaging liquid; and the aforementioned developing liquid supply mechanism includes Yes ... The nozzle for the immersion liquid is used for overflowing and fixing the developing liquid on the substrate held by the aforementioned holding device; and the spray nozzle is used for spraying the supply-fixing developing liquid to be held In the foregoing The substrate of the holding device; and the aforementioned rinsing liquid supply device includes: a pre-rinsing nozzle, which is used to continue to supply a stack of rinsing liquid to the substrate held in the aforementioned holding and completion of the application of the _fixed developing liquid. Substrate; and, flushing nozzle, read and write the aforementioned pre-rinsing nozzle after the completion of the supply of the flushing liquid-the supply of the flushing liquid; and the spray nozzle and the aforementioned pre-washing nozzle are mounted on the same nozzle holding arm that holds the nozzle According to the third aspect of the present invention, a development processing method is provided, which is a development processing method for a substrate subjected to exposure processing. The method includes a fifth process, which is performed by filling the liquid with a certain amount of development liquid. The substrate is mounted in a slightly parallel manner; the second process is to spray-deliver a fixed imaging solution to the substrate overflowed with a certain developing solution; and the third process is in the aforementioned second process. After the spraying and supplying of the developing solution is completed, the substrate is continuously supplied with a flushing solution. According to such a development processing device and a development processing method, since most development liquid discharge nozzles are provided in one development processing device (development processing unit) to apply the development liquid to a substrate, Where it is necessary to supply different types and / or different concentrations of developing solution, a nozzle can be formed to be used instead. Compared with the case where only the nozzle is installed, the time for nozzle cleaning is not lost, and productivity is improved. In addition, by mixing different developing liquids, the characteristics are reduced and particles are generated to form a substrate that can maintain high quality. . A4 size (210X297 mm) This paper size applies Chinese National Standard (CNS) / jy V. Description of the invention (4) b In addition, after the imaging liquid immersion liquid is formed on the substrate, a spray nozzle is used to give Pressure (impact) —supply the developing solution on the surface. Because the developing solution immersion liquid is mixed, the developing process is formed more uniformly. This improves the developing characteristics and obtains a more uniform and uniform developing pattern. ; Image time is shortened. ^ ^ Furthermore, when the pre-rinsing nozzle is installed on the same nozzle holding arm as the developer discharge nozzle, the rinse solution can be supplied because the developer cannot be emptied after the application of the developer, so it is used. The spray nozzle is used to supply the flushing liquid immediately after the development reaction, so that the development reaction can be stopped, and the development characteristics can be improved, the uniform formation pattern can be understood, and the development processing time can be shortened to further develop the image. High quality substrate with reduced liquid residue. < Structure and function of the invention > Hereinafter, an embodiment of the present invention will be described in detail with reference to the attached drawings. FIG. 1 is a plan view showing a protective film coating and developing processing system 100 for an LCD substrate having a developing processing device (developing processing unit) (DEV) 24a to 24c of the present invention. The shy film coating and developing processing system 100 includes a box area 1, a processing section 2, and an interface section 3. This box area is used to hold a large number of [^ 1) a substrate c (substrate) G; a processing unit 2 is provided to perform a continuous process including coating and development of a protective film on the substrate G. The majority of the processing units; the interface unit 3 is used to receive and pay for the substrate 0 with an exposure device (not shown); and at both ends of the processing unit 2, a box area 1 and an interface unit 3 are respectively arranged. This paper size applies to China National Standard (CNS) A4 (210X297 mm)

f Please read the notes on the back ¾ and then fill in this page) 504739 A7 B7 V. Description of the invention (5) (Please read the notes on the back before filling in this page) Box 1 is equipped with a transport mechanism 10 for The substrate G is transferred between the cassette C and the processing unit 2. In the cassette area 1, the cassette C is carried in and out. In addition, the transfer mechanism 10 has a transfer arm 11 that is movable on a transfer path 10a provided along the arrangement direction of the cassettes, and the substrate G is transferred between the cassette C and the processing unit 2 by the transfer arm 11. The processing section 2 is divided into a front section 2a, a middle section 2b, and a rear section 2c, and has a conveying path 12 · 13 · 14 in the center of each of them. Each processing unit is provided on both sides of the conveying path. In addition, a relay section 15 · 16 ° front section 2 a is provided between them, and the main conveying device 17 is movable along the conveying path 12, and two cleaning units (SCRs) are arranged on one side of the conveying path 12. 21a, 21b, a processing area 25, a processing area 26, and a processing area 27 are provided on the other side of the transport path 12. The processing area 25 is formed by overlapping an ultraviolet irradiation unit (UV) and a cooling unit (COL) into two sections; the processing area 26 is formed by overlapping a heating processing unit (HP) into two sections; the processing Zone 27 is formed by overlapping cooling units (COL) into two sections. In addition, the middle section 2b is provided with a main conveying device 18 movable along the conveying path 13 and a peripheral protective film removing unit (CT) is integrally provided on one side of the conveying path 12 to remove the protective film coating processing unit ( CT) 22 and the protective film of the peripheral portion of the substrate G are provided with a processing area 28, a processing area 29, and a processing area 30 on the other side of the transport path 13. The processing area 28 is formed by overlapping the heat treatment unit (HP) into two sections; the processing area 29 is formed by overlapping the heat treatment unit (HP) and the cooling unit (COL); the processing area 30. It is formed by overlapping the adhesive processing unit (AD) and the cooling unit (COL). The paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm). 504739 A7 B7 V. Description of the invention (6). Furthermore, the rear section 2c has a main transfer device 19 that can be moved along the transfer path 14. Three development processing units (DEV) 24a, 24b, and 24c are arranged on one side of the transfer path 14. A processing area 31 and a processing area 32 · 33 are arranged on the other side of 14. The processing area 31 is formed by overlapping the heating processing unit (HP) into two sections, and the processing area 32 · 33 is formed by overlapping the heating processing unit (HP) and the cooling unit (COL). In addition, the processing unit 2 is only a rotation system unit including a cleaning unit (SCR) 21a, a protective film coating processing unit (CT) 22, and a development processing unit (DEV) 24a on one side of the holding conveyance path. On the other side, a structure in which a heat treatment unit such as a heat treatment unit (HP) and a cooling unit (COL) is arranged is formed. In addition, the medicinal solution supply unit 34 is allocated to a portion on the side of the rotation system unit arrangement of the relay section 15 · 16 and a space 35 is provided for the maintenance of the main transfer device 17 · 18 · 19. The main conveying devices 17 · 18 · 19 are X-axis drive mechanism, Y-axis drive mechanism, and Z-axis drive mechanism in two directions in the horizontal plane, and they also have a rotary drive that rotates around the Z axis. Mechanism, and has arms respectively supporting the substrate G. The main transfer device 17 has a transfer arm 17a for receiving and paying the substrate G between the transfer arm 11 and the transfer arm 10 of the transfer mechanism 10. At the same time, the substrate G of each processing unit in the front section 2a is moved in and out. A function of receiving and paying the substrate G is provided between the sections 15. In addition, the main conveying device 18 has a conveying arm 18a, which receives and pays the substrate G between the relay section 15 and the 9 (please read the precautions on the back before filling this page). This paper size applies Chinese national standards ( CNS) A4 specification (210X297 mm) 504739 A7 B7 V. Description of the invention (7) The board G is moved in and out of each processing unit in the middle section 2b, and the board G is further received between the relay section 16 and the board G. Function. Further, the main transfer device 19 has a transfer arm 19a for receiving and paying the substrate G between the relay section 16 and the substrate G of each processing unit in the rear section 2c. There is a function of receiving and paying the substrate G at a time. In addition, the relay section 15 · 16 also functions as a cooling plate. The interface section 3 includes an extension table 36, a buffer stage 37, and a transport mechanism 38. The extension stage 36 is used to temporarily hold the substrate G while receiving and disposing the substrate G between the processing unit 2 and the buffer stage 37. The buffer stage 37 is provided with two buffer cassettes, and is disposed on the two sides thereof. This conveying mechanism 38 is used to carry in and out the substrate G between these and an exposure device (not shown). The conveying mechanism 38 is provided with a moving arm 39 on a conveying path 38a provided along the arrangement direction of the extension table 36 and the buffer stage 37, and the conveying arm 39 is used between the processing section 2 and the exposure device. Transfer of the substrate G. In this way, by integrating the processing units together, it is possible to achieve space saving and efficient processing. In such a protective film coating and developing processing system 100, the substrate G in the cassette C is transported to the processing section 2. In the processing section 2, first, the ultraviolet irradiation unit (UV in the processing section 25 of the previous section 2a) ) For surface modification and cleaning treatment, after being cooled by the cooling treatment unit (COL), the washing unit is washed by the cleaning unit (SCR) 21a, 21b, and is heated by any heating treatment unit (HP) in the processing area 26 ) After heating and drying, it is cooled by any cooling unit (COL) in the processing zone 27. Thereafter, the substrate G was transferred to the middle section 2b. In order to increase the protection film 10 (please read the precautions on the back before filling this page) This paper size applies the Chinese National Standard (CNS) A4 (210X297 mm) A7 5 2. Description of the invention (individuality, the adhesion processing unit (the upper stage is hydrophobized (HMDS treatment) in the upper stage of the M treatment zone 30), the cooling treatment unit (c0L) in the lower stage is cooled and then coated with a protective film The processing unit (CT) 22 is coated with a protective film, and the peripheral protective film removing unit (ER) 23 is used to remove the excess protective film on the peripheral edge of the substrate G. The eighth substrate G is a heating processing unit (1) in the middle section 2b. Hp) is pre-fired, yttrium treated, and cooled by a cooling unit (c0l) in the lower section of the processing zone 29 or 30. Thereafter, the substrate G is passed through the relay section 16 and the main transfer device 19 through the interface section. 3 is transported to the exposure device, where a certain type of exposure is performed. In addition, the substrate G is carried in again through the interface section 3, and a heating processing unit (Hp) of any of the processing sections 31, 32, 33 in the subsequent section is required as needed. ) After the post-exposure coping process, Any one of the processing unit (DEV) 24a · 2 servant · 24c is developed to form a certain circuit type. The substrate G that is developed is a post-baking process for any one of the heating processing units in the second section 2c. After that, it is cooled by any one of the cooling units (c0L), and is stored in a certain box on the box area 1 by the main transfer device 19 · 18 · 17 and the transfer mechanism 10. Next, the present invention is directed to the present invention. The development processing units (DEV) 24a to 24c are described in detail. FIG. 2 is a plan view showing one embodiment of the development processing units (DEv) 24a to 24c, and FIG. 3 is the development processing in FIG. 2 A cross-sectional view of the cover portion of the units (DEV) 24a to 24c. As shown in FIG. 2, the development processing units (DEV) 24a to 24c are surrounded by a water tank 48. As shown in FIG. 3, the development processing unit In (DEV) 24a to 24c, a mechanical holding device for holding the substrate G, such as a rotary chuck 41, is provided to be rotated by a rotary driving mechanism such as a motor. The paper size of the rotary chuck 41 is adapted to Chinese national standards. (CNS) A4 size (210X297mm) 11 (Please read the back first Note: Please fill in this page again.) Order | B7 V. Description of the invention (9), there is a cover 43 that surrounds the rotary drive mechanism 42. The rotary suction cup 41 is formed by a lifting mechanism (not shown) that can be raised and lowered. Payment and receipt of the substrate G is performed with the transfer arm 19a. The rotary chuck 41 is formed to hold and hold the substrate G by means of a vacuum suction force. Two outer covers 44 and 45 are provided at intervals on the outer periphery of the cover 43. Above the two lower covers 44 and 45, an inner cover 46 that can be lifted and lowered is provided, which is mainly used to flow the developing liquid downward. On the outer side of the lower cover 45, the inner cover 46 can be installed freely. The lifting cover 47 is mainly used to push the flushing down. In Fig. 3, when the developing liquid is discharged on the left side, the positions of the inner cover 46 and the outer cover 47 are raised, and when the flushing liquid is discharged on the right side, the positions are lowered. An exhaust port 49 is provided at the bottom of the inner peripheral side of the lower cover 44 to discharge the gas in the unit during spin drying. A drain port 50a is provided between the two lower covers 44.45. The main purpose is to discharge the developing solution. A drain port 50b is provided at the bottom of the outer peripheral side, and is mainly used to discharge the washing liquid. On one side of the lower cover 47, as shown in FIG. 2, a nozzle holding arm 51 is provided, and an immersion liquid forming nozzle 8a used as a continuous application type of the developing liquid discharge nozzle is mounted on the nozzle holding arm 51. 80b for applying the developing solution to the substrate G. The nozzle holding arm 51 is moved along the length of the guide 53 by a driving mechanism 52 such as a belt drive to move it through the substrate G. When the developing liquid is applied, the nozzle holding arm 51 is immersed. The liquid-forming nozzles 80a and 80b eject the developing liquid on one side, and form a scanning stationary substrate 0 on the other side. In addition, the nozzles 80a and 80b for forming an immersion liquid are formed on the nozzle standby portion 115, and a nozzle cleaning mechanism 12 is provided in the nozzle standby portion ι15. This paper size applies the Chinese National Standard (CNS) A4 specification (210X297) Centimeters) 12

(Please read the precautions on the back before filling this page) 504739 A7 B7 V. Description of the invention (10) The nozzles 80a and 80b for cleaning the immersion liquid are cleaned. Details of the nozzles 80a and 80b for forming an immersion liquid will be described later. • ... (Please read the precautions on the back before filling in this page.) On the other side of the cover 47, a flushing nozzle 60 that discharges a flushing liquid such as pure water is installed on the flushing nozzle arm 54. As the flushing nozzle 60, a tube-shaped object having a circular discharge port can be used. The flushing nozzle arm is set to be able to slide freely along the length of the guide 53 by the driving mechanism 56. The flushing nozzle 60 is formed so that the flushing liquid is discharged while scanning the substrate β.

， 可 I Still, toward the development processing units (DEV) 24a ~ 24c, a space is formed in the upper part, so that the protective film is applied to the development processing system 丨 〇〇〇 It is supplied from the highest place of the place to be cleaned downward. Hair dryer. In addition, an air blowing mechanism and an ionization are respectively provided above the substrate G, and the air blowing mechanism is used to supply a dry gas such as nitrogen to the substrate G held by the rotary chuck 41; the ionization is used to remove the rotation occurring in the rotation The static electricity of the chuck 41. In addition, as shown in FIG. 4, the rotation driving mechanism 42 that rotates the rotary chuck 41, the driving mechanism 52 that slides the nozzle holding arm 51 for the developing liquid, and the driving mechanism 56 that slides the flushing nozzle arm 54 are all It is controlled by the control device 70. Next, the nozzles 80a and 80b for forming an immersion liquid for applying a developing liquid to the substrate G held by the rotary chuck 41 will be described in detail. As the nozzle 80a.80b for forming an immersion liquid, as shown in the perspective view of FIG. 5, for example, a plurality of slightly rounded developing liquid ejection outlets may be formed in a row or in a long direction. Side by side nozzles, etc., instead of nozzles with slit-shaped developer discharge ports 85a · 85b. In this case, it can also be slightly perpendicular to the substrate g.

504739

The supply of slightly banded imaging solution. (Please read the precautions on the back before filling in this page.) The nozzles 80a and 80b for immersion liquid formation can also be constructed by changing the height position by lifting mechanisms such as pressure cylinders and electric motors. At this time, the lifting mechanism 58a is expanded to make a squeak for one of the immersion liquid formations. For example, the immersion liquid formation nozzle 80a is positioned below, and the unused / manufactured liquid opening > formation nozzle 8o is used. b, it is made close to the bottom surface of the nozzle holding arm 51 so that it can be held upward. In addition, Fig. 6 is an explanatory view showing a liquid feeding path toward the developing liquid of the immersion liquid forming nozzles 80a and 80b. Here, a liquid feeding path a · b is formed at the opening / opening position of the nozzle 80a · 80b to supply different types and / or different concentrations of the developing solutions A · b. Order — With this structure, the nozzle holding arm 51 scans the substrate G on one side, for example, at the developing solution discharge port 85a of the nozzle 80a for forming the immersion liquid, the developing solution (development solution A ) When it is applied to the substrate g, the unused developing solution ejection port 85b of the nozzle 80b for immersion liquid formation is not in contact with the developing solution A coated on the substrate G, so the developing solution b is mixed in. The developing liquid immersion liquid on the substrate g, and the immersion liquid forming nozzle 80b will not be contaminated by the developing liquid A. In addition, since different developing liquids from the nozzles 80a and 80b for forming an immersion liquid can be applied to the substrate G, for example, two sets of substrates (3 use different types of protective films, so it is necessary to Different types of imaging solutions are used for imaging processing, and it is also easy to cope with the cases where they need to be processed continuously. That is, it has a nozzle for forming an immersion solution (the ejection of the imaging solution) Nozzle) After comparison, it is not necessary to clean the nozzle for forming the immersion liquid. Since only the nozzle for immersion liquid formation is adjusted, the paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 504739 A7 _B7_ V. Description of the invention (12) The development processing can be performed continuously at the positions of 80a and 80b, so the processing efficiency can be improved and the productivity can be improved. As shown in FIG. 6, a degassing component is provided in each of the liquid feeding paths A and B. 59a · 59b. The developer solution A · B to be fed is dissolved and used, for example, to send the developer solution A · B to the high-pressure nitrogen gas of the nozzle 80a · 80b for immersion solution formation. Imaging When the liquid is applied to the substrate G, the dissolved gas adheres to the substrate G in a bubble state, and the development failure may occur in the portion of the plate G that is not wetted by the developing liquid. Here, the deaeration unit 59a is used. 59b removes such dissolved gas. The degassing components 59a and 59b can be made into a structure in which the developing solution passes through the hollow system membrane and the porous resin through the decompressed air. Three-way valves 57a and 57b are provided in the liquid feeding path A and B. When the developing solution A and B are supplied to the immersion liquid forming nozzles 80a and 80b, the valve is closed for vacuum suction, and the developing solution A is closed after the supply of the developing solution A and B is completed. · The valve on the supply side of B, and the valve on the vacuum suction side is opened, so that the developing liquid remaining in the immersion liquid forming nozzles 80a and 80b is discharged. This prevents the developing liquid from the immersion liquid forming nozzle 80a. · 80b dripping, especially to prevent dripping from the unused immersion liquid forming nozzle 80a · 80b dripping can prevent other developing liquid from mixing into the developing solution immersion liquid in the formation. Moreover, the vacuum suction time can be arbitrary Settings so that can wait In order to control the amount of imaging liquid in the nozzles 80a and 80b for forming an immersion liquid, the imaging processing units (DEV) 24a to 24c using the two nozzles 80a and 80b for forming an immersion liquid are described above. In the image processing process, a plurality of substrates G in a certain group (referred to as group A) are treated with the developing solution A using the immersion liquid forming nozzle 80a, and then the majority of the other groups (referred to as group B) 15 ( Please read the notes on the back before filling this page.) This paper size is applicable to China National Standard (CNS) A4 specification (210X297 mm) A7 --- _B7 ^ ___ 5. Description of the invention (13) substrate G The liquid-forming nozzle 801) will be described using an example in which the developing solution B is different from the developing solution a. Fig. 7 is an explanatory diagram (flow chart) showing the developing process. First, the inner cover 46 and the outer cover 47 are held at the lower stage (the right position in Fig. 3) (step 1). In this state, the transfer arm 19 holding the substrate ^ is inserted into the development processing units (DEV) 24a to 24c, and the rotary chuck 41 is raised in accordance with this time, and the substrate G is charged toward the rotary chuck 41 (step 2). The transfer arm 19a is waited outside the development processing units (DEV) 24a to 24c, and the rotary chuck 41 on which the substrate G is placed is lowered and held at a predetermined position (step 3). Then, the nozzle holding arm 51 is moved to a predetermined position in the inner cover 46 (step 4), the lifting mechanism 58a is expanded, and only the position of the immersion liquid forming nozzle 80a is held below (step 5). Continuously, while scanning the substrate (3, using a nozzle 8a for forming an immersion liquid, apply a certain developing liquid a to the substrate G 'to form a developing liquid immersion liquid (step 6). Also, in When the developing solution A is applied to the substrate G, the three-way valve 5 shown in FIG. 6 is closed to supply the developing solution A for vacuum suction. The valve is closed. After the developing solution immersion liquid, the elevating mechanism 58a is reduced and the immersion solution forming nozzle 80a is moved upward and held between a certain development processing time (development reaction time) (step 7), so that The nozzle holding arm 51 is to be avoided by the inner cover 46 and the outer cover 47 (step 8), and the flushing nozzle arm 54 is driven, and the flushing nozzle 60 is arranged at a certain position on the substrate G (step 9). Continue to make the inner cover 46 and the outer cover 47 rises and remains at the upper position (the left position in FIG. 3) (step 10). The horizontal position of the surface of the substrate G at the upper position is a height that approximately matches the position of the tapered portion of the inner cover 46. 16 (Please read the notes on the back before filling this page) Use the Chinese National Standard (CNS) A4 specification (210X297 mm) 504739 A7 B7 V. Description of the invention (14) (Please read the precautions on the back before filling this page) Make the substrate G rotate at a low speed and turn the display on the substrate G The flushing liquid is ejected from the flushing liquid nozzle 60 at about the same time as when the image liquid enters the shake-off operation, and at the same time as this, the exhausting operation is started by the exhaust port 49 (step 11). That is, after the development reaction time elapses Previously, the exhaust port 49 was preferably left in a non-operating state, so that the developing liquid immersion liquid in the substrate G was formed, and the adverse effects of air flow would not occur due to the operation of the exhaust port 49. Start of the substrate G During the rotation, the developing liquid and washing liquid scattered from the substrate G to its outer periphery are guided by the cone-shaped portion and the outer peripheral wall (vertical wall on the side) that hit the inner cover 46 to be discharged to the lower drain port 50a. At this time, a certain period of time elapses from the start of rotation of the substrate G, and the processing solution having a high concentration of the developing solution formed by the developing solution is discharged through the drainage port 50a. The discharged solution having such a high concentration of the developing solution is preferably recovered For reuse. Therefore, the drain port 50a is constructed by a switching valve and can be divided into a recovery flow path and a waste flow path. After a certain period of time has passed from the start of the rotation of the substrate G, it is also discharged and flushed. While the substrate G is rotating, the inner cover 46 and the outer cover 47 are lowered and held at the lower position (step 12). At the lower position, the horizontal position of the surface of the substrate G is made to approximately match the position of the tapered portion of the outer cover 47. The rotation number of the substrate G is made larger than the start of the rotation operation, so that the residue of the developing solution on the substrate G is reduced. The operation of increasing the rotation number of the substrate G is simultaneously with the lowering operation of the inner cover 46 and the outer cover 47. , Or even at any stage before and after it. The processing liquid mainly formed by the rinsing liquid scattered from the substrate G is discharged through the taper portion of the cover 47 and the drain port 50b on the outer peripheral wall. This paper size is in accordance with Chinese National Standard (CNS) A4 specification (210X297 mm) _ Π-504739 A7 — ___ B7______ V. Description of the invention (15) Secondly, stop the discharge of the flushing liquid, and make the flushing liquid nozzle 60 to a certain position At a certain position outside the outer cover 47, at the same time, the inner cover 46 and the outer cover 47 are moved and held upward (step 13), and the substrate is further raised (the number of rotations of 3 is maintained for a certain time. That is, the rotation of the dried substrate G is performed by high-speed rotation. Drying (step 14). In this spin-drying, it is preferable to supply dry nitrogen or the like to the substrate while using a blowing mechanism from above the substrate G. This drying time is shortened. FIG. 8 is an illustration An explanatory view of an embodiment of supplying gas to the substrate g. The nozzle 98 for discharging nitrogen is shown in FIG. 8 (a), except that it is held horizontally above the inner cover 46 and the outer cover 47 except for spin drying. When the spin-drying is performed, as shown in FIG. 8 (b), the joint portion 99a of the piping 99 is bent, the tip of the nozzle 98 faces the substrate G, and nitrogen gas is supplied to the substrate G. The nitrogen supply is stopped at the end of the spin drying. The Guanlang portion 99a is restored to its original shape, and the nozzle 98 and the piping 99 are kept slightly horizontal. After the spin drying is finished, the rotation of the substrate G is stopped to make the inner cover 46 and the outer cover. 47 moves to the lower position and raises the rotary chuck 41 (step 15) 'The transfer arm i9a is inserted into the development processing units (DEV) 24a to 24c to receive and pay for the substrate G in accordance with the time, and then occurs using ionization. Removal of static electricity on the rotating chuck 41 (electrostatic elimination step K16). This electrostatic elimination method is the same as the method of spraying nitrogen on the substrate G using a blowing mechanism just before spin drying. The gasification is carried out on the substrate G. After the end of the process from one of the steps 1 to 16, the rotation of this paper applies the Chinese National Standard (CNS) A4 specification (21〇297297). (Please read the (Notes to refill this page)

可可 504739 A7 __B7_ 5. Description of the invention (16) In the state without the substrate G on the suction cup 41, since the inner cover 46 and the outer cover 47 are located at the lower position, the state of step 1 can be satisfied. In addition, if the substrate G to be processed next is transferred to the development processing units (DEV) 24a to 24c by the transfer arm 19a, the development processing of the substrate G can be continued according to the aforementioned process from step 2. According to the above process, after the development processing for all substrates G of group A is completed, the three-way valve 57a (refer to FIG. 6) provided in the liquid feeding path A is operated to close the supply side of the developing solution A. The valve is opened, and the valve on the vacuum suction side is opened, and the developing liquid A remaining in the immersion liquid forming nozzle 80a is discharged (step 17). In this way, it is possible to prevent the liquid of the developing solution A from dripping from the immersion liquid forming nozzle 80a. Thereafter, in the same manner as in steps 1 to 16 described above, the substrate G of the group B is subjected to development processing by using the developing solution B of the immersion liquid forming nozzle 80b (step 18). In this way, different developing solutions A and B can be continuously used for development processing. For all substrates G in group B, after the development process is completed, the three-way valve 57b (refer to FIG. 6) provided in the liquid feed path B is used to close the valve on the supply side of the development liquid B and open the vacuum. The suction-side valve discharges the developing solution B remaining in the immersion liquid-forming nozzle 80b (step 19). This completes all processing. Next, the developing solution processing units (DEVs) 24a to 24c and other embodiments of the structure of the developing solution supply mechanism will be described. Fig. 5 shows a type in which the nozzles 80a and 80b for forming an immersion liquid having two different structures are mounted on the nozzle holding arm 51. However, a type of developing solution can be discharged and a large number of developing solutions can be discharged. nozzle. For example, Fig. 9 shows that the developing liquid will be sprayed toward the substrate G at a constant strength with the nozzle 80a for forming the immersion liquid. 19 (Please read the precautions on the back before filling this page.) This paper size applies Chinese national standards. (CNS) A4 size (210X297 mm)

V. Description of the Invention (Π) The spray nozzle 80c of the coating supply is mounted on the nozzle holding arm 51. The immersion liquid forming nozzle 80a and the spray nozzle 80e are formed by the lifting mechanisms 58a and 58o, and the positions can be adjusted individually up and down. When the immersion liquid forming nozzle 80a and the spray nozzle 80c are attached to the nozzle holding arm 51, it is different from the case shown in FIG. 6 described above. For example, as shown in FIG. 10, the immersion liquid The forming nozzle 80a and the spray nozzle 80c constitute a liquid feeding path A · C of the developing solution, and the same developing solution is supplied, and the developing solution is initially formed using the immersion liquid forming nozzle 80a. After the immersion liquid, the developing liquid is further supplied from above the developing liquid immersion liquid using the spray nozzle 80c. The developing liquid formed in the slightly elliptical developing liquid discharge port 85c formed in the spray nozzle 80c is discharged in a slightly fan shape, and the discharging momentum of the developing liquid thus discharged is compared with the use of the immersion liquid forming nozzle 80a. The occasion is still big. In this way, the developing solution is applied to the substrate G by applying pressure (impact) while the developing solution just formed is stirred, and the development of the developing reaction proceeds more uniformly. With such improved development characteristics, it is clearer that a uniform pattern is obtained 'and the development time is shortened. In addition, the shape of the developing liquid discharge port 85c is not limited to the slightly elliptical shape shown in Fig. 9 and may be a circle, a rectangle, or the like. In addition, the type of the developing solution discharged from the developing solution discharge port 8 is not limited to a slightly fan shape, and it does not matter if it is conical or the like. Furthermore, the developing liquid discharge ports 85c need not be arranged side by side as shown in Fig. 9, for example, even if they are arranged in a plurality of rows. Degassing components 59a, 59c and three-way valves are provided in each of the liquid feeding paths A and C. 20 paper-size paper towels, gg family (CNS, M specifications, qx297, public love) 5. Description of the invention (8) 57a, 57c. The imaging liquid and the imaging liquid in the mouth mist nozzle 80e can be discharged separately. However, the mouthpiece 80a and the mouth mist nozzle in J ^ 80a are supplied with the same liquid formation for use as one of the nozzles, and can be ignored regardless of the imaging solution. The influence of the imaging noise is not applied by a nozzle. Using the above-mentioned nozzle 80a and nozzle 80c for the formation of the immersion liquid, the same-developing solution is applied to the substrate. Figure 11 shows the flowchart. In the developing process shown in FIG. 11, as described just now with reference to the flowchart in FIG. 7, the two immersion liquid forming nozzles 8Ga · are hidden in the nozzle holding arm 51. The substrates G of different groups do not use the so-called development processing surplus which is continuously processed using different development liquids α · B. However, the processes from the 11th material and the processes from step 6 and steps 8 to 17 are related to the process 1 from the development processing process shown in FIG. 7 and from step 6 and steps 8 to 17 The process is the same. Therefore, the process from step 6 to step 8 will be described in detail. In step 6, the immersion liquid forming nozzle 8Ga is used to form the developing liquid immersion liquid on the substrate G, and then the driving immersion liquid is formed, and the lifting mechanism 58a of the nozzle 80a is held at the upper position (step 7- 1) The other side keeps the spray nozzle 80c driven by the lifting mechanism 58c at the lower position (step 7_2). Further, by using the nozzle 80a for forming an immersion liquid of the spray nozzle 80c, a developing liquid is further supplied from the top of the formed developing liquid immersion liquid (step 7-3), and the developing process is performed. In the process of step 7-3, even if the substrate G is rotated with a certain low number of rotations, the developing liquid is ejected by the spray nozzle 80c, even if the paper size is in accordance with the Chinese National Standard (CNS) A4 specification ( 210X297 mm) 504739 V. Description of the invention (l9) The state of rotating the substrate G can be shifted to the process after step 7.3. The substrate G is rotated and discharged from the G-plane of the substrate, and a part of the developing solution is removed. On the other hand, by applying a new developing solution, the early development reaction proceeds, and the processing can be shortened if the spray nozzle 8Ge is used to complete the development. When the liquid is applied, the lifting mechanism 58c of the spray nozzle 80c is driven and held at the upper position (step 7_4), and the nozzle holding arm 51 is to be avoided from the cover 47 (step 8). Go further. Here, step 16 of receiving and paying the substrate G from the rotary chuck 4 to the transfer arm 19a is completed for all the substrates G. By closing the valve on the supply side of the developing solution in the three-way valve 57 and 70, the The opening of the vacuum suction side is wide, and the imaging liquid in the immersion liquid forming nozzle 80a and the spray nozzle 80c is discharged (step 17). In this way, development processing is completed. Next, another embodiment of the developer supply mechanism will be described with reference to the plan view of FIG. The developing solution processing units T0 (DEV) 24a ′ to 24c ′ shown in FIG. 12 are provided with three nozzles 8 (^, spray nozzle 80c, and pre-rinsing nozzle 60a) for forming an immersion liquid. Nozzle holding arm 51 'The nozzle holding arm 51 is driven along the guide 53 by the driving mechanism 52. The nozzle for forming the immersion liquid is adjusted, the nozzle 80a, the spray nozzle 80c, and the pre-rinsing The mechanism of the position of the ejection outlet height of the nozzle 60a is provided between the nozzle holding arm 51 and each nozzle. The pre-rinsing nozzle 60a has, for example, the structure of a straight tube-shaped nozzle similar to that of the flushing nozzle, and the substrate G is used. The spray nozzle 80c continues to supply a certain flushing liquid to the substrate G shortly after applying a certain developing solution to the substrate G to stop the development reaction and complete the task. The spray nozzle 80c is used to scale the paper Applicable to Chinese National Standard (Na) A4 specification (21〇χ297 公 爱) -22 (Please read the precautions on the back before filling this page), " 504739 A7 B7 V. Description of the invention (2〇) (Please read the back first (Notes on this page, please fill out this page) Uniform imaging response Immediately after the operation, the flushing liquid is discharged from the pre-rinsing nozzle 60a. By stopping the developing reaction, the time during which the developing solution stays on the substrate G is shortened, and the uniformity of the developing reaction can be further improved. The shape accuracy type is shown in Fig. 12. The development processing unit (DEV) 24, a to 24, and c, plus the pre-rinsing nozzle 60a are also set. The pre-rinsing nozzle 60a is used to stop the development reaction. After that, the flushing treatment using the flushing nozzle 60 is performed. Order-It is not necessary to flush the nozzle 60 in advance, so that it can perform the task of flushing the spraying nozzle 60. However, in this case, the developer is discharged by soaking The liquid-forming nozzle 80a and the spray nozzle 80c are also formed on the substrate () during processing. For example, 'rinsing processing is completed. In order to transfer to the spin-drying processing, the nozzle holding arm 51 is moved to be avoided by the substrate G. At this time, the developing solution may drop onto the substrate G from the immersion liquid forming nozzle 80a and the spray nozzle 80c. Because of the dropping of the developing solution, there is a fear that a developing failure may occur on the substrate G, so In the final stage of the rinsing process, the nozzle that only discharges the rinsing liquid is located on the substrate G, and it is preferable to use a type that supplies the rinsing liquid. Fig. 13 shows the use of the immersion liquid forming nozzle 80a and the spray nozzle mounted on the nozzle holding arm 51. Flow chart of the imaging processing process of the mist nozzle 80c and the pre-rinsing nozzle 60a. The process from step 1 to step 3 shown in FIG. 13 is from step 丨 to step 3 shown in FIGS. 7 and 11 The manufacturing process is the same. Therefore, the manufacturing process after step 3 will be described in detail. According to step 3, the rotary chuck 41 is lowered, and the substrate G is held at a certain position, and then the nozzle holding arm 51 is arranged at a certain position in the inner cover 46. The formation of the developing liquid immersion liquid by the immersion liquid forming nozzle 80a (step

504739

) At this time, adjust the liquid discharge port a of the nozzle 8oa for the formation of the liquid (please read the precautions on the back before filling this page). Adjust the height position so that it is positioned higher than the spray nozzle 8o. The developing liquid discharge port 85c of c and the washing liquid discharge port of the pre-rinsing nozzle 60a are also below. -Ordering Secondly, although the height position is adjusted so that the nozzle for forming an immersion liquid 80a rises to be close to the nozzle holding arm 51, the developing liquid discharge port 85c of the spray nozzle 80c is positioned at the bottom and is formed by A developing solution is further supplied on top of the developing solution immersion solution on the substrate G (step 5a). After the application of the developing liquid by the spray nozzle 80c, although the height position is adjusted to raise the spray nozzle 800 to close to the nozzle holding arm 51, the position of the pre-rinsing nozzle 60a is adjusted so that the pre-rinsing nozzle 6 is adjusted. The flushing liquid soil outlet of 〇a comes to a position lower than the developing liquid discharge outlets 85a and 85c of the spray nozzles 80a and 80c. In addition, the inner cover 46 and the outer cover 47 are raised and held at the upper position (step 6a). Thereafter, the rotation of the substrate G is started by the pre-rinsing nozzle 60a at about the same time as the discharge of the rinsing liquid is started, and the exhaust operation from the exhaust port is started (step 1). After a certain period of time has elapsed, the discharge of the washing liquid from the pre-rinsing nozzle 60a is completed, the nozzle holding arm 51 is retracted out of the cover 47, and the washing nozzle 60 is moved to a certain position on the substrate G (step 8a). After lowering the inner cover 46 and the outer cover 47 to the lower position (step 9a), the number of rotations of the lifting substrate G starts to discharge the washing liquid from the washing nozzle 60 (step 10a). If so, the discharge of the rinse liquid is stopped, and the rinse nozzle 60 is retracted to the outside of the cover 47 (step 47). Next, the inner cover 46 and the outer cover 47 are raised and held at the upper position (step 12a) ', and the substrate G is rotated at high speed to perform spin drying (step 13a). At this time, it is preferable to blow nitrogen to the substrate G. This paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) 24 '504739 A7 B7 V. Description of the invention (22 (Please read the precautions on the back before filling this page) Stop the substrate G after the spin drying is completed Rotate to lower the inner cover 46 and outer cover 47 to the lower position, and raise the rotary chuck 41 (step 14a). The transfer arm 19a is inserted into the development processing unit (DEV) 24a, and the substrate G is collected. After that, the static electricity generated by the spin chuck 41 is removed (elimination) using ionization (step 15a). After all the substrates G 'have completed the development process, the immersion liquid is discharged > The developing liquid in the mist nozzle 80c (step i6a). By using the pre-rinsing nozzle 60a in this way, the spray nozzle 80c can be used to shorten the time from the end of the application of the developing liquid to the beginning of the spitting out of the washing liquid. The state of the uniformity of the development reaction is formed so that the development reaction can be stopped, and a uniform and excellent shape accuracy can be obtained. In addition, in the above process, the rotation of the substrate G is started in step 7a. The mist nozzle 80c applies the developing solution while rotating the substrate G with a low rotation number (step 5a). In the state where the substrate G is rotated, it is best to start the cleaning solution by pre-rinsing the nozzle 60. In this case, it is possible to reduce the occurrence of vortex-shaped development marks that occur while rotating the substrate g while developing. Second, referring to FIG. 14 for further implementation of the developing liquid supply mechanism. The plan view will be explained. The development processing units (DEV) 24a, ~ 24c, shown in Fig. 2 are compared with the development processing units (DEV) 24a, ~ 24c shown in Fig. 2; The difference is that the flushing nozzle arm 54 equipped with the flushing nozzle 60 is equipped with a high-pressure flushing tank 61. The high-pressure flushing tank 61 has a shape in which a bottom surface is opened, and a flushing spray nozzle 62 is provided in the interior. With a pressure larger than the washing nozzle 60, a pressure supply of seven washing liquids is applied to the substrate g. As the washing spray nozzle a, it is appropriate

504739 A7 B7 V. Description of the invention (23 uses a conical nozzle that discharges the washing liquid into a slightly conical shape, etc. In addition, an exhaust mechanism 63 is provided in the high-pressure washing tank 61 for suction and discharge from the inside of the high-pressure washing tank 6 丨By using the flushing spray nozzle 62 and supplying the flushing liquid to the substrate G at a relatively large discharge pressure, the developing liquid residue on the substrate G can be effectively removed. In addition, the flushing liquid is used to collide with the substrate G at a high speed to rinse The liquid is atomized, and the mist is recovered by the operation exhaust mechanism 63, which can prevent the mist from spreading to the inside of the water tank 48 and contaminating the interior of the development processing unit (DEV) 24a, ~ 24c, .... Rinse treatment using the flushing spray nozzle 62 It is performed after the substrate G using the rinse nozzle 60 and before the spin-drying treatment, and the processes other than the rinse treatment by the rinse spray nozzle 62 are performed according to the process shown in Fig. 13 just now. The figure shows the flowchart of the imaging processing process in the case of using the flushing spray nozzle 62. The process from step 1 to step 7a and the process from step 14a to step i6a are the same as step i shown in FIG. 13 just now. The process of step 7 & and the process from step 14a to step 16a are performed in the same way. Here, the process from step 7a to step 14a will be described below. If the rinse solution is supplied from the pre-rinsing nozzle 60a to the substrate g to complete the rinse process Then, the discharge of the flushing liquid from the pre-flushing nozzle 60a is stopped, the nozzle holding arm 51 is retracted from the outer cover 47, and the flushing nozzle arm 54 is arranged at a certain position inside the inner cover 46 (step 8b). Continue to make the inner cover 46 The cover 47 is lowered (step 9b), and the number of rotations of the lifted substrate G is started from the rinse nozzle 60 to supply the rinse liquid to the substrate 0 (step 10B). At this time, the rinse liquid that is thrown away by the substrate 0 is mainly discharged from the drain 50b discarded. This paper size is in accordance with Chinese National Standard (CNS) A4 specification (210X297 public love) 26 (Please read the precautions on the back before filling out this page), Yiding — 504739 A7 __B7_ V. Description of the invention (24) Secondly, The discharge of the washing liquid from the washing liquid nozzle 60 is stopped, the inner cover 46 and the outer cover 47 are raised and maintained at the upper position (step lib), and the discharge of the washing liquid from the washing spray nozzle 62 is started. The three-action operation exhausts the high-pressure flushing tank 61 (step 12b). According to the flushing spray nozzle 62, the residue of the developing solution can be reduced by the flushing process. If the flushing spray nozzle 62 is used to complete the flushing process, Stop the rinsing of the rinsing liquid, make the rinsing nozzle arm 54 retreat out of the cover 47, further increase the number of rotations of the substrate G, and spin dry the gas while blowing nitrogen on the substrate g (step 13b). After this step 13b, Step 14 just described processes the substrate G in accordance with the process of step 16a. Furthermore, as described above, the processing (step lib) using the flushing spray nozzle 62 is preferably performed in a state where the steps 46 and 47 are maintained at the upper position. This is because the flushing liquid discharged from the flushing spray nozzle 62 is formed by being atomized. The exhaust port 49 is easier to be exhausted than the drain port 50a. The inner cover 46 and the outer cover 47 are held at the upper stage, and the cover substrate g The space is made narrower because the exhaust efficiency of the exhaust port 49 can be improved. For the same reason, the spin-drying of the substrate G is performed while the inner cover 46 and the outer cover 47 are held at the upper position. Furthermore, in step Ua and step 11fc, the flushing liquid flowing into the drain pipe 50a contains almost no developing solution, so the developing solution concentration can be discarded by using the draining flow path of the waste low-draining solution. The above 'has been described with respect to the implementation mode of the present invention, but the present invention is not limited to the foregoing implementation mode, and may be modified and implemented without departing from the scope of the invention. For example, as shown in FIG. 5, when two nozzles for immersion liquid formation 8 such as · 80b are installed on one nozzle holding arm 51, Chinese national standard (CNS) A4 is further applied to the paper size of the nozzle. Specifications (21〇χ297 公 爱) 27 (Please read the precautions on the back before filling in this page)

V. Description of the invention (25) The arm 51A | county flush nozzle operation, even if the lifting and lowering of each nozzle is provided: the structure can adjust the position of the outlet of the processing liquid. In this field, for example, a developing solution immersion liquid is formed on the substrate in a short period of time using a nozzle 80a for forming an immersion liquid, and the developing liquid is fed into the nozzle 8a by the same immersion liquid formation- The supply of the developing solution is performed in a radial direction step by step, and a process of supplying the washing solution to the substrate G by a pre-rinsing nozzle technique can be performed between a certain developing place and a process of stopping the developing reaction. In addition, two nozzle holding arms 51 are provided, and each of the "solid immersion liquid forming nozzle 80a, the spray nozzle 80c, and the pre-rinsing nozzle _ are attached to each arm, and each arm structure can discharge different types and / or After the concentration of the developer solution, the developer solution can be easily used for the development of different groups of substrates G. The number of nozzles that can be mounted on the nozzle holding arm 51 is arbitrary, for example, one nozzle holder The arm 51 is provided with three or more immersion liquid forming nozzles 80a (80b) or spray nozzles 80c, and even a pre-rinsing nozzle 60a can be provided. The imaging processing unit (Ev) 24a to 24c installed on the platform The number of the holding arms 51 can be made more than two. As a device for holding the substrate G, it is the same as the above embodiment, and is not limited to the rotating chuck 41 holding the substrate G by the suction force. On a large rotating plate, the substrate is placed with a large number of convex pins formed on the rotating plate. When the substrate G is rotated, a substrate (a fixed position on the end surface of the substrate 3, for example, a mechanism for holding the substrate G at the four corners with other pins, etc.) can be used. of In the development processing process, the inner cover 46 and the outer cover 47 are raised and lowered to perform image development, shake off, rinse, and rotate and dry the position adjustment, but the inner cover 504739 A7 B7 V. Description of the invention (26 46 is fixed with the outer cover 47, while the rotary sucker 41 is lifted and held at a certain position, and the processing liquid can be shaken off. Further, in the above embodiment, the LCD substrate has been given The substrate to be processed is described as an example, but the present invention can also be applied to the development processing of other substrates such as semiconductor wafers. <Effects of the Invention> As described above, according to the present invention, due to the development processing in the stage The device (developing processing unit) is not provided with a large number of developing liquid discharge nozzles, and is used to apply the developing liquid to substrates such as nozzles for forming immersion liquid and spray nozzles. Therefore, different types and / or different concentrations need to be supplied. In the case of a developing solution, the nozzle can be replaced with a replacement nozzle. Compared with the case where only one nozzle is provided, the time for nozzle cleaning is not lost. Improve the productivity, and reduce the characteristics and the generation of particles by mixing the different developing liquids, so that high-quality substrates can be obtained. In addition, after forming the developing liquid immersion liquid on the substrate, use a spray nozzle and give it by one side. The development liquid is supplied on the pressure (impact) side, because the imaging liquid immersion liquid is stirred, and the development process is formed more uniformly, so the image characteristics are improved and a clearer image is obtained. The phase is shortened. The kink point can also improve productivity and obtain a high-quality substrate, and it can be formed to correspond to the miniaturization of the type. Furthermore, the pre-rinsing nozzle is mounted on the same nozzle holding arm as the developing solution discharge nozzle: In this case, since the flushing liquid is supplied in the gap between the start and the start of the imaging solution, the imaging reaction can be stopped. Therefore, with ##, the gastric imaging characteristics are improved and the formation of the imaging is uniform. Compatible with this paper standard CNS A4 specification ⑵〇 心 7 公 3

Order | (Please read the notes on the back before filling this page) 504739 A7 _________B7_____ V. Description of the invention (27) The effect of shortening the development processing time. <Brief Description of Drawings> Fig. 1 is a plan view showing a protective film coating and developing processing system 100 for an LCD substrate having a developing processing device (developing processing unit) (DEV) 24a to 24c of the present invention. Fig. 2 is a plan view showing an embodiment of the developing processing apparatus of the present invention. Fig. 3 is a sectional view showing an embodiment of a developing processing apparatus of the present invention. Fig. 4 is an explanatory diagram showing an embodiment of a control system of the development processing apparatus of the present invention. Fig. 5 is a perspective view showing an embodiment of a developing liquid nozzle using the developing processing apparatus of the present invention. Fig. 6 is an explanatory view showing a liquid feeding path of the developing solution toward the developing solution discharge nozzle when the developing solution discharge nozzle of Fig. 5 is used. Fig. 7 is an explanatory diagram showing a developing process when the developing liquid discharge nozzle of Fig. 5 is used. Fig. 8 is an explanatory view showing an embodiment in which gas is supplied to a substrate during spin drying. Fig. 9 is a perspective view showing another embodiment of a developing liquid discharge nozzle used in the developing processing apparatus of the present invention. Fig. 10 is an explanatory view showing an embodiment of a path for supplying developer liquid to a developer discharge nozzle in the case where the developer discharge nozzle shown in Fig. 9 is used. This paper size applies to China National Standard (OB) A4 (210X297 mm) (Please read the precautions on the back before filling this page)

30 504739 A7 B7 V. Description of the invention (28) Fig. 11 is an explanatory diagram showing a developing process in the case where the developing liquid discharge nozzle shown in Fig. 9 is used. Fig. 12 is a plan view showing another embodiment of the development processing apparatus of the present invention. Fig. 13 is an explanatory diagram showing a development processing process using a developing solution discharge nozzle shown in Fig. 12; Fig. 14 is a plan view showing still another embodiment of the image processing apparatus of the present invention. Fig. 15 is an explanatory diagram showing a development process when the flushing spray nozzle of Fig. 14 is used. 31 (Please read the precautions on the back before filling this page) This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 504739 A7 B7 V. Description of the invention (29 Component label comparison 1 ... box area 2 ... processing Section 3 ... Interface section 24a · 24b · 24c, 24a '· 24b' 24c '· 24a "· 24b" · 24c ”》 Development processing unit (DEV) 41… Swivel suction cup 46… Inner cover 47… Outer cover 48… Water tank 51 ... Nozzle holding arm 54 ... Flushing nozzle arms 57a, 57b ... Three-way valves 58a to 58c ... Lifting mechanisms 59a to 59c ... Degassing assembly 60 ... Flushing nozzle 60a ... Flushing nozzle 61 in advance ... High pressure flushing box 62 ... Rinse spray nozzle 80a · 80b ·· Nozzle for forming immersion liquid 80c ... Spray nozzle 100 ... Protective film coating • Development processing system G ... Substrate (substrate to be processed) (Please read the note on the back first Please fill in this page again for details) 32 This paper size applies to China National Standard (CNS) A4 (210X297 mm)

Claims (1)

The imaging processing device of the patent application category includes a holding device for holding the substrate; and a developing liquid supply mechanism for holding the substrate on the holding device; The image liquid supply mechanism includes a plurality of developing liquid discharge nozzles, which are used to discharge the fixed developing liquid; a fixed nozzle holding arm, which is used to hold the majority of the developing liquid discharge nozzles; and, a lifting mechanism ' That is, the height of the mouth of the majority can be adjusted individually. The imaging processing device of the scope of application for patent No. 丨, at least ^ read the development liquid discharge nozzle in the bean has a slit-shaped _ liquid ^ mouth or has a large number of holes arranged in a column in a direction:歩. Chengzhi imaging fluid spit out. 3 · If the scope of patent application is the first! Or 2 development processing devices, in which all of the front ^ most of the imaging liquid ejection nozzles are printed by a consumer cooperative of employees of the Intellectual Property Bureau of the Ministry of Economic Affairs, which is full of certain printing _ immersion on the substrate held in the aforementioned holding device Place the nozzle for liquid formation. 4 · ^ If the development processing device of item 丨 or 2 of the scope of the application for a patent, wherein the above-mentioned number of the development liquid ejection nozzles is a kind of overflowing certain development liquid on the substrate held by the holding device The immersion liquid formation sprays out and at least one of the other developing liquid is ejected from the nozzle, which is sprayed to supply a certain developing liquid to a spray nozzle held on the substrate of the holding device. This paper size is applicable to China National Standard (CNS) A4 specification (210X297 mm). Application range: A8 B8 C8 D8 ^ If the development processing device of scope 1 or 2 of the patent application, the first number of imaging liquid is ejected from the nozzle It is to supply different types and / or different degrees of imaging liquid to the substrate held on the holding device η 6. 8. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 3 If the scope of patent application is 1 or 2 The developing processing device of the item, wherein, after the liquid feeding path for feeding the fixed developing liquid toward the developing liquid discharging nozzle is exhausted, a device for reducing the inside of the developing liquid discharging nozzle and preventing the developing liquid is provided. The suction machine falling from the aforementioned developing solution ejection nozzle, and the developing processing device of the first or second application scope of the patent application claim 4, wherein the developing solution of Krypton toward the aforementioned developing solution ejecting nozzle is a liquid feeding path. On the way, a degassing unit is provided to remove air bubbles contained in the developing solution. A developing processing device includes: a holding device for holding a substrate; a developing liquid supply mechanism for supplying a certain developing liquid to a substrate held by the holding device; and a washing liquid supplying device, It is used to supply the washing liquid on the substrate to which the developing solution is applied; and the aforementioned developing solution supply mechanism includes: / nozzle for forming a liquid, which is used to fill a certain developing solution to be held The substrate of the holding device; and the spray nozzle, which is used to condense and supply a certain developing liquid to the substrate held by the holding device; (Please read the precautions on the back before filling this page) 34 504739 Α8 Β8 C8 D8 6. The application scope of the patent describes the rinse liquid supply device, which includes: a pre-rinsing nozzle, which is used to apply a certain amount of imaging liquid to the substrate held by the holding device. Those who continue to supply a certain amount of rinsing liquid to the substrate; and, a rinsing nozzle, which is used to supply a certain amount of rinsing liquid after completing the supply of the rinsing liquid by the aforementioned pre-rinsing nozzle; It is installed on the same nozzle holding arm that holds the nozzle by I. For example, the development processing device of item 8 of the patent scope has n position adjustment nozzles for adjusting the position of the feed nozzle and the aforementioned pre-punching nozzle. 10_ Read the imaging processing device such as item 9 in the scope of the patent application, wherein the aforementioned immersion liquid forms a nozzle with the aforementioned nozzle and the aforementioned pre-rinsing spray, and is maintained at the aforementioned nozzle, and has the aforementioned immersion liquid 丨Position adjustment mechanism using the position adjustment of the nozzle. 1% of the imaging processing device of the patent item 8, wherein the aforementioned supply mechanism further has a spray flushing nozzle for a predetermined pressure of two: a certain flushing liquid nozzle is applied to the substrate held by the aforementioned holding device; . 12. Read the imaging processing device as described in item Η of the scope of patent application, in which the flushing nozzle is purely set in a box with an exhaust mechanism, and mainly touches the exhaust mechanism. The stomach spit out the flushing liquid because of the spray flushing nozzle. The mist of the washing liquid is attracted to the exhauster. 13 ·-Kinds of imaging processing methods' system—The paper size of the printed substrates of the exposed substrates of the seed industry is applicable to the Chinese national standard (C is called A4 specification (21〇 × 297):-(Please read the precautions on the back before (Fill in this page), 1T printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, Consumer Consumption Cooperative, 35 504739 Patent application processing methods, including: The 2nd process of the process is to supply the fixed imaging liquid to the substrate that is placed into a slightly flat lamp With a full developer solution; one-by-two manufacturing process is to spray and supply a stack of developer solution to a substrate full of a certain developer solution; and, the manufacturing process is to complete the development of the aforementioned second process Spraying of the liquid 5 Cold: continue to supply the substrate with the rinse solution. 14 · Ϊ: The imaging processing method as described in item 13 of the scope of the patent application, in which the nozzle for supplying the aforementioned rinse solution is changed after the aforementioned: sound path. : The fourth process of the 4th process. 15. For example, the imaging processing method of the 14th scope of the patent application, in which the aforementioned washing solution is made slightly conical under a certain pressure during the front peak process. Describing the substrate. 16. ^ = ^ 如 申The imaging processing method in the scope of the patent No. 13, 14 or 15 is to support those who make the aforementioned substrate rotate by a certain number of rotations and perform the processes after the previous two processes. Through the Consumers' Cooperative of the Intellectual Property Bureau of Qibu The printed paper size is applicable to China National Standard (CNS) A4 (210X297 mm)