1345260 九、發明說明： ， (一） 發明所屬之技術領域 本發明係關於在液晶製造過程的光阻剝離處理或顯影 處理等使用的光阻去除裝置，特別是關於基板搬運式之光 阻去除裝置。 (二） 先前技術 在製造液晶面板時，爲了在玻璃基板之表面形成疊層 電路，予以反覆成膜、光阻塗層、顯影、蝕刻、剝離之各 處理。於此所使用的剝離裝置係例如有基板搬運式。在基 板搬運式之剝離裝置，由於從上方之淋浴單元撒布剝離液 於水平方向所搬運的基板表面，予以去除殘留在其基板表 面的光阻。 作爲於光阻去除裝置的玻璃基板，通常乃使用使液體 以圓錐形狀吐出，將全圓錐體型式之噴霧嘴排列成矩陣狀 者。除剝離裝置以外，在專利文獻1記載有使全圓錐體型 式之噴霧嘴向兩側同步擺動的蝕刻裝置用淋浴單元。又記 載於專利文獻2係將液體噴吹於直線狀的扁形噴霧嘴，對 搬運方向直角的板寬方向傾斜配置成八字狀的蝕刻裝置用 淋浴單元。 (專利文獻1)日本國國際公開第〇2/49087號小冊子 (專利文獻2)日本國特開2001-200379號公報 基本上對於在基板搬運式光阻剝離裝置之淋浴單元的 想法，在於供給大量剝離液在基板之表面。從此觀點，其 意義係使用了排列全圓錐體型式之噴霧嘴排列爲矩陣狀的 1345260 淋浴單元，但全圓錐體型式之噴霧嘴時，因旋轉液來噴出 所以有容易發生泡的問題。又與供給大量剝離液相比，從 基板表面去除的光阻容易留在基板上，有再附著的問題。 再者，滴滴變細小容易發生霧，對其霧的附著於基板情況 -亦有再附著的問題。 記載於專利文獻1及專利文獻2之淋浴單元乃爲蝕刻 之用，所以在均勻處理之面乃優越，但並不能說爲適於光 阻剝離。亦即，專利文獻1所記載的淋浴單元時，係伴隨 使用全圓錐體型式噴霧嘴有泡、霧方面的問題，雖不管將 ® 其噴霧嘴向兩側作同步擺動，不能說爲有充分從含去除光 阻剝離液之基板上的排出性，其剝離光阻有容易留在基板 上的問題。又記載於專利文獻的淋浴單元時，在基板上的 液干涉激烈，有顯著的去除光阻殘留於基板上之傾向》 (三）發明內容 (發明之啓示） (發明欲解決的課題） 本發明之目的，在於提供能有效果地抑制發生泡及霧 ® ，而且從基板上能有效率地排除去除光阻之光阻去除裝置 〇 (爲了解決課題的手段） 爲了達成上述目的，本發明之光阻去除裝置具備有： 支撐基板搬運於水平方向的基板搬運機構，及用來供給藥 液於該基板表面設在基板搬運面上方的淋浴單元，該淋浴 單元具有，使藥液沿基板搬運方向直線的且倂排的噴吹， 1345260 配置複數列的多數個扁形噴霧嘴，及將多數個扁形噴霧嘴 以基部側爲中心向兩側同步擺動的噴嘴擺動機構。 於本發明之光阻去除裝置，係由於其扁形噴霧嘴使液 - 擴散方向大致向基板搬運方向排複數列，在各列以直線的 . 沿基板搬運方向噴吹光阻去除液。而且由於各列之扁形噴 霧嘴以基板側爲中心互相向兩側同步擺動，使複數列之液 膜互相向兩側傾斜，從基板表面向基板之兩側有效率地排 除含光阻的藥液。而有效果地抑制在使用全圓錐體型式噴 霧嘴成問題的泡發生及發生霧，亦有效果地實行排除所發 Φ 生的泡。 多數個之扁形噴霧嘴，係用規定間隔排列於基板寬度 方向，用規定之間隔分別安裝在支撐爲可旋轉地基板搬運 方向之複數管集箱管，噴嘴擺動機構，由於用規定角度同 步旋轉各管集箱管於兩方向，將多數個扁形噴霧嘴向兩側 旋轉擺的構成爲理想。 排列於基板搬運方向的複數扁形噴霧嘴，係在鄰接的 噴霧嘴之間使其避免噴射液之干涉，對基板搬運方向用30 度以下，較佳係用1 5度以下之角度向同方向傾斜爲理想。 此傾斜角度大時，就降低排除基板上之液體於基板兩側的 功能。對於此傾斜角度之下限，係從避免干涉之點1度以 上爲理想。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photoresist removal device used in a photoresist stripping process or a development process in a liquid crystal manufacturing process, and more particularly to a substrate transfer type photoresist removal device. . (2) Prior Art In the production of a liquid crystal panel, in order to form a laminated circuit on the surface of a glass substrate, various processes of film formation, photoresist coating, development, etching, and peeling are repeated. The peeling device used here is, for example, a substrate transfer type. In the substrate transport type peeling device, the surface of the substrate conveyed by the peeling liquid in the horizontal direction is sprinkled from the upper shower unit, and the photoresist remaining on the surface of the substrate is removed. As the glass substrate of the photoresist removing device, it is generally used to discharge a liquid in a conical shape and to arrange a full-cone type spray nozzle in a matrix. In addition to the peeling device, Patent Document 1 discloses a shower unit for an etching apparatus that oscillates a spray nozzle of a full-cone type to both sides. Further, the patent document 2 is a shower unit for an etching apparatus in which a liquid is sprayed on a linear flat spray nozzle and arranged in a figure-eight shape in a direction in which the direction of the sheet is perpendicular to the conveyance direction. (Patent Document 1) Japanese Laid-Open Patent Publication No. 2/49087 (Patent Document 2) Japanese Laid-Open Patent Publication No. 2001-200379. The basic idea of the shower unit in the substrate transport type resist stripping apparatus is that a large amount of supply is provided. The stripping solution is on the surface of the substrate. From this point of view, the meaning is that the 1345260 shower unit in which the spray nozzles of the full cone type are arranged in a matrix shape is used. However, when the spray nozzle of the full cone type is sprayed by the rotary liquid, there is a problem that bubbles are likely to occur. Further, the photoresist removed from the surface of the substrate is likely to remain on the substrate as compared with the supply of a large amount of the peeling liquid, and there is a problem of reattachment. Further, when the droplets become fine, fogging is likely to occur, and the fog adheres to the substrate - there is also a problem of reattachment. The shower unit described in Patent Document 1 and Patent Document 2 is used for etching, and therefore is superior in the surface to be uniformly treated, but it cannot be said to be suitable for resist stripping. In other words, in the case of the shower unit described in Patent Document 1, there is a problem of foaming or fog accompanying the use of the full-cone type spray nozzle, and it is not sufficient to fully swing the spray nozzle to the both sides. The discharge property on the substrate containing the photoresist stripping-removing liquid has a problem that the peeling resist is likely to remain on the substrate. Further, when it is described in the shower unit of the patent document, the liquid interference on the substrate is intense, and there is a tendency to remove the photoresist on the substrate. (III) SUMMARY OF THE INVENTION (Problems to be Solved by the Invention) The present invention It is an object of the present invention to provide a photoresist removal apparatus which can effectively suppress the generation of bubbles and mists, and which can efficiently remove the photoresist from the substrate (in order to solve the problem), in order to achieve the above object, the light of the present invention The resist removal device includes: a substrate transport mechanism that transports the support substrate in the horizontal direction; and a shower unit that supplies the chemical solution on the substrate surface above the substrate transport surface, the shower unit having a straight line for moving the chemical liquid along the substrate transport direction The 1345260 is equipped with a plurality of flat spray nozzles in a plurality of rows, and a nozzle swinging mechanism that swings a plurality of flat spray nozzles synchronously on both sides of the base side. In the photoresist removal apparatus of the present invention, the flat spray nozzle discharges the photoresist removal liquid in a row along the substrate transport direction by arranging the liquid-diffusion direction substantially in the substrate transport direction. Moreover, since the flat spray nozzles of the respective columns are synchronously oscillated toward each other on the substrate side, the liquid films of the plurality of columns are inclined to each other, and the photoresist containing the photoresist is efficiently removed from the surface of the substrate toward both sides of the substrate. . In addition, it is effective to suppress the occurrence of bubbles and fogging which are problematic in the use of the full-cone type nozzle, and it is also effective to eliminate the bubbles generated by the Φ. A plurality of flat spray nozzles are arranged at predetermined intervals in the width direction of the substrate, and are respectively attached to a plurality of tube header tubes supported in a rotatably substrate transport direction at predetermined intervals, and the nozzle swinging mechanism is rotated by a predetermined angle. It is desirable that the tube header tube is rotated in both directions and that a plurality of flat spray nozzles are pivoted to both sides. The plurality of flat spray nozzles arranged in the substrate transport direction are arranged between the adjacent spray nozzles to avoid interference of the spray liquid, and the substrate transport direction is 30 degrees or less, preferably inclined at an angle of 15 degrees or less in the same direction. Ideal. When the tilt angle is large, the function of removing the liquid on the substrate on both sides of the substrate is reduced. The lower limit of the tilt angle is ideal from the point of avoiding interference of 1 degree or more.
本發明之光阻去除裝置，係使用以矩陣狀排列於基丰反 搬運面上的多數個扁形噴霧嘴，由於實行沿基板搬運方向 的複數列直線狀液噴射，能有效果地抑制產生泡及霧。M 1345260 且向其等之扁形噴霧嘴向兩側同步旋轉擺動，由於將複數 列之液膜以上端側爲中心向兩側同步的傾斜，邊提高處理 的均勻性，有效率地向兩側排除基板上之液體，能從基板 - i有·效率地排除去除光阻及泡。 - (四）實施方式 (胃7實施發明的較佳形態） 以下根據圖面詳細說明本發明之實施形態。第1圖係 表示本發明一實施形態的光阻去除裝置側視圖；第2圖係 同光阻去除裝置之前視圖；第3圖係於同光阻去除裝置表 · 示噴霧圖型上視圖。 本實施形態之光阻去除裝置，係爲使用於製造液晶面 板用坡璃基板的基板搬運式光阻剝離裝置。在此光阻去除 裝置具備有’將玻璃基板10支撐爲水平來搬運於水平方向 的基板搬運機構2 0，及供給剝離液於以基板搬運機構2 0 所搬運的玻璃基板10表面之淋浴單元20。 基板搬運機構2 0具有，用規定間隔排列在基板搬運方 向X的複數搬運輥子21’及用1個比率組合於規定數搬運 ® 輥子2 1的壓住輥子2 2。各搬運輥子2 1係成爲與基板搬運 方向X直角的水平方向旋轉軸，用規定間隔安裝大徑圓板 狀之支持構成，兩端之支持部，爲了定位玻璃基板1〇之寬 方向形成爲嵌合基板10兩邊緣部的具凸緣形狀。 淋浴單元3 0具有：用等間隔排列於基板寬方向的複數 管集箱管3 1 ;用規定間隔向下安裝於各管集箱管3 1的複 數噴霧嘴32;及爲了擺動噴霧嘴32將管集箱管31用規定 1345260 角度向兩方旋轉的噴嘴擺動機構33。 各管集箱管31，在與基板搬運方向X平行的水平管， 支撐成圍繞中心爲旋轉自如，藉由未圖示之可撓管供給剝 離液》 噴霧嘴32，由於用規定間隔安裝在複數之管集箱管3 1 ，於縱橫兩方各以每規定數矩陣狀的排列在基板搬運面之 上方。各噴霧嘴3 2係使剝離液直線狀的噴吹於玻璃基板 1 〇表面，乃將其剝離液吐出爲三角形膜狀的扁形噴霧嘴。 於各管集箱管3 1的複數噴霧嘴3 2，亦即排列在基板搬運 方向X(縱方向）的複數噴霧嘴32，係各噴嘴之直線狀噴霧 圖型3 4於基板搬運方向X隔以若干間隙排成直線狀，且對 其基板搬運方向於方向配置成用同角度0傾斜。 排列在基板搬運方向X的複數噴霧嘴之各噴霧圖型34 ’由於對基板搬運方向X傾斜於同方向，在基板上能避免 從鄰接的噴霧嘴所噴出剝離液之干涉。於此的傾斜角度0 係3 0度以下，尤其是理想爲1 5度以下，在此乃設定爲約 5度。 噴嘴擺動機構33，將排列在基板寬方向的複數管集箱 管3 1向兩向同步旋轉每一規定角度（參照專利文獻〗）。並 依此’以矩陣狀排列在基板搬運面上的多數噴霧嘴3 2就同 步向兩側旋轉擺動。噴霧嘴32的旋轉擺動角度ω，依擺動 的基板寬方向之液噴射範圍W在鄰接縱方向之噴霧嘴列間 ’因應於噴霧嘴列之間隔D適宜選擇爲使其重疊。又擺動 週期以7〜1 5秒爲理想。亦即，週期短時，藥液載在基板 1345260 上的攪煉處理時間變短，攪煉後因排除藥液於兩側的時間 變短，所以降低處理效率。又此週期長時，向兩側排除載 於基板上藥液的力變弱，仍然降低處理效率。 _ 於本實施形態之光阻去除裝置，係從配置在基板搬運 . 面上方的淋浴單元3 0噴射雨淋狀剝離液。然後使玻璃基板 10通過其雨淋之內。並依此，溶解去除留在基板10表面 的光阻。 在此，淋浴單元3 0，由排列矩陣狀於基板搬運面上方 的多數個扁形噴霧嘴32所構成。具體地，於各管集箱管 H 3 1的複數噴霧嘴3 2，亦即從排列在基板搬運方向X(縱方 向）的複數噴霧嘴3 2，以直線狀噴射剝離液在通過下方的玻 璃基板10表面。依此，對玻璃基板10之表面，予以實施 沿基板搬運方向的複數列直線狀液噴射。而且多數個扁形 噴霧嘴3 2係向兩側同步作旋轉擺動。 並由於使用扁形噴霧嘴3 2來實施複數列之直線狀液 噴射’則在基板寬方向向基板表面的液供給雖會變不均勻 ’但其扁形噴霧嘴3 2因向兩側同步作旋轉擺動，所以緩和 ® 了不均勻。 而最重要者，由於直線狀液噴射與旋轉擺動組合，基 板上之液體有效率地向兩側排除。亦即，由於組合直線狀 '液噴射與旋轉擺動噴射液膜互相向兩側傾斜，其液膜一齊 向右側傾斜時係基板上之液體向右側排除，一齊向左側傾 斜時係向左側排除基板上之液體者。其結果，有效率地排 除含自基板的表面剝離光阻的剝離液中之泡，與抑制霧等 -10- !345260 牛目輔有效果地防止光阻的再附著。 又上述實施形態係爲光阻剝離裝置’但亦可爲顯影裝 置。又基板係支撐於水平來搬運，但傾斜於側方所搬運傾 斜搬運方式亦可以。 (五）圖式簡單說明 第1圖係表示本發明一實施形態的光阻去除裝置側視 圖。 第2圖係同光阻去除裝置之前視圖。 第3圖係於同光阻去除裝置表示噴霧圖型的上視圖。 主要元件符號說明 10 玻 璃 基 板 20 基 板 搬 運 機 構 2 1 搬 運 輥 子 22 壓 住 輥 子 3 0 淋 浴 單 元 3 1 管 集 箱 管 32 噴 霧 嘴 3 3 噴 嘴 擺 動 機 構 34 噴 霧 圖 型In the photoresist removal apparatus of the present invention, a plurality of flat spray nozzles arranged in a matrix on the base anti-transport surface are used, and by performing a plurality of linear liquid jets in the substrate transport direction, the generation of bubbles can be effectively suppressed. fog. M 1345260 and the flat spray nozzles of the same type are synchronously oscillated to the sides, and the liquid crystal film of the plurality of columns is inclined to the sides on the upper end side, thereby improving the uniformity of the treatment and efficiently eliminating the two sides. The liquid on the substrate can efficiently remove the photoresist and bubbles from the substrate. - (4) Embodiments (Best Mode of Carrying Out the Invention of Stomach 7) Hereinafter, embodiments of the present invention will be described in detail based on the drawings. Fig. 1 is a side view showing a photoresist removing apparatus according to an embodiment of the present invention; Fig. 2 is a front view of the photoresist removing apparatus; and Fig. 3 is a top view showing a spray pattern in the same photoresist removing apparatus. The photoresist removal device of the present embodiment is a substrate transfer type resist stripping device used for manufacturing a glass substrate for a liquid crystal panel. The photoresist removal apparatus includes a substrate transport mechanism 20 that supports the glass substrate 10 horizontally and is transported in the horizontal direction, and a shower unit 20 that supplies the peeling liquid to the surface of the glass substrate 10 transported by the substrate transport mechanism 20. . The substrate conveyance mechanism 20 has a plurality of conveyance rollers 21' arranged at a predetermined interval in the substrate conveyance direction X, and a pressure roller 2 2 which is combined with a predetermined number of conveyance ® rollers 2 1 at a ratio. Each of the conveyance rollers 21 is a horizontal rotation axis that is perpendicular to the substrate conveyance direction X, and is supported by a large-diameter disk shape at a predetermined interval, and the support portions at both ends are formed to be in the width direction of the positioning glass substrate 1 Both edge portions of the combined substrate 10 have a flange shape. The shower unit 30 has a plurality of tube header tubes 3 1 arranged at equal intervals in the width direction of the substrate; a plurality of spray nozzles 32 mounted downwardly at respective tube header tubes 31 at predetermined intervals; and for swinging the spray nozzles 32 The header tube 31 is a nozzle swing mechanism 33 that rotates in two directions at a predetermined angle of 1345260. Each of the tube header tubes 31 is supported so as to be rotatable around the center in a horizontal tube parallel to the substrate conveyance direction X, and the spray nozzle 32 is supplied by a flexible tube (not shown), and is attached to the plurality of nozzles at predetermined intervals. The tube header tube 3 1 is arranged above the substrate transport surface in a matrix of a predetermined number in both the vertical and horizontal directions. Each of the spray nozzles 3 2 is a flat spray nozzle in which a peeling liquid is linearly sprayed on the surface of the glass substrate 1 and the peeled liquid is discharged into a triangular film shape. The plurality of spray nozzles 3 2 of the respective header tubes 3 1 , that is, the plurality of spray nozzles 32 arranged in the substrate transport direction X (longitudinal direction), are linear spray patterns 34 of the respective nozzles in the substrate transport direction X The gaps are arranged in a straight line with a plurality of gaps, and the substrate conveyance direction is arranged to be inclined at the same angle 0 in the direction. Since each of the spray patterns 34' of the plurality of spray nozzles arranged in the substrate conveyance direction X is inclined in the same direction with respect to the substrate conveyance direction X, interference of the peeling liquid discharged from the adjacent spray nozzles can be avoided on the substrate. Here, the inclination angle 0 is 30 degrees or less, and particularly preferably 15 degrees or less, and is set to about 5 degrees here. The nozzle swinging mechanism 33 rotates the plurality of header tubes 3 1 arranged in the width direction of the substrate in synchronization with each other at a predetermined angle (see Patent Document). Accordingly, the plurality of spray nozzles 3 2 arranged in a matrix on the substrate carrying surface are rotatably oscillated to both sides. The rotational swing angle ω of the spray nozzle 32 is appropriately selected between the spray nozzle rows adjacent to the longitudinal direction in accordance with the interval D between the spray nozzle rows in the longitudinal direction of the swinging plate so as to overlap. The swing period is ideal for 7 to 15 seconds. That is, when the cycle is short, the pulverization treatment time on the substrate 1345260 is shortened, and the time for removing the chemical solution on both sides becomes shorter after the pulverization, so that the treatment efficiency is lowered. When the cycle is long, the force for removing the chemical liquid on the substrate from both sides is weakened, and the processing efficiency is still lowered. In the photoresist removal apparatus of the present embodiment, the shower-like stripping liquid is sprayed from the shower unit 30 disposed above the substrate. The glass substrate 10 is then passed through its rain. Thereby, the photoresist remaining on the surface of the substrate 10 is dissolved and removed. Here, the shower unit 30 is composed of a plurality of flat spray nozzles 32 arranged in a matrix shape above the substrate transport surface. Specifically, the plurality of spray nozzles 3 2 of the tube header tubes H 3 1 , that is, the plurality of spray nozzles 3 2 arranged in the substrate transport direction X (longitudinal direction), spray the stripping liquid in a straight line through the glass below. The surface of the substrate 10. Accordingly, the surface of the glass substrate 10 is subjected to a plurality of linear liquid ejections in the substrate transport direction. Moreover, a plurality of flat spray nozzles 3 2 are synchronously oscillated to both sides. Further, since the linear liquid ejecting of the plurality of columns is performed by using the flat spray nozzles 3 2, the liquid supply to the surface of the substrate in the width direction of the substrate may become uneven, but the flat spray nozzles 3 2 are rotated in synchronization with each other. , so the mitigation® is uneven. Most importantly, due to the combination of linear liquid jet and rotary swing, the liquid on the substrate is effectively removed to both sides. That is, since the combined linear liquid jet and the rotary oscillating jet liquid film are inclined to each other on both sides, the liquid film is tilted to the right side, and the liquid on the substrate is excluded to the right side, and when tilted to the left side, the substrate is removed to the left side. Liquid. As a result, the bubbles in the stripping liquid containing the surface peeling resist from the substrate are efficiently removed, and the fog is prevented from being reattached by the effect of suppressing fog or the like. Further, the above embodiment is a photoresist peeling device', but may be a developing device. Further, the substrate is supported by the horizontal conveyance, but the inclined conveyance method may be carried by the side. (5) Brief Description of the Drawings Fig. 1 is a side elevational view showing a photoresist removing apparatus according to an embodiment of the present invention. Figure 2 is a front view of the same photoresist removal device. Figure 3 is a top view showing the spray pattern of the same photoresist removal device. Main component symbol description 10 Glass base plate 20 Base plate transporting mechanism 2 1 Handling roller 22 Pressing roller 3 0 Showering unit 3 1 Tube collecting box tube 32 Spray nozzle 3 3 Nozzle swinging mechanism 34 Spray pattern