JP2003151947A - Apparatus and method of treating surface - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an apparatus and a method of treating a surface, which enables treatment by a treatment liquid, cleaning, and drying of a plate to be treated, by only a single apparatus of a simple structure. SOLUTION: In a surface treatment apparatus 1A, with an opposite face 31 of a vehicle 3 which is close to a treatment face 101 of a plate 100 to be treated, a treatment liquid T is supplied from treatment liquid outlet ports 62a-62h into a space 10 in between the treatment face 101 and the opposite face 31 of the vehicle 3 to treat the treatment face 101. Then, a cleaning liquid R is supplied from a cleaning liquid outlet port 72 for cleaning the treatment face 101. Then, with the plate 100 kept in a non-horizontal state, a surface active gas is supplied near a meniscus M of the cleaning liquid R formed at the higher side of the plate 100, to be treated from a gas outlet port (the treatment liquid outlet port 62a), formed in the vehicle 3. While the surface active gas is supplied, the vehicle 3 is pivoted about a part near the edge 102 at the lower side of the plate 100 to be treated as the pivoting center 30 for moving the meniscus M along the treatment face 101 toward the pivoting center 30 side to dry the treatment face 101.

Description

Detailed Description of the Invention

[0001]

TECHNICAL FIELD The present invention relates to a surface treatment apparatus and a surface treatment method.

[0002]

2. Description of the Related Art As a method for drying and removing water adhering to a substrate, a meniscus caused by the surface tension of water and a solvent gas +
A method of drying a substrate is known in which the Marangoni effect of an inert gas is used to dry the substrate surface without causing water droplets (Japanese Patent Laid-Open No. 10-321587).

This publication discloses a drying device for carrying out the drying method (hereinafter referred to as a conventional "drying device"), and this conventional drying device includes the following. There are various drawbacks.

1. The conventional drying device has a function of only drying the water adhering to the substrate (plate to be processed), and performs the pre-process such as cleaning process and the pre-process such as deposit film coating and etching process. Must be performed using a separately prepared coating device, a cleaning device such as a cleaning tank, or a processing device such as a processing liquid tank.

Therefore, for example, in a line in which processing, cleaning and drying of substrates are performed continuously, a processing device, a cleaning device and a drying device are installed in parallel, and the substrate is moved between the respective devices for processing. Therefore, the equipment cost and the large installation space are required.

[0006] In particular, when the substrate after being cleaned by the cleaning device is transferred to the drying device, it is necessary to prevent dust (foreign matter) from entering and adhering to the substrate. In some cases, it is necessary to install a mechanism or means having a dustproof function in the transfer route.

2. Although water adheres to the surface of the substrate by some method, the amount of water adhered is not controlled artificially, and is therefore expected to fluctuate.

In this case, as described above, since the gap distance between the draining blocks is fixed, the transportation speed of the substrate becomes faster, and the thickness of the substrate is thinner than the designed value (the surface of the substrate and In the case of a water film formed between the inner surface of the draining block and the inner surface of the draining block (hereinafter simply referred to as "water film"), the drying chamber (mixed gas filling space surrounded by the cover) The amount of water flowing in may be excessive. In this case, it may take a long time to dry, or the meniscus may increase beyond an appropriate size, resulting in a decrease in drying efficiency and poor drying (water droplet marks, remaining particles, etc.).

On the contrary, when the amount of water adhering to the substrate becomes too small, the water is not sufficiently diffused and filled between the substrate surface and the inner surface of the draining block due to the capillary phenomenon. It may cause poor drying.

3. In the conventional drying device, even if dirt (for example, foreign matter) is mixed in the water entering the gap between the draining blocks, or if the water existing in the gap between the draining blocks (that is, the water film) becomes dirty, Since the water cannot be removed or replaced and is brought into the drying chamber, there is a possibility that such water stains may cause poor drying.

4. In the conventional drying device, the substrate passes through the gap between the pair of draining blocks,
Since the gap distance between the draining blocks is fixed, it is not possible to cope with the change in the thickness of the substrate, and the drying can be performed only on the substrate having a constant thickness. When the substrate has a pattern, the gap between the block and the substrate varies, so that the meniscus varies, and there is a possibility that a portion where the capillarity phenomenon does not occur and water droplets remain.

5. In the conventional drying device, both surfaces of the substrate are wet with water, and both surfaces of the substrate are dried at the same time. Therefore, it is difficult to cope with the case where only one side of the substrate is desired to be dried. In particular, if one side of the substrate that has been wetted with water is dry and the other side is not desired to be wetted with water, this cannot be dealt with. Also, it is not possible to deal with the case where it is desired to perform the treatment with the treatment liquid on only one side.

[0013]

SUMMARY OF THE INVENTION An object of the present invention is to provide a surface treatment apparatus and a surface treatment apparatus capable of performing treatment with a treatment liquid, cleaning and drying on a plate to be treated with a single device having a simple structure. It is to provide a processing method.

[0014]

The above objects are achieved by the present invention described in (1) to (29) below.

(1) An apparatus main body supporting a plate to be processed,
A proximity body that can be located close to the surface of the plate to be processed supported by the apparatus main body, a driving unit that relatively moves the proximity body and the plate to be processed, and the proximity body. Treatment liquid supply means for supplying at least one treatment liquid for treating the surface to a gap between the surface and the proximity body from a treatment liquid outlet, and the surface and the cleaning liquid outlet formed in the proximity body. A cleaning liquid supply unit that supplies a cleaning liquid to a gap between the proximity body and a cleaning liquid supplied to a gap between the surface and the proximity body, and a surfactant is included near a meniscus of the cleaning liquid from a gas outlet formed in the proximity body. A surface-active gas supply means for supplying a surface-active gas, and in a state where the proximity body is brought close to the surface of the plate to be processed, the treatment is performed from the treatment liquid outlet in a gap between the surface and the proximity body. Supply the liquid to the surface Then, a cleaning liquid is supplied to the gap between the surface and the proximity body from the cleaning liquid outlet to clean the surface, and the surface-active gas is supplied from the gas outlet to the vicinity of the meniscus of the cleaning liquid. While moving the meniscus along the surface by relatively moving the proximity body and the plate to be processed by the driving means, the surface of the plate to be processed is dried. A surface treatment device characterized by being activated.

(2) The surface treatment apparatus as described in (1) above, which has a conveying means for conveying the plate to be treated.

(3) The surface treatment apparatus according to the above (2), which has a positioning means for positioning the carrying stop position of the plate to be processed.

(4) The method according to any one of (1) to (3) above, which has a removing means for removing the processing liquid and / or the cleaning liquid supplied to the gap between the surface of the plate to be processed and the proximity body. Surface treatment equipment.

(5) The removing means is composed of an air supply means for supplying air into a gap between the surface of the plate to be processed and the proximity body, and by the air supply, the treatment liquid or the cleaning liquid is fed into the gap. The surface treatment apparatus as described in (4) above, which is extruded from and removed.

(6) The surface according to (4) above, wherein the removing means comprises a draining means for sucking and discharging the processing liquid or the cleaning liquid from a liquid inlet formed in the proximity body. Processing equipment.

(7) After removing the processing liquid or the cleaning liquid by the removing means, the processing liquid or the cleaning liquid is supplied by the processing liquid supply means or the cleaning liquid supply means, whereby the surface of the plate to be processed and the proximity body. The surface treatment apparatus according to any one of the above (4) to (6), wherein the treatment liquid or the cleaning liquid in the gap between and can be exchanged.

(8) By removing the processing liquid or the cleaning liquid by the removing means and supplying the processing liquid or the cleaning liquid by the processing liquid supply means or the cleaning liquid supply means, the surface of the plate to be processed and the proximity body. The surface treatment apparatus according to any one of the above (4) to (7), which can treat or clean the surface while exchanging a treatment liquid or a cleaning liquid in a gap between the surface treatment device and the cleaning liquid.

(9) In any one of the above (1) to (8), the treatment liquid outlet and / or the cleaning liquid outlet is composed of a plurality of small holes arranged in one or two or more rows. The surface treatment device described.

(10) The proximity body has a facing surface that can be positioned so as to face the surface of the plate to be processed, and in the drying treatment, the plate to be processed is in a non-horizontal state, and While supplying the surface-active gas from the gas outlet in the vicinity of the meniscus of the cleaning liquid formed on the high side of the processing plate, by the driving means, the facing surface near the lower edge of the plate to be processed. The surface treatment according to any one of (1) to (9), wherein the meniscus is moved along the surface toward the center of rotation by relatively rotating as a center of rotation. apparatus.

(11) The surface treatment apparatus according to the above (10), further comprising a plate inclining means for inclining the plate to be in a non-horizontal state.

(12) The surface treatment apparatus according to the above (10) or (11), wherein the proximity body has a substantially plate shape.

(13) The surface treatment apparatus according to any one of (10) to (12), wherein the size of the plate to be processed and the size of the facing surface are substantially the same.

(14) The drive means can process the surface of the plate to be processed with the processing liquid while relatively swinging the facing surface along the surface of the plate to be processed. The surface treatment apparatus according to any one of (1) to (13).

(15) The proximity member can be relatively scanned along the plate to be processed by the driving means, and the drying process is performed in the scanning direction backward of the proximity member with respect to the plate to be processed. While supplying the surface-active gas from the gas outlet to the vicinity of the meniscus of the cleaning liquid formed on the side, by relatively scanning the proximity member along the plate to be processed by the driving means, the meniscus The surface treatment apparatus according to any one of (1) to (9) above, which is performed by moving the substrate along the surface.

(16) The drive means performs the treatment with the treatment liquid or the cleaning treatment while relatively scanning the proximity body along the plate to be treated.
The surface treatment apparatus according to.

(17) The surface according to the above (15) or (16), which has exhaust means for sucking in and discharging the surface-active gas supplied from the gas outlet through a gas inlet formed in the proximity body. Processing equipment.

(18) With the proximity body movable relative to the plate to be processed and the surface of the plate to be processed in close proximity to each other, the processing liquid outlet formed in the proximity body brings the surface into contact with the surface. At least one type of treatment liquid for treating the surface is supplied to the gap between the proximity body and the surface to treat the surface, and then the gap between the surface and the proximity body is formed from the cleaning liquid outlet formed in the proximity body. While supplying the cleaning liquid to the surface to clean the surface, while supplying the surface-active gas near the meniscus of the cleaning liquid from the gas outlet formed in the proximity body, the proximity body and the plate to be treated are opposed to each other. The surface treatment method is characterized in that the meniscus is moved along the surface by moving the surface of the plate, and thereby the surface of the plate to be processed is dried.

(19) After removing the processing liquid or the cleaning liquid supplied to the gap between the surface of the plate to be processed and the proximity body, the processing liquid or the cleaning liquid is supplied from the processing liquid outlet or the cleaning liquid outlet. Thereby, the surface treatment method according to (18), wherein the treatment liquid or the cleaning liquid is exchanged to perform the treatment or the cleaning treatment.

(20) In the treatment with the treatment liquid or the cleaning treatment, the treatment liquid or the cleaning liquid in the gap between the surface of the plate to be treated and the proximity body is removed, and the treatment liquid outlet or the cleaning liquid outlet is used. The surface treatment method according to (18) above, which is performed while the treatment liquid or the cleaning liquid is exchanged by supplying the treatment liquid or the cleaning liquid.

(21) The proximity body has a facing surface that can be positioned so as to face the surface of the plate to be processed, and in the drying process, the plate to be processed is in a non-horizontal state, and While supplying the surface-active gas from the gas outlet to the vicinity of the meniscus of the cleaning liquid formed on the higher side of the processing plate, the opposing surface is relatively rotated around the lower side edge of the plate to be processed as a rotation center. The surface treatment method according to any one of (18) to (20) above, wherein the meniscus is moved along the surface toward the center of rotation by rotating the lens.

(22) The surface treatment method as described in (21) above, wherein the treatment with the treatment liquid is performed while the opposite surface is relatively swung along the surface of the plate to be treated.

(23) The surface treatment method according to the above (21) or (22), wherein the moving body has a substantially plate shape.

(24) The surface treatment method as described in any of (21) to (23) above, wherein the size of the plate to be treated and the size of the facing surface are substantially the same.

(25) The proximity body is capable of relatively scanning along the plate to be processed, and the drying process is formed on the rear side in the scanning direction of the proximity body with respect to the plate to be processed. While supplying the surface-active gas from the gas outlet near the meniscus of the cleaning liquid, by relatively scanning the proximity body along the plate to be processed, the meniscus along the surface of the plate to be processed. The method for surface treatment as described in any one of (18) to (20) above, wherein the method is performed by moving the surface treatment.

(26) The surface treatment method as described in (25) above, wherein the treatment with the treatment liquid or the cleaning treatment is performed while relatively scanning the proximity body along the plate to be treated.

(27) The drying treatment is carried out while sucking and discharging the surface-active gas supplied from the gas outlet from the gas inlet formed in the proximity member.
Alternatively, the surface treatment method according to (26).

(28) The surface treatment method according to any one of (18) to (27), wherein the treatment liquid is ozone water or diluted hydrofluoric acid.

(29) The surface treatment method as described in any of (18) to (28) above, wherein the cleaning liquid is pure water or ozone water.

[0044]

BEST MODE FOR CARRYING OUT THE INVENTION A surface treating apparatus and a surface treating method of the present invention will be described below in detail with reference to the preferred embodiments shown in the accompanying drawings.

<First Embodiment> FIG. 1 is a diagram (block diagram) schematically showing a first embodiment of the surface treatment apparatus of the present invention, and FIG. 2 shows a moving body in the surface treatment apparatus shown in FIG. FIG. 3 is a bottom view showing the surface treatment apparatus shown in FIG.
FIG. 4 is a partial cross-sectional side view showing how the moving body is rotated.
FIG. 4 is a partial cross-sectional side view showing an enlarged vicinity of a meniscus of the cleaning liquid in FIG. 3.

Surface treatment apparatus 1A shown in FIGS. 1 and 2.
Is an apparatus that performs (performs) the surface of the plate to be processed 100 (processed surface 101) with the process liquid T, the cleaning process with the cleaning liquid R, and the drying process.

The surface treatment apparatus 1A is provided with a plate 100 to be treated.
The apparatus main body 11 that supports the substrate and the processing surface 1 of the processing target plate 100
01, a moving body (proximity body) 3 having a facing surface 31, a driving means 5 for moving (displacement) the moving body (proximity body) 3 with respect to the apparatus main body 11, and a processing surface 10.
1 for supplying the processing liquid T to the gap 10 between the facing surface 31 and the facing surface 31, the cleaning liquid supply means 7 for supplying the cleaning liquid R to the gap 10, and the surfactant gas supply for supplying the surfactant gas to the gap 10. Means 8, transfer means 12 for transferring the plate 100 to be processed, positioning means 13 for positioning the transfer stop position of the plate 100 to be processed, and plate inclining means for inclining the plate 100 to be in a non-horizontal state. 14 and an air supply means 15 for supplying air to the gap 10.

In the present embodiment, a case will be described in which the target plate 100 having a rectangular flat plate shape is targeted.

The type, material and the like of the plate 100 to be processed in the present invention are not particularly limited, and examples thereof include a semiconductor substrate and an LCD.
(Liquid crystal display screen) Substrate such as substrate, crystal plate, glass plate, metal plate such as stainless steel plate, and the like. Further, the shape of the plate to be processed 100 is not limited to a rectangle, and may be, for example, a circle, an ellipse, or the like, and the size can be applied to any size. That is, the present invention can be applied to the treatment of any plate (plate-shaped member).

The apparatus main body 11 can support the plate 100 to be processed in a substantially horizontal state or in a state of being inclined by the plate inclining means 14 to be described later. The surface treatment apparatus 1A performs a treatment described below on a treatment surface 101, which is an upper surface of a treatment target plate 100 supported by the apparatus body 11.

A transfer means 12 for transferring the plate 100 to be processed is installed in the apparatus main body 11. The transport means 12 is
It has a plurality of rollers 121 and these rollers 12
The plate to be processed 100 placed on the substrate 1 is conveyed from the right side to the left side in the drawing in a substantially horizontal state.

The plates to be processed 100 are carried into the surface processing apparatus 1A one by one by the carrying means 12 from a pre-process (not shown) located on the right side of the drawing, and after the processing in the surface processing apparatus 1A is completed. , Is carried out to a post-process (not shown) located on the left side of the figure.

The apparatus main body 11 is provided with positioning means 13 for positioning the carrying stop position of the processing target plate 100 carried in by the carrying means 12. The positioning means 13 has a stopper 131, and the stopper 1
Reference numeral 31 is displaceable between a state in which the plate 100 to be processed is projected onto the transport path (a state shown in FIG. 1) and a state in which it is retracted from the transport path (not shown).

As a mechanism for moving the stopper 131 up and down (displacement), for example, a mechanism having a rack gear, a pinion gear, and a motor for rotating the pinion gear is used. In addition, in this embodiment, it is realized by arranging a plurality of the mechanisms.

The plate to be processed 100 carried into the surface treatment apparatus 1A by the conveying means 12 is stopped with respect to the apparatus main body 11 when the left edge 102 in the figure abuts against the protruding stopper 131. In this transportation stopped state, the processing by the surface processing apparatus 1A is performed.

When the processing on the plate 100 to be processed is completed, the positioning means 13 sets the stopper 131 in the retracted state, and the positioning state (stopped state) for the plate 100 to be processed.
To cancel. As a result, the plate 10 to be processed is completed.
0 is carried out to the subsequent step by the carrying means 12. Then, the positioning means 13 brings the stopper 131 into a protruding state, and the carrying means 12 carries in the next plate to be processed 100 to the carrying stop position. Then, the surface processing apparatus 1A performs processing on the plate 100 to be processed.

As described above, the surface processing apparatus 1A is a single-wafer processing type apparatus and processes the target plate 100 one by one.

The apparatus main body 11 is further provided with a plate inclining means 14 to be processed. The plate inclining means 14 is
It has a pin 141 that can be displaced between a state in which the plate 100 to be processed is projected onto the transport path (a state shown in FIG. 3) and a state where it is retracted from the transport path (a state shown in FIG. 1). The upper end of the pin 141 can come into contact with the lower surface of the right end portion of the plate 100 to be processed at the conveyance stop position in the figure.

The mechanism for moving the pin 141 up and down (displacement) is, for example, a mechanism having a rack gear, a pinion gear, and a motor for rotating the pinion gear. In addition, in this embodiment, it is realized by arranging a plurality of the mechanisms.

As shown in FIG. 3, the plate inclining means 14 to be processed is shown.
When the pin 141 is projected, the plate 100 to be processed is tilted by lifting the right end side in the drawing, and becomes a non-horizontal state.

As described above, the apparatus main body 11 includes the plate 1 to be processed.
00 can be supported in both a horizontal state and a non-horizontal state.

By adjusting the protrusion amount of the pin 141, the inclination angle α of the plate 100 to be processed with respect to the horizontal plane.
(See FIG. 3) can also be adjusted (changed).

As will be described later, in the present embodiment, the processing surface 101 is dried while the plate 100 to be processed is in a non-horizontal state. The plate 100 to be processed can be loaded and unloaded in a horizontal state. Therefore, as compared with the case where the plate 100 to be processed is conveyed in a non-horizontal state (inclined state), the efficiency of conveyance of the plate 100 to be processed can be improved. Further, by performing the treatment with the treatment liquid T and the cleaning treatment with the cleaning liquid R, which will be described later, in a state where the plate 100 to be treated is horizontal, the entire treatment surface 101 can be uniformly and reliably treated.

The conveying means 12 and the positioning means 1
Each of the components 3 is not limited to the configuration shown in the drawing, and may have any configuration as long as it can exhibit the same function. Further, the plate inclining means 14 is not limited to the configuration shown in the drawings as long as it can incline the plate 100 without causing the plate 100 to be deformed such as a warp. It may be one.

As shown in FIG. 2, the moving body (proximity body) 3
Has a substantially rectangular plate shape (flat plate shape). As shown in FIG. 1, the facing surface 31, which is the lower surface of the moving body (proximity body) 3, faces the processing surface 101 of the processing target plate 100 (substantially in parallel) and can be located close to it. It is like this.

In the surface treatment apparatus 1A, the processing liquid T and the cleaning liquid R are placed in the gap 10 formed between the facing surface 31 and the processing surface 101, with the facing surface 31 being close to the processing surface 101 almost in parallel. It is supplied, and the treatment with the treatment liquid T and the cleaning treatment are performed. The gap between the treatment surface 101 and the facing surface 31 (gap distance of the gap 10) when this treatment is performed is such that the treatment liquid T or the cleaning liquid R is sufficiently distributed in the gap 10 and the treatment liquid T or the cleaning liquid R is caused by surface tension. The size is set so that it can be retained in the gap 10, and it is preferably about 1 to 5 mm.

In the present invention, the processing liquid T and the cleaning liquid R are supplied to the gap 10 in this manner to perform the processing, so that the plate 100 to be processed is dipped in the tank in which the processing liquid T and the cleaning liquid R are stored. Compared to such a case, the usage amounts of the processing liquid T and the cleaning liquid R can be significantly reduced.

In this embodiment, the size of the facing surface 31 is
The size of the plate to be processed 100 is almost the same as or slightly larger than that of the plate to be processed 100.

The moving body (proximity body) 3 is provided so as to be movable (displaceable) with respect to the apparatus main body 11, and is driven (moved) by the driving means 5. The drive means 5 is capable of rotating at least the moving body (proximity body) 3 around the rotation center 30 (see FIG. 3). In addition to this, the driving means 5 is a moving body (proximity body).
3 can be moved in a direction described later. As the drive means 5, for example, various known drive mechanisms using a proper combination of a servo motor, a fluid pressure cylinder, a feed screw, a cam mechanism, a gear mechanism, a link mechanism and the like can be used.

The processing liquid supply means 6 for supplying the processing liquid T to the gap 10 includes the processing liquid tank 61 for storing the processing liquid T and the processing liquid outlets 62a to 6a formed in the moving body (proximity body) 3.
2h, a supply line (flow path) 63 extending from the processing liquid tank 61, a pump 64 installed in the middle of the supply line 63, and a branch from the supply line 63 into eight processing liquid outlets 62a to 62h. It is composed of branch lines (flow paths) 66a to 66h connected to each other.

The processing liquid T is for performing various kinds of processing on the processing surface 101, and the pump 64 is operated so that the processing liquid tank 61 is supplied to the supply line 63 and the branch line 66.
It flows out from the processing liquid outlets 62a to 62h through a to 66h and is supplied to the gap 10.

The treatment with the treatment liquid T may be any treatment, for example, a coating treatment for coating a resist or the like, a peeling treatment for peeling the resist or the like, an etching treatment, a washing treatment, a treatment for removing a masking film, etc. Examples include plating treatment.

Treatment liquid T for stripping the resist
It is preferably ozone water (aqueous ozone solution) or dilute hydrofluoric acid. As a result, the effect of removing the resist residue, polymer, etc. can be further enhanced.

When ozone water is used as the treatment liquid T, its concentration is not particularly limited, but it is preferably a relatively high concentration of about 30 to 100 ppm.

When dilute hydrofluoric acid is used as the treatment liquid T, its concentration is not particularly limited, but is 1 ppm to 50000 p.
It is preferably about pm.

As shown in FIG. 2, the processing liquid outlets 62a ...
62h is composed of a plurality of small holes (orifices) that open to the facing surface 31, and these small holes are arranged in a plurality of rows (8 rows in the illustrated configuration). In other words, the processing liquid outlets 62a to 62h are arranged in a matrix (matrix).
It is located in. As a result, the processing liquid T can be evenly distributed over the entire processing surface 101.

Here, for convenience of explanation, the processing liquid outlet 6 is shown.
Among 2a to 62h, those arranged in the vertical direction in FIG. 2 (direction perpendicular to the paper surface of FIG. 1) are called “rows”, and a to
Each column is distinguished by the letter h. That is, the ones forming the rightmost column in the figure are treated liquid outlets 62a, and the ones constituting the seven columns on the left side in the figure are treated liquid outlets 62b to 62h, respectively.

The number of the processing liquid outlets 62a to 62h (the number of rows and the number of columns) is not limited to the configuration shown in the drawing, and is set appropriately according to the size of the plate 100 to be processed, the viscosity of the processing liquid T, and the like. To be done.

The small holes forming the processing liquid outlets 62a to 62h are formed so as to penetrate to the upper surface 32 of the moving body (proximity body) 3, respectively. Then, on the upper surface 32 of the moving body (proximity body) 3, elongated casings 65a to 65h forming flow paths are fixedly attached to the respective rows of the processing liquid outlets 62a to 62h. As a result, the processing liquid outlet 6
The flow paths to 2a to 62h communicate with each other in each of the rows in the casings 65a to 65h.

Branch line 6 branched from the supply line 63
6a to 66h are casings 65a to 65h, respectively.
It is connected to the. With such a configuration, the processing liquid tank 61 and the processing liquid outlets 62a to 62h are connected.

In the present embodiment, the processing liquid outlet 62
A plurality of a to 62h are provided in a matrix, but in the present invention, at least one processing liquid outlet is sufficient.

Further, the treatment liquid supply means 6 is provided with a plurality of treatment liquid tanks 61, and a plurality of treatment liquids T (for example, ozone water and SC1 (ammonia water + perhydrogen) or ozone water and dilute fluorine). Acid) may be respectively supplied. That is, the processing liquid supply means 6 may perform a plurality of types of processing on the processing surface 101.

The cleaning liquid supply means 7 for supplying the cleaning liquid (rinsing liquid) R to the gap 10 includes a cleaning liquid tank 71 for storing the cleaning liquid R, a cleaning liquid outlet 72 formed in the moving body (proximity body) 3, and a cleaning liquid tank. 71, a supply line (flow passage) 73 connecting the switching valve 70, a pump 74 installed in the middle of the supply line 73, and a supply line (flow passage) 75 connecting the switching valve 70 and the cleaning liquid outlet 72. It consists of and.

The cleaning liquid R is for cleaning the processing surface 101 (rinsing process), and when the switching valve 70 is in the first state, which will be described later, the operation of the pump 74 causes the cleaning liquid tank 71 to supply line 73 and It flows out of the cleaning liquid outlet 72 through 75 and is supplied to the gap 10.

The cleaning liquid R is not particularly limited as long as it carries out a cleaning treatment, but is preferably pure water or ozone water. Thereby, the cleaning effect can be further improved.

When pure water is used as the cleaning liquid R, for example, distilled water, ion-exchanged water, ultrapure water, RO water or the like can be used.

When ozone water is used as the cleaning liquid R, its concentration is not particularly limited, but is 1 to 30 ppm.
A relatively low concentration (a concentration lower than that of ozone water used as the treatment liquid T) is preferable.

As shown in FIG. 2, the cleaning liquid outlet 72 is
It is composed of one small hole that is open at approximately the center of the facing surface 31. This small hole is provided on the upper surface 32 of the moving body (proximity body) 3.
The casing 76 is fixed to the opening to the upper surface 32. The supply line 75 is connected to the casing 76.

In this embodiment, the processing liquid outlets 62a to 62a are provided.
2h and the cleaning liquid outlet 72 are provided separately,
The treatment liquid T and the cleaning liquid R may be configured to flow out from the same outlet. That is, the supply line of the processing liquid T and the supply line of the cleaning liquid R may be shared (shared).

Further, in the illustrated configuration, the processing liquid outlet 62
The shapes of a to 62h and the cleaning liquid outlet 72 are circular, but the shape is not limited to this and may be, for example, an elliptical shape, a rectangular shape, or the like.

The surface-active gas supply means 8 for supplying the surface-active gas to the gap 10 has a surface-active gas tank 81 for storing the surface-active gas, a supply line (flow path) 82 extending from the surface-active gas tank 81, and a supply line 82. And a pump 83 provided on the way.

The surface-active gas is a gas containing a surface-active agent, and when dissolved in (absorbed by) the cleaning liquid R, the cleaning liquid R
It has the property of reducing the surface tension of.

Examples of the surfactant contained in this surfactant gas include isopropyl alcohol (IPA),
Various alcohols such as methyl alcohol and ethyl alcohol can be used.

The surface-active gas may be such a surface-active agent gas itself. However, for example, an inert gas (a gas having poor reactivity) such as nitrogen (N ₂ ) gas may be used as the surface-active agent gas. Is preferably a mixture of about 0.1 to 10%. Even when diluted in this way, the function as the surface-active gas in the present invention can be sufficiently exerted, so that the emission amount (use amount) of the volatile organic compound (VOC) can be further reduced. Because it is preferable.

Branch line 66a of the processing liquid supply means 6
A switching valve 80 is provided in the middle of, and the supply line 82 is connected to the switching valve 80.

The changeover valve 80 includes the upstream side 661a and the downstream side 6a of the branch line 66a relative to the changeover valve 80.
Switching between a first state in which the supply line 82 is blocked (blocked) and a second state in which the supply line 82 and the downstream side 662a are linked and the upstream side 661a is blocked (blocked). You can do it.

The surface active gas is supplied from the surface active gas tank 81 to the supply line 82 and the branch line 66a by the operation of the pump 83 when the switching valve 80 is in the second state.
Through the downstream side 662a of the processing liquid, flows out from the processing liquid outlet 62a, and is supplied to the gap 10.

As described above, in this embodiment, the processing liquid outlet 62a and the downstream side 662a of the branch line 66a are shared (shared) by the processing liquid supply means 6 and the surface active gas supply means 8. ing. That is, the processing liquid outlet 6
2a also serves as a gas outlet through which the surface-active gas flows.

In this embodiment, a part of the flow path is shared (shared) between the supply line of the processing liquid T and the supply line of the surface-active gas in this way, thereby further simplifying and downsizing the configuration of the apparatus. Can be planned.

The air supply means 15 for supplying air to the gap 10 includes an inert gas tank 151 for storing an inert gas (a gas having a low reactivity) such as nitrogen (N ₂ ) gas, and a supply extending from the inert gas tank 151. It has a line 152 and a pump 153 provided in the middle of the supply line 152.

The supply line 152 is connected to the switching valve 7
It is connected to 0. The switching valve 70 connects the supply line 73 and the supply line 75 of the cleaning liquid supply means 7 to each other,
It is possible to switch between a first state in which the supply line 152 is blocked (blocked) and a second state in which the supply line 152 and the supply line 75 are communicated with each other and the supply line 73 is blocked (blocked). There is.

When the switching valve 70 is in the second state and the pump 153 of the air supply means 15 is operated, the inert gas from the inert gas tank 151 passes through the supply lines 152 and 75, and the cleaning liquid outlet port is formed. Outflow from 72. By supplying air to the gap 10 in this way,
The treatment liquid T or the cleaning liquid R supplied to the gap 10 can be extruded (blown away) and removed. That is, the air supply unit 15 serves as a removal unit that removes the processing liquid T and the cleaning liquid R supplied to the gap 10.

Air supply means 15 as such removing means
After the processing liquid T or the cleaning liquid R in the gap 10 is removed by the processing liquid T or the cleaning liquid R again by the processing liquid supply means 6 or the cleaning liquid supply means 7, the processing liquid T or the cleaning liquid R in the gap 10 can be quickly supplied. In addition, it can be replaced without any liquid remaining. In addition, when the type of the processing liquid T is switched and the next processing is performed, or when the cleaning liquid R is supplied after the processing of the processing liquid T is finished, the liquids can be replaced quickly and without remaining liquid.

As described above, in this embodiment, the processing liquid outlet 62a and the downstream side 662a of the branch line 66a are shared (shared) by the processing liquid supply means 6 and the surface active gas supply means 8. ing. That is, the processing liquid outlet 6
2a also serves as a gas outlet through which the surface-active gas flows.

In this embodiment, a part of the flow path is shared (shared) between the supply line for the processing liquid T and the supply line for the surface-active gas in this way, thereby further simplifying and downsizing the configuration of the apparatus. Can be planned.

Driving means 5 and pump 6 of processing liquid supply means 6
4, pump 74 of cleaning liquid supply means 7, pump 84 of surface-active gas supply means 8, transport means 12, positioning means 1
3, the plate inclining means 14, the air feeding means 15, the switching valve 70 and the switching valve 80 are electrically connected to the control means 50, respectively.
It operates based on the signal (control signal) from.

In such a surface treatment apparatus 1A, the gap 1
A recovery unit that removes or recovers the processing liquid T or the cleaning liquid R that has flown out (spilled) from 0 may be provided. Examples of the recovery means include a receiving tray (reservoir) that receives the processing liquid T and the cleaning liquid R, and an absorbent material that absorbs the processing liquid T and the cleaning liquid R.

Further, in the surface treatment apparatus 1A, the conveying means 1
2, the positioning means 13 and the plate inclining means 14 are
You don't have to have each.

Next, a first embodiment (operation of the surface treatment apparatus 1A) of the surface treatment method of the present invention using the surface treatment apparatus 1A will be described.

[1] With the moving body (proximity body) 3 retracted to the upper side by the driving means 5, the plate 100 to be processed is carried in by the carrying means 12. The processed plate 100 is positioned at a predetermined position by the stopper 131 and then stopped.

[2] Next, the moving body (proximity body) 3 is lowered by the driving means 5 to bring the facing surface 31 close to the processing surface 101. At this time, the facing surface 31 is set to be substantially parallel to the processing surface 101, and the gap distance between the facing surface 31 and the processing surface 101 is set to the size described above.

In this embodiment, the facing surface 3 is adjusted by adjusting the lowering stop position of the moving body (proximity body) 3 at this time.
The gap distance between 1 and the processing surface 101 can be adjusted. By adjusting the gap distance of the gap 10, the processing surface 10
The amount of the treatment liquid T or the cleaning liquid R attached to 1 can be controlled. Further, it is possible to deal with the plate 100 having different plate thicknesses.

The surface processing apparatus 1A detects the position of the processing surface 101 of the plate 100 to be processed, and automatically adjusts the gap distance between the facing surface 31 and the processing surface 101 to a set value. It may be configured to do so.
This makes it possible to deal with a case where the plate thickness changes from the middle when the plurality of plates 100 to be processed are continuously processed.

Further, unlike the above [1], the plate 1 to be processed is in a state where the moving body (proximity body) 3 is at a predetermined lowering stop position.
00 may be carried in.

[3] Next, the switching valve 80 is brought into a state of connecting the upstream side 661a and the downstream side 662a of the branch line 66a to each other, and the pump 64 is operated. As a result, the processing liquid T is supplied to the gap 10 between the processing surface 101 and the facing surface 31 from the processing liquid outlets 62a to 62h. Gap 1
When 0 is filled with the processing liquid T, the pump 64 is stopped.
In this way, the treatment surface 101 is subjected to a predetermined treatment with the treatment liquid T.

While performing the treatment with the treatment liquid T, the driving means 5
The moving body (proximity body) 3 (opposing surface 31) to the processing surface 10
It may be rocked (vibrated) along 1 (in a direction substantially parallel to the processing surface 101). As a result, a minute flow is generated in the processing liquid T in the gap 10 and the liquid is agitated, so that more reliable processing is performed and the processing efficiency can be improved.

In this case, the moving body (proximity body) 3 may be swung in the left-right direction or the up-down direction in FIG.

Further, even after the gap 10 is filled with the treatment liquid T, the treatment may be carried out while the pump 64 is operating. As a result, since the treatment can be performed in a state where the new treatment liquid T is continuously supplied, the treatment liquid T in the gap 10 can be kept in a fresh state without alteration, deterioration, dirt, etc. Therefore, the treatment efficiency can be improved. Can be further improved.

By operating the air supply means 15 to supply air to the gap 10 to completely remove the treatment liquid T in the gap 10, the treatment liquid supply means 6 refills the gap 10 with the treatment liquid T. Alternatively, the treatment liquid T in the gap 10 may be entirely replaced and the treatment may be continued. Thereby, the processing efficiency can be further improved. The exchange of the treatment liquid T may be performed plural times as needed.

[4] When processing with a plurality of types of treatment liquids T (when the treatment liquid supply means 6 is capable of supplying a plurality of types of treatment liquids T), the treatment liquids T should be different types. The process is switched to perform the same process as the above [3]. This allows
Multiple types of processing can be performed.

[5] Next, the air supply means 15 is operated to supply air to the gap 10 to remove the processing liquid T in the gap 10. Note that this step may be omitted.

[6] Next, the switching valve 70 is placed in a state where the supply line 73 and the supply line 75 are communicated with each other,
The pump 74 is operated. As a result, the cleaning liquid R is supplied to the gap 10 from the cleaning liquid outlet 72. When the gap 10 is filled with the cleaning liquid R, the pump 64 is stopped. In this way, the cleaning processing (rinsing processing) is performed on the processing surface 101.

After the gap 10 is filled with the cleaning liquid R, the operation of the pump 64 may be continued, and the cleaning treatment may be performed while the cleaning liquid R is flowing into the gap 10 (while being continuously supplied). Thereby, the cleaning efficiency (cleaning effect) can be improved.

Further, the operation of the pump 64 is once stopped, the air supply means 15 is operated to supply air to the gap 10 to completely remove the processing liquid T in the gap 10, and then the cleaning liquid R is again supplied from the cleaning liquid outlet 72. By filling the gap 10, the cleaning liquid R in the gap 10 may be entirely replaced and the cleaning process may be continued. As a result, the cleaning efficiency can be further improved and the processing surface 101
Can be washed more cleanly, and thus the cleanliness of the treated surface 101 after drying can be further improved.
The exchange of the cleaning liquid R may be performed a plurality of times if necessary.

Further, as a method of further enhancing the cleaning effect, an ultrasonic wave applying means (not shown) is provided to the moving body (proximity body) 3.
, And ultrasonic cleaning may be used together.

[7] Next, as shown in FIG. 3, the pin 141 of the plate inclining means 14 is projected to incline the plate 100 to be in a non-horizontal state.

At this time, at the same time as the plate 100 to be processed is tilted, the moving body (proximity body) 3 is tilted in the same direction by the driving means 5 so that the gap distance between the processing surface 101 and the facing surface 31 becomes substantially constant. The cleaning liquid R is retained and filled (filled) in the gap 10.

At this time, the inclination angle α of the plate 100 to be processed with respect to the horizontal plane is not particularly limited and is appropriately determined in consideration of the viscosity of the cleaning liquid R, etc., but in the present embodiment, it is 1 to 30.
It is preferably about 0 °, more preferably about 1 to 15 °.

In such a state, the processed plate 100
A meniscus M of the cleaning liquid R is formed in the gap 10 on the higher side (right side in the figure) of the. This meniscus M is
It has a substantially U-shaped (arc-shaped) curved surface.

In the present invention, the inclination angle of the plate 100 to be processed in the drying process with respect to the horizontal plane is not limited to the above range and may be 1 to 90 °. That is, the drying process can be performed even when the plate 100 to be processed is vertical to the horizontal plane.

[8] Next, the switching valve 80 is brought into a state of connecting the supply line 82 and the downstream side 662a of the branch line 66a to operate the pump 83. As a result, the surface-active gas flows out from the processing liquid outlet 62a, and the surface-active gas is supplied to the vicinity of the meniscus M of the cleaning liquid R formed on the higher side of the plate 100 to be processed.

By dissolving this surface-active gas in the cleaning liquid R, the surface tension of the cleaning liquid R becomes small near the meniscus M. As a result, when particles (foreign matter such as dust) P adhere to the processing surface 101,
The cleaning liquid R enters between the particles P and the processing surface 101, and the particles P float in the cleaning liquid R (see FIG. 4).

In the meniscus M, the end portion M1
A concentration gradient is generated in which the surfactant concentration decreases (decreases) from the vicinity of (the end portion on the processing surface 101 side) toward the central portion M2, and therefore the surface tension is directed from the vicinity of the end portion M1 toward the central portion M2. Becomes larger (increasing gradually). This is because the film thickness of the cleaning liquid R (distance between the processing surface 101 and the meniscus M) is smaller (thinner) near the end portion M1 than near the center portion M2. This is because the degree to which the agent) is diluted is small.

Due to the difference (gradient) in the surface tension as described above, the cleaning liquid R near the meniscus M has a flow from the end M1 to the central part M2 as shown by the arrow in FIG. The effect caused by (difference) in surface tension is called the Marangoni effect, and this flow is called the Marangoni flow.

Due to such Marangoni flow, in the vicinity of the end M1 of the meniscus M, the film thickness of the cleaning liquid R is further thinned, and the cleaning liquid R is evaporated, and the treated surface 10
1 dries. In this way, the cleaning liquid R is evaporated and dried in the state of a thin film, so that a water mark
The treated surface 101 can be dried without leaving any residue.

The particles P are moved from the vicinity of the end M1 of the meniscus M to the center M2 by the Marangoni flow.
Shed towards. Therefore, it is possible to dry without leaving the particles P on the processing surface 101.

In the present embodiment, in the meniscus M, a Marangoni flow from the end M3 opposite to the end M1 (the end on the facing surface 31 side) toward the central portion M2 is also generated by the same mechanism as described above. Accordingly, in the drying process of the processing surface 101, it is possible to prevent the particles P from remaining on the facing surface 31, and therefore, when performing the next processing on the target plate 100, the particles P on the facing surface 31 are processed. It is possible to prevent the particles P from moving and adhering to the processing surface 101.

The supplied surface-active gas is provided around the moving body (proximity body) 3 and the plate 100 to be processed.
A hood (windshield) may be provided to prevent escape from the vehicle. As a result, the amount of surface active gas used can be further reduced.

[9] Next, while supplying the surface-active gas to the vicinity of the meniscus M from the processing liquid outlet 62a, the driving means 5 drives the lower side of the plate 100 to be processed (left side in the drawing).
The moving body (proximity body) 3 is slowly rotated so as to open with respect to the plate 100 to be processed with the vicinity of the edge portion 102 as the rotation center 30. As a result, the meniscus M is rotated about the rotation center 30.
It gradually moves toward the side (edge 102 side). Along with this, the cleaning liquid R in the gap 10 gradually flows out from the vicinity of the edge portion 102. The cleaning liquid R that has flowed out is removed or recovered by the recovery means.

In this way, the meniscus M is attached to the edge portion 102.
By moving the processing surface 101 to almost the entire surface 101, the drying processing as described in [8] above can be performed.

In the present invention, when the meniscus M moves,
Since the surface tension near the meniscus M is small and the Marangoni flow from the end M1 toward the center M2 is generated, the liquid film near the end M1 is broken and the droplets of the cleaning liquid R on the processing surface 101. Therefore, it is possible to perform good drying without remaining water droplets (watermarks), particles P, and the like.

Further, in the surface treatment apparatus 1A, the plate 1 to be treated is
By performing such a drying process in a state in which 00 is not horizontal, the meniscus M can be moved more smoothly, and the liquid suitability of the cleaning liquid R can be more reliably prevented from remaining on the processing surface 101. You can

The moving speed of the meniscus M can be appropriately adjusted to a speed at which good drying is performed by adjusting the rotating speed of the moving body (proximity body) 3. In the present embodiment, by combining the adjustment of the moving speed of the meniscus M and the adjustment of the gap distance of the gap 10, it is possible to deal with different types of target plate 100, cleaning liquid R and the like.

As described above, according to the present invention, by utilizing the Marangoni effect,
A reliable and uniform drying process can be performed, and
The degree of cleanliness of the treated surface 101 after drying is also high.

In addition, the processing by the processing liquid T, the cleaning, and the drying on the plate 100 to be processed are performed by one apparatus.
In particular, these can be performed continuously, and these can be achieved by a device having a simple structure. for that reason,
It is not necessary to separately provide a processing device, a cleaning device, and a drying device, and move the plate 100 to be processed between them to perform sequential processing. Therefore, it is possible to reduce equipment cost and install the device. It has the advantage that the space can be small.

In particular, the surface treatment apparatus 1A of this embodiment is
Since cleaning and drying are not performed while the plate 100 to be processed is conveyed in the direction of the processing surface 101, it is not necessary to secure a conveyance path for drying the plate 100 to be processed unlike the conventional drying device. Therefore, it is possible to further reduce the size of the device and save space. Further, in the present embodiment, since the size of the plate to be processed 100 and the facing surface 31 are substantially the same and the size of the moving body (proximity body) 3 is not wasted, such an effect is more remarkable. Become.

Further, since the treatment with the treatment liquid T, the washing and the drying can be continuously performed by one apparatus, it is possible to prevent re-adhesion of foreign matters such as particles P removed from the plate 100 to be treated. This can be surely prevented, and therefore the cleanliness of the treated surface 101 after drying is high.

Further, as described above, in the present embodiment,
At the time of drying, it is possible to control the amount of the cleaning liquid R adhering to the processing surface 101 by adjusting the gap distance of the gap 10, and the thickness of the plate to be processed 100 can be controlled because the plate to be processed 100 is fixed. Since there is no swinging in the depth direction, the meniscus M can be dried while maintaining an appropriate size. As a result, the drying efficiency can be further improved, and uniform drying can be performed over the entire processing surface 101.
The degree of cleanliness of the treated surface 101 after drying is also improved.

Further, in the present invention, unlike the case where the drying process is performed by spraying the drying air ejected from the conventional air knife nozzle, the droplets of the cleaning liquid R are not scattered,
Therefore, the degree of cleanliness of the treated surface 101 after drying is remarkably high.

Further, as compared with the case where the conventional IPA (isopropyl alcohol) vapor drying process is performed, the amount of use (release amount) of the volatile organic compound is significantly smaller. Therefore,
The equipment can be simplified, such as eliminating the need for explosion-proof specifications of the equipment, and the equipment cost can be further reduced, and the burden on the environment is small.

In the present embodiment, the treatment with the treatment liquid T or the washing treatment with the cleaning liquid R is performed while the plate 100 to be treated is horizontal, but in the present invention, the plate 100 to be treated is processed.
May be performed in a non-horizontal state (inclined or vertical to the horizontal plane). Further, in the present invention, as described above, the drying process can be performed even in the state where the plate to be treated 100 is vertical to the horizontal plane, and thus the treatment with the treatment liquid T and the cleaning liquid in the state where the plate to be treated 100 is vertical to the horizontal plane. The cleaning process and the drying process with R may be performed. In this case, even if the plate 100 to be processed is relatively large, it does not take up much space, and therefore the installation space of the apparatus can be made smaller.

In this embodiment, the surface-active gas flows out from the processing liquid outlet 62a. However, the surface-active gas outlet is processed from the processing liquid outlet 62a in accordance with the movement of the meniscus M. It is also possible to sequentially switch to the liquid outlet 62h. To realize such a mechanism, for example, the branch lines 66b to 66 are used.
A switching valve connected to the surface active gas tank 81 is also installed in h, and the position of the meniscus M is detected from the rotation speed (rotation position) of the moving body (proximity body) 3 to open and close these valves. , The surface-active gas outlet port 62
It is possible to adopt a configuration in which the processing liquid is sequentially switched from a to the processing liquid outlet 62h.

Further, in the present invention, as described above, the treatment liquid supply means 6 may be capable of supplying a plurality of treatment liquids T, and treatment with a plurality of treatment liquids T may be performed. In this case, the treatment with the plurality of types of treatment liquids T and the cleaning treatment can be performed in any combination (order). For example, when three kinds of processing α, processing β, and processing γ are performed with a plurality of kinds of processing liquid T, the combination (in order) with the cleaning processing may be processing α → processing β → processing γ → cleaning → drying. , Processing α → cleaning → processing β → processing γ → cleaning → drying, processing α → processing β → cleaning → processing γ → cleaning → drying,
Treatment α → wash → treatment β → wash → treatment γ → wash → dry may be performed. That is, any cleaning treatment may be performed before the drying treatment. The combination (order) of such processing can be automatically performed by the control (program) of the control means 50.

<Second Embodiment> FIG. 5 is a diagram (block diagram) schematically showing a second embodiment of the surface treatment apparatus of the present invention, and FIG. 6 shows a scanning head in the surface treatment apparatus shown in FIG. FIG. 7 is a partial cross-sectional side view showing an enlarged front end portion of the scanning head during the drying process in the surface treatment apparatus shown in FIG.

Hereinafter, the second embodiment of the surface treatment apparatus and the surface treatment method of the present invention will be described with reference to these drawings. The differences from the first embodiment will be mainly described and the same matters will be described. Will not be described.

Surface treatment apparatus 1B shown in FIGS. 5 and 6.
Is an apparatus main body 11 that supports the processing target plate 100, a scanning head (proximity body) 2 that is provided so as to be movable (displaceable) with respect to the apparatus main body 11, and the scanning head (proximity body) 2
1, a driving means 5 that moves (displaces) with respect to 1, and a processing liquid supply means 9 that supplies the processing liquid T to a gap 20 between the processing surface 101 of the processing target plate 100 and the tip portion 21 of the scanning head (proximity body) 2. A cleaning liquid supply means 4 for supplying the cleaning liquid R to the gap 20, a surface active gas supply means 19 for supplying a surface active gas near the tip portion 21, a transfer means 18 for transferring the target plate 100, and a target plate. Positioning means 13 for positioning the transportation stop position of 100, draining means 16 for sucking and discharging the processing liquid T or cleaning liquid R in the gap 20, and exhausting means for exhausting the surface-active gas supplied near the tip portion 21. 17 and 17.

In this embodiment, a case will be described in which the target plate 100 having a rectangular flat plate shape is targeted. In the plate 100 to be processed, the left-right direction in FIG. 5 is the long side direction, and the direction perpendicular to the paper surface of FIG. 5 is the short side direction.

The apparatus main body 11 can support the plate 100 to be processed in a substantially horizontal state. Surface treatment device 1B
Performs processing as described below on the processing surface 101, which is the upper surface of the processing target plate 100 supported by the apparatus main body 11.

A transport means 18 for transporting the plate 100 to be processed is installed in the apparatus main body 11. The transport means 18 is
It has a plurality of rollers 181 arranged in parallel, and the plate 100 to be processed placed on these rollers 181 is in a substantially horizontal state from the back side of the paper surface of FIG. 5 toward the front side (FIG.
Transport in a direction almost perpendicular to the paper surface of.

The plates to be processed 100 are carried into the surface processing apparatus 1B one by one by the carrying means 18 from a front step (not shown) located on the back side of the paper surface of FIG.
After the processing in B is completed, it is carried out to a post-process (not shown) located on the front side of the paper surface of FIG.

The apparatus main body 11 is provided with positioning means 13 for positioning the carrying stop position of the plate 100 to be processed carried in by the carrying means 18. The positioning means 13 has a stopper 131, and the stopper 1
Reference numeral 31 is displaceable between a state in which the plate 100 to be processed is projected onto the transport path (the state shown in FIG. 5) and a state in which the plate 100 is retracted from the transport path (not shown).

The plate to be processed 100 carried into the surface treatment apparatus 1B by the conveying means 18 is stopped with respect to the apparatus main body 11 when the front edge in FIG. . In this transportation stopped state, the processing by the surface processing apparatus 1B is performed.

When the processing on the plate 100 to be processed is completed, the positioning means 13 puts the stopper 131 in the retracted state and sets the positioning state (stopped state) to the plate 100 to be processed.
To cancel. As a result, the plate 10 to be processed is completed.
0 is carried out to the subsequent process by the carrying means 18. Next, the positioning means 13 brings the stopper 131 into the protruding state, and the carrying means 18 carries in the next plate to be processed 100 to the carrying stop position. Then, the surface processing apparatus 1B performs processing on the plate 100 to be processed.

As described above, the surface processing apparatus 1B is a single-wafer processing type apparatus and processes the target plate 100 one by one.

The transport means 18 and the positioning means 1
Each of the components 3 is not limited to the configuration shown in the drawing, and may have any configuration as long as it can exhibit the same function.

The scanning head (proximity body) 2 is provided so as to be movable with respect to such an apparatus main body 11. The scanning head (proximity body) 2 is driven (moved) by a driving unit 5. The driving unit 5 is arranged such that at least the front end portion 21 (lower end portion in FIG. 5) of the scanning head (proximity body) 2 is close to the processing surface 101, and the scanning head (proximity body) 2 is substantially parallel to the processing surface 101. It can be moved in any direction.
That is, the scanning head (proximity body) 2 is provided so as to be able to scan along the plate 100 to be processed by the driving unit 5.

In the illustrated configuration, the scanning head (proximity body) 2
Are scanned in the left-right direction in FIG. That is, the scanning direction of the scanning head (proximity body) 2 and the transportation direction of the plate 100 to be processed by the transportation means 18 are substantially orthogonal to each other.

The driving means 5 is also capable of moving the scanning head (proximity body) 2 in the vertical direction in FIG.
That is, the driving means 5 is movable between a state in which the scanning head (proximity body) 2 is retracted to the upper side in the drawing and a state in which the scanning head (proximity body) 2 is brought close to the plate 100 to be processed.

As the driving means 5, for example, a servo motor, a fluid pressure cylinder, a feed screw, a cam mechanism, a gear mechanism,
It is possible to use various known drive mechanisms that are appropriately combined and used with link mechanisms and the like.

Further, the driving means 5 has a rail member (not shown) provided along the scanning direction of the scanning head (proximity body) 2, and the scanning head (proximity body) is provided along the rail member. ) 2 is moved to scan the scanning head (proximity body) 2 while keeping the gap distance (distance of the gap 20) between the tip 21 of the scanning head (proximity body) 2 and the processing surface 101 constant. It is possible.

The width (length in the vertical direction in FIG. 6) of the scanning head (proximity body) 2 is almost the same as the width of the plate 100 to be processed (length in the direction perpendicular to the paper surface of FIG. 5) or slightly. It is getting bigger.

The surface processing apparatus 1B is arranged such that, with the tip 21 of the scanning head (proximity body) 2 brought close to the processing surface 101, the processing liquid is placed in the gap 20 formed between the tip 21 and the processing surface 101. T and the cleaning liquid R are supplied, and the treatment and the cleaning treatment with the treatment liquid T are performed. Processing surface 101 when performing this processing
The distance between the tip 21 and the tip 21 (gap distance of the gap 20) is such that the treatment liquid T and the cleaning liquid R are sufficiently distributed in the gap 20, and
The treatment liquid T and the cleaning liquid R are caused by surface tension to form the gap 20 (or a region around the gap 20; hereinafter, simply referred to as the "gap 20").
The size is preferably such that it can be retained in a space of about 1 to 5 mm.

In the present invention, the processing liquid T or the cleaning liquid R is supplied to the gap 20 in this manner to perform the processing, so that the plate 100 to be processed is immersed in the tank storing the processing liquid T or the cleaning liquid R for the processing. Compared to such a case, the usage amounts of the processing liquid T and the cleaning liquid R can be significantly reduced.

Further, since the treatment liquid T and the cleaning liquid R are retained (held) in the gap 20 due to the surface tension, the treatment is performed even in the state in which the plate 100 to be treated is inclined or perpendicular to the horizontal plane. be able to.

In the present embodiment, as described above, the scanning direction of the scanning head (proximity body) 2 and the conveyance direction of the plate 100 to be processed are substantially orthogonal to each other, whereby the scanning of the scanning head (proximity body) 2 is performed. The direction is the long side direction of the plate 100 to be processed, and the transport direction of the plate 100 to be processed is the short side direction of the plate 100 to be processed. As a result, the width of the scanning head (proximity body) 2 can be made relatively small, so that the supply and discharge of the liquid or gas can be performed more uniformly in the width direction of the plate 100 to be processed, and the transfer means 18 can be provided. There is an advantage that the transport distance of the plate 100 to be processed can be shortened. In addition, since the standby position when the scan head 2 is on standby is not on the transport path of the plate 100 to be processed, contamination of the plate 100 to be processed by the scan head 2, for example, scattering or liquid dripping during cleaning of the scan head 2. By limiting the scanning direction of the scanning head 2 which can prevent contamination and the like, the device mechanism can be greatly simplified.
There is also an advantage.

As shown in FIG. 6, the scanning head (proximity body)
2, a plurality of liquid outlets 42 through which the processing liquid T and the cleaning liquid R flow out, a plurality of liquid inlets 161 through which the processing liquid T and the cleaning liquid R flow, and a plurality of gas outlets 1 through which the surfactant gas flows out.
92 and a plurality of gas inlets 17 through which the surface-active gas flows
1 and 1 are formed respectively. These liquid outlets 4
2, the liquid inlet 161, the gas outlet 192, and the gas inlet 171 are each formed of a small hole (orifice).

The plurality of liquid outlets 42, the liquid inlet 161, the gas outlet 192 and the gas inlet 171 are respectively
The scanning heads (proximity bodies) 2 are arranged in a line in a direction perpendicular to the scanning direction, preferably at substantially equal intervals. As a result, it is possible to uniformly supply and discharge the liquid or gas in the width direction of the processing surface 101.

As shown in FIG. 5, the liquid outlet 42 and the liquid inlet 161 are open at the tip 21 (tip surface) of the scanning head (proximity body) 2, respectively. The gas outlet 192 and the gas inlet 171 are formed on the right side of the liquid outlet 42 and the liquid inlet 161 in the drawing, respectively, and are opened slightly closer to the base end side than the liquid outlet 42 and the liquid inlet 161. is doing.

Thus, in this embodiment, the liquid outlet 4
2 and the gas outlet 192, and four types including the liquid inlet 161 and the gas inlet 171 are collectively formed in one scanning head (proximity body) 2, thereby further simplifying the configuration of the apparatus. The size can be reduced. Note that the scanning head (proximity body) 2 is not limited to such a configuration, and may have a structure in which these openings are formed as two or more separate bodies.

The numbers of the liquid outlets 42, the liquid inlets 161, the gas outlets 192 and the gas inlets 171 are not limited to those shown in the drawings, but may be set appropriately according to the size of the plate 100 to be processed. To be done. Further, the liquid outlet 42, the liquid inlet 161, the gas outlet 192 and the gas inlet 171.
May be arranged in two or more rows. Further, the liquid outlet 42, the liquid inlet 161, and the gas outlet 192.
At least one gas inlet 171 and each gas inlet 171 may be provided. Further, in the illustrated configuration, the liquid outlet 42, the liquid inlet 161, the gas outlet 192, and the gas inlet 171 each have a circular shape, but the shape is not limited to this, and for example, an elliptical shape, a rectangular shape, or the like. May be

In the illustrated structure, the hole 46 forming the liquid outlet 42, the hole 163 forming the liquid inlet 161, the hole 195 forming the gas outlet 192 and the hole 174 forming the gas inlet 171 are respectively formed. , Scanning head (proximity body)
2 is formed so as to penetrate to the base end portion 23. And
At the base end openings of the holes 46, 163, 195, and 174, elongated casings 47, 16 forming flow paths are formed.
4, 196 and 175 are fixedly attached. Thereby, the flow paths to the plurality of liquid outlets 42, the liquid inlet 161, the gas outlet 192 and the gas inlet 171 are in communication with each other inside the casings 47, 164, 196 and 175.

Further, in the configuration shown in the figure, the hood (windshield) for preventing the surface active gas supplied from the gas outlet 192 from escaping (diffusing) to the scanning head (proximity body) 2.
22 is provided. As a result, it is possible to improve the supply efficiency of the surface-active gas and prevent diffusion into the environment.

The processing liquid supply means 9 for supplying the processing liquid T to the gap 20 includes a processing liquid tank 91 for storing the processing liquid T, a liquid outlet 42 and a hole 46 formed in the scanning head (proximity body) 2. A casing 47, a supply line (flow path) 93 connecting the processing liquid tank 91 and the switching valve 40,
It is configured by a pump 94 installed in the middle of the supply line 93 and a supply line (flow path) 45 connecting the switching valve 40 and the casing 47.

When the switching valve 40 is in the second state described later, the treatment liquid T is sequentially passed from the treatment liquid tank 91 through the supply line 93, the supply line 45, the inside of the casing 47, and the hole 46 by the operation of the pump 94. It flows out from the liquid outlet 42 and is supplied to the gap 20.

The treatment liquid supply means 9 may be capable of supplying a plurality of types of treatment liquids T (for example, ozone water and SC1 (ammonia water + perhydrogen) or ozone water and dilute hydrofluoric acid). Good. That is, the processing liquid supply means 9 may perform a plurality of types of processing on the processing surface 101.

The cleaning liquid supply means 4 for supplying the cleaning liquid (rinsing liquid) R to the gap 20 has a cleaning liquid tank 41 for storing the cleaning liquid R, a liquid outlet 42 and a hole 46 formed in the scanning head (proximity body) 2. A casing 47, a supply line (flow path) 43 connecting the cleaning liquid tank 41 and the switching valve 40, a pump 44 installed in the middle of the supply line 43, and a supply line connecting the switching valve 40 and the casing 47. (Flow path) 45.

The switching valve 40 connects the supply line 43 and the supply line 45 to each other, and closes (blocks) the supply line 93 in the first state, and the supply line 93 and the supply line 4.
5 for communicating with 5 and for blocking (blocking) the supply line 43
The state can be switched to.

The cleaning liquid R is supplied by the switching valve 40 to the first
In this state, by operating the pump 44, the cleaning liquid tank 41 sequentially passes through the supply line 43, the supply line 45, the inside of the casing 47, and the hole 46 to flow out from the liquid outlet 42.
It is supplied to the gap 20.

As described above, in the present embodiment, the cleaning liquid supply means 4 and the processing liquid supply means 9 have the liquid outlet 42 and the hole 4.
6, the supply line 45 and the casing 47 are shared (shared). That is, the liquid outlet 42
Is used both as a cleaning liquid outflow port through which the cleaning liquid R flows out and as a processing liquid outflow port through which the processing liquid T flows out. As described above, in this embodiment, a part of the flow path is shared (shared) between the processing liquid T supply line and the cleaning liquid R supply line.
By doing so, the configuration of the device can be further simplified and downsized.

In the present invention, unlike this configuration, the cleaning liquid outlet and the treatment liquid outlet may be provided separately.

Surface-active gas supply means 19 for supplying surface-active gas near the tip 21 of the scanning head (proximity body) 2.
Is a surface-active gas tank 191 that stores surface-active gas.
And the gas outlet 1 formed in the scanning head (proximity body) 2.
92 and holes 195, a casing 196, a supply line (flow passage) 193 connecting the surface-active gas tank 191 and the casing 196, and a pump 194 provided in the middle of the supply line 193.

The surface active gas is supplied from the surface active gas tank 191 to the supply line 193 by the operation of the pump 194.
The gas flows out from the gas outlet 192 through the hole 195 in the casing 196 sequentially, and is supplied to the vicinity of the tip 21 of the scanning head (proximity body) 2 (right side of the tip 21 in the drawing).

The drainage means 16 for sucking and discharging the processing liquid T and the cleaning liquid R in the gap 20 is a liquid inlet 161 and a hole 163 formed in the scanning head (proximity body) 2, a casing 164, and a casing 164. Drain line 16 extending from
2 and a pump 16 provided in the middle of the drain line 162
It is composed of 5 and 5.

When the pump 165 operates, the processing liquid T and the cleaning liquid R in the gap 20 are sucked in and discharged (removed) from the liquid inflow port 161. That is, the drainage means 16 has the gap 2
It serves as a removing means for removing the processing liquid T and the cleaning liquid R supplied to 0.

In the present embodiment, such drainage means 16 is used.
Since the processing liquid T and the cleaning liquid R are supplied from the liquid outlet 42, the processing can be performed while the processing liquid T and the cleaning liquid R are sucked and discharged from the liquid inlet 161. As a result, the processing liquid T or the cleaning liquid R in the gap 20 can be processed while being gradually exchanged, and thus the processing liquid T or the cleaning liquid R can be maintained in a fresh state without deterioration, deterioration, and dirt. Therefore, the processing efficiency can be further improved, and the cleanliness of the processed surface 101 after drying can be further improved.

By operating the draining means 16, the amount of the processing liquid T or the cleaning liquid R in the gap 20 (processing surface 1
It is also possible to adjust the adhesion amount of the treatment liquid T or the cleaning liquid R to 01). As a result, the processing liquid T or the cleaning liquid R that does not completely fill the gap 20 (cannot be held) is treated.
It is possible to prevent the droplets from remaining on the surface.

The tip portion 2 of the scanning head (proximity body) 2
A droplet sensor (not shown) for detecting water content is installed in the vicinity of 1, and the amount of the processing liquid T or the cleaning liquid R in the gap 20 is detected and automatically adjusted to an appropriate amount. Good.

The exhaust means 17 for exhausting the surface-active gas supplied near the tip 21 extends from the gas inlet 171 and the hole 174 formed in the scanning head (proximity body) 2, the casing 175, and the casing 175. It is composed of an exhaust line 172 and a pump 173 provided in the middle of the exhaust line 172.

When the pump 173 operates, the gas outlet 1
The surface-active gas supplied from 92 is supplied to the gas inlet 171.
Inhaled and discharged from.

In the present embodiment, such exhaust means 17 is used.
With the provision of, it is possible to prevent the surface-active gas supplied near the tip portion 21 from diffusing into the environment, and it is possible to further reduce the burden on the environment.

Further, as shown in FIG. 7, the gas outlet 19
The surface active gas supplied from No. 2 is sucked from the gas inflow port 171 to generate an air flow F in the vicinity of the meniscus M of the cleaning liquid R, thereby removing the particles P and drying the vicinity of the end M1 of the meniscus M. The efficiency can be further improved.

The evacuation means 17 may be operated even during the processing with the processing liquid T. This can prevent the gas generated from the treatment liquid T in the gap 20 from diffusing into the environment and further reduce the burden on the environment.

Driving means 5 and pump 9 of processing liquid supply means 9
4, pump 44 of cleaning liquid supply means 4, pump 194 of surface-active gas supply means 19, pump 16 of drainage means 16
5, the pump 173 of the exhaust means 17, the conveying means 18, the positioning means 13, and the switching valve 40 are electrically connected to the control means 50, respectively, and are based on a signal (control signal) from the control means 50. Works.

The surface treatment apparatus 1B may be provided with a recovery means for removing or recovering the processing liquid T or the cleaning liquid R spilled from the processing surface 101. Examples of the recovery means include a receiving tray (reservoir) that receives the processing liquid T and the cleaning liquid R, and an absorbent material that absorbs the processing liquid T and the cleaning liquid R.

In addition, in the surface treatment apparatus 1B, the transport means 1
8, positioning means 13, drainage means 16 and exhaust means 1
Each of 7 may be omitted.

Next, a second embodiment (operation of the surface treatment apparatus 1B) of the surface treatment method of the present invention using the surface treatment apparatus 1B will be described.

<1> While the scanning head (proximity body) 2 is retracted to the upper side by the driving means 5, the plate 100 is carried in by the carrying means 18. The processed plate 100 is positioned at a predetermined position by the stopper 131 and then stopped.

<2> Next, the scanning means (proximity body) 2 is moved down by the driving means 5, and the tip 21 is moved to the processing surface 10.
Close to 1. At this time, the tip 21 and the processing surface 101
The gap distance of the gap 20 between and is set to the size described above.

In the present embodiment, the gap distance of the gap 20 can be adjusted by adjusting the lowering stop position of the scanning head (proximity body) 2 at this time. By adjusting the gap distance, the amount of the processing liquid T or the cleaning liquid R attached to the processing surface 101 can be controlled. Also,
It is possible to deal with the target plate 100 having different plate thicknesses.

The surface processing apparatus 1B has a structure in which the position of the processing surface 101 of the plate 100 to be processed is detected by a sensor and the gap distance of the gap 20 is automatically adjusted to a set value. May be. This makes it possible to deal with a case where the plate thickness changes from the middle when the plurality of plates 100 to be processed are continuously processed.

Further, unlike the above <1>, the plate 100 to be processed may be carried in while the scanning head (proximity body) 2 is at a predetermined lowering stop position.

<3> Next, the driving means 5 moves the scanning head (proximity body) 2 to the left or right edge of the plate 100 to be processed in the figure, and the switching valve 40 is moved to the supply line 93.
And the supply line 45 are communicated with each other.
To operate. As a result, the processing liquid T is supplied from the liquid outlet 42 to the gap 20. When the gap 20 is filled with the processing liquid T, the pump 94 is stopped, and the driving unit 5 gradually scans the scanning head (proximity body) 2 along the plate 100 to the opposite edge. In this way, the processing surface 101 is subjected to the predetermined processing with the processing liquid T. If necessary, the scanning head (proximity body) 2 may be reciprocated once or twice or more along the plate 100 to be processed.

While the treatment with the treatment liquid T is being performed, the pump 94 is continuously operated and the drainage means 16 is operated so that the treatment liquid T is supplied from the liquid outlet 42 while the treatment liquid T is supplied from the liquid inlet 161. It may be in a state of inhaling T. As a result, the treatment liquid T in the gap 20 can be maintained while maintaining an appropriate amount, and the treatment liquid T in the gap 20 can be gradually replaced while performing the treatment. It is possible to maintain a fresh state, and further improve the processing efficiency (effect) and further shorten the processing time.

Further, by moving the scanning head (proximity body) 2 beyond the edge of the plate to be processed 100 to the outside, the processing liquid T in the gap 20 is spilled and removed from the processing surface 101, and then the processing liquid is supplied. By supplying the treatment liquid T again by the means 9, the treatment liquid T may be almost entirely exchanged and the treatment may be continued. Thereby, the processing efficiency can be further improved. The exchange of the treatment liquid T may be performed plural times as needed. The processing liquid T spilled from the processing surface 101 is removed or recovered by the recovery means (the same applies to the cleaning liquid R).

Further, during the processing with the processing liquid T, the exhaust means 17 may be operated to exhaust the gas generated from the processing liquid T in the gap 20.

<4> When processing with a plurality of types of processing liquids T (when the processing liquid supply means 9 is capable of supplying a plurality of types of processing liquids T), the processing liquids T should be different types. The process is switched and the same process as the above <3> is performed. This allows
Multiple types of processing can be performed. When changing the type of the processing liquid T, the scanning head (proximity body) is used as described above.
2 is moved to the outside beyond the edge of the plate to be processed 100 to spill and remove the processing liquid T in the gap 20 from the processing surface 101, and then the next processing liquid T is supplied. As a result, the processing liquid T in the gap 20 can be replaced quickly and without any liquid remaining.

<5> When the treatment with the treatment liquid T is completed, the scanning head (proximity body) 2 is moved to the outside beyond the edge of the plate 100 to be treated so that the treatment liquid T in the gap 20 is treated.
Spill from 01 and remove.

<6> Next, the scanning head (proximity body) 2
At a position on the left or right edge of the plate to be processed 100 in the figure, the switching valve 40 is placed in a state of connecting the supply line 43 and the supply line 45, and the pump 44 is operated.
As a result, the cleaning liquid R is supplied to the gap 20 from the liquid outlet 42. When the gap 20 is filled with the cleaning liquid R, the pump 44 is stopped and the driving means 5 drives the scanning head (proximity body).
2 is gradually scanned along the plate 100 to be processed up to the opposite edge. In this way, the cleaning liquid R is applied to the processing surface 101.
The cleaning process (rinsing process) is performed. If necessary, the scanning head (proximity body) 2 may be reciprocated once or twice or more along the plate 100 to be processed.

During the treatment with the cleaning liquid R, the pump 44 is continuously operated and the drainage means 16 is operated to supply the cleaning liquid R from the liquid outlet 42 and suck the cleaning liquid R from the liquid inlet 161. It may be in a state of performing. As a result, the cleaning liquid R in the gap 20 can be maintained while maintaining an appropriate amount, and the cleaning liquid R in the gap 20 can be gradually replaced while performing the treatment. Therefore, the cleaning liquid R can be fresh without deterioration, deterioration, and dirt. The state can be maintained, the cleaning efficiency (effect) can be improved, and the cleaning time can be shortened.
Further, the processing surface 101 can be cleaned more cleanly,
The degree of cleanliness of the treated surface 101 after drying can be further improved.

By moving the scanning head (proximity body) 2 beyond the edge of the plate to be processed 100 to the outside, the cleaning liquid R in the gap 20 is spilled and removed from the processing surface 101, and then the cleaning liquid supply means 4 is provided. By supplying the cleaning liquid R again by, the cleaning liquid R may be replaced almost completely and the cleaning process may be continued. Thereby, the cleaning efficiency can be further improved. The exchange of the cleaning liquid R may be performed a plurality of times if necessary.

Further, as a method for further enhancing the cleaning effect, ultrasonic wave applying means (not shown) may be installed in the scanning head (proximity body) 2 and ultrasonic cleaning may be used together.

<7> Next, the processing surface 101 is dried. In this drying process, with the cleaning liquid R in the gap 20, the scanning head (proximity body) 2 is gradually scanned once by the drive means 5 from the right side edge to the left side edge of the plate to be processed 100 in the figure. Do it. That is, the scanning direction of the scanning head (proximity body) 2 in the drying process is from the right side to the left side in the drawing.

As shown in FIG. 7, when the scanning head (proximity body) 2 scans in this direction, the meniscus M (curved surface) of the cleaning liquid R is located behind the cleaning liquid R in the gap 20 in the scanning direction (on the right side in the drawing). ) Is formed. For the drying process, the pump 194 of the surface-active gas supply means 19 is operated to move the meniscus M.
Is performed while supplying the surface-active gas from the gas outlet 192 to the vicinity.

When the surface-active gas is supplied to the vicinity of the meniscus M, due to the Marangoni effect similar to that of the first embodiment, water droplet marks (watermarks), particles P and the like remain near the end M1 of the meniscus M. The treated surface 101 can be dried without any treatment.

Further, in this embodiment, by operating the exhaust means 17, the surface active gas supplied from the gas outlet 192 is sucked in from the gas inlet 171 to generate the air flow F and the particles P. Further, the meniscus M is made to flow more strongly from the vicinity of the end portion M1 toward the central portion M2. Therefore, it is possible to more reliably prevent the particles P from remaining on the processing surface 101.

The scanning head (proximity body) 2 is attached to the processing target plate 100.
By scanning from the edge on the right side to the edge on the left side in the figure, the meniscus M moves from the edge on the right side in the figure to the edge on the left side of the target plate 100. As a result, the processing surface 10
The same drying process as in the first embodiment is performed on almost the entire area of 1.

Further, in the present embodiment, the exhaust means 17 is operated to perform the drying process while sucking and discharging the surface active gas from the gas inlet 171 so that the air flow F of the surface active gas is generated along the meniscus M. Occurs, which causes the end M1
The drying efficiency in the vicinity can be further improved. Also,
This air flow F also acts to promote (smooth) the Marangoni flow, and thus more reliably prevents the liquid film near the end M1 from being broken and the droplets of the cleaning liquid R to remain on the processing surface 101. It can also be prevented.

The moving speed of the meniscus M can be properly adjusted by adjusting the scanning (traveling) speed of the scanning head (proximity body) 2 so that good drying is performed. In the present embodiment, by combining the adjustment of the moving speed of the meniscus M and the adjustment of the gap distance of the gap 20, it is possible to deal with different types of the processed plate 100, the cleaning liquid R, and the like.

Further, in this drying process, the cleaning liquid R in the gap 20 may be gradually replaced as described above.

In the above, the cleaning process (the above <6>)
Although the case where the drying process (the above <7>) is separately (continuously) performed after the above is described, in the present embodiment, the cleaning process and the drying process may be performed in parallel (at the same time). That is, as described above, while the scanning head (proximity body) 2 is gradually scanned once from the right edge portion to the left edge portion in the drawing of the plate to be processed 100, cleaning and drying are performed at once. You may

In this embodiment, as in the case of the first embodiment, the amount of the cleaning liquid R deposited on the processing surface 101 can be controlled by adjusting the gap distance of the gap 20 during drying. Since the processing plate 100 is fixed, there is no rocking of the plate to be processed 100 in the thickness direction, so that the meniscus M can be maintained in an appropriate size and dried. As a result, the drying efficiency can be further improved, the entire treated surface 101 can be uniformly dried, and the cleanliness of the treated surface 101 after drying can be further improved.

In the present embodiment, the amount of the cleaning liquid R deposited on the processing surface 101 may be controlled by using the drainage means 16 in combination.

Further, in the present embodiment, the processing is carried out while the plate 100 to be processed is horizontal, but in the present invention, the processing is carried out when the plate 100 to be processed is inclined or vertical to the horizontal plane. It may be one. In this case, even if the plate 100 to be processed is relatively large, it does not take up much space, and therefore the installation space of the apparatus can be made smaller.

Although the surface treating apparatus and the surface treating method of the present invention have been described above with reference to the illustrated embodiment, the present invention is not limited to this. Moreover, each part which comprises the surface treatment apparatus of this invention can be replaced by the thing of arbitrary structure which can exhibit the same function.

Further, in the above-described embodiment, the plate to be processed is fixed and the proximity body is moved (rotated, scanned, etc.) with respect to the plate to be processed so that the meniscus is moved along the surface of the plate to be processed. Although the apparatus and method for performing the drying process by moving the meniscus relative to the surface of the plate to be processed are relatively moved in the present invention by relatively moving the plate to be processed and the proximity body. Anything can be used.
That is, the proximity body is fixed and the plate to be processed is moved (rotation, slide, etc.) with respect to the proximity body, or both the proximity body and the plate to be processed are moved (rotation, slide, etc.). It may be one that causes it.

Further, the surface treatment apparatus of the present invention comprises:
It may be a combination of the configurations (features) of the embodiment and the second embodiment.

[0237]

As described above, according to the present invention, the processing, cleaning and drying of the plate to be processed can be carried out by one apparatus, and particularly, these can be carried out continuously and these can be carried out easily. Can be achieved with a device of various configurations. Therefore, it is not necessary to separately prepare the processing device, the cleaning device, and the drying device, and move the plate to be processed between these devices to perform sequential processing, and thus, it is possible to reduce the equipment cost, This has the advantage that the installation space for the device can be small.

In particular, when the plate to be processed is fixed and the proximity body is moved (rotated, scanned, etc.) with respect to the plate to be processed for cleaning and drying, the objects to be processed between the respective devices as described above. Since a processing plate conveyance path is not required, further downsizing of the apparatus and space saving can be achieved.

Then, when a part of the flow path is shared (shared) between the processing liquid and cleaning liquid supply lines and the processing liquid and cleaning liquid drain lines, or when the processing liquid supply line and the surfactant gas supply line flow. When a part of the road is shared (shared), the configuration of the device can be further simplified and downsized.

Further, when the treatment with the treatment liquid is performed while the opposing surface of the proximity body is relatively swung along the surface of the plate to be treated, the treatment effect is further increased and the treatment time is increased. Can be shortened.

Further, in the present invention, since the processing liquid or the cleaning liquid can be removed or exchanged during the processing or the cleaning,
Do not process or clean with deteriorated processing liquid or dirty cleaning liquid. Then, since the drying can be performed immediately after such efficient and favorable cleaning is performed or while performing such cleaning, the degree of cleanliness of the dried surface is high.

In particular, as a treatment liquid for removing the resist,
When ozone water or dilute hydrofluoric acid is used, the effect of removing resist residues, polymers, etc. is further enhanced.

When pure water or ozone water is used as the cleaning liquid, the cleaning effect can be further improved.

Further, according to the present invention, it is possible to cope with different plates to be processed having different plate thicknesses.

Further, according to the present invention, the drying efficiency is high, and good drying can be carried out without leaving traces of water droplets or particles. In particular, at the time of drying, it is possible to control the amount of the cleaning liquid attached to the surface of the plate to be treated, so that it is possible to maintain the meniscus in an appropriate size for drying, and thus, it is possible to further improve the drying efficiency. Uniform drying can be performed over the entire surface of the treated plate to be dried, and the degree of cleanliness of the dried surface is further improved.

Further, in the present invention, it is possible to wash and dry only one side of the plate to be treated, and it is possible to deal with various patterns such as single side washing / drying and double side washing / drying.

When the plate to be processed is placed in a non-horizontal state for drying, or when a proximity member is scanned along the plate to be dried, a meniscus is applied to the plate to be processed with a simple structure. It is possible to move reliably and at an appropriate speed, and it becomes possible to perform cleaner and better drying.

At this time, in the case of having the plate inclining means, the plate to be processed can be placed in a horizontal state and a non-horizontal state. For example, the plate to be processed can be loaded / unloaded or washed in the horizontal state. Can improve its efficiency,
It is possible to enjoy the advantage of performing the steps other than the drying in the horizontal state.

Further, when performing a series of processing with the plate to be processed in a non-horizontal state, especially when the plate to be processed is processed in the horizontal state, a relatively large installation space is required for the apparatus. Even in such a case, it is possible to enjoy the advantage of performing in a non-horizontal state that the installation space of the device may be smaller.

Also, when the means for exhausting the surface-active gas is provided, the flow of the surface-active gas near the meniscus can be improved, and the drying efficiency can be further improved.

Further, in the case of having a conveying means for the plate to be processed or further having a positioning means, in the case of processing a plurality of plate to be processed, particularly in the case of continuously processing the plurality of plate to be processed, etc. This is advantageous for automation of processing and contributes to improvement in mass productivity.

[Brief description of drawings]

FIG. 1 is a diagram (block diagram) schematically showing a first embodiment of a surface treatment apparatus of the present invention.

FIG. 2 is a bottom view of a moving body in the surface treatment apparatus shown in FIG.

FIG. 3 is a partial cross-sectional side view showing how the movable body is rotated in the surface treatment apparatus shown in FIG.

4 is a partial cross-sectional side view showing, in an enlarged manner, the vicinity of the meniscus of the cleaning liquid in FIG.

FIG. 5 is a diagram (block diagram) schematically showing a second embodiment of the surface treatment apparatus of the present invention.

6 is a bottom view of a scanning head in the surface treatment apparatus shown in FIG.

7 is a partial cross-sectional side view showing an enlarged tip portion of the scanning head during a drying process in the surface treatment apparatus shown in FIG.

[Explanation of symbols]

1A ... Surface treatment device 1B ... Surface treatment device 2 ...
Scanning head 21 ... Tip 22 ... Hood 23 ...
... Base end 3 ... Moving body 31 ... Opposing surface 32 ... Top surface 4 ... Cleaning liquid supply means 41 ... Cleaning liquid tank 42
...... Liquid outlet 43 ...... Supply line 44 ...... Pump 45 ...... Supply line 46 ...... Hole 47 ...... Casing 5 ...... Driving means 6 ...... Treatment liquid supply means 61 ...... Treatment liquid tank 6
2a to 62h ... Treatment liquid outlet 63 ... Supply line
64 ... Pumps 65a to 65h ... Casing 66a to 66h ... Branch line 661a ... Upstream side 662a ... Downstream side
7 ... Cleaning liquid supply means 71 ... Cleaning liquid tank 72 ... Cleaning liquid outlet 73 ... Supply line 74 ...
Pump 75 ... Supply line 76 ... Casing 8
…… Surfactant gas supply means 81 …… Surfactant gas tank 82 …… Supply line 83 …… Pump 9 …… Treatment liquid supply means 91 …… Treatment liquid tank 93 …… Supply line 94 …… Pump 11 …… Device body 12 …… Conveying means 121 …… Roller 13 …… Positioning means 131 …… Stopper 14 …… Processed plate tilting means 141 …… Pin 15 …… Air supply means 151 …… Inert gas tank 152 …… Supply line 153 …… Pump 16 ... Draining means 161 ... Liquid inlet 162
…… Drainage line 163 …… Hole 164 …… Casing 165 …… Pump 17 …… Exhaust means 171 …… Gas inlet 172 …… Exhaust line 173 …… Pump 174 ……
Hole 175 ... Casing 18 ... Conveying means 181
...... Roller 19 …… Surfactant gas supply means 191 ・ ・ ・
… Surfactant gas tank 192 …… Gas outlet 193
…… Supply line 194 …… Pump 195 …… Hole 196 …… Casing 10 …… Gap 20 …… Gap 30 …… Rotation center
40 ... Switching valve 50 ... Control means 70 ... Switching valve 80 ... Switching valve 100 ... Processing plate 101 ... Processing surface 102 ... Edge T ... Processing liquid R ... Cleaning liquid M ... Meniscus M1 ...... End M
2 ... central part M3 ... end part F ... air flow P ... particles

─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. ⁷ Identification code FI theme code (reference) H01L 21/027 H01L 21/30 564Z 572B F term (reference) 3B201 AA01 BB92 BB93 BB96 CC01 CC12 4K053 PA13 QA04 RA07 RA17 RA64 SA06 SA19 TA16 TA18 TA19 XA09 XA28 XA45 XA50 5F046 HA03 JA02 JA03 JA27 MA02 MA10

Claims (29)

[Claims] 1. An apparatus main body that supports a plate to be processed, a proximity body that can be positioned close to the surface of the plate to be processed supported by the apparatus body, and the proximity body and the plate to be processed relative to each other. Driving means for moving the same, and a treatment liquid supply means for supplying at least one treatment liquid for treating the surface from a treatment liquid outlet formed in the proximity body to a gap between the surface and the proximity body. A cleaning liquid supply unit that supplies a cleaning liquid to a gap between the surface and the proximity member from a cleaning liquid outlet formed in the proximity member, and a vicinity of the meniscus of the cleaning liquid supplied to the gap between the surface and the proximity member, With a surface-active gas supply means for supplying a surface-active gas containing a surfactant from a gas outlet formed in the close-up body, in a state where the close-up body is brought close to the surface of the plate to be processed,
The treatment liquid is supplied to the gap between the surface and the proximity body from the treatment liquid outlet to treat the surface, and then the cleaning liquid is supplied to the gap between the surface and the proximity body from the cleaning liquid outlet. By cleaning the surface, while supplying the surface-active gas from the gas outlet near the meniscus of the cleaning liquid, by relatively moving the proximity body and the plate to be processed by the driving means A surface treatment apparatus, wherein the meniscus is moved along the surface, thereby operating to dry the surface of the plate to be processed. 2. The surface processing apparatus according to claim 1, further comprising a transfer unit that transfers the plate to be processed. 3. The surface processing apparatus according to claim 2, further comprising a positioning unit that positions a transportation stop position of the plate to be processed. 4. The surface treatment apparatus according to claim 1, further comprising a removing unit that removes the treatment liquid and / or the cleaning liquid supplied to the gap between the surface of the plate to be treated and the proximity body. 5. The removing means is composed of an air supply means for supplying air to a gap between the surface of the plate to be processed and the proximity body, and by this air supply, the treatment liquid or the cleaning liquid is discharged from the gap. The surface treatment apparatus according to claim 4, which is extruded and removed. 6. The surface treatment apparatus according to claim 4, wherein the removing means is a draining means for sucking and discharging the treatment liquid or the cleaning liquid from a liquid inlet formed in the proximity body. . 7. The surface of the plate to be processed and the proximity body by supplying the processing liquid or the cleaning liquid by the processing liquid supply unit or the cleaning liquid supply unit after removing the processing liquid or the cleaning liquid by the removing unit. 7. The surface treatment apparatus according to claim 4, wherein the treatment liquid or the cleaning liquid in the gap is exchangeable. 8. The surface of the plate to be processed and the proximity body by removing the processing liquid or the cleaning liquid by the removing unit and supplying the processing liquid or the cleaning liquid by the processing liquid supply unit or the cleaning liquid supply unit. 8. The surface treatment apparatus according to claim 4, wherein the surface can be treated or washed while exchanging the treatment liquid or the cleaning liquid in the gap. 9. The surface treatment according to claim 1, wherein the treatment liquid outlet and / or the cleaning liquid outlet is composed of a plurality of small holes arranged in one or two or more rows. apparatus. 10. The proximity body has a facing surface that can be positioned so as to face the surface of the plate to be processed, and in the drying treatment, the plate to be processed is in a non-horizontal state. While supplying the surface-active gas from the gas outlet to the vicinity of the meniscus of the cleaning liquid formed on the higher side of the plate, the drive means rotates the facing surface near the lower edge of the plate to be processed. The surface treatment apparatus according to claim 1, wherein the meniscus is moved along the surface toward the center of rotation by relatively rotating as a center of motion. 11. The surface treatment apparatus according to claim 10, further comprising a plate inclining means for inclining the plate to be in a non-horizontal state. 12. The surface treatment apparatus according to claim 10, wherein the proximity body has a substantially plate shape. 13. The surface treatment apparatus according to claim 10, wherein the size of the plate to be processed and the size of the facing surface are substantially the same. 14. The surface of the plate to be processed can be processed by the processing liquid by the drive means while relatively swinging the facing surface along the surface of the plate to be processed. The surface treatment apparatus according to any one of 1. 15. The proximity member is driven by the drive means.
It is relatively scannable along the plate to be processed, and the drying process is performed from the gas outlet near the meniscus of the cleaning liquid formed on the scanning direction rear side of the proximity body with respect to the plate to be processed. While supplying the surface-active gas,
10. The surface according to claim 1, wherein the driving means relatively scans the proximity body along the plate to be processed to move the meniscus along the surface. Processing equipment. 16. The surface treatment apparatus according to claim 15, wherein the drive means performs the treatment with the treatment liquid or the cleaning treatment while relatively scanning the proximity body along the plate to be treated. 17. The surface treatment apparatus according to claim 15, further comprising exhaust means for sucking and discharging the surface-active gas supplied from the gas outlet from a gas inlet formed in the proximity body. 18. In a state in which a proximity body that is relatively movable with respect to the plate to be processed and a surface of the plate to be processed are in proximity to each other, the surface of the proximity plate and the surface of the plate from the processing liquid outlet formed in the proximity body. At least one type of treatment liquid for treating the surface is supplied to the gap between the proximity body and the surface to treat the surface, and then the cleaning liquid outlet formed in the proximity body causes a gap between the surface and the proximity body. A cleaning liquid is supplied to clean the surface, and while supplying the surface-active gas near the meniscus of the cleaning liquid from a gas outlet formed in the proximity body, the proximity body and the plate to be processed are relatively By moving to
A surface treatment method, wherein the meniscus is moved along the surface, whereby the surface of the plate to be treated is dried. 19. The processing liquid or the cleaning liquid is supplied from the processing liquid outlet or the cleaning liquid outlet after removing the processing liquid or the cleaning liquid supplied to the gap between the surface of the plate to be processed and the proximity body. 19. The processing liquid or the cleaning liquid is exchanged to perform the processing or the cleaning treatment according to
The surface treatment method described in. 20. The treatment with the treatment liquid or the cleaning treatment removes the treatment liquid or the cleaning liquid in the gap between the surface of the plate to be treated and the proximity body, and performs the treatment from the treatment liquid outlet or the cleaning liquid outlet. The surface treatment method according to claim 18, wherein the treatment liquid or the cleaning liquid is exchanged by supplying the liquid or the cleaning liquid. 21. The proximity body has a facing surface that can be positioned so as to face the surface of the plate to be processed, and in the drying process, the plate to be processed is in a non-horizontal state. While supplying the surface-active gas from the gas outlet to the vicinity of the meniscus of the cleaning liquid formed on the higher side of the plate, the facing surface is relatively rotated around the lower side edge of the plate to be processed as a rotation center. The surface treatment method according to any one of claims 18 to 20, wherein the meniscus is moved along the surface toward the center of rotation by rotating the surface to the center. 22. The surface treatment method according to claim 21, wherein the treatment with the treatment liquid is performed while the opposite surface is relatively swung along the surface of the plate to be treated. 23. The surface treatment method according to claim 21, wherein the moving body has a substantially plate shape. 24. The surface treatment method according to claim 21, wherein the size of the plate to be processed and the size of the facing surface are substantially the same. 25. The proximity body is capable of relatively scanning along the plate to be processed, and the drying process is formed on the rear side of the proximity plate in the scanning direction with respect to the plate to be processed. While supplying the surface-active gas from the gas outlet near the meniscus of the cleaning liquid,
21. The surface treatment method according to claim 18, wherein the meniscus is moved along the surface of the plate to be processed by relatively scanning the proximity body along the plate to be processed. 26. The surface treatment method according to claim 25, wherein the treatment with the treatment liquid or the cleaning treatment is performed while relatively scanning the proximity body along the plate to be treated. 27. The drying process is performed while sucking and discharging a surface-active gas supplied from the gas outlet through a gas inlet formed in the proximity body.
The surface treatment method according to item 6. 28. The surface treatment method according to claim 18, wherein the treatment liquid is ozone water or diluted hydrofluoric acid. 29. The surface treatment method according to claim 18, wherein the cleaning liquid is pure water or ozone water.