TWI263273B - Protective tape applying method and apparatus, and protective tape separating method - Google Patents

Protective tape applying method and apparatus, and protective tape separating method

Info

Publication number
TWI263273B
TWI263273B TW091137095A TW91137095A TWI263273B TW I263273 B TWI263273 B TW I263273B TW 091137095 A TW091137095 A TW 091137095A TW 91137095 A TW91137095 A TW 91137095A TW I263273 B TWI263273 B TW I263273B
Authority
TW
Taiwan
Prior art keywords
protective tape
wafer
separating
chuck table
protective
Prior art date
Application number
TW091137095A
Other languages
English (en)
Other versions
TW200302520A (en
Inventor
Masayuki Yamamoto
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Publication of TW200302520A publication Critical patent/TW200302520A/zh
Application granted granted Critical
Publication of TWI263273B publication Critical patent/TWI263273B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/6834—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to protect an active side of a device or wafer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
    • H01L2221/68386—Separation by peeling
    • H01L2221/68395—Separation by peeling using peeling wheel
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor
    • Y10T156/1052—Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/12—Surface bonding means and/or assembly means with cutting, punching, piercing, severing or tearing

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
TW091137095A 2002-01-15 2002-12-24 Protective tape applying method and apparatus, and protective tape separating method TWI263273B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002006013A JP2003209082A (ja) 2002-01-15 2002-01-15 保護テープの貼付方法およびその装置並びに保護テープの剥離方法

Publications (2)

Publication Number Publication Date
TW200302520A TW200302520A (en) 2003-08-01
TWI263273B true TWI263273B (en) 2006-10-01

Family

ID=19191174

Family Applications (1)

Application Number Title Priority Date Filing Date
TW091137095A TWI263273B (en) 2002-01-15 2002-12-24 Protective tape applying method and apparatus, and protective tape separating method

Country Status (6)

Country Link
US (1) US6919284B2 (zh)
EP (1) EP1328011A2 (zh)
JP (1) JP2003209082A (zh)
KR (1) KR100868142B1 (zh)
CN (1) CN1287428C (zh)
TW (1) TWI263273B (zh)

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JP2002367931A (ja) * 2001-06-07 2002-12-20 Lintec Corp ダイボンディングシート貼着装置およびダイボンディングシートの貼着方法
US20040214432A1 (en) * 2003-04-24 2004-10-28 Mutsumi Masumoto Thinning of semiconductor wafers
JP2005086074A (ja) * 2003-09-10 2005-03-31 Disco Abrasive Syst Ltd 半導体ウェーハの移し替え方法
JP4090416B2 (ja) 2003-09-30 2008-05-28 日東電工株式会社 粘着テープ付ワークの離脱方法及び離脱装置
JP4530638B2 (ja) 2003-10-07 2010-08-25 日東電工株式会社 半導体ウエハへの保護テープ貼付方法及び貼付装置
JP4136890B2 (ja) 2003-10-17 2008-08-20 日東電工株式会社 保護テープの切断方法及び切断装置
JP2005150177A (ja) * 2003-11-12 2005-06-09 Nitto Denko Corp 半導体ウエハ裏面への粘着テープ貼付方法及び粘着テープ貼付装置
JP4416108B2 (ja) * 2003-11-17 2010-02-17 株式会社ディスコ 半導体ウェーハの製造方法
JP4472316B2 (ja) * 2003-11-28 2010-06-02 日東電工株式会社 粘着テープ切断方法及び粘着テープ切断装置
JP4297829B2 (ja) * 2004-04-23 2009-07-15 リンテック株式会社 吸着装置
TW200539357A (en) * 2004-04-28 2005-12-01 Lintec Corp Adhering apparatus and adhering method
JP4540403B2 (ja) 2004-06-16 2010-09-08 株式会社東京精密 テープ貼付方法およびテープ貼付装置
JP2006272505A (ja) * 2005-03-29 2006-10-12 Nitto Denko Corp 保護テープ切断方法およびこれを用いた装置
JP4285455B2 (ja) * 2005-07-11 2009-06-24 パナソニック株式会社 半導体チップの製造方法
JP4836557B2 (ja) 2005-11-25 2011-12-14 株式会社東京精密 ダイシングテープ貼付装置およびダイシングテープ貼付方法
JP4953764B2 (ja) 2005-11-29 2012-06-13 株式会社東京精密 剥離テープ貼付方法および剥離テープ貼付装置
JP2007214357A (ja) * 2006-02-09 2007-08-23 Nitto Denko Corp ワーク貼付け支持方法およびこれを用いたワーク貼付け支持装置
US20070204520A1 (en) * 2006-03-01 2007-09-06 Calleja Michael J Self-elevating staging with rack-and-pinion posts
JP4953738B2 (ja) * 2006-09-07 2012-06-13 日東電工株式会社 粘着テープ切断方法およびこれを用いた粘着テープ貼付け装置
US7614848B2 (en) 2006-10-10 2009-11-10 United Technologies Corporation Fan exit guide vane repair method and apparatus
KR100775933B1 (ko) * 2006-12-14 2007-11-13 우리마이크론(주) 확산판 보호테이프 자동 부착장치
US7659140B2 (en) * 2007-03-30 2010-02-09 Stats Chippac Ltd. Integrated circuit system with a debris trapping system
US20090264053A1 (en) * 2008-04-21 2009-10-22 Applied Materials, Inc. Apparatus and methods for using a polishing tape cassette
JP5160297B2 (ja) * 2008-05-02 2013-03-13 日東電工株式会社 カッタ刃の清掃方法およびカッタ刃の清掃装置、並びに、これを備えた粘着テープ貼付け装置
TWI410329B (zh) * 2009-03-09 2013-10-01 Ind Tech Res Inst 可撓式裝置的取下設備及其取下方法
US8069893B2 (en) * 2010-02-03 2011-12-06 Lai Chin-Sen Cutting mechanism for dry film laminator
JP5381821B2 (ja) 2010-03-10 2014-01-08 三菱電機株式会社 保護テープ剥離方法および保護テープ剥離装置
JP5607965B2 (ja) * 2010-03-23 2014-10-15 日東電工株式会社 半導体ウエハマウント方法および半導体ウエハマウント装置
US8574398B2 (en) 2010-05-27 2013-11-05 Suss Microtec Lithography, Gmbh Apparatus and method for detaping an adhesive layer from the surface of ultra thin wafers
JP6054622B2 (ja) * 2012-04-05 2016-12-27 信越ポリマー株式会社 半導体ウェーハ用保護テープ及びその貼り付け方法
JP6388331B2 (ja) * 2014-07-14 2018-09-12 Ｎｅｃプラットフォームズ株式会社 テープ貼付装置及びテープ貼付治具
JP6510393B2 (ja) * 2015-12-15 2019-05-08 三菱電機株式会社 半導体装置の製造方法
JP6879840B2 (ja) * 2017-06-28 2021-06-02 株式会社ディスコ テープ貼り機及びテープ外し方法
JP7022560B2 (ja) * 2017-10-18 2022-02-18 リンテック株式会社 接着シート処理方法および接着シート処理装置
JP2020178103A (ja) * 2019-04-22 2020-10-29 リンテック株式会社 シート支持装置およびシート支持方法
JP7441734B2 (ja) 2020-06-05 2024-03-01 リンテック株式会社 転写装置および転写方法

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JP2003051473A (ja) * 2001-08-03 2003-02-21 Disco Abrasive Syst Ltd 半導体ウェーハの裏面研削方法
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Also Published As

Publication number Publication date
KR100868142B1 (ko) 2008-11-10
CN1287428C (zh) 2006-11-29
EP1328011A2 (en) 2003-07-16
CN1433055A (zh) 2003-07-30
JP2003209082A (ja) 2003-07-25
KR20030062224A (ko) 2003-07-23
TW200302520A (en) 2003-08-01
US20030131929A1 (en) 2003-07-17
US6919284B2 (en) 2005-07-19

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees