TW540089B - Method and device of peeling semiconductor device using annular contact members - Google Patents
Method and device of peeling semiconductor device using annular contact members Download PDFInfo
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- TW540089B TW540089B TW091104019A TW91104019A TW540089B TW 540089 B TW540089 B TW 540089B TW 091104019 A TW091104019 A TW 091104019A TW 91104019 A TW91104019 A TW 91104019A TW 540089 B TW540089 B TW 540089B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68318—Auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
- H01L2221/68322—Auxiliary support including means facilitating the selective separation of some of a plurality of devices from the auxiliary support
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10S156/934—Apparatus having delaminating means adapted for delaminating a specified article
- Y10S156/941—Means for delaminating semiconductive product
- Y10S156/943—Means for delaminating semiconductive product with poking delaminating means, e.g. jabbing means
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/976—Temporary protective layer
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
- Y10T156/1168—Gripping and pulling work apart during delaminating
- Y10T156/1179—Gripping and pulling work apart during delaminating with poking during delaminating [e.g., jabbing, etc.]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
- Y10T156/1978—Delaminating bending means
- Y10T156/1983—Poking delaminating means
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49815—Disassembling
- Y10T29/49822—Disassembling by applying force
- Y10T29/49824—Disassembling by applying force to elastically deform work part or connector
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- Microelectronics & Electronic Packaging (AREA)
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
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Description
540089 A7 五、發明説明(i ^~- 發明背景 1·發明範疇 本發明係有關一種用於半導體元件製程之剝離半導體 曰曰片之方去。又本發明係有關一種用於剝離之裝置。 2.相關技藝說明 習知半導體元件之製造方式為例如多數半導體元件形 成於石夕曰曰圓(半導體基板)之第一表面上,石夕晶圓經切晶粒 因而將各個半導體元件(石夕晶片)彼此分開。石夕晶圓於切晶 粒之别黏著於切晶粒膠帶,於完成切晶粒時,彼此分開的 矽阳片仍然黏著於切晶粒膠帶。於接合晶粒前藉剝離裝置 而由切晶粒膠帶上剝離石夕晶片。 為了由切晶粒膠帶剝離晶片,習知使用第丨丨圖所示之 針衣置34。針裝置34包括針34A。針34八由切晶粒膠帶μ 底側朝向切晶粒膠帶24移動,刺穿切晶粒膠帶24因而舉升 矽b曰片16。也提供一種針裝置,其中針34A並未穿透切晶 粒膠帶2 4 〇 曰本專利公開案第1〇_1 89690號揭示一種剝離裝置,其 中針排列於接近四角以及,位在接近矽晶片中心位置。排列 於接近四角位置的針首先操動,然後排列於接近中心位置 的針被刼動,因此矽晶片由四角隅部份朝向中心逐步被剝 出。 曰本專利公開案第6_338527號揭示一種玻璃裝置,其 中未使用針,反而係藉具有抽吸溝槽的玻璃裝置由切晶粒 膠帶的底侧吸引而將石夕晶片由切晶粒膠帶上剝離。日本專 本紙張尺度適用中國國豕標準(CNS) A4規格(210X297公釐·〉 (請先閲讀背面之注意事項再填寫本頁)
氣 曰曰 片 吸
-·裝- :線丨 (請先閲讀背面之注意事項再填寫本頁) 540089 五、發明説明(2 利公開案第2__1 18862號揭示_種_裝置,其μ藉吸 引漠槽由切晶粒膠帶底側吸引以及平行移動平台,而由切 晶粒膠帶上剝除晶片。 晚近對縮小石夕晶圓厚度及石夕晶片厚度的需求日增。伸 隨著石夕晶圓厚度的減薄,變成難以從切晶粒膠帶上剝離石夕 晶片。舉例言之,但石夕晶片厚度變薄時,針於刺穿切晶粒 膠帶後容易刺穿矽晶片。 又’當石夕晶片厚度減薄時容易變形。如第12圖所示, 切晶粒膠帶24及石夕晶片i 6於針3从接觸切晶粒膠帶24及石夕 晶片16位置變形成為凹陷形,如第12圖所示。因此石夕晶 可能毀損或裂開。類似問題出現於藉抽吸溝槽由底側 引切晶粒膠帶案例。 又,為了由切晶粒膠帶24上剝離矽晶片16,需要空 進入矽晶片16與切晶粒膠帶24間的界面,展開於界面上。 當針並未穿透及撕裂晶粒膠帶24時,空氣首先不會進入石夕 日日片16中口界面’反而空氣先進入石夕晶片外周部界面。 因此剝離僅出現石夕晶片16外周部。第12圖所示情況下,石夕 晶片16變成難以由切晶粒,膠帶24剝離,矽晶片16容易受損。 發明概要 ~ 本發明之目的係提供一種剝離半導體晶片之方法及其 裝置,該方法及裝置即使於半導體晶片厚度薄之時,仍然 可牢靠地由切晶粒膠帶上剝離半導體晶片。 根據本發明一種剝離半導體晶片之方法,包含下列步 驟·使用一種剝離裝置由膠帶剝離黏著於膠帶的半導體 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公爱) 540089 五、發明説明 片㈣離衣置包括多數環形接觸件其由外側至内側逐一 排歹! /、中4多數環形接觸件經操動,因而半導體晶片由 其外周部朝向其中部由膠帶連續被剝離。 壯根據本發明一 f重由膠帶剝離黏著於膠帶之半導體晶片 之衣置& s多數壞形接觸件其由外側至内側逐一排列, 以及知動裝置其係用於操動該多數環形接觸件因而半導 體晶片由其外周部至中部連續由膠帶剝離。 月ίι ϋ方法及衣置中,半導體晶片係藉—種剝離裝置盆 包括多數環形接觸件由外側至内側循序逐_排列,從膠帶 上由其外周部朝向中部連續剝離。如此即使半導體晶片厚 度小,仍可牢靠的由膠帶剝離。 圖式之簡單說明 由後文較佳具體實施例之說明參照附圖將讓本發明更 為彰顯,附圖中: 第1圖為剖面圖顯示本發明之具體實施例剝離半導體 晶片之方法及裝置; ' 第2圖為放大剖面圖顯示第1圖之剝離頭; 第3 Α圖為平面圖顯示’第1圖之剝離頭表面; 第3B圖為平面圖顯示經修改之剝離頭表面· 第4A圖為剖面圖說明第i圖所示剝離裝置之操動·、 第4B圖剝離頭之平面圖; 第5A圖為剖面圖說明第i圖所示剝離装置之操動· 第5B圖剝離頭之平面圖; 第6A圖為剖面圖說明第i圖所示剝離裝置之操動· 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 6 540089 五、發明説明(4 第6B圖剝離頭之平面圖; 第7A圖為剖面圖說明第1圖所示剝離裝置之操動; 第7B圖剝離頭之平面圖; 第8A圖為剖面圖說明第丨圖所示剝離裝置之操動; 第8B圖剝離頭之平面圖; 第9A圖為剖面圖,說明第J圖所示剝離裝置之操動; 第9B圖剝離頭之平面圖; 第10A至10F圖為視圖顯示半導體元件製法之一系列 步驟之典型例; 第11圖為視圖顯示用於剝離半導體晶圓之習知針裝 置;以及 第12圖為視圖顯示當半導體晶片薄時於剝離裝置變形 的半導體晶片。 較佳具體實施例之說明 現在將參照附圖說明本發明知具體實施例。一系列半 ‘體元件製造方法步驟之典型例將參照第1〇A至l〇F圖說 明如後。 第10A圖為視圖顯示接受積體電路形成處理之矽晶圓 (半導體基板)。矽晶圓1〇具有第一表面12及第二表面14。 多數半導體元件(矽晶片16)於積體電路形成處理期間已經 形成於矽晶圓1〇第一表面12上。第1〇B圖中,保護膠帶18 黏著於矽晶圓10之第一表面12。 第ioc圖中,矽晶圓10之第二面14成為係於保護膠帶 18黏著於矽晶圓10第一表面12狀態下研磨。本例中機械處 本紙張尺度適用中國國家標準(CNS) M規格(21〇χ297公釐) (請先閲讀背面之注意事項再填寫本頁)
540089 五、發明説明(5 ) 理工具鑽石磨輪22研磨矽晶圓1〇之第二表面14,研磨時旋 轉支持件20支持矽晶圓1〇於保護膠帶18該侧。研磨過程 中,其上形成半導體元件16之矽晶圓1〇第二表面12係藉保 4膠帶18保護。本步驟中,石夕晶圓1〇經研磨成具有預定厚 度。 第10D圖中,石夕晶圓10之第二表面14黏著於切晶粒膠 帶24,保護膠帶18由石夕晶圓1〇之第一表面12撕離。切晶粒 膠帶24黏著於晶圓環26上,保護膠帶18例如係藉雙面膠帶 28而被撕離。於保護膠帶18被撕離前,保護膠帶μ照射紫 外光。 第10E圖中,矽晶圓10係於矽晶圓1〇黏著於切晶粒膠 帶24之狀態下利用切晶粒器3〇切晶粒及分開。分開後的石夕 晶片16仍然黏著於切晶粒膠帶24。於切晶粒完成後,切晶 粒膠帶24照射紫外光。第1〇F圖中,石夕晶片16藉壓模接: 至引線框32。此種案例中,各個石夕晶片16係藉剝離装置% 由切晶粒膠帶剝離且藉抽吸頭36而轉運至引線框Μ。 第1圖為剖面圖顯示根據本發明之具體實施例剝離 導體晶片之方法及裝置。.第i圖顯示替代第u圖之針裝置 34,用於壓模接合步驟之剝離裝置38,該步驟係類似第, 圖壓模接合步驟。多數石夕晶片16黏著於切晶粒膠帶^且輸 送至剝離裝置38與抽吸頭36間的位置。 剝離裝置38包括框40,抽吸蓋42排列於框4〇頂部,及 剝離頭44排列於框40,故由抽吸蓋42中央開口暴霖出。又, 剝離裝置38包括凸輪46及馬達48用以操動剝離頭料。凸輪 本紙張尺度適用中國國家標準 (CNS) A4規格 (210X297公釐) 540089 A7 B7 五、發明説明( 真空作用於切晶粒膠帶24之對應於矽晶片16最外周部 部份。因此切晶粒膠帶24被向下拉。如此當全部環形接觸 件54,56,58及60向上移動時,環繞最外環形接觸件之矽 晶片16之最外周部由切晶粒膠帶24被剝離。換言之,於矽 曰曰片16之隶外周邛,空氣進入石夕晶片16及切晶粒膠帶μ間 的界面。此種情;兄下,大部份石夕曰曰曰片16係藉環形接觸.件 54,56,58及60支持,由切晶粒膠帶24被剝離的矽晶片μ之 最外周部之徑向方向寬度極小。因此當石夕晶片16由切晶粒 膠帶24剝離時,不會施加過大力至石夕晶片16上。又,因由 7晶粒膠帶24剝離的碎晶片16的最外周部係於周邊方向連 續,故當石夕晶片16由切晶粒膠帶24剝離時不會引起應力 中。如此矽晶片16不會受損。 其次第6A及6B圖中,最外方環形接觸件54維持第一征 置’次外方環形接觸件56向上移動至第二位置,故環形接 1件54,56,58及60向上移動。此時,對應於最外方環形接 觸件56之部分石夕晶片16由切晶粒膠帶24被剝離。換古之* 氣由外側至内側進入界面。此種案例於石夕晶片16__ 也未施加過多力於石夕晶片16。因此部份石夕晶片16牢靠地由 切晶粒膠帶24剝離。 其次於第7 A及7 B圖’環形接觸件5 6係維持於第二位置 而又次外方環形接觸件58向上移動至第三位置,故環形接 56=錢向上_ ^此時石夕晶片16對應於環形接觸件 離位在環形接觸件58外側)部分由切晶粒膠帶Μ被剝 換3之空氣由外侧至内側進入界面。 集 位 (請先閱讀背面之注意事項再填寫本頁) 訂| ••線.......... 本紙張尺度適(CNS) 540089 A7 B7 五、發明説明(l〇 ) 元件標號對照 10…石夕晶圓 36···抽吸頭 12…第一面 38…剝離裝置 14…第二面 4 2…框 16…石夕晶片 42···抽吸蓋 18…保護膠帶 44···剝離頭 20…支持件 46···凸輪 22…鑽石磨輪 4 8…馬達 24…切晶粒膠帶 50,51…滑輪 26…晶圓環 52…帶 28…雙面膠帶 54-60…環形接觸件 30…切晶粒器 34A···針 3 2…引線框 54-58i…内肩部 34…針裝置 56-60〇···夕卜肩部 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 13
Claims (1)
- 第91104019號專利申請_ _請專㈣靜正本μ年彳月μ日 種到離半導體晶片之方法,包含下列步驟·· 使用-種剝離裝置由膠帶剝離黏著於膠帶的半導 體晶片’該剝離裝置包括多數環形接觸件其由外側至内 側逐一排列,其中該多數環形接觸件經操動,因而半導 體曰曰片由其外周部朝向其中部由膠帶連續被剝離。 2·如申请專利範圍第i項之剝離半導體晶片之方法,其中 多數環形接觸件係同時移動,然後多數環形接觸件之最 外方環形接觸件停止,而其於環形接觸件同時進一步移 動。. 3· -種由膠帶剝離黏著於膠帶之半導體晶片之裝置,包 含·· 多數環形接觸件其由外側至内側逐一排列;以及 、…一操動裝置其係用於操動該多數環形接觸件因而 半導體晶片由其外周部至卡部連續由膠帶剝離。 4·如申請專利範圍第3項之由膠帶剝離黏著於膠帶之半導 體晶片之裝置,其中操動裝置包括一凸輪用以操動多數 環形接觸件。 5 ·如申明專利範圍第3項之由膠帶剝離黏著於膠帶之半導 體晶片之裝置,進一步包含一框界限一個真空腔室於其 中,一頂板設置於該框上且有一開口,以及一抽吸裝置 設置於該框上方,環形接觸件係排列於該框。
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US (1) | US6824643B2 (zh) |
JP (1) | JP3976541B2 (zh) |
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US6824643B2 (en) | 2004-11-30 |
JP2003133391A (ja) | 2003-05-09 |
US20030075271A1 (en) | 2003-04-24 |
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JP3976541B2 (ja) | 2007-09-19 |
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CN1414602A (zh) | 2003-04-30 |
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