TW434175B - System for transferring wafers from cassettes to furnaces and method - Google Patents

System for transferring wafers from cassettes to furnaces and method Download PDF

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Publication number
TW434175B
TW434175B TW087114415A TW87114415A TW434175B TW 434175 B TW434175 B TW 434175B TW 087114415 A TW087114415 A TW 087114415A TW 87114415 A TW87114415 A TW 87114415A TW 434175 B TW434175 B TW 434175B
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wafer
furnace
patent application
scope
item
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TW087114415A
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Gert-Jan Snijders
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Asm Int
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67757Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a batch of workpieces
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67303Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67775Docking arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67778Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00Material or article handling
    • Y10S414/135Associated with semiconductor wafer handling
    • Y10S414/14Wafer cassette transporting

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Description

4 '7 Α7 Β7 五、發明説明(1 ) 發明領域 本發明是關於將晶圓裝入與移出爐中。 ί 發明背景 當處理半導體碟片或晶圓時,習用技術是將後者裝入 晶圓架中,此晶圓架導入爐內然後在一提高的溫度下進行 —供應有任何類型處理氣體之處理。在已讓渡給A SM國 際公司(ASM International N.V.)的美國第 5 4 0 7 4 4 9號專利中|說明一以習用方式利用匣盒來 供應晶圓的系統。晶圓是藉由中央自動裝置自匣盒移開並 轉送至與爐相關的晶圓架上。晶圓架是經由一旋轉裝置放 入爐中。各含有一爐與其它處理裝置的群組具有它自己的 裝卸裝置。 當增加晶圓處理裝置的容量時,在習知技術中最先建 議放置數個彼此相互平行的系統》 設計此系統的問題在於,用來將晶圓自匣盒轉送至晶 圓架之自動裝置是必須設計成如此的尺寸使得轉送晶圓的 時間不會構成一限制因素,即使是爐中的最短處理時間》 一個解決此問題的方法包含將數個自動裝置相互定位於其 上以便同時裝載一晶圓架。 在一後來的提議中,將兩個爐放置在一區而這兩個爐 藉由一單獨自動裝置的協助配置有來自匣盒的晶圓。 然而實際上發現很少用到此自動裝置的全部容量。而 且’大量自動裝置的安裝費用是可觀的,空間的需求亦然 ---------装------11----,——1^ (誚先閱讀背而之注意事項再"fii本頁) 本纸張尺度璉州中围β家標肀{ (,NS > Λ4規格(210X297公釐).4 - ^^"中^^^^一^工^费合化权印% 4341 75 A7 __B7_五、發明説明(2 ) 〇 本發明的目的是在避免這些缺點並提供一藉此可有效 提供大量具有晶圓的解決方法,其在一方面具有將晶圓自 匣盒轉送至晶圓架之足夠容量,但在另一方面具有使用至 最大可能程度的轉送容量。 此目的是藉由上述用來將晶圓裝入、處理於及移出自 一爐的系統來達成,此系統包含數個在一區域相靠配置的 爐,以及該晶圓的裝卸裝置,其中該裝卸裝置包含一供應 不同的爐之中央裝卸台,並配置有用來將晶圓自匣盒/晶 圓架轉送至晶圓架/匣盒之裝置,此裝置安裝在一運送載 有晶圓的晶圓架之裝置中,其包含一具有底座及垂直壁並 配置有運送裝置的支撐架,一至少使晶圓架底部安裝在該 支撐架中的支撐,以及此支撐架於其壁附近配置有自該晶 圓架運送並移動該晶圓時用來抓緊該晶圓的裝置》 本發明所根據的見識在於自匣盒至晶圓架的轉送不再 以群組的方式來完成,而是在距其某些距離的位置來完成 。結果是可以中央裝卸台在一區域提供不同的爐。可以有 三個|亦可以有三十個爐。因爲所有爐的最大容量是不曾 在同一時間達到,所以是可能選擇一中央裝卸台的尖峰容 量’其可觀地低於根據習知技術的裝卸裝置所決定的尖峰 容量。結果達成,在一方面節省了成本,在另一方面節省 了空間。後者導致不僅在固定成本的限制,而且亦可能在 淸潔室條件下達成不同的特色。 根據本發明的較佳實施例,上述之支撐架配置有一可 本紙張尺度適π中阈K家標苹(('NS ) 格(2丨0X297公釐) ΓΤΙ ---------^------iT-------^ (請先閱讀背面之注意事項4填艿本頁〕 434175 A7 B7 五、發明説明(3 ) 分離蓋。結果是可能在該支撐架中創造出一相對於環境一 之保護大氣。這些條件能夠近似於或者是淸潔室條件。亦 可能將惰性氣體導入支撐架中,或者藉由鼓風機的協助在 運送中通過支撐架將淨空氣或其它氣體移出。亦可能將支 撐架中的內容物抽出。關於晶圓在中央台與爐間的運送, 重要的是晶圓相對於晶圓架的移動結果不能有任何顆粒釋 放於運送中。目前所提議的是在運送中最好是以例如塑膠 指狀物將晶圓自晶圓架提起。僅當晶圓架載入爐中時,亦 即當溫度升高時|使晶圓架再次負起晶圓的支撐功能。 藉此方式塑膠指狀物是經常受制於低溫應力並儘可能 防止顆粒的產生。若運送中有一蓋安裝在運送晶圓架的裝 置上,將更增進淸潔條件下的作用。藉此方式該裝置在中 央台與爐間的移動中是完全關閉。是可能設計如此的架構 以便將位於壚的裝置帶入與爐底部的密封接合然後將安裝 在此裝置上的蓋移入一位於爐下提供此目的之分離室。此 分離室亦能夠用來接受爐的閉合,此爐是移開以露出用來 導入晶圓架的開口。 如習知技術所揭示的,是可能提供一爐用閉合板至晶 圓架底部,因此當晶圓架導入爐中時,閉合是自動提供的 〇 將爐的閉合與運送晶圓架裝置的蓋同時移開是特別有 效率的。以此程序,能夠遮護此裝置蓋的頂部與爐閉合的 底部與環境分開,以防止黏著於其上的污染物進入環境中 〇 本紙乐尺度1¾ 冢「NS ) /\4規格(210X297公釐) 7〇1 ---------#------1Τ-------0 (請先閲讀背面之注意事項再填艿本頁) 434175 A7 B7 五、發明説明(4 ) 用來移動晶圓架的裝置是配置有晶圓架用頂高裝置, 一方面用來裝塡晶圓架,另一方面用來將晶圓架導入爐中 。再者’宥位於爐的頂髙裝置將用來運送晶圓架的裝置帶 入與爐底部的密合接觸。 本發明亦有關於處理晶圓的方法,其步驟包含:將匣 盒中的晶圓裝入中央裝卸台,將晶圓自匣盒中移出並放在 晶圓架上’將晶圓架裝入運送晶圓架的裝置中,將該裝置 移至多樣化的數個爐之一,將裝塡有晶圓的晶圓架轉送入 該數個爐之一,將晶圓支配至一熱處理,將儲存於晶圓架 的晶圓卸入一運送晶圓架的裝置中,將該裝置移至裝卸台 ,以及將晶圓自晶圓架轉送至匣盒。 圖式簡單說明 本發明將參考圖中所示之實施例在以下作更詳細的說 明。圖中: 圖1顯示根據本發明之系統的上視圖; 圖2顯示根據本發明之滑車在爐下移動時的截面圖; 圖3顯示圖2中之滑車與爐接合時的簡圖: 圖4顯1拳緣中之責車導入晶圓架的簡圖: 圖5顯示H中沿- 線的簡圖;及 圖6顯示穿通道的簡圖。 主要元件對照表 1 系統 本紙乐尺度(('NS )六4坭格(210X297公釐) 7 ---------Jti------ΪΤ------- (諳先聞讀背面之注意事項再填巧本頁) 4341 7 A7 B7 五、發明説明(5 2 3 4 5 6 7 8 9 0 14 15 16 17 18 19 2 0 2 1 2 2 2 3 2 4 2 5 區 中央裝卸台 爐 滑車 匣盒 裝置 台 晶圓架 晶圓 閉合板 頂高轉軸 頂高支撐 頂高馬達 石英支撐 塑膠支撐 支撐架 輪 底部 蓋 閉合 隔絕塞 室 圓形密封環 頂筒台 ---------¾------ΪΤ------—漆. (#先閲讀背而之注意事項再填窍本頁) 本纸张尺度適W中园园家標卒((’NS ) Λ4規格(210X 297公f ) Δί Id Α7 __Β7 五、發明説明(6 ) 2 6 頂高機 2 8 電子組件 2 9 ·! 氣體控制裝置 詳細說明 圖1中根據本發明之系統在整體中是以1來標示。此 系統是由室2與轉送系統3組成。室2能夠在淸潔室的條 件下作業。然而亦可能以標準條件存在於此室中。 在室2中配置有數個於提高溫度時處理晶的爐,例如 在那些條件下供應一氣體。將裝塡有晶圓的晶圓架導入該 爐。此晶圓架是配置在滑車5中,此滑車是自配置在室3 中的裝卸台轉送至爐4。滑車5的裝卸是在台8中發生。 這些台能夠自清潔室2與區3兩者中打開與關閉》 晶圓是以匣盒包裝而供應於裝卸台中。在先前技術中 比匣盒是用來移動晶圓於短程與長程之習用運送裝置。然 後藉由自動裝置將晶圓自匣盒移出並放入安裝於滑車5的 晶圓架中。然後在爐下驅動滑車5後,將晶圓以下文敘述 的方式裝入爐4中以作上述的處理。 在此一處理後,滑車5移回卸台,亦即進入台8,並 將晶圓放回匣盒中6。 當然是可能在一爐4中作處理後,將晶圓支配至另不 迆中作另一處理》—方面,這將包含一先前處理的沿續, 但亦可能在另一爐中使用不同的氣體或另一溫度條件。 比較起習知技術,此架構不再需要使用串聯至各爐的 本紙張又度ii 中家櫺冷(rNS ) Λ4規格(2】0X 297公釐) -9- ---------^------ΪΤ-------線 (請先閱讀背面之注意事項再填寫本頁) 434175 :# 部屮少代^^卩-τ.消 合;印;^ A7 __. B7__五、發明说明(7 ) 空氣鎖。亦即,上述之裝卸台能夠架構以一容量使得所有 爐在任何時間都能夠全面作業》實際上,發現此一容量在 許多時候小於具有鎖固架構串聯至各爐的容量,且通常使 用至一非常有限的程度。終究,此鎖固架構通常不會在爐 的熱處理中作用。再者,是可能以此架構來決定根據所有 爐而不是分別各爐的總尖峰負載之尖峰負載,此亦可能導 致以一更限制的容量來架構區3中的裝卸台。因爲裝卸台 的更限制架構是可能的,其安裝成本將減少,同時亦減少 所拿掉的面積。 圖2至圖4顯示圖中滑車5的截面側視圖。此滑車包 含一支撐架狀部件,其安裝在輪1 8上並在頂部配置有一 蓋2 0 »其間有一頂高支撐1 3的三個頂高轉軸1 2是安 裝於滑車中*頂高支撐1 3藉由支撐轉軸上下移動。頂轉 軸是藉由頂高馬達1 4以達成轉動。頂高架構僅以簡圖表 示且任何習知技術之架構都可使用。頂高支撐是配置以接 收晶圓架9 »晶圓架9具有一其上安裝有真實石英材料架 的頂區段,其配置有用來運送晶圓1 0的石英支撐1 5。 一閉合板是配置1晶圓架9的底部。 當滑車5裝入台8時,滑車1 3將會在一位置使得最 上面的石英支撐1 5彈出滑車之上。當以自動裝置7協助 裝塡時,晶圓架將緩慢向上移出滑車並在完全裝塡後下降 。然後安裝蓋2 0。在滑車5內的狀況能夠修正,其方式 未顯示,以便產生淸潔室狀況於其中。亦可能導入惰性氣 體或繼續使滑車的部通風。 ---------fi------ΐτ----τ--.^ (請先閱請背面之注意事項再硪艿本育) 本纸乐尺度適用中阀S家標肀(i’NS ) Λ4規格(210X297公釐丨 -1〇 ·
4341 7S Α7 Β7 五、發明説明(8 ) 在將晶圓架9完全帶入滑車5後,固定在支撐架1 7 的支撐1 6向內移入放置石英支撐1 5上的晶圓1 0下方 (如圖5所示)。然後具有塑膠支撐16的支撐架17向 上移動以便晶圓放置塑膠支撐1 6上。而後開始運送而無 因晶圓相對於石英支撐15的移動而產生顆粒之風險。 滑車5以並未更詳細顯示的方式在盧4下移動,如圖 3所示。此移動可用手達成,然而亦可自動化成不同的特 色》滑車5以在輪1 8上滑動並不是絕對必要的。任何將 滑車5自台8帶入爐4的習知技術架構都是'可使用的。 可從圖2看到爐4是配置在滑車5可在其下滑動的高 度。一可由頂高機2 6操作的頂高台2 5是位於爐4開口 下方。藉此方式滑車5能夠緊靠著爐4的底部1 9,如圖 3所示。滑車5或爐式部1 9配置有一圓形密封環2 4使 得它們能夠相互密合。爐4在其底部配置有一設有隔絕塞 2 2的爐閉合2 1 此閉合以並未更詳細顯示的方式帶下 至接觸到蓋2 0爲止。 然後藉由爐閉合2 1抓緊蓋2 0 —起多少向上移動, 此並未更詳細顯示。 如圖4所示,此爐閉合2 1與蓋2 0的組合向右移入 室2 3中。以此方式確保存在於爐閉合2 1下部與蓋2 0 上部的任何污染物質是鎖閉且不會散佈。在爐閉合2 1與 蓋2 0的組合完全進入室2 3後,晶圓架才能夠進入爐中 。到此首要的是將晶圓放置在晶圓架9的石英支撐丨5上 。到此具有塑膠支撐的支撐架1 7向下些微移動而塑膠支 ---------11------1Τ-------狭: (請先閱讀背面之注意事項再填巧本頁) 本纸张尺度適用中程托家標(’NS )八4現格(210X297公策> -11 - Λ Α7 Β7 五、發明説明(9 ) 撐1 6向外移動。然後塑膠支撐1 6維持此位置。頂高支 撐1 3藉由頂高馬達1 4向上移動,以便晶圓架進入爐中 。此移動連續到閉合板1 1自下方將爐關閉,在此之後才 能夠完成相關處理。 然後上述作業將以相反次序進行》再以蓋2 0關閉滑 車5後,可能將滑車在同方向移回,然而亦可能將滑車直 行移動,如圖6所示,結果,另一滑車5能夠立刻定位在 爐4下方|以便儘可能增加系統的容量》 圖6中爐4的電子組件是以2 8表示,而2 9表示處 理用氣體控制裝置。從此圖中可看到滑車5是在爐下方自 左向右移動。 將會瞭解到在上述此系統的一實施例中,滑車5將自 其原先導入的相同方向移回。 雖然本發明已參考一較佳實施例來說明,將會瞭解到 存在有很多應用上述槪念的修改之可能生,這對於熟知此 技術者是顯而易見的且是在所附加的申請專利範圍內。例 如,是可能提供一具有可關閉蓋的室2 3與滑車的蓋2 0 相互作用。以此方式爐4的內部是完全與外界隔絕以便在 爐內以簡單的方式保持最好的處理狀況。僅在連接滑車5 至爐4後,將此蓋與蓋2 0 —起移動,所以實質上防止了 污染物的進入。蓋2 0能夠隨後或同時自爐管移開。 (请先閱請背面之注意事項再填寫本頁) -裝. 、1Τ 線 本紙&尺度这州中网^家榡苹(('NS ) Λ4規格(2]0X 297公釐).\2 -

Claims (1)

  1. ΛΒ B8 C8 DS 六、申請專利範圍 1 . 一種用於移動載有晶圓(1 0)的晶圓架(9) 之裝置(5 ),其包含一具有底座及垂直壁並配置有運送 構件的支撐架,一至少使晶圓架底部安裝在該支撐架中的 支撐,以及此支撐架於其壁附近配置有自該晶圓架運送並 移動該晶圓時用來抓緊該晶圓的構件(16,17)。 2 .如申請專利範圍第1項之移_ I ' ~ * 架具有一可分開的蓋(20) » 裝置,其中該支撐 3,如申請專利範圍第1項之 V' | 裝置,其中該支撐 架是配置有用於影響正在其中進行_況之構件 裝置,其中該支撐 經濟部中央標準局*Ε:工消費合作社印装 4 .如申請專利範圍第1項之 架是配置有用於移動裝在其中的晶圜:桀之頂高構件(1 2 :.· \ • 13-14)。 —— 5 .如申請專利範圍第1至4項中任一項之裝置,其 中該運送構件包含數個輪(18)。 6 . —種運送晶圓的系統,其包含一爐(4 )與如申 請專利範圔第1至5項中任一項的用於運送晶圓之裝置( 5),其中爐的一側是配置有一室(2 3),其具有一開 口以可密封方式接受用於運送載有晶圓的晶圓架之該裝置 頂部。 7 .如申請專利範圍第6項之系統,其中用於將蓋移 動自該支撐架的構件是配置於該室(23)中。 8 .如申請專利範圍第6項之系統,其中用於移動爐 閉合的構件是配置於該室中》 9.如申請專利範圍第7項之系統,其中該用於移動 ---------^------^------1^ <請先Η讀背面之注意事項再填寫本頁) 本紙張尺度逋用中國國家標準< CNS ) Α4说格(210X297公釐) _ 13 - 經濟部中央標隼局員工消費合作社印装 4341 76 Λ8 B8 C8 D8 六、申請專利範圍 該支撐架蓋與該爐閉合的構件是架構以將該支撐架蓋與該 爐閉合緊靠放置並同時移動。 1 〇 .如申請專利範圍第6項之系統,其中該支撐架 的頂高構件(2 5,2 6 )是存在於該爐的位置。 11.如申請專利範圍第6至10項中任一項之系統 ,其中晶圓架在底部配置有一板(2 1),其在晶圓架導 入爐中時形成該爐(4) II朗合板。 1 2 ·—種用於負_ k理並將晶圓(1 0 )移入/ 移至/移出一爐(4 ) ,其包含數個在一區(2) 中相靠配置的爐,以及一用於該晶圓的裝卸裝置,其特徵 在於該裝卸裝置包含一用於供應不同爐的中央裝卸台(3 ),配置有將晶圓轉送自/至匣盒至/自晶圓架的構件· 此晶圓架安裝在如申請專利範圍第1至5項任一項之移動 裝置中。 1 3 .如申請專利範圍第1 2項之系統,其中中央裝 卸台(3 )是配置在一淸潔室中。 14 .如申請專利範圍第12或13項之系統|其中 該爐(4)是配置在一淸潔室中。 1 5 .如申請專利範圍第1 4項之系統,其中在中央 裝卸台(3 )與爐(4 )間的區移入有如申請專利範圍第 1至5項中任一項之移動裝置並包含一淸潔室。 1 6 . —種用於處理晶圓之方法,其包含將匣盒中的 該晶圓裝入中央裝卸台,將該晶圓自該匣盒拿出並放入晶 圓架中,將該晶圓架載入一用於運送晶圓架的裝置中,將 本纸張尺度適用中國國家標準(CNS ) A4规格(210X297公釐) 裝------訂------線 (請先聞讀背面之注項再填寫本頁) 4 3 41 7 5 A8 B8 C8 ___D8 々、申請專利範圍 該運送裝置移至數個爐之一’將裝塡有晶圓的該晶圓架轉 送入該數個爐之一’支配晶圓至一熱處理,釋出儲存於晶 圓架中的該晶圓進入一用於運送晶圓架的裝置,將該運送 裝置移至裝卸台’以及將該晶圓自該晶圓架轉送至匣盒。 1 7 .如申請專利範圍第1 6項之方法,其中在自該 爐釋出後,用於運送晶圓架的該裝置是移至用於該晶圓另 〜處理的另一爐。 ---------^------1Γ------—0 (請先閱讀背面之注$項再填寫本頁) 經濟部中央標準扃員工消費合作社印製 -TF- 本纸張尺度適用中國國家標準(CNS ) Μ現格(21〇X:Z97公釐)
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KR20010005697A (ko) 2001-01-15
JP2001519095A (ja) 2001-10-16
DE69824562T2 (de) 2004-11-11
EP0970510A1 (en) 2000-01-12
JP4801711B2 (ja) 2011-10-26
NL1005625C2 (nl) 1998-10-01
AU6526298A (en) 1998-10-20
WO1998043283A1 (en) 1998-10-01
DE69824562D1 (de) 2004-07-22
JP2009027187A (ja) 2009-02-05
EP0970510B1 (en) 2004-06-16

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