JP2001519095A - カセットから炉へのウエーハ移送用のシステム及び方法 - Google Patents
カセットから炉へのウエーハ移送用のシステム及び方法Info
- Publication number
- JP2001519095A JP2001519095A JP54551398A JP54551398A JP2001519095A JP 2001519095 A JP2001519095 A JP 2001519095A JP 54551398 A JP54551398 A JP 54551398A JP 54551398 A JP54551398 A JP 54551398A JP 2001519095 A JP2001519095 A JP 2001519095A
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- Prior art keywords
- wafer
- furnace
- rack
- holder
- loading
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67757—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a batch of workpieces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67303—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67775—Docking arrangements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/14—Wafer cassette transporting
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.ウエーハ(10)の装填されたウエーハラック(9)を動かすための装置 (5)であって、底部と垂直方向の壁とを有しかつ輸送手段の設けられたホルダ ー、前記ホルダーに取り付けられたウエーハラックの少なくも底部のための支持 具を具備し、ホルダーは、その壁の近くに、輸送中、前記ウエーハを把持しかつ 前記ウエーハを前記ウエーハラックから移動させるための手段(16、17)が 設けられた装置。 2.前記ホルダーが脱着可能な蓋(20)を有する請求項1による装置。 3.内部の状態に影響を与える手段が前記ホルダーに設けられる先行請求項の 一による装置。 4.取り付けられたウエーハラックを動かすためのリフト手段(12、13、 14)が前記ホルダーに設けられる先行請求項の一による装置。 5.前記輸送手段が車輪(18)を備える先行請求項の一による装置。 6.炉(4)及び先行請求項の一によるウエーハの輸送装置(5)を備えたシ ステムであって、前記炉の一方の側に室(23)が設けられ、この室は、ウエー ハの装填されたウエーハラックを輸送する装置の前記頂部を閉鎖可能な方法で受 け入れるための開口を有する前記システム。 7.蓋を前記ホルダーから動かすための手段が前記室(23)に適合する実施 態様2と組み合わせられた請求項6によるシステム。 8.炉の閉鎖体を動かすための手段が前記室に適合される請求項6又は7によ る装置。 9.前記ホルダーの蓋及び前記炉の閉鎖体を動かすための前記手段が、前記ホ ルダーの蓋と前記炉の閉鎖体とを互いに押し付けて置きかつこれ ら者を同時に動かすように構成される請求項7又は8による装置。 10.前記ホルダー用のリフト手段(25、26)が前記炉の位置にある請求 項6−9の一によるシステム。 11.ウエーハラックは底部に板(21)が設けられ、これがウエーハラック が炉の中に導かれたときの前記炉(4)の閉鎖板を形成する請求項6−10の一 によるシステム。 12.ウエーハ(10)を炉(4)に装填し、炉内で処理し、そして炉から取 り出すためのシステムであって、前記ウエーハの装填/取出し装置と同様に1区 域(2)内で互いに並んで配列された複数の炉を備え、前記装填/取り出し装置 は、種々の炉のために作業する中央装填/取出しステーション(3)であってか つカセットと請求項1−5の一による装置に取り付けられたウエーハラックとの 間でウエーハを往復移送するための手段(7)が設けられた前記ステーションを 備えることを特徴とするシステム。 13.中央装填/取出しステーション(3)がクリーンルーム内に配置される 請求項12によるシステム。 14.前記炉(4)がクリーンルーム内に配置される請求項12又は13によ るシステム。 15.請求項1−5の一つによる装置が動かされる中央装填/取出しステーシ ョン(3)と炉(4)との間の区域がクリーンルームよりなる請求項14による システム。 16.ウエーハの処理方法であって、カセット内の前記ウエーハを中央装填/ 取出しステーションに送り、前記カセットから前記ウエーハを取り出しこれをウ エーハラック内に置き、前記ウエーハラックをウエー ハラック輸送用の装置内に載せ、前記装置を多数の前記炉の一つに動かし、ウエ ーハで満たされた前記ウエーハラックを前記炉の一つの中に移送し、ウエーハを 熱処理し、ウエーハラック内に収納された前記ウエーハをウエーハラック輸送装 置内に取り出し、前記装置を装填/取出しステーションに動かし、そして前記ウ エーハを前記ウエーハラックからカセットに移送することを含んだ方法。 17.前記炉から出された後、前記ウエーハの更なる処理のために前記ウエー ハラック輸送装置が更なる炉に動かされる請求項16による方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL1005625A NL1005625C2 (nl) | 1997-03-25 | 1997-03-25 | Stelsel voor het overbrengen van wafers uit cassettes naar ovens alsmede werkwijze. |
NL1005625 | 1997-03-25 | ||
PCT/NL1998/000167 WO1998043283A1 (en) | 1997-03-25 | 1998-03-25 | System for transferring wafers from cassettes to furnaces and method |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008250825A Division JP4801711B2 (ja) | 1997-03-25 | 2008-09-29 | カセットから炉へのウエーハ移送用のシステム及び方法 |
Publications (1)
Publication Number | Publication Date |
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JP2001519095A true JP2001519095A (ja) | 2001-10-16 |
Family
ID=19764660
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP54551398A Withdrawn JP2001519095A (ja) | 1997-03-25 | 1998-03-25 | カセットから炉へのウエーハ移送用のシステム及び方法 |
JP2008250825A Expired - Lifetime JP4801711B2 (ja) | 1997-03-25 | 2008-09-29 | カセットから炉へのウエーハ移送用のシステム及び方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008250825A Expired - Lifetime JP4801711B2 (ja) | 1997-03-25 | 2008-09-29 | カセットから炉へのウエーハ移送用のシステム及び方法 |
Country Status (9)
Country | Link |
---|---|
US (1) | US6139239A (ja) |
EP (1) | EP0970510B1 (ja) |
JP (2) | JP2001519095A (ja) |
KR (1) | KR20010005697A (ja) |
AU (1) | AU6526298A (ja) |
DE (1) | DE69824562T2 (ja) |
NL (1) | NL1005625C2 (ja) |
TW (1) | TW434175B (ja) |
WO (1) | WO1998043283A1 (ja) |
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KR970008320B1 (ko) * | 1987-11-17 | 1997-05-23 | 도오교오 에레구토론 가부시끼가이샤 | 열처리 장치 |
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JPH07120634B2 (ja) * | 1988-12-27 | 1995-12-20 | 東京エレクトロン東北株式会社 | 処理装置 |
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JP2888369B2 (ja) * | 1990-09-25 | 1999-05-10 | 東京エレクトロン株式会社 | 縦型熱処理装置 |
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JP3258748B2 (ja) * | 1993-02-08 | 2002-02-18 | 東京エレクトロン株式会社 | 熱処理装置 |
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-
1997
- 1997-03-25 NL NL1005625A patent/NL1005625C2/nl not_active IP Right Cessation
-
1998
- 1998-03-25 JP JP54551398A patent/JP2001519095A/ja not_active Withdrawn
- 1998-03-25 WO PCT/NL1998/000167 patent/WO1998043283A1/en active IP Right Grant
- 1998-03-25 DE DE69824562T patent/DE69824562T2/de not_active Expired - Fee Related
- 1998-03-25 KR KR1019997008765A patent/KR20010005697A/ko not_active Application Discontinuation
- 1998-03-25 EP EP98911277A patent/EP0970510B1/en not_active Expired - Lifetime
- 1998-03-25 AU AU65262/98A patent/AU6526298A/en not_active Abandoned
- 1998-08-31 TW TW087114415A patent/TW434175B/zh not_active IP Right Cessation
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1999
- 1999-09-23 US US09/404,222 patent/US6139239A/en not_active Expired - Lifetime
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- 2008-09-29 JP JP2008250825A patent/JP4801711B2/ja not_active Expired - Lifetime
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TW434175B (en) | 2001-05-16 |
EP0970510A1 (en) | 2000-01-12 |
JP2009027187A (ja) | 2009-02-05 |
EP0970510B1 (en) | 2004-06-16 |
JP4801711B2 (ja) | 2011-10-26 |
DE69824562T2 (de) | 2004-11-11 |
NL1005625C2 (nl) | 1998-10-01 |
US6139239A (en) | 2000-10-31 |
AU6526298A (en) | 1998-10-20 |
WO1998043283A1 (en) | 1998-10-01 |
KR20010005697A (ko) | 2001-01-15 |
DE69824562D1 (de) | 2004-07-22 |
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