TW316995B - - Google Patents

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Publication number
TW316995B
TW316995B TW085100408A TW85100408A TW316995B TW 316995 B TW316995 B TW 316995B TW 085100408 A TW085100408 A TW 085100408A TW 85100408 A TW85100408 A TW 85100408A TW 316995 B TW316995 B TW 316995B
Authority
TW
Taiwan
Prior art keywords
cleaning
substrate
holding
semiconductor wafer
contact
Prior art date
Application number
TW085100408A
Other languages
English (en)
Chinese (zh)
Original Assignee
Tokyo Electron Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Co Ltd filed Critical Tokyo Electron Co Ltd
Application granted granted Critical
Publication of TW316995B publication Critical patent/TW316995B/zh

Links

Classifications

    • H10P52/00—
    • H10P72/0428—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/30—Cleaning by methods involving the use of tools by movement of cleaning members over a surface
    • B08B1/32—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members
    • B08B1/36—Cleaning by methods involving the use of tools by movement of cleaning members over a surface using rotary cleaning members rotating about an axis orthogonal to the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/50—Cleaning by methods involving the use of tools involving cleaning of the cleaning members
    • B08B1/52—Cleaning by methods involving the use of tools involving cleaning of the cleaning members using fluids
    • H10P52/402—
    • H10P72/0412—
    • H10P72/0414—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
TW085100408A 1995-01-19 1996-01-15 TW316995B (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2474795 1995-01-19

Publications (1)

Publication Number Publication Date
TW316995B true TW316995B (enExample) 1997-10-01

Family

ID=12146746

Family Applications (1)

Application Number Title Priority Date Filing Date
TW085100408A TW316995B (enExample) 1995-01-19 1996-01-15

Country Status (3)

Country Link
US (2) US5651160A (enExample)
KR (1) KR100224462B1 (enExample)
TW (1) TW316995B (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI636518B (zh) * 2013-04-23 2018-09-21 荏原製作所股份有限公司 基板處理裝置及處理基板之製造方法
TWI848342B (zh) * 2021-09-22 2024-07-11 日商斯庫林集團股份有限公司 基板洗淨裝置及基板洗淨方法

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US20050056303A1 (en) * 2003-09-16 2005-03-17 Wei-Ming Lee Oblique burnish/wipe mechanism for hard drive disk like media
CN1301804C (zh) * 2003-09-19 2007-02-28 旺宏电子股份有限公司 清洗保养旋转蚀刻机的方法
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JP5535687B2 (ja) * 2010-03-01 2014-07-02 株式会社荏原製作所 基板洗浄方法及び基板洗浄装置
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TWM451568U (zh) * 2012-11-19 2013-04-21 家登精密工業股份有限公司 光罩清洗裝置
WO2014128528A1 (en) * 2013-02-21 2014-08-28 Okulov Pavel D Portable modular deburring machine
KR20150075357A (ko) * 2013-12-25 2015-07-03 가부시키가이샤 에바라 세이사꾸쇼 기판 세정 장치 및 기판 처리 장치
JP6684191B2 (ja) * 2016-09-05 2020-04-22 株式会社Ｓｃｒｅｅｎホールディングス 基板洗浄装置およびそれを備える基板処理装置
JP6905684B2 (ja) * 2017-10-02 2021-07-21 日本電気硝子株式会社 ガラス板の洗浄装置およびガラス板の製造方法
JP7232615B2 (ja) * 2017-12-13 2023-03-03 東京エレクトロン株式会社 基板処理装置および基板処理方法
TWI834489B (zh) 2017-12-13 2024-03-01 日商東京威力科創股份有限公司 基板處理裝置
JP7153683B2 (ja) * 2020-03-17 2022-10-14 パナソニックホールディングス株式会社 切断装置
RU2766090C1 (ru) * 2021-04-16 2022-02-07 Федеральное государственное бюджетное образовательное учреждение высшего образования "Саратовский государственный технический университет имени Гагарина Ю.А." (СГТУ имени Гагарина Ю.А.) Способ очистки поверхности изделия от окалины
CN114273294B (zh) * 2021-12-17 2022-12-13 秦皇岛满药本草药业股份有限公司 一种五味子专用清洗装置

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI636518B (zh) * 2013-04-23 2018-09-21 荏原製作所股份有限公司 基板處理裝置及處理基板之製造方法
TWI848342B (zh) * 2021-09-22 2024-07-11 日商斯庫林集團股份有限公司 基板洗淨裝置及基板洗淨方法

Also Published As

Publication number Publication date
KR960030343A (ko) 1996-08-17
US5858112A (en) 1999-01-12
US5651160A (en) 1997-07-29
KR100224462B1 (ko) 1999-10-15

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees