SG90772A1 - Integration of remote plasma generation with semiconductor processing chamber - Google Patents

Integration of remote plasma generation with semiconductor processing chamber

Info

Publication number
SG90772A1
SG90772A1 SG200102554A SG200102554A SG90772A1 SG 90772 A1 SG90772 A1 SG 90772A1 SG 200102554 A SG200102554 A SG 200102554A SG 200102554 A SG200102554 A SG 200102554A SG 90772 A1 SG90772 A1 SG 90772A1
Authority
SG
Singapore
Prior art keywords
integration
processing chamber
plasma generation
semiconductor processing
remote plasma
Prior art date
Application number
SG200102554A
Other languages
English (en)
Inventor
Janakiraman Karthik
Fong Kelly
Chen Chen-An
Le Paul
Pan Rong
Venkataraman Shankar
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of SG90772A1 publication Critical patent/SG90772A1/en

Links

Classifications

    • H01L21/205—
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
SG200102554A 2000-04-28 2001-04-28 Integration of remote plasma generation with semiconductor processing chamber SG90772A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/561,325 US6387207B1 (en) 2000-04-28 2000-04-28 Integration of remote plasma generator with semiconductor processing chamber

Publications (1)

Publication Number Publication Date
SG90772A1 true SG90772A1 (en) 2002-08-20

Family

ID=24241489

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200102554A SG90772A1 (en) 2000-04-28 2001-04-28 Integration of remote plasma generation with semiconductor processing chamber

Country Status (6)

Country Link
US (1) US6387207B1 (ko)
EP (1) EP1150332A3 (ko)
JP (1) JP5214832B2 (ko)
KR (1) KR100715075B1 (ko)
SG (1) SG90772A1 (ko)
TW (1) TW492045B (ko)

Families Citing this family (620)

* Cited by examiner, † Cited by third party
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