DE60319462T2
(de)
*
|
2002-06-11 |
2009-03-12 |
Asml Netherlands B.V. |
Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
|
US8064730B2
(en)
*
|
2003-09-22 |
2011-11-22 |
Asml Netherlands B.V. |
Device manufacturing method, orientation determination method and lithographic apparatus
|
US7408616B2
(en)
*
|
2003-09-26 |
2008-08-05 |
Carl Zeiss Smt Ag |
Microlithographic exposure method as well as a projection exposure system for carrying out the method
|
US7228034B2
(en)
*
|
2003-11-03 |
2007-06-05 |
Intel Corporation |
Interference patterning
|
DE10352040A1
(de)
*
|
2003-11-07 |
2005-07-21 |
Carl Zeiss Sms Gmbh |
In Lage, Form und/oder den optischen Eigenschaften veränderbare Blenden-und/oder Filteranordnung für optische Geräte, insbesondere Mikroskope
|
DE102004010363B4
(de)
*
|
2004-03-03 |
2012-11-15 |
Qimonda Ag |
Verfahren zur Bestimmung einer örtlichen Variation des Reflektions- oder Transmissionsverhaltens über die Oberfläche einer Maske
|
DE102004012125B3
(de)
*
|
2004-03-12 |
2005-09-01 |
Nanofilm Technologie Gmbh |
Ellipsometrisches Messverfahren mit ROI-gestützter Bildkorrektur
|
DE102004032933B3
(de)
*
|
2004-07-07 |
2006-01-05 |
Süss Microtec Lithography Gmbh |
Mittelpunktbestimmung von drehsymmetrischen Justiermarken
|
US7791727B2
(en)
|
2004-08-16 |
2010-09-07 |
Asml Netherlands B.V. |
Method and apparatus for angular-resolved spectroscopic lithography characterization
|
US20080144036A1
(en)
*
|
2006-12-19 |
2008-06-19 |
Asml Netherlands B.V. |
Method of measurement, an inspection apparatus and a lithographic apparatus
|
US20060061743A1
(en)
*
|
2004-09-22 |
2006-03-23 |
Asml Netherlands B.V. |
Lithographic apparatus, alignment system, and device manufacturing method
|
CN1700101B
(zh)
*
|
2005-05-13 |
2010-12-08 |
上海微电子装备有限公司 |
用于投影光刻机的调焦调平传感器
|
JP4425239B2
(ja)
*
|
2005-05-16 |
2010-03-03 |
エーエスエムエル ネザーランズ ビー.ブイ. |
リソグラフィ装置およびデバイス製造方法
|
US7528934B2
(en)
*
|
2005-05-16 |
2009-05-05 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US20060256311A1
(en)
*
|
2005-05-16 |
2006-11-16 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7266803B2
(en)
*
|
2005-07-29 |
2007-09-04 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Layout generation and optimization to improve photolithographic performance
|
US20070146708A1
(en)
*
|
2005-11-24 |
2007-06-28 |
Nikon Corporation |
Mark structure, mark measurement apparatus, pattern forming apparatus and detection apparatus, and detection method and device manufacturing method
|
US7480050B2
(en)
*
|
2006-02-09 |
2009-01-20 |
Asml Netherlands B.V. |
Lithographic system, sensor, and method of measuring properties of a substrate
|
US7511826B2
(en)
*
|
2006-02-27 |
2009-03-31 |
Asml Holding N.V. |
Symmetrical illumination forming system and method
|
US8908175B1
(en)
*
|
2006-03-31 |
2014-12-09 |
Kla-Tencor Corporation |
Flexible scatterometry metrology system and method
|
WO2007115824A2
(en)
*
|
2006-04-12 |
2007-10-18 |
Nassir Navab |
Virtual penetrating mirror device for visualizing virtual objects in angiographic applications
|
JP5002221B2
(ja)
*
|
2006-09-11 |
2012-08-15 |
キヤノン株式会社 |
マークの位置を検出する装置
|
US7573584B2
(en)
*
|
2006-09-25 |
2009-08-11 |
Asml Netherlands B.V. |
Method and apparatus for angular-resolved spectroscopic lithography characterization
|
CN1949087B
(zh)
*
|
2006-11-03 |
2010-05-12 |
上海微电子装备有限公司 |
一种光刻装置的对准系统以及该对准系统的级结合系统
|
TWI370894B
(en)
*
|
2007-02-26 |
2012-08-21 |
Corning Inc |
Method for measuring distortion
|
JP4885029B2
(ja)
*
|
2007-03-28 |
2012-02-29 |
株式会社オーク製作所 |
露光描画装置
|
US7580131B2
(en)
*
|
2007-04-17 |
2009-08-25 |
Asml Netherlands B.V. |
Angularly resolved scatterometer and inspection method
|
US8451427B2
(en)
|
2007-09-14 |
2013-05-28 |
Nikon Corporation |
Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
|
JP5267029B2
(ja)
|
2007-10-12 |
2013-08-21 |
株式会社ニコン |
照明光学装置、露光装置及びデバイスの製造方法
|
WO2009050976A1
(en)
*
|
2007-10-16 |
2009-04-23 |
Nikon Corporation |
Illumination optical system, exposure apparatus, and device manufacturing method
|
WO2009050977A1
(en)
*
|
2007-10-16 |
2009-04-23 |
Nikon Corporation |
Illumination optical system, exposure apparatus, and device manufacturing method
|
US8379187B2
(en)
|
2007-10-24 |
2013-02-19 |
Nikon Corporation |
Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
|
US9116346B2
(en)
*
|
2007-11-06 |
2015-08-25 |
Nikon Corporation |
Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
|
NL1036179A1
(nl)
*
|
2007-11-20 |
2009-05-25 |
Asml Netherlands Bv |
Lithographic apparatus and method.
|
SG153747A1
(en)
*
|
2007-12-13 |
2009-07-29 |
Asml Netherlands Bv |
Alignment method, alignment system and product with alignment mark
|
NL1036308A1
(nl)
*
|
2007-12-19 |
2009-06-22 |
Asml Netherlands Bv |
Lithographic method.
|
NL1036351A1
(nl)
*
|
2007-12-31 |
2009-07-01 |
Asml Netherlands Bv |
Alignment system and alignment marks for use therewith cross-reference to related applications.
|
JP5279280B2
(ja)
*
|
2008-01-16 |
2013-09-04 |
博雄 木下 |
形状測定装置
|
JP5006889B2
(ja)
*
|
2008-02-21 |
2012-08-22 |
エーエスエムエル ネザーランズ ビー.ブイ. |
粗ウェーハ位置合わせ用マーク構造及びこのようなマーク構造の製造方法
|
EP2282188B1
(en)
*
|
2008-05-28 |
2015-03-11 |
Nikon Corporation |
Illumination optical system and exposure apparatus
|
JP2009302354A
(ja)
|
2008-06-16 |
2009-12-24 |
Canon Inc |
露光装置、デバイス製造方法及び開口絞りの製造方法
|
CN101750417B
(zh)
*
|
2008-12-12 |
2012-03-14 |
鸿富锦精密工业(深圳)有限公司 |
检测装置
|
US8039366B2
(en)
*
|
2009-02-19 |
2011-10-18 |
International Business Machines Corporation |
Method for providing rotationally symmetric alignment marks for an alignment system that requires asymmetric geometric layout
|
US8170838B2
(en)
*
|
2009-04-27 |
2012-05-01 |
Nanometrics Incorporated |
Simulating two-dimensional periodic patterns using compressed fourier space
|
JP5391333B2
(ja)
*
|
2009-06-17 |
2014-01-15 |
エーエスエムエル ネザーランズ ビー.ブイ. |
オーバレイ測定方法、リソグラフィ装置、検査装置、処理装置、及びリソグラフィ処理セル
|
NL2005459A
(en)
|
2009-12-08 |
2011-06-09 |
Asml Netherlands Bv |
Inspection method and apparatus, and corresponding lithographic apparatus.
|
WO2011078968A2
(en)
*
|
2009-12-26 |
2011-06-30 |
D2S, Inc. |
Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes
|
CN102253609B
(zh)
*
|
2010-05-18 |
2014-05-21 |
上海微电子装备有限公司 |
对准标记测量信号处理方法
|
NL2007216A
(en)
|
2010-09-08 |
2012-03-12 |
Asml Netherlands Bv |
Self-referencing interferometer, alignment system, and lithographic apparatus.
|
NL2007765A
(en)
|
2010-11-12 |
2012-05-15 |
Asml Netherlands Bv |
Metrology method and inspection apparatus, lithographic system and device manufacturing method.
|
NL2007425A
(en)
|
2010-11-12 |
2012-05-15 |
Asml Netherlands Bv |
Metrology method and apparatus, and device manufacturing method.
|
EP2458441B1
(en)
|
2010-11-30 |
2022-01-19 |
ASML Netherlands BV |
Measuring method, apparatus and substrate
|
IL217843A
(en)
*
|
2011-02-11 |
2016-11-30 |
Asml Netherlands Bv |
A system and method for testing, a lithographic system, a cell for lithographic processing, and a method for producing a device
|
NL2008111A
(en)
*
|
2011-02-18 |
2012-08-21 |
Asml Netherlands Bv |
Optical apparatus, method of scanning, lithographic apparatus and device manufacturing method.
|
EP2730226A4
(en)
*
|
2011-07-06 |
2015-04-08 |
Fujifilm Corp |
X-RAY IMAGING DEVICE AND CORRESPONDING CALIBRATION METHOD
|
NL2009273A
(en)
*
|
2011-08-31 |
2013-03-04 |
Asml Netherlands Bv |
Level sensor arrangement for lithographic apparatus, lithographic apparatus and device manufacturing method.
|
US20130110005A1
(en)
*
|
2011-10-27 |
2013-05-02 |
Covidien Lp |
Point size light illumination in metrology systems for in-situ surgical applications
|
CN103135371B
(zh)
*
|
2011-12-02 |
2015-02-11 |
上海微电子装备有限公司 |
基于分束偏折结构的小光斑离轴对准系统
|
CN103186060B
(zh)
*
|
2011-12-31 |
2014-12-03 |
中芯国际集成电路制造(上海)有限公司 |
光刻对准装置、其使用方法及光刻机
|
JP5832345B2
(ja)
*
|
2012-03-22 |
2015-12-16 |
株式会社ニューフレアテクノロジー |
検査装置および検査方法
|
CN103365122B
(zh)
*
|
2012-03-31 |
2016-01-20 |
上海微电子装备有限公司 |
用于光刻设备的自参考干涉对准系统
|
KR101675039B1
(ko)
*
|
2012-04-12 |
2016-11-10 |
에이에스엠엘 네델란즈 비.브이. |
위치 측정 방법, 위치 측정 장치, 리소그래피 장치 및 디바이스 제조 방법, 광학 요소
|
JP5992103B2
(ja)
*
|
2012-07-30 |
2016-09-14 |
エーエスエムエル ネザーランズ ビー.ブイ. |
位置測定装置、位置測定方法、リソグラフィ装置およびデバイス製造方法
|
US9778025B2
(en)
|
2012-08-16 |
2017-10-03 |
Asml Netherlands B.V. |
Method and apparatus for measuring asymmetry of a microstructure, position measuring method, position measuring apparatus, lithographic apparatus and device manufacturing method
|
JP5451832B2
(ja)
*
|
2012-08-21 |
2014-03-26 |
株式会社ニューフレアテクノロジー |
パターン検査装置
|
US9753377B2
(en)
|
2012-08-29 |
2017-09-05 |
Asml Netherlands B.V. |
Deformation pattern recognition method, pattern transferring method, processing device monitoring method, and lithographic apparatus
|
US9506743B2
(en)
|
2012-10-02 |
2016-11-29 |
Asml Netherlands B.V. |
Position measuring apparatus, position measuring method, lithographic apparatus and device manufacturing method
|
NL2011477A
(en)
|
2012-10-10 |
2014-04-14 |
Asml Netherlands Bv |
Mark position measuring apparatus and method, lithographic apparatus and device manufacturing method.
|
CN103777476B
(zh)
*
|
2012-10-19 |
2016-01-27 |
上海微电子装备有限公司 |
一种离轴对准系统及对准方法
|
NL2011726A
(en)
*
|
2012-11-05 |
2014-05-08 |
Asml Netherlands Bv |
Method and apparatus for measuring asymmetry of a microstructure, position measuring method, position measuring apparatus, lithographic apparatus and device manufacturing method.
|
CN103869628B
(zh)
*
|
2012-12-11 |
2016-07-06 |
上海微电子装备有限公司 |
一种用于光刻设备的自参考干涉对准信号处理系统
|
CN104020642B
(zh)
*
|
2013-03-01 |
2016-04-20 |
上海微电子装备有限公司 |
自参考干涉对准系统
|
CN105143986B
(zh)
*
|
2013-03-20 |
2017-04-26 |
Asml荷兰有限公司 |
用于测量微结构的非对称性的方法和设备、位置测量方法、位置测量设备、光刻设备和器件制造方法
|
CN104062858B
(zh)
*
|
2013-03-21 |
2016-09-28 |
上海微电子装备有限公司 |
零光程差自参考干涉对准系统
|
CN104062852B
(zh)
*
|
2013-03-21 |
2016-09-28 |
上海微电子装备有限公司 |
零光程差自参考干涉对准系统
|
CN104111594B
(zh)
*
|
2013-04-16 |
2016-09-28 |
上海微电子装备有限公司 |
基于信号频率的二维自参考干涉对准系统及对准方法
|
US9547241B2
(en)
|
2013-05-07 |
2017-01-17 |
Asml Netherlands B.V. |
Alignment sensor, lithographic apparatus and alignment method
|
EP3055737A1
(en)
|
2013-10-09 |
2016-08-17 |
ASML Netherlands B.V. |
Polarization independent interferometer
|
DE102014203348A1
(de)
*
|
2014-02-25 |
2015-08-27 |
Carl Zeiss Smt Gmbh |
Bündelverteilungsoptik, Beleuchtungsoptik mit einer derartigen Bündelverteilungsoptik, optisches System mit einer derartigen Beleuchtungsoptik sowie Projektionsbelichtungsanlage mit einem derartigen optischen System
|
WO2015200315A1
(en)
*
|
2014-06-24 |
2015-12-30 |
Kla-Tencor Corporation |
Rotated boundaries of stops and targets
|
NL2015160A
(en)
|
2014-07-28 |
2016-07-07 |
Asml Netherlands Bv |
Illumination system, inspection apparatus including such an illumination system, inspection method and manufacturing method.
|
CN105445929B
(zh)
*
|
2014-08-20 |
2018-03-02 |
上海微电子装备(集团)股份有限公司 |
光程调整装置和光程调整方法
|
DE102014111979A1
(de)
*
|
2014-08-21 |
2016-02-25 |
Martin Berz |
Interferometer
|
CN106796406B
(zh)
*
|
2014-08-25 |
2019-08-30 |
Asml控股股份有限公司 |
测量方法、测量设备、光刻设备和器件制造方法
|
CN105388706B
(zh)
*
|
2014-09-09 |
2018-03-02 |
上海微电子装备(集团)股份有限公司 |
自参考干涉对准系统
|
CN107430356B
(zh)
|
2015-03-25 |
2021-02-26 |
株式会社尼康 |
布局方法、标记检测方法、曝光方法、测量装置、曝光装置、以及组件制造方法
|
WO2016192865A1
(en)
|
2015-06-05 |
2016-12-08 |
Asml Netherlands B.V. |
Alignment system
|
NL2016937A
(en)
|
2015-06-17 |
2016-12-22 |
Asml Netherlands Bv |
Recipe selection based on inter-recipe consistency
|
US9823574B2
(en)
|
2015-09-29 |
2017-11-21 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Lithography alignment marks
|
WO2017063898A1
(en)
|
2015-10-12 |
2017-04-20 |
Asml Holding N.V. |
An apparatus with a sensor and a method of performing target measurement
|
WO2017093256A1
(en)
|
2015-12-03 |
2017-06-08 |
Asml Netherlands B.V. |
Position measuring method of an alignment target
|
WO2017097564A1
(en)
*
|
2015-12-07 |
2017-06-15 |
Asml Holding N.V. |
Objective lens system
|
KR102612558B1
(ko)
*
|
2015-12-11 |
2023-12-12 |
한국전자통신연구원 |
복수의 공간 광 변조기를 타일링하여 홀로그램 엘리먼트 이미지들을 기록하는 홀로그램 기록 장치
|
WO2017102264A1
(en)
|
2015-12-17 |
2017-06-22 |
Asml Netherlands B.V. |
Source separation from metrology data
|
WO2017114672A1
(en)
|
2015-12-31 |
2017-07-06 |
Asml Netherlands B.V. |
Metrology by reconstruction
|
JP6553817B2
(ja)
|
2016-01-19 |
2019-07-31 |
エーエスエムエル ネザーランズ ビー.ブイ. |
位置センシング機構、そのような機構を含むリソグラフィ装置、位置センシング方法、及びデバイス製造方法
|
DE102016103295A1
(de)
*
|
2016-02-24 |
2017-08-24 |
Martin Berz |
Dreidimensionales Interferometer und Verfahren zur Bestimmung einer Phase eines elektrischen Feldes
|
US10942460B2
(en)
|
2016-04-12 |
2021-03-09 |
Asml Netherlands B.V. |
Mark position determination method
|
JP6748907B2
(ja)
*
|
2016-04-26 |
2020-09-02 |
株式会社ニコン |
計測装置、露光装置、デバイス製造方法、及びパターン形成方法
|
US10394132B2
(en)
|
2016-05-17 |
2019-08-27 |
Asml Netherlands B.V. |
Metrology robustness based on through-wavelength similarity
|
WO2017202602A1
(en)
|
2016-05-23 |
2017-11-30 |
Asml Netherlands B.V. |
Selection of substrate measurement recipes
|
JP6926403B2
(ja)
*
|
2016-05-31 |
2021-08-25 |
株式会社ニコン |
位置検出装置及び位置検出方法、露光装置及び露光方法、並びに、デバイス製造方法
|
US10845720B2
(en)
|
2016-05-31 |
2020-11-24 |
Nikon Corporation |
Mark detection apparatus, mark detection method, measurement apparatus, exposure apparatus, exposure method and device manufacturing method
|
CN107450272B
(zh)
*
|
2016-05-31 |
2020-04-10 |
上海微电子装备(集团)股份有限公司 |
离轴照明装置
|
WO2017207269A1
(en)
*
|
2016-06-03 |
2017-12-07 |
Asml Holding N.V. |
Alignment system wafer stack beam analyzer
|
EP3469425B1
(en)
|
2016-06-09 |
2023-08-02 |
ASML Netherlands B.V. |
Radiation source
|
US10691029B2
(en)
|
2016-06-15 |
2020-06-23 |
Asml Netherlands B.V. |
Substrate measurement recipe configuration to improve device matching
|
KR102178588B1
(ko)
*
|
2016-06-30 |
2020-11-16 |
에이에스엠엘 홀딩 엔.브이. |
오버레이 및 임계 치수 센서들에서의 퓨필 조명을 위한 디바이스 및 방법
|
CN109643071B
(zh)
|
2016-08-15 |
2021-04-23 |
Asml荷兰有限公司 |
对准方法
|
US10578982B2
(en)
|
2016-08-17 |
2020-03-03 |
Asml Netherlands B.V. |
Substrate measurement recipe design of, or for, a target including a latent image
|
KR102221714B1
(ko)
*
|
2016-08-23 |
2021-03-03 |
에이에스엠엘 네델란즈 비.브이. |
리소그래피 공정에 의해 기판 상에 형성된 구조체를 측정하는 메트롤로지 장치, 리소그래피 시스템, 및 리소그래피 공정에 의해 기판 상에 형성된 구조체를 측정하는 방법
|
KR102203005B1
(ko)
|
2016-08-30 |
2021-01-14 |
에이에스엠엘 네델란즈 비.브이. |
위치 센서, 리소그래피 장치 및 디바이스 제조 방법
|
WO2018041550A1
(en)
|
2016-09-01 |
2018-03-08 |
Asml Netherlands B.V. |
Automatic selection of metrology target measurement recipes
|
NL2019424A
(en)
|
2016-09-08 |
2018-03-13 |
Asml Holding Nv |
Measurement system
|
KR102556130B1
(ko)
|
2016-09-27 |
2023-07-14 |
가부시키가이샤 니콘 |
결정 방법 및 장치, 프로그램, 정보 기록 매체, 노광 장치, 레이아웃 정보 제공 방법, 레이아웃 방법, 마크 검출 방법, 노광 방법, 그리고 디바이스 제조 방법
|
EP3309616A1
(en)
*
|
2016-10-14 |
2018-04-18 |
ASML Netherlands B.V. |
Method of inspecting a substrate, metrology apparatus, and lithographic system
|
WO2018077587A1
(en)
|
2016-10-24 |
2018-05-03 |
Asml Netherlands B.V. |
Lithographic apparatus and method
|
JP7043493B2
(ja)
|
2016-11-15 |
2022-03-29 |
エーエスエムエル ネザーランズ ビー.ブイ. |
放射分析システム
|
WO2018114152A1
(en)
|
2016-12-19 |
2018-06-28 |
Asml Netherlands B.V. |
Metrology sensor, lithographic apparatus and method for manufacturing devices
|
US10990018B2
(en)
|
2017-02-22 |
2021-04-27 |
Asml Netherlands B.V. |
Computational metrology
|
CN110582729B
(zh)
|
2017-05-04 |
2022-03-08 |
Asml控股股份有限公司 |
测量光学量测的性能的方法、衬底和设备
|
NL2020530A
(en)
|
2017-05-08 |
2018-11-14 |
Asml Netherlands Bv |
Metrology sensor, lithographic apparatus and method for manufacturing devices
|
US11181835B2
(en)
|
2017-05-15 |
2021-11-23 |
Asml Netherlands B.V. |
Metrology sensor, lithographic apparatus and method for manufacturing devices
|
CN110709778B
(zh)
*
|
2017-06-02 |
2021-12-21 |
Asml荷兰有限公司 |
量测设备
|
NL2020921A
(en)
|
2017-06-07 |
2018-12-13 |
Stichting Vu |
Alignment Measurement System
|
US11249404B2
(en)
|
2017-06-08 |
2022-02-15 |
Asml Netherlands B.V. |
System and method for measurement of alignment
|
EP3422103A1
(en)
*
|
2017-06-26 |
2019-01-02 |
ASML Netherlands B.V. |
Method of determining a performance parameter of a process
|
US11181836B2
(en)
|
2017-06-26 |
2021-11-23 |
Asml Netherlands B.V. |
Method for determining deformation
|
CN111095108A
(zh)
|
2017-07-17 |
2020-05-01 |
Asml荷兰有限公司 |
信息确定设备和方法
|
EP3432071A1
(en)
|
2017-07-17 |
2019-01-23 |
ASML Netherlands B.V. |
Information determining apparatus and method
|
EP3441819A1
(en)
|
2017-08-07 |
2019-02-13 |
ASML Netherlands B.V. |
Computational metrology
|
KR102352673B1
(ko)
|
2017-08-07 |
2022-01-17 |
에이에스엠엘 네델란즈 비.브이. |
컴퓨테이션 계측법
|
WO2019034318A1
(en)
|
2017-08-16 |
2019-02-21 |
Asml Netherlands B.V. |
ALIGNMENT MEASUREMENT SYSTEM
|
EP3454125A1
(en)
|
2017-09-07 |
2019-03-13 |
ASML Netherlands B.V. |
A method of measuring a parameter and apparatus
|
KR102384556B1
(ko)
|
2017-09-29 |
2022-04-08 |
에이에스엠엘 네델란즈 비.브이. |
방사선 소스
|
KR102394346B1
(ko)
|
2017-11-01 |
2022-05-03 |
에이에스엠엘 홀딩 엔.브이. |
리소그래피 클러스터, 리소그래피 장치, 및 디바이스 제조 방법
|
EP3729197A1
(en)
|
2017-12-19 |
2020-10-28 |
ASML Netherlands B.V. |
Computational metrology based correction and control
|
CN111512237B
(zh)
|
2017-12-22 |
2023-01-24 |
Asml荷兰有限公司 |
基于缺陷概率的过程窗口
|
CN111615669A
(zh)
|
2018-01-17 |
2020-09-01 |
Asml荷兰有限公司 |
扫描信号表征诊断
|
US11635698B2
(en)
|
2018-01-24 |
2023-04-25 |
Asml Netherlands B.V. |
Computational metrology based sampling scheme
|
CN111656183B
(zh)
|
2018-01-26 |
2024-01-19 |
Asml荷兰有限公司 |
用于确定衬底上目标结构的位置的设备和方法
|
WO2019149586A1
(en)
|
2018-01-30 |
2019-08-08 |
Asml Netherlands B.V. |
Method of patterning at least a layer of a semiconductor device
|
KR102606115B1
(ko)
|
2018-02-23 |
2023-11-29 |
에이에스엠엘 네델란즈 비.브이. |
패턴의 시맨틱 분할을 위한 딥 러닝
|
WO2019162280A1
(en)
|
2018-02-23 |
2019-08-29 |
Asml Netherlands B.V. |
Guided patterning device inspection
|
IL277055B1
(en)
|
2018-03-06 |
2024-02-01 |
Asml Holding Nv |
Anti-reflection optical infrastructures and manufacturing methods
|
EP3536217B1
(en)
*
|
2018-03-06 |
2021-11-03 |
Leica Instruments (Singapore) Pte. Ltd. |
Catadioptric medical imaging system for observing the inside wall of a surgical cavity
|
US11409206B2
(en)
|
2018-04-26 |
2022-08-09 |
Asml Netherlands B.V. |
Alignment method and apparatus
|
WO2019206586A1
(en)
|
2018-04-26 |
2019-10-31 |
Asml Netherlands B.V. |
Alignment sensor apparatus for process sensivity compensation
|
WO2019219389A1
(en)
|
2018-05-16 |
2019-11-21 |
Asml Holding N.V. |
High stability collimator assembly, lithographic apparatus, and method
|
EP3572881A1
(en)
|
2018-05-24 |
2019-11-27 |
ASML Netherlands B.V. |
Bandwidth calculation system and method for determining a desired wavelength bandwidth for a measurement beam in a mark detection system
|
TWI791196B
(zh)
|
2018-05-24 |
2023-02-01 |
荷蘭商Asml荷蘭公司 |
判定基板之堆疊組態之方法及其相關非暫時性電腦可讀媒體
|
EP3575875A1
(en)
*
|
2018-05-31 |
2019-12-04 |
ASML Netherlands B.V. |
Measurement apparatus and method of measuring a target
|
KR102529085B1
(ko)
|
2018-06-25 |
2023-05-08 |
에이에스엠엘 네델란즈 비.브이. |
성능 매칭에 기초하는 튜닝 스캐너에 대한 파면 최적화
|
KR102539367B1
(ko)
*
|
2018-07-04 |
2023-06-01 |
에이에스엠엘 네델란즈 비.브이. |
리소그래피 측정을 위한 센서 장치 및 방법
|
WO2020007558A1
(en)
|
2018-07-06 |
2020-01-09 |
Asml Netherlands B.V. |
Position sensor
|
CN112543892A
(zh)
|
2018-07-26 |
2021-03-23 |
Asml荷兰有限公司 |
针对模拟系统的用于确定晶片的层的蚀刻轮廓的方法
|
US11055464B2
(en)
|
2018-08-14 |
2021-07-06 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Critical dimension uniformity
|
WO2020035272A1
(en)
|
2018-08-14 |
2020-02-20 |
Asml Netherlands B.V. |
Model calibration and guided metrology based on smart sampling
|
WO2020035203A1
(en)
|
2018-08-16 |
2020-02-20 |
Asml Netherlands B.V. |
Apparatus and method for clearing and detecting marks
|
TWI749355B
(zh)
|
2018-08-17 |
2021-12-11 |
荷蘭商Asml荷蘭公司 |
用於校正圖案化程序之度量衡資料之方法及相關的電腦程式產品
|
WO2020038629A1
(en)
|
2018-08-20 |
2020-02-27 |
Asml Netherlands B.V. |
Apparatus and method for measuring a position of alignment marks
|
EP3614194A1
(en)
|
2018-08-24 |
2020-02-26 |
ASML Netherlands B.V. |
Matching pupil determination
|
CN112639624B
(zh)
|
2018-08-29 |
2024-04-30 |
Asml控股股份有限公司 |
紧凑型对准传感器布置
|
KR102571918B1
(ko)
|
2018-09-19 |
2023-08-28 |
에이에스엠엘 네델란즈 비.브이. |
위치 계측을 위한 계측 센서
|
JP7195411B2
(ja)
|
2018-09-21 |
2022-12-23 |
エーエスエムエル ネザーランズ ビー.ブイ. |
放射システム
|
TWI722562B
(zh)
|
2018-09-24 |
2021-03-21 |
荷蘭商Asml荷蘭公司 |
自圖案化製程之圖案組判定候選圖案的方法
|
US11650513B2
(en)
|
2018-09-27 |
2023-05-16 |
Asml Netherlands B.V. |
Apparatus and method for measuring a position of a mark
|
TW202020577A
(zh)
|
2018-09-28 |
2020-06-01 |
荷蘭商Asml荷蘭公司 |
基於晶圓量測判定熱點排序
|
US11556068B2
(en)
|
2018-10-12 |
2023-01-17 |
Asml Netherlands B.V. |
Detection system for an alignment sensor
|
EP3640972A1
(en)
|
2018-10-18 |
2020-04-22 |
ASML Netherlands B.V. |
System and method for facilitating chemical mechanical polishing
|
SG11202103803QA
(en)
|
2018-10-24 |
2021-05-28 |
Asml Netherlands Bv |
Optical fibers and production methods therefor
|
EP3647874A1
(en)
|
2018-11-05 |
2020-05-06 |
ASML Netherlands B.V. |
Optical fibers and production methods therefor
|
WO2020094385A1
(en)
|
2018-11-08 |
2020-05-14 |
Asml Netherlands B.V. |
Prediction of out of specification based on spatial characteristic of process variability
|
EP3663856A1
(en)
|
2018-12-07 |
2020-06-10 |
ASML Netherlands B.V. |
Method for adjusting a target feature in a model of a patterning process based on local electric fields
|
WO2020120050A1
(en)
|
2018-12-14 |
2020-06-18 |
Asml Netherlands B.V. |
Apparatus and method for grouping image patterns to determine wafer behavior in a patterning process
|
WO2020126266A1
(en)
*
|
2018-12-18 |
2020-06-25 |
Asml Netherlands B.V. |
Method of measuring a parameter of a patterning process, metrology apparatus, target
|
JP7143526B2
(ja)
|
2018-12-20 |
2022-09-28 |
エーエスエムエル ホールディング エヌ.ブイ. |
並列アライメントマークを同時に獲得するための装置及びその方法
|
US11493852B2
(en)
|
2018-12-21 |
2022-11-08 |
Asml Holdings N.V. |
Noise correction for alignment signal
|
US11635699B2
(en)
|
2018-12-28 |
2023-04-25 |
Asml Netherlands B.V. |
Determining pattern ranking based on measurement feedback from printed substrate
|
WO2020141050A1
(en)
|
2018-12-31 |
2020-07-09 |
Asml Netherlands B.V. |
Position metrology apparatus and associated optical elements
|
EP3715951A1
(en)
|
2019-03-28 |
2020-09-30 |
ASML Netherlands B.V. |
Position metrology apparatus and associated optical elements
|
WO2020164904A1
(en)
|
2019-02-15 |
2020-08-20 |
Asml Holding N.V. |
Metrology system, lithographic apparatus, and calibration method
|
EP3696606A1
(en)
|
2019-02-15 |
2020-08-19 |
ASML Netherlands B.V. |
A metrology apparatus with radiation source having multiple broadband outputs
|
WO2020169419A1
(en)
|
2019-02-19 |
2020-08-27 |
Asml Holding N.V. |
Metrology system, lithographic apparatus, and method
|
WO2020169357A1
(en)
|
2019-02-21 |
2020-08-27 |
Asml Holding N.V. |
Wafer alignment using form birefringence of targets or product
|
EP3702840A1
(en)
|
2019-03-01 |
2020-09-02 |
ASML Netherlands B.V. |
Alignment method and associated metrology device
|
EP3705942A1
(en)
|
2019-03-04 |
2020-09-09 |
ASML Netherlands B.V. |
Hollow-core photonic crystal fiber based optical component for broadband radiation generation
|
CN113631999B
(zh)
|
2019-03-25 |
2023-05-16 |
Asml荷兰有限公司 |
频率拓宽装置和方法
|
EP3715944A1
(en)
|
2019-03-25 |
2020-09-30 |
ASML Netherlands B.V. |
Frequency broadening apparatus and method
|
EP3719551A1
(en)
|
2019-04-03 |
2020-10-07 |
ASML Netherlands B.V. |
Optical fiber
|
CN113678037A
(zh)
|
2019-04-03 |
2021-11-19 |
Asml荷兰有限公司 |
光纤
|
WO2020224879A1
(en)
|
2019-05-03 |
2020-11-12 |
Asml Netherlands B.V. |
Method for determining an alignment model based on an oblique fitting technique
|
JP7261903B2
(ja)
|
2019-05-06 |
2023-04-20 |
エーエスエムエル ネザーランズ ビー.ブイ. |
暗視野顕微鏡
|
EP3739389A1
(en)
|
2019-05-17 |
2020-11-18 |
ASML Netherlands B.V. |
Metrology tools comprising aplanatic objective singlet
|
WO2020239516A1
(en)
*
|
2019-05-30 |
2020-12-03 |
Asml Holding N.V. |
Self-referencing interferometer and dual self-referencing interferometer devices
|
CN113966490A
(zh)
|
2019-06-03 |
2022-01-21 |
Asml荷兰有限公司 |
图像形成设备
|
WO2020254066A1
(en)
|
2019-06-20 |
2020-12-24 |
Asml Netherlands B.V. |
Method for patterning process modelling
|
EP3754389A1
(en)
|
2019-06-21 |
2020-12-23 |
ASML Netherlands B.V. |
Mounted hollow-core fibre arrangement
|
EP3767347A1
(en)
|
2019-07-17 |
2021-01-20 |
ASML Netherlands B.V. |
Mounted hollow-core fibre arrangement
|
EP3758168A1
(en)
|
2019-06-25 |
2020-12-30 |
ASML Netherlands B.V. |
Hollow-core photonic crystal fiber based optical component for broadband radiation generation
|
EP3994523A1
(en)
|
2019-07-02 |
2022-05-11 |
ASML Netherlands B.V. |
Metrology method and associated metrology and lithographic apparatuses
|
US20220350254A1
(en)
|
2019-07-03 |
2022-11-03 |
Asml Netherlands B.V. |
Method for applying a deposition model in a semiconductor manufacturing process
|
WO2021008929A1
(en)
|
2019-07-16 |
2021-01-21 |
Asml Netherlands B.V. |
Light sources and methods of controlling; devices and methods for use in measurement applications
|
EP3786712A1
(en)
|
2019-08-28 |
2021-03-03 |
ASML Netherlands B.V. |
Light sources and methods of controlling; devices and methods for use in measurement applications
|
EP3767375A1
(en)
|
2019-07-19 |
2021-01-20 |
ASML Netherlands B.V. |
A light source and a method for use in metrology applications
|
EP3796080A1
(en)
|
2019-09-18 |
2021-03-24 |
ASML Netherlands B.V. |
Radiation source
|
JP2022542070A
(ja)
|
2019-07-24 |
2022-09-29 |
エーエスエムエル ネザーランズ ビー.ブイ. |
放射源
|
TWI777193B
(zh)
|
2019-07-31 |
2022-09-11 |
荷蘭商Asml控股公司 |
基於波長掃描之對準感測器
|
WO2021028292A1
(en)
|
2019-08-09 |
2021-02-18 |
Asml Netherlands B.V. |
Phase modulators in alignment to decrease mark size
|
US11815675B2
(en)
|
2019-08-09 |
2023-11-14 |
Asml Netherlands B.V. |
Metrology device and phase modulator apparatus therefor comprising a first moving grating and a first compensatory grating element
|
EP3786701B1
(en)
|
2019-08-29 |
2023-04-26 |
ASML Netherlands B.V. |
End facet protection for a light source and a method for use in metrology applications
|
EP3786700A1
(en)
|
2019-08-29 |
2021-03-03 |
ASML Netherlands B.V. |
End facet protection for a light source and a method for use in metrology applications
|
EP3812836A1
(en)
|
2019-10-21 |
2021-04-28 |
ASML Netherlands B.V. |
End facet protection for a light source and a method for use in metrology applications
|
EP3786702A1
(en)
|
2019-09-02 |
2021-03-03 |
ASML Netherlands B.V. |
Mode control of photonic crystal fiber based broadband light sources
|
EP3786703B1
(en)
|
2019-09-02 |
2023-05-17 |
ASML Netherlands B.V. |
Mode control of photonic crystal fiber based broadband light sources
|
ES2969587T3
(es)
*
|
2019-09-03 |
2024-05-21 |
Esmart Tech Sa |
Sistema y métodos de emparejamiento de dispositivos
|
WO2021043596A1
(en)
|
2019-09-03 |
2021-03-11 |
Asml Netherlands B.V. |
Method for determining aberration sensitivity of patterns
|
JP7367194B2
(ja)
|
2019-09-17 |
2023-10-23 |
エーエスエムエル ホールディング エヌ.ブイ. |
アライメントソースとしてのレーザモジュール、メトロロジシステム、及びリソグラフィ装置
|
CN114514465A
(zh)
|
2019-09-18 |
2022-05-17 |
Asml荷兰有限公司 |
中空芯部光纤中的改进的宽带辐射生成
|
EP3805857A1
(en)
|
2019-10-09 |
2021-04-14 |
ASML Netherlands B.V. |
Improved broadband radiation generation in hollow-core fibres
|
WO2021058313A1
(en)
|
2019-09-27 |
2021-04-01 |
Asml Holding N.V. |
Lithographic apparatus, metrology system, and illumination systems with structured illumination
|
KR20220047387A
(ko)
|
2019-09-27 |
2022-04-15 |
에이에스엠엘 홀딩 엔.브이. |
계측 시스템 및 위상 어레이 조명 소스
|
CN114502911A
(zh)
|
2019-09-27 |
2022-05-13 |
Asml荷兰有限公司 |
量测系统、相干加扰器照射源及其方法
|
CN114450641A
(zh)
*
|
2019-09-30 |
2022-05-06 |
Asml控股股份有限公司 |
具有调制光源的对准传感器
|
CN114556219A
(zh)
|
2019-10-02 |
2022-05-27 |
Asml荷兰有限公司 |
使用预测模型的过程监控和调节
|
EP3809190A1
(en)
|
2019-10-14 |
2021-04-21 |
ASML Netherlands B.V. |
Method and apparatus for coherence scrambling in metrology applications
|
WO2021078474A1
(en)
|
2019-10-21 |
2021-04-29 |
Asml Holding N.V. |
Apparatus for and method of sensing alignment marks
|
JP2022553545A
(ja)
|
2019-10-24 |
2022-12-23 |
エーエスエムエル ネザーランズ ビー.ブイ. |
広帯域放射発生用の中空コアフォトニック結晶ファイバに基づく光学部品
|
EP3839586A1
(en)
|
2019-12-18 |
2021-06-23 |
ASML Netherlands B.V. |
Hollow-core photonic crystal fiber based optical component for broadband radiation generation
|
WO2021083704A1
(en)
|
2019-11-01 |
2021-05-06 |
Asml Netherlands B.V. |
Metrology method and lithographic apparatuses
|
JP7357151B2
(ja)
|
2019-11-07 |
2023-10-05 |
エーエスエムエル ホールディング エヌ.ブイ. |
リソグラフィ装置の一部を洗浄するためのシステム
|
KR20220078664A
(ko)
|
2019-11-07 |
2022-06-10 |
에이에스엠엘 네델란즈 비.브이. |
중공 코어 광결정 섬유용 캐필러리 제조 방법
|
EP3819266A1
(en)
|
2019-11-07 |
2021-05-12 |
ASML Netherlands B.V. |
Method of manufacture of a capillary for a hollow-core photonic crystal fiber
|
US11774861B2
(en)
|
2019-11-11 |
2023-10-03 |
Asml Netherlands B.V. |
Calibration method for a lithographic system
|
WO2021110391A1
(en)
|
2019-12-05 |
2021-06-10 |
Asml Netherlands B.V. |
Alignment method
|
CN114830039A
(zh)
|
2019-12-12 |
2022-07-29 |
Asml荷兰有限公司 |
对准方法以及相关对准和光刻设备
|
WO2021122016A1
(en)
|
2019-12-16 |
2021-06-24 |
Asml Netherlands B.V. |
Metrology method and associated metrology and lithographic apparatuses
|
EP3839635A1
(en)
|
2019-12-17 |
2021-06-23 |
ASML Netherlands B.V. |
Dark field digital holographic microscope and associated metrology method
|
CN114830043A
(zh)
|
2019-12-17 |
2022-07-29 |
Asml荷兰有限公司 |
暗场数字全息显微镜和相关联的量测方法
|
WO2021121906A1
(en)
|
2019-12-18 |
2021-06-24 |
Asml Netherlands B.V. |
Method for correcting measurements in the manufacture of integrated circuits and associated apparatuses
|
EP3851915A1
(en)
|
2020-01-14 |
2021-07-21 |
ASML Netherlands B.V. |
Method for correcting measurements in the manufacture of integrated circuits and associated apparatuses
|
WO2021121871A1
(en)
|
2019-12-19 |
2021-06-24 |
Asml Netherlands B.V. |
Optically determining electrical contact between metallic features in different layers in a structure
|
EP3839631A1
(en)
|
2019-12-19 |
2021-06-23 |
ASML Netherlands B.V. |
Determining relative positions of different layers in a structure
|
WO2021136632A1
(en)
|
2019-12-30 |
2021-07-08 |
Asml Netherlands B.V. |
Lithographic apparatus, metrology systems, illumination sources and methods thereof
|
EP3865931A1
(en)
|
2020-02-12 |
2021-08-18 |
ASML Netherlands B.V. |
Method, assembly, and apparatus for improved control of broadband radiation generation
|
DK3851904T3
(da)
|
2020-01-15 |
2023-02-27 |
Asml Netherlands Bv |
Fremgangsmåde, anordning og apparat til forbedret styring af bredbåndsstrålingsgenerering
|
WO2021144066A1
(en)
|
2020-01-16 |
2021-07-22 |
Asml Netherlands B.V. |
Substrate, patterning device and lithographic apparatuses
|
WO2021151565A1
(en)
|
2020-01-28 |
2021-08-05 |
Asml Netherlands B.V. |
Metrology method and associated metrology and lithographic apparatuses
|
US11841628B2
(en)
|
2020-02-05 |
2023-12-12 |
Asml Holding N.V. |
Apparatus for and method of sensing alignment marks
|
WO2021165419A1
(en)
|
2020-02-21 |
2021-08-26 |
Asml Netherlands B.V. |
Method for calibrating simulation process based on defect-based process window
|
EP3876036A1
(en)
|
2020-03-04 |
2021-09-08 |
ASML Netherlands B.V. |
Vibration isolation system and associated applications in lithography
|
CN113448190B
(zh)
*
|
2020-03-26 |
2022-11-15 |
上海微电子装备(集团)股份有限公司 |
一种对准系统、对准方法及光刻机
|
EP3889681A1
(en)
|
2020-03-31 |
2021-10-06 |
ASML Netherlands B.V. |
An assembly including a non-linear element and a method of use thereof
|
CN115605810A
(zh)
|
2020-04-03 |
2023-01-13 |
Asml控股股份有限公司(Nl) |
用于在表面上形成结构的系统和方法
|
US11249402B2
(en)
|
2020-04-23 |
2022-02-15 |
Asml Holding N. V. |
Adjustable retardance compensator for self-referencing interferometer devices
|
JP7490817B2
(ja)
|
2020-05-19 |
2024-05-27 |
エーエスエムエル ホールディング エヌ.ブイ. |
アライメントマークの局所的な歪みに基づくアライメント信号の生成
|
EP3913429A1
(en)
|
2020-05-19 |
2021-11-24 |
ASML Netherlands B.V. |
A supercontinuum radiation source and associated metrology devices
|
US20230213871A1
(en)
*
|
2020-05-26 |
2023-07-06 |
Asml Netherlands B.V. |
Lithographic apparatus, multi-wavelength phase-modulated scanning metrology system and method
|
KR20230013039A
(ko)
|
2020-05-27 |
2023-01-26 |
에이에스엠엘 네델란즈 비.브이. |
정렬 방법 및 연관된 정렬과 리소그래피 장치
|
US20230205097A1
(en)
|
2020-05-29 |
2023-06-29 |
Asml Netherlands B.V. |
Substrate, patterning device and metrology apparatuses
|
TW202331426A
(zh)
|
2020-06-01 |
2023-08-01 |
荷蘭商Asml控股公司 |
用於清潔微影設備之一部分之清潔工具及方法
|
WO2021254810A1
(en)
|
2020-06-18 |
2021-12-23 |
Asml Netherlands B.V. |
Lithographic apparatus, metrology systems, and methods thereof
|
US20230213868A1
(en)
|
2020-06-23 |
2023-07-06 |
Asml Holding N.V. |
Lithographic apparatus, metrology systems, illumination switches and methods thereof
|
WO2021259559A1
(en)
|
2020-06-24 |
2021-12-30 |
Asml Netherlands B.V. |
Metrology method and associated metrology and lithographic apparatuses
|
CN115702391A
(zh)
|
2020-06-24 |
2023-02-14 |
Asml控股股份有限公司 |
自参考集成式对准传感器
|
KR20230019952A
(ko)
|
2020-07-03 |
2023-02-09 |
에이에스엠엘 네델란즈 비.브이. |
불량률에 기초한 프로세스 윈도우
|
CN115769151A
(zh)
|
2020-07-06 |
2023-03-07 |
Asml荷兰有限公司 |
照射设备和相关联的量测和光刻设备
|
IL299122A
(en)
|
2020-07-08 |
2023-02-01 |
Asml Netherlands Bv |
Broadband radiation generator based on hollow fibers with extended fiber life
|
EP3936936A1
(en)
|
2020-07-08 |
2022-01-12 |
ASML Netherlands B.V. |
Hollow-core photonic crystal fiber based broadband radiation generator with extended fiber lifetime
|
US20230273531A1
(en)
|
2020-07-16 |
2023-08-31 |
Asml Holding N.V. |
Spectrometric metrology systems based on multimode interference and lithographic apparatus
|
EP3974899A1
(en)
|
2020-09-28 |
2022-03-30 |
ASML Netherlands B.V. |
Method for generating broadband radiation and associated broadband source and metrology device
|
JP2023537662A
(ja)
|
2020-08-03 |
2023-09-05 |
エーエスエムエル ネザーランズ ビー.ブイ. |
広帯域放射を発生させるための方法並びに関連する広帯域源及びメトロロジデバイス
|
IL299361A
(en)
|
2020-08-06 |
2023-02-01 |
Asml Netherlands Bv |
Hollow core fiber light source and method for manufacturing a hollow core fiber
|
EP4001976A1
(en)
|
2020-11-13 |
2022-05-25 |
ASML Netherlands B.V. |
Hollow core fiber light source and a method for manufacturing a hollow core fiber
|
KR20230054384A
(ko)
|
2020-08-26 |
2023-04-24 |
에이에스엠엘 홀딩 엔.브이. |
리소그래피 장치, 계측 시스템, 및 오차 정정을 위한 세기 불균형 측정
|
EP3964892A1
(en)
|
2020-09-02 |
2022-03-09 |
Stichting VU |
Illumination arrangement and associated dark field digital holographic microscope
|
EP3964809A1
(en)
|
2020-09-02 |
2022-03-09 |
Stichting VU |
Wavefront metrology sensor and mask therefor, method for optimizing a mask and associated apparatuses
|
EP3968090A1
(en)
|
2020-09-11 |
2022-03-16 |
ASML Netherlands B.V. |
Radiation source arrangement and metrology device
|
WO2022048847A1
(en)
|
2020-09-03 |
2022-03-10 |
Asml Netherlands B.V. |
Hollow-core photonic crystal fiber based broadband radiation generator
|
EP3988996A1
(en)
|
2020-10-20 |
2022-04-27 |
ASML Netherlands B.V. |
Hollow-core photonic crystal fiber based broadband radiation generator
|
EP3978964A1
(en)
|
2020-10-01 |
2022-04-06 |
ASML Netherlands B.V. |
Achromatic optical relay arrangement
|
WO2022096249A1
(en)
|
2020-11-04 |
2022-05-12 |
Asml Holding N.V. |
Polarization selection metrology system, lithographic apparatus, and methods thereof
|
IL303057A
(en)
|
2020-11-24 |
2023-07-01 |
Asml Holding Nv |
A multi-purpose metrology system, a lithographic device, and its methods
|
JP2023550904A
(ja)
|
2020-11-27 |
2023-12-06 |
エーエスエムエル ネザーランズ ビー.ブイ. |
メトロロジ方法並びに関連付けられたメトロロジ及びリソグラフィ装置
|
EP4009107A1
(en)
|
2020-12-01 |
2022-06-08 |
ASML Netherlands B.V. |
Method and apparatus for imaging nonstationary object
|
KR20230113565A
(ko)
|
2020-12-08 |
2023-07-31 |
에이에스엠엘 네델란즈 비.브이. |
메트롤로지 방법 및 관련 장치
|
US20240027913A1
(en)
|
2020-12-08 |
2024-01-25 |
Asml Netherlands B.V. |
Metrology system and coherence adjusters
|
JP2023553078A
(ja)
|
2020-12-10 |
2023-12-20 |
エーエスエムエル ネザーランズ ビー.ブイ. |
中空コアフォトニック結晶ファイバに基づく広帯域放射生成器
|
WO2022122565A1
(en)
|
2020-12-10 |
2022-06-16 |
Asml Holding N.V. |
Intensity order difference based metrology system, lithographic apparatus, and methods thereof
|
EP4012492A1
(en)
|
2020-12-10 |
2022-06-15 |
ASML Netherlands B.V. |
Hollow-core photonic crystal fiber based broadband radiation generator
|
JP2024500380A
(ja)
|
2020-12-23 |
2024-01-09 |
エーエスエムエル ネザーランズ ビー.ブイ. |
リソグラフィ装置、メトロロジシステム、及びそれらの方法
|
JP2024503585A
(ja)
|
2021-01-19 |
2024-01-26 |
エーエスエムエル ホールディング エヌ.ブイ. |
リソグラフィアライメント装置における強度を測定するためのシステム及び方法
|
US20240053532A1
(en)
|
2021-01-27 |
2024-02-15 |
Asml Netherlands B.V. |
Hollow-core photonic crystal fiber
|
EP4036619A1
(en)
|
2021-01-27 |
2022-08-03 |
ASML Netherlands B.V. |
Hollow-core photonic crystal fiber
|
JP2024512198A
(ja)
|
2021-02-04 |
2024-03-19 |
エーエスエムエル ネザーランズ ビー.ブイ. |
光パルスを空間的にフィルタリングするための方法および装置
|
EP4067968A1
(en)
|
2021-03-29 |
2022-10-05 |
ASML Netherlands B.V. |
Methods and apparatuses for spatially filtering optical pulses
|
EP4053636A1
(en)
|
2021-03-02 |
2022-09-07 |
ASML Netherlands B.V. |
Alignment method
|
WO2022199958A1
(en)
|
2021-03-10 |
2022-09-29 |
Asml Netherlands B.V. |
Alignment method and associated alignment and lithographic apparatuses
|
EP4060403A1
(en)
|
2021-03-16 |
2022-09-21 |
ASML Netherlands B.V. |
Hollow-core photonic crystal fiber based multiple wavelength light source device
|
JP2024509518A
(ja)
|
2021-03-16 |
2024-03-04 |
エーエスエムエル ネザーランズ ビー.ブイ. |
中空コア光ファイバベースの放射源
|
EP4086698A1
(en)
|
2021-05-06 |
2022-11-09 |
ASML Netherlands B.V. |
Hollow-core optical fiber based radiation source
|
CN117157586A
(zh)
|
2021-03-29 |
2023-12-01 |
Asml荷兰有限公司 |
用于晶片对准的不对称性扩展栅格模型
|
JP2024515477A
(ja)
|
2021-04-23 |
2024-04-10 |
エーエスエムエル ネザーランズ ビー.ブイ. |
光学系、計測システム、リソグラフィ装置における収差の制御及びその方法
|
JP2024519279A
(ja)
|
2021-05-03 |
2024-05-10 |
エーエスエムエル ネザーランズ ビー.ブイ. |
広帯域放射を発生させるための光学素子
|
EP4105696A1
(en)
|
2021-06-15 |
2022-12-21 |
ASML Netherlands B.V. |
Optical element for generation of broadband radiation
|
WO2022258275A1
(en)
|
2021-06-07 |
2022-12-15 |
Asml Netherlands B.V. |
Integrated optical alignment sensors
|
KR20240018488A
(ko)
|
2021-06-08 |
2024-02-13 |
에이에스엠엘 홀딩 엔.브이. |
계측 시스템, 시간적 및 공간적 가간섭성 스크램블러 및 그 방법
|
WO2022258371A1
(en)
|
2021-06-08 |
2022-12-15 |
Asml Netherlands B.V. |
Intensity imbalance calibration on an overfilled bidirectional mark
|
EP4112572A1
(en)
|
2021-06-28 |
2023-01-04 |
ASML Netherlands B.V. |
Method of producing photonic crystal fibers
|
CN117581161A
(zh)
|
2021-07-13 |
2024-02-20 |
Asml控股股份有限公司 |
具有用于污染物检测和显微镜检查的相控阵列的量测系统
|
EP4374226A1
(en)
|
2021-07-20 |
2024-05-29 |
ASML Netherlands B.V. |
Methods and computer programs for data mapping for low dimensional data analysis
|
EP4130880A1
(en)
|
2021-08-03 |
2023-02-08 |
ASML Netherlands B.V. |
Methods of data mapping for low dimensional data analysis
|
CN117882013A
(zh)
|
2021-08-12 |
2024-04-12 |
Asml荷兰有限公司 |
使用离轴照射的强度测量
|
KR20240050358A
(ko)
|
2021-08-18 |
2024-04-18 |
에이에스엠엘 네델란즈 비.브이. |
계측 방법 및 장치
|
CN117836722A
(zh)
|
2021-08-20 |
2024-04-05 |
Asml荷兰有限公司 |
用于不均匀表面的补偿光学系统、量测系统、光刻设备及其方法
|
KR20240046486A
(ko)
|
2021-08-25 |
2024-04-09 |
에이에스엠엘 네델란즈 비.브이. |
광결정 또는 고도로 비선형인 섬유 내에서의 개선된 광대역 방사선 생성
|
EP4163715A1
(en)
|
2021-10-05 |
2023-04-12 |
ASML Netherlands B.V. |
Improved broadband radiation generation in photonic crystal or highly non-linear fibres
|
KR20240063113A
(ko)
|
2021-09-08 |
2024-05-10 |
에이에스엠엘 네델란즈 비.브이. |
계측 방법 그리고 관련된 계측 및 리소그래피 장치
|
WO2023041488A1
(en)
|
2021-09-15 |
2023-03-23 |
Asml Netherlands B.V. |
Source separation from metrology data
|
WO2023046420A1
(en)
|
2021-09-22 |
2023-03-30 |
Asml Netherlands B.V. |
Source selection module and associated metrology and lithographic apparatuses
|
EP4163687A1
(en)
|
2021-10-06 |
2023-04-12 |
ASML Netherlands B.V. |
Fiber alignment monitoring tool and associated fiber alignment method
|
EP4167031A1
(en)
|
2021-10-18 |
2023-04-19 |
ASML Netherlands B.V. |
Method of determining a measurement recipe in a metrology method
|
EP4170429A1
(en)
|
2021-10-19 |
2023-04-26 |
ASML Netherlands B.V. |
Out-of-band leakage correction method and metrology apparatus
|
WO2023072880A1
(en)
|
2021-10-29 |
2023-05-04 |
Asml Netherlands B.V. |
Inspection apparatus, polarization-maintaining rotatable beam displacer, and method
|
EP4174568A1
(en)
|
2021-11-01 |
2023-05-03 |
ASML Netherlands B.V. |
Hollow-core photonic crystal fiber based broadband radiation generator
|
WO2023078619A1
(en)
|
2021-11-02 |
2023-05-11 |
Asml Netherlands B.V. |
Hollow-core photonic crystal fiber based broadband radiation generator
|
EP4174567A1
(en)
|
2021-11-02 |
2023-05-03 |
ASML Netherlands B.V. |
Hollow-core photonic crystal fiber based broadband radiation generator
|
WO2023104469A1
(en)
|
2021-12-07 |
2023-06-15 |
Asml Netherlands B.V. |
Target asymmetry measurement for substrate alignment in lithography systems
|
WO2023104504A1
(en)
|
2021-12-09 |
2023-06-15 |
Asml Netherlands B.V. |
Surrounding pattern and process aware metrology
|
WO2023117610A1
(en)
|
2021-12-23 |
2023-06-29 |
Asml Netherlands B.V. |
Generating an alignment signal without dedicated alignment structures
|
WO2023117611A1
(en)
|
2021-12-23 |
2023-06-29 |
Asml Netherlands B.V. |
Systems and methods for generating multiple illumination spots from a single illumination source
|
WO2023126173A1
(en)
|
2021-12-28 |
2023-07-06 |
Asml Netherlands B.V. |
An optical system implemented in a system for fast optical inspection of targets
|
WO2023126174A1
(en)
|
2021-12-29 |
2023-07-06 |
Asml Netherlands B.V. |
Enhanced alignment for a photolithographic apparatus
|
WO2023131589A1
(en)
|
2022-01-10 |
2023-07-13 |
Asml Netherlands B.V. |
Mechanically controlled stress-engineered optical systems and methods
|
WO2023138916A1
(en)
|
2022-01-21 |
2023-07-27 |
Asml Netherlands B.V. |
Systems and methods for inspecting a portion of a lithography apparatus
|
WO2023147951A1
(en)
|
2022-02-07 |
2023-08-10 |
Asml Netherlands B.V. |
Inspection apparatus, motorized apertures, and method background
|
EP4231090A1
(en)
|
2022-02-17 |
2023-08-23 |
ASML Netherlands B.V. |
A supercontinuum radiation source and associated metrology devices
|
WO2023160924A1
(en)
|
2022-02-22 |
2023-08-31 |
Asml Netherlands B.V. |
Method and apparatus for reflecting pulsed radiation
|
WO2023160925A1
(en)
|
2022-02-25 |
2023-08-31 |
Asml Netherlands B.V. |
Systems and methods for cleaning a portion of a lithography apparatus
|
WO2023165823A1
(en)
|
2022-03-02 |
2023-09-07 |
Asml Netherlands B.V. |
Inspection apparatus, linearly movable beam displacer, and method
|
EP4242744A1
(en)
|
2022-03-09 |
2023-09-13 |
ASML Netherlands B.V. |
Method for correcting measurements in the manufacture of integrated circuits and associated apparatuses
|
EP4246232A1
(en)
|
2022-03-18 |
2023-09-20 |
Stichting VU |
Illumination arrangement for a metrology device and associated method
|
WO2023174648A1
(en)
|
2022-03-18 |
2023-09-21 |
Stichting Vu |
Illumination arrangement for a metrology device and associated method
|
EP4273622A1
(en)
|
2022-05-02 |
2023-11-08 |
ASML Netherlands B.V. |
Hollow-core optical fiber based radiation source
|
WO2023194049A1
(en)
|
2022-04-08 |
2023-10-12 |
Asml Netherlands B.V. |
Hollow-core optical fiber based radiation source
|
WO2023198444A1
(en)
|
2022-04-15 |
2023-10-19 |
Asml Netherlands B.V. |
Metrology apparatus with configurable printed optical routing for parallel optical detection
|
WO2023198466A1
(en)
|
2022-04-15 |
2023-10-19 |
Asml Netherlands B.V. |
A lithographic apparatus, an inspection system, and a detector having a square-core fiber
|
WO2023217553A1
(en)
|
2022-05-12 |
2023-11-16 |
Asml Netherlands B.V. |
A movable stage for a lithographic apparatus
|
WO2023217499A1
(en)
|
2022-05-12 |
2023-11-16 |
Asml Netherlands B.V. |
Optical arrangement for a metrology system
|
WO2023222317A1
(en)
|
2022-05-16 |
2023-11-23 |
Asml Netherlands B.V. |
Passive integrated optical systems and methods for reduction of spatial optical coherence
|
EP4289798A1
(en)
|
2022-06-07 |
2023-12-13 |
ASML Netherlands B.V. |
Method of producing photonic crystal fibers
|
WO2023242012A1
(en)
|
2022-06-14 |
2023-12-21 |
Asml Netherlands B.V. |
Integrated optical system for scalable and accurate inspection systems
|
EP4300183A1
(en)
|
2022-06-30 |
2024-01-03 |
ASML Netherlands B.V. |
Apparatus for broadband radiation generation
|
EP4300178A1
(en)
*
|
2022-06-30 |
2024-01-03 |
Mycronic Ab |
Electrical crosstalk cancellation in acoustooptical modulators
|
EP4303658A1
(en)
|
2022-07-05 |
2024-01-10 |
ASML Netherlands B.V. |
Method of correction metrology signal data
|
WO2024017649A1
(en)
|
2022-07-19 |
2024-01-25 |
Asml Netherlands B.V. |
Enhanced alignment apparatus for lithographic systems
|
WO2024022839A1
(en)
|
2022-07-25 |
2024-02-01 |
Asml Netherlands B.V. |
Metrology system using multiple radiation spots
|
EP4312005A1
(en)
|
2022-07-29 |
2024-01-31 |
Stichting VU |
Method and apparatuses for fourier transform spectrometry
|
EP4318131A1
(en)
|
2022-08-01 |
2024-02-07 |
ASML Netherlands B.V. |
Sensor module, illuminator, metrology device and associated metrology method
|
WO2024041827A1
(en)
|
2022-08-22 |
2024-02-29 |
Asml Netherlands B.V. |
Metrology system and method
|
EP4332678A1
(en)
|
2022-09-05 |
2024-03-06 |
ASML Netherlands B.V. |
Holographic metrology apparatus and method
|
WO2024052061A1
(en)
|
2022-09-08 |
2024-03-14 |
Asml Netherlands B.V. |
Measuring contrast and critical dimension using an alignment sensor
|
EP4336251A1
(en)
|
2022-09-12 |
2024-03-13 |
ASML Netherlands B.V. |
A multi-pass radiation device
|
WO2024061736A1
(en)
|
2022-09-23 |
2024-03-28 |
Asml Netherlands B.V. |
Positioning system for an optical element of a metrology apparatus
|
WO2024078830A1
(en)
|
2022-10-10 |
2024-04-18 |
Asml Netherlands B.V. |
Electrostatic clamp with a structured electrode by post bond structuring
|
EP4354200A1
(en)
|
2022-10-11 |
2024-04-17 |
ASML Netherlands B.V. |
An aberration correction optical system
|
WO2024078813A1
(en)
|
2022-10-11 |
2024-04-18 |
Asml Netherlands B.V. |
An aberration correction optical system
|
WO2024078818A1
(en)
|
2022-10-11 |
2024-04-18 |
Asml Netherlands B.V. |
Inspection systems using metasurface and integrated optical systems for lithography
|
EP4361703A1
(en)
|
2022-10-27 |
2024-05-01 |
ASML Netherlands B.V. |
An illumination module for a metrology device
|
WO2024099744A1
(en)
|
2022-11-09 |
2024-05-16 |
Asml Netherlands B.V. |
Alignment method and associated alignment and lithographic apparatuses
|
EP4372462A1
(en)
|
2022-11-16 |
2024-05-22 |
ASML Netherlands B.V. |
A broadband radiation source
|
EP4371951A1
(en)
|
2022-11-17 |
2024-05-22 |
ASML Netherlands B.V. |
A method of producing photonic crystal fibers
|
EP4371949A1
(en)
|
2022-11-17 |
2024-05-22 |
ASML Netherlands B.V. |
A fiber manufacturing intermediate product and method of producing photonic crystal fibers
|
EP4372463A1
(en)
|
2022-11-21 |
2024-05-22 |
ASML Netherlands B.V. |
Method and source modul for generating broadband radiation
|
EP4375744A1
(en)
|
2022-11-24 |
2024-05-29 |
ASML Netherlands B.V. |
Photonic integrated circuit for generating broadband radiation
|
CN116859682B
(zh)
*
|
2023-08-31 |
2023-12-08 |
光科芯图(北京)科技有限公司 |
一种掩模的曝光标定装置及方法
|
CN116819917B
(zh)
*
|
2023-08-31 |
2023-11-17 |
光科芯图(北京)科技有限公司 |
一种掩模板、曝光设备及掩模板对准方法
|