WO2009028494A1 - 位置検出装置、位置検出方法、露光装置、およびデバイス製造方法 - Google Patents

位置検出装置、位置検出方法、露光装置、およびデバイス製造方法 Download PDF

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Publication number
WO2009028494A1
WO2009028494A1 PCT/JP2008/065185 JP2008065185W WO2009028494A1 WO 2009028494 A1 WO2009028494 A1 WO 2009028494A1 JP 2008065185 W JP2008065185 W JP 2008065185W WO 2009028494 A1 WO2009028494 A1 WO 2009028494A1
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WO
WIPO (PCT)
Prior art keywords
light
position detecting
diffracted
detection
detection light
Prior art date
Application number
PCT/JP2008/065185
Other languages
English (en)
French (fr)
Inventor
Keiji Inada
Mikihiko Ishii
Tetsuya Koike
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Publication of WO2009028494A1 publication Critical patent/WO2009028494A1/ja
Priority to US12/715,227 priority Critical patent/US8416423B2/en
Priority to US13/791,465 priority patent/US9885558B2/en

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02041—Interferometers characterised by particular imaging or detection techniques
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

　位置検出装置（１１）は、検出光を供給する光源（２１）と、物体（Ｍ）に設けられた回折光発生部（ＰＨ）に検出光を集光させる集光光学系（２３）と、検出光を受けて回折光発生部から発生する回折測定光および検出光を受けて参照面（２４）から発生する参照光を所定位置へ導く導光光学系（２２，２５）と、所定位置に配置されて回折測定光と参照光との干渉縞を検出する光検出器（２６）とを備えている。比較的簡素な構成にしたがって、例えばマスクのパターン面または感光性基板の露光面の三次元的な位置情報を高精度で検出することができる。
PCT/JP2008/065185 2007-08-28 2008-08-26 位置検出装置、位置検出方法、露光装置、およびデバイス製造方法 WO2009028494A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US12/715,227 US8416423B2 (en) 2007-08-28 2010-03-01 Interferometric apparatus for detecting 3D position of a diffracting object
US13/791,465 US9885558B2 (en) 2007-08-28 2013-03-08 Interferometric apparatus for detecting 3D position of a diffracting object

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007220552 2007-08-28
JP2007-220552 2007-08-28

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/715,227 Continuation US8416423B2 (en) 2007-08-28 2010-03-01 Interferometric apparatus for detecting 3D position of a diffracting object

Publications (1)

Publication Number Publication Date
WO2009028494A1 true WO2009028494A1 (ja) 2009-03-05

Family

ID=40387213

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/065185 WO2009028494A1 (ja) 2007-08-28 2008-08-26 位置検出装置、位置検出方法、露光装置、およびデバイス製造方法

Country Status (4)

Country Link
US (2) US8416423B2 (ja)
JP (1) JP5206954B2 (ja)
TW (1) TW200925791A (ja)
WO (1) WO2009028494A1 (ja)

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CN103207532A (zh) * 2013-04-21 2013-07-17 中国科学院光电技术研究所 一种同轴检焦测量系统及其测量方法

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DE102011006055A1 (de) * 2011-03-24 2012-09-27 Carl Zeiss Smt Gmbh Positionsmessvorrichtung sowie Positioniersystem für eine Maskeninspektionseinrichtung
US20120274913A1 (en) * 2011-04-29 2012-11-01 Nikon Corporation Enhanced contrast pin mirror for lithography tools
JP5895054B2 (ja) * 2012-06-07 2016-03-30 旭化成エレクトロニクス株式会社 位置検出装置
KR20140126807A (ko) * 2013-04-22 2014-11-03 한국전자통신연구원 동작 인식을 위해 패턴을 투사하는 프로젝터, 이를 이용한 동작 인식 장치 및 방법
DE102016204535A1 (de) * 2016-03-18 2017-09-21 Carl Zeiss Smt Gmbh Messmikroskop zur Vermessung von Masken für lithographische Verfahren sowie Messverfahren und Kalibrierverfahren hierfür
US10416408B2 (en) * 2017-09-05 2019-09-17 Himax Technologies Limited Projector assembling equipment
TWI725875B (zh) * 2018-01-16 2021-04-21 美商伊路米納有限公司 結構照明成像系統和使用結構化光來創建高解析度圖像的方法
US11686935B2 (en) * 2019-01-29 2023-06-27 Meta Platforms Technologies, Llc Interferometric structured illumination for depth determination
US11899380B2 (en) 2019-10-21 2024-02-13 Asml Holding N.V. Apparatus for and method of sensing alignment marks

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JPS63229309A (ja) * 1987-03-18 1988-09-26 Nikon Corp 微細パタ−ンの深さ測定方法及びその装置
JPH0357905A (ja) * 1989-07-26 1991-03-13 Matsushita Electric Works Ltd 非接触型の表面形状測定装置
JPH06295855A (ja) * 1993-04-08 1994-10-21 Hitachi Ltd 信号の周期検出方法及びそれを用いた投影露光装置
JPH08213300A (ja) * 1995-02-01 1996-08-20 Nikon Corp 位置検出方法及び装置

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JPH01180403A (ja) * 1988-01-12 1989-07-18 Furukawa Electric Co Ltd:The 微小孔径の測定方法
US5783833A (en) 1994-12-12 1998-07-21 Nikon Corporation Method and apparatus for alignment with a substrate, using coma imparting optics
DE69738910D1 (de) 1996-11-28 2008-09-25 Nikon Corp Ausrichtvorrichtung und belichtungsverfahren
JP3626504B2 (ja) 1997-03-10 2005-03-09 アーエスエム リソグラフィ ベスローテン フェンノートシャップ ２個の物品ホルダを有する位置決め装置
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Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63229309A (ja) * 1987-03-18 1988-09-26 Nikon Corp 微細パタ−ンの深さ測定方法及びその装置
JPH0357905A (ja) * 1989-07-26 1991-03-13 Matsushita Electric Works Ltd 非接触型の表面形状測定装置
JPH06295855A (ja) * 1993-04-08 1994-10-21 Hitachi Ltd 信号の周期検出方法及びそれを用いた投影露光装置
JPH08213300A (ja) * 1995-02-01 1996-08-20 Nikon Corp 位置検出方法及び装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103207532A (zh) * 2013-04-21 2013-07-17 中国科学院光电技术研究所 一种同轴检焦测量系统及其测量方法

Also Published As

Publication number Publication date
JP2009075094A (ja) 2009-04-09
TW200925791A (en) 2009-06-16
JP5206954B2 (ja) 2013-06-12
US20130188197A1 (en) 2013-07-25
US9885558B2 (en) 2018-02-06
US20100285400A1 (en) 2010-11-11
US8416423B2 (en) 2013-04-09

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