SG108091G - Photosensitive coating compositions,thermally stable coatings prepared from them,and the use of such coatings in forming thermally stable polymer images - Google Patents

Photosensitive coating compositions,thermally stable coatings prepared from them,and the use of such coatings in forming thermally stable polymer images

Info

Publication number
SG108091G
SG108091G SG1080/91A SG108091A SG108091G SG 108091 G SG108091 G SG 108091G SG 1080/91 A SG1080/91 A SG 1080/91A SG 108091 A SG108091 A SG 108091A SG 108091 G SG108091 G SG 108091G
Authority
SG
Singapore
Prior art keywords
thermally stable
coatings
images
coating compositions
photosensitive coating
Prior art date
Application number
SG1080/91A
Other languages
English (en)
Original Assignee
Rohm & Haas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=24469821&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=SG108091(G) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Rohm & Haas filed Critical Rohm & Haas
Publication of SG108091G publication Critical patent/SG108091G/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C08J7/16—Chemical modification with polymerisable compounds
    • C08J7/18—Chemical modification with polymerisable compounds using wave energy or particle radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Paints Or Removers (AREA)
  • Cosmetics (AREA)
  • Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
  • Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Medical Uses (AREA)
  • Dental Preparations (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Paper (AREA)
  • Treatments For Attaching Organic Compounds To Fibrous Goods (AREA)
SG1080/91A 1984-06-01 1991-12-24 Photosensitive coating compositions,thermally stable coatings prepared from them,and the use of such coatings in forming thermally stable polymer images SG108091G (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US61651884A 1984-06-01 1984-06-01

Publications (1)

Publication Number Publication Date
SG108091G true SG108091G (en) 1992-04-16

Family

ID=24469821

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1080/91A SG108091G (en) 1984-06-01 1991-12-24 Photosensitive coating compositions,thermally stable coatings prepared from them,and the use of such coatings in forming thermally stable polymer images

Country Status (18)

Country Link
EP (1) EP0164248B1 (fr)
JP (1) JPS60263143A (fr)
KR (1) KR920005773B1 (fr)
AT (1) ATE68272T1 (fr)
AU (1) AU595160B2 (fr)
BR (1) BR8502638A (fr)
CA (1) CA1283799C (fr)
DE (1) DE3584316D1 (fr)
DK (1) DK241885A (fr)
FI (1) FI84942C (fr)
HK (1) HK17492A (fr)
IE (1) IE57143B1 (fr)
IL (1) IL75373A (fr)
MX (1) MX170270B (fr)
MY (1) MY103545A (fr)
NO (1) NO173574C (fr)
SG (1) SG108091G (fr)
ZA (1) ZA854172B (fr)

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JP5698922B2 (ja) 2009-06-26 2015-04-08 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 電子デバイスを形成する方法
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FI84942B (fi) 1991-10-31
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DK241885A (da) 1985-12-02
MY103545A (en) 1993-07-31
IL75373A (en) 1990-06-10
EP0164248A3 (en) 1987-06-03
HK17492A (en) 1992-03-13
ZA854172B (en) 1986-07-30
NO173574C (no) 1993-12-29
FI852190L (fi) 1985-12-02
AU595160B2 (en) 1990-03-29
IE851350L (en) 1985-12-01
IL75373A0 (en) 1985-09-29
AU4325185A (en) 1985-12-05
DE3584316D1 (de) 1991-11-14
BR8502638A (pt) 1986-02-12
ATE68272T1 (de) 1991-10-15
FI852190A0 (fi) 1985-05-31
JPS60263143A (ja) 1985-12-26
IE57143B1 (en) 1992-05-06
KR860000330A (ko) 1986-01-28
MX170270B (es) 1993-08-11
NO173574B (no) 1993-09-20
EP0164248A2 (fr) 1985-12-11
KR920005773B1 (ko) 1992-07-18
EP0164248B1 (fr) 1991-10-09
CA1283799C (fr) 1991-05-07
FI84942C (fi) 1992-02-10

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