NL1007939C2 - Werkwijze en inrichting waarin ArF fotoresist wordt gebruikt. - Google Patents

Werkwijze en inrichting waarin ArF fotoresist wordt gebruikt. Download PDF

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Publication number
NL1007939C2
NL1007939C2 NL1007939A NL1007939A NL1007939C2 NL 1007939 C2 NL1007939 C2 NL 1007939C2 NL 1007939 A NL1007939 A NL 1007939A NL 1007939 A NL1007939 A NL 1007939A NL 1007939 C2 NL1007939 C2 NL 1007939C2
Authority
NL
Netherlands
Prior art keywords
carboxylate
norbornene
photoresist
butyl
hydroxyethyl
Prior art date
Application number
NL1007939A
Other languages
English (en)
Dutch (nl)
Other versions
NL1007939A1 (nl
Inventor
Jae Chang Jung
Cheol Kyu Bok
Ki Ho Baik
Original Assignee
Hyundai Electronics Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hyundai Electronics Ind filed Critical Hyundai Electronics Ind
Publication of NL1007939A1 publication Critical patent/NL1007939A1/xx
Application granted granted Critical
Publication of NL1007939C2 publication Critical patent/NL1007939C2/nl

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0395—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having a backbone with alicyclic moieties
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F232/00—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C08F232/02—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having no condensed rings
    • C08F232/04—Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system having no condensed rings having one carbon-to-carbon double bond
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymerization Catalysts (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
NL1007939A 1996-12-31 1997-12-30 Werkwijze en inrichting waarin ArF fotoresist wordt gebruikt. NL1007939C2 (nl)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR19960080264 1996-12-31
KR19960080264 1996-12-31
KR1019970026807A KR100265597B1 (ko) 1996-12-30 1997-06-21 Arf 감광막 수지 및 그 제조방법
KR19970026807 1997-06-21

Publications (2)

Publication Number Publication Date
NL1007939A1 NL1007939A1 (nl) 1998-07-01
NL1007939C2 true NL1007939C2 (nl) 1998-11-17

Family

ID=26632436

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1007939A NL1007939C2 (nl) 1996-12-31 1997-12-30 Werkwijze en inrichting waarin ArF fotoresist wordt gebruikt.

Country Status (10)

Country Link
US (1) US6132926A (ko)
JP (4) JP3220745B2 (ko)
KR (1) KR100265597B1 (ko)
CN (2) CN1983029B (ko)
DE (1) DE19758244B4 (ko)
FR (1) FR2757868B1 (ko)
GB (1) GB2320718B (ko)
IT (1) IT1297352B1 (ko)
NL (1) NL1007939C2 (ko)
TW (1) TW388926B (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1012916C2 (nl) * 1998-08-26 2002-12-03 Hyundai Electronics Ind Nieuw fotoresistmonomeer met hydroxygroep en carboxylgroep, copolymeer daarvan en fotoresistcompositie waarin dit gebruikt wordt.

Families Citing this family (91)

* Cited by examiner, † Cited by third party
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KR100334387B1 (ko) 1997-12-31 2002-11-22 주식회사 하이닉스반도체 공중합체수지와그제조방법및이수지를이용한포토레지스트
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KR20000015014A (ko) 1998-08-26 2000-03-15 김영환 신규의 포토레지스트용 단량체, 중합체 및 이를 이용한 포토레지스트 조성물
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KR20010011766A (ko) * 1999-07-30 2001-02-15 김영환 신규한 포토레지스트 단량체, 그의 공중합체 및 이를 이용한 포토레지스트 조성물
KR20010016971A (ko) * 1999-08-06 2001-03-05 박종섭 신규한 포토레지스트 중합체 및 이를 이용한 포토레지스트 조성물
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JP3220745B2 (ja) 2001-10-22
JP2007146182A (ja) 2007-06-14
IT1297352B1 (it) 1999-09-01
US6132926A (en) 2000-10-17
KR100265597B1 (ko) 2000-09-15
NL1007939A1 (nl) 1998-07-01
GB2320718B (en) 2000-09-13
DE19758244B4 (de) 2014-08-14
FR2757868A1 (fr) 1998-07-03
GB2320718A (en) 1998-07-01
JP2002003542A (ja) 2002-01-09
KR19980063345A (ko) 1998-10-07
JPH10218947A (ja) 1998-08-18
TW388926B (en) 2000-05-01
DE19758244A1 (de) 1998-07-02
GB2320718A8 (en) 1999-08-17
ITTO971150A1 (it) 1999-06-30
JP2002003541A (ja) 2002-01-09
CN1280321C (zh) 2006-10-18
JP4999499B2 (ja) 2012-08-15
FR2757868B1 (fr) 2003-11-14
CN1478800A (zh) 2004-03-03
CN1983029A (zh) 2007-06-20
GB9727474D0 (en) 1998-02-25
GB2320718A9 (en) 1999-08-17
JP4025956B2 (ja) 2007-12-26

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