KR960015945A - 반도체 장치 - Google Patents

반도체 장치 Download PDF

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Publication number
KR960015945A
KR960015945A KR1019950034252A KR19950034252A KR960015945A KR 960015945 A KR960015945 A KR 960015945A KR 1019950034252 A KR1019950034252 A KR 1019950034252A KR 19950034252 A KR19950034252 A KR 19950034252A KR 960015945 A KR960015945 A KR 960015945A
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KR
South Korea
Prior art keywords
electrode
semiconductor
terminal
semiconductor device
input
Prior art date
Application number
KR1019950034252A
Other languages
English (en)
Other versions
KR100359051B1 (ko
Inventor
가즈지 야마다
아끼라 다나까
류이찌 사이또
야스또시 구리하라
다다오 구시마
다까시 하라마끼
요시히꼬 고이께
다까시 호소까와
마모루 사와하따
마사히로 고이즈미
진 오누끼
가즈히로 스즈끼
이사오 고바야시
히데오 시미즈
유따까 히가시무라
시게끼 세끼네
노부야 고이께
히데야 고꾸분
Original Assignee
가나이 쯔도무
가부시끼가이샤 히다찌 세이사꾸쇼
이께다 야스히꼬
히다찌 하라마찌 덴시고교 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP06243654A external-priority patent/JP3129113B2/ja
Priority claimed from JP6326633A external-priority patent/JPH08186193A/ja
Priority claimed from JP32664094A external-priority patent/JP3250399B2/ja
Priority claimed from JP00281895A external-priority patent/JP3222341B2/ja
Application filed by 가나이 쯔도무, 가부시끼가이샤 히다찌 세이사꾸쇼, 이께다 야스히꼬, 히다찌 하라마찌 덴시고교 가부시끼가이샤 filed Critical 가나이 쯔도무
Publication of KR960015945A publication Critical patent/KR960015945A/ko
Application granted granted Critical
Publication of KR100359051B1 publication Critical patent/KR100359051B1/ko

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
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    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/495Lead-frames or other flat leads
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    • H01L23/049Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls the container being a hollow construction and having a conductive base as a mounting as well as a lead for the semiconductor body the other leads being perpendicular to the base
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Abstract

본 발명은 신뢰성이 높은 반도체 장치를 제공하는 것을 목적으로 한다. 주면에 복수의 전극 패턴이 형성된 절연 기판의 적어도 하나의 전극 패턴상에 복수의 반도체 소자를 접합하고, 상기 반도체 소자의 전극이 상기 전극 패턴에 각각 전기적으로 접속되어, 절연 기간의 다른 면이 방열 베이스로 접합되어, 상기 방열 베이스상에 상기 반도체 소자를 외부 분위기로부더 차단하는 부제로 피복하고, 상기 절연 기판상에 전극과 상기 차단하는 부제의 밖에 설치된 전극을 전기적으로 접속한 단자를 구비한 반도체 장치에 있어서, 상기 방열 베이스 재료는 그 선팽창 계수가 반도체 소자의 선팽창 계수 이상 내지 그 계수의 3배 이내, 그 열전도가 100W/mK 이상이고, 상기 반도체 소자가 상기 절연 기판의 주면상에 적어도 하나의 전극면상에서, 다른 전극면에 의해, 적어도 2개의 영역으로 분리되어 배치된다.

Description

반도체 장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 반도체 장치의 외관도이고 (a)는 그 사시도, (b)는 그 상면도,
제2도의 (a)는 본 발명의 반도체 장치의 내부 구조도,(b)는 그 단자 상세도.

Claims (41)

  1. 주면에 복수의 전극 패턴이 형성된 절연 기판의 적어도 1개의 전극 패턴상에 복수의 반도체 소자가 접합되고, 상기 반도체 소자의 전극이 상기 전극 패턴에 각각 전기적으로 접속되고, 절연 기판의 다른 면이 방열베이스에 접합되고, 상기 방열 베이스상에 상기 반도체 소자를 외부 분위기로부터 차단하는 부제로 피복하고, 상기 절연 기판상에 전극과 상기 차단하는 부제의 외부에 설치된 전극을 전기적으로 접속한 단자를 구비한 반도체 장치에 있어서, 상기 방열 베이스 제료는 그 선팽창 계수가 반도체 소자의 선팽창 계수 이상 내지 그 계수의 3배 이내, 그 열전도도가 100W/mK 이상이고, 상기 반도체 소자가 상기 절연 기판의 주면상에 적어도 1개의 전극면상에서 다른 전극면에 의해 적어도 2개의 영역으로 분리되어 배치된 것을 특징으로 하는 반도체 장치.
  2. 제1항에 있어서, 상기 차단하는 부제내에서 상기 복수의 반도체 소자, 절연기판의 주면, 및 방렬 베이스 상부가 겔상의 물질로 코팅되며, 그 겔상 물질의 표면은 실질적으로 공간으로 이루어진 것을 특징으로 하는 반도체 장치.
  3. 제1항에 있어서, 상기 전극 단자가 접속되는 절연 기판상에 전극 패턴부와 상기 절연 기판 사이에 공간이 설치되는 한편, 그 공간의 상기 절연 기판에의 투영면적으로 포함하도록 절연 기판측에 금속 패턴이 형성되며, 상기 전극 패턴과 동전위로 이루어진 것을 특징으로 하는 반도체 장치.
  4. 제1항에 있어서, 절연 기관이 그 기판내에 그 주면에 형성된 주전류 전극 패턴과 동전위로 하고, 단부면이 노출되지 않는 적어도 1개의 내층 전극 패턴을 구비하는 것을 특징으로 하는 반도체 장치.
  5. 제1항에 있어서, 주전류 전극과 그 전극에 대응하는 절연 기판상의 전극 사이에, 선팽창 계수가 방열 베이스 재료의 선팽창 계수에 가까운 중간 부제룰 삽입한 것을 특징으로 하는 반도체 장치.
  6. 제1항에 있어서, 적어도 1개의 단자에 있어서, 상기 전극 단자가 접속되는 단자의 단부와 그 단자에 대응된 절연 기판상의 전극 패턴 단부와의 거리가, 단자를 구성하는 부제의 판 두께와 상기 전극 패턴의 판 두께의 합이 실질적으로 2배 이상인 것을 특징으로 하는 반도체 장치.
  7. 제1항에 있어서, 주전류 외부 전극 배치를 반도체 장치의 단축(端軸)방향으로 평행하게 배열한 것을 특징으로 하는 반도체 장치.
  8. 제1항에 있어서, 상기 방열 베이스에 형성된 상기 장치를 외부 냉각판에 설치하기 위한 홀에 설치를 위한 볼트의 선팽창 계수와 실질적으로 같은 재료로 이루어지는 칼라부가 설치된 것을 특징으로 하는 반도체 장치.
  9. 제1항에 있어서, 2개의 주전류 전극 단자를 겔상의 물질내에서 서로 십자로, 높이 방향으로 스페이서를 마련하여 배치하고, 겔상의 물질 내에서 외부 전극까지의 입상부를 서로 평행하게 배치한 것을 특징으로 하는 반도체 장치.
  10. 제1항에 있어서, 입력 단자에 직렬로 저항을 접속하는 보조 단자를 설치한 것을 특징으로 하는 반도체 장치.
  11. 제2항에 있어서, 상기 겔상의 물질 표면 공간의 단자를 상기 차단하는 부제와 동둥한 물질로 피복한 것을 특징으로 하는 반도체 장치.
  12. 제2항에 있어서, 상기 단자를 구성하는 부제와 다른 상기 차단하는 부제 사이를 하드 레진으로 결합한것을 특징으로 하는 반도체 장치.
  13. 제2항에 있어서, 상기 차단하는 부제와 단자를 일제 성형 또는 하드 레진 결합한 것을 특징으로 하는 반도체 장치.
  14. 주면에 복수의 전극 패턴이 형성된 절연 기판의 적어도 하나의 전극 패턴상에 복수의 반도체 소자가 접합되고, 상기 반도체 소자의 전극이 상기 전극 패턴에 각각 전기적으로 접속되고, 절연 기판의 다른 면이 방열 베이스에 접합되고, 상기 방열 베이스상에 상기 반도체 소자를 외부 분위기로부터 차단하는 부제로 피복하고, 상기 절연 기판상에 전극과 상기 차단하는 부제의 외부에 설치된 전극을 전기적으로 접속한 단자를 구비한 반도체 장치에 있어서, 상기 반도체 소자가 상기 절연 기판의 주면상에 적어도 1개의 전극면상에서 다른 전극면에 의해 적어도 2개의 영역으로 분리되어 배치되고, 차단하는 부제내에서 적어도 반도체 소자, 절연기판의 주면, 방열 베이스 표면이 겔상의 물질로 코팅되고, 그 겔상의 물질 적은 실질적으로 공간으로 이루어진 것을 특징으로 하는 반도체 장치.
  15. 제14항에 있어서, 상기 전극 단자가 접속되는 절연 기판상에 전극 패턴부와 상기 절연 기판 사이에 공간이 마련되는 한편, 그 공간의 상기 절연 기판에의 투영면적으로 포함하도록 절연 기판측에 금속 패턴이 형성되고, 상기 전극 패턴과 동전위로 이루어진 것을 특징으로 하는 반도체 장치.
  16. 제14항에 있어서, 절연 기판이 그 기판내에 그 주면에 형성된 주전류 전극 패턴과 동전위로 하고, 단부면이 노출되지 않는 적어도 1개의 내층 전극 패턴을 구비한 것을 특징으로 하는 반도체 장치.
  17. 제14항에 있어서, 적어도 1개의 단자에 있어서, 상기 전극 단자가 접속되는 단자의 단부와 그 단자에 대응된 절연 기판상의 전극 패턴 단부와의 거리가 단자를 구성하는 부제의 단 두께와 상기 전극 패턴의 단 두께의 합이 실질적으로 2배 이상인 것을 특징으로 하는 반도체 장치.
  18. 제14에 있어서, 주전류 외부 전극 배치를 반도체 장치의 단축 방향으로 평행하게 배열한 것 특징으로 하는 반도체 장치.
  19. 제l4항에 있어서, 2개의 주전류 전극 단자를 겔상의 물질내에서 서로 십자로, 높이 방향으로 스페이스를 마련하여 배치하고, 겔상의 물질 내에서 외부 전극까지의 입상부를 서로 평행하게 배치한 반도체 장치.
  20. 제14항에 있어서, 입력 단자에 직렬로 저항을 접속하는 보조 단자를 설치한 것을 특징으로 하는반도체 장치.
  21. 제14항에 있어서, 상기 겔상의 물질 표면 공간의 단자를 상기 차단하는 부제와 동등한 물질로 피복한 것을 특징으로 하는 반도체 장치.
  22. 제14항에 있어서, 단자를 구성하는 부제와 다른 상기 차단하는 부제 사이를 하드 레진으로 결합한 것을 특징으로 하는 반도체 장치.
  23. 제14항에 있어서, 상기 차단하는 부제와 단자를 일제 성형 또는 하드 레진 결합한 것을 특징으로 하는 반도체 장치.
  24. 제1항에 기제된 반도체 장치를 이용하는 것을 특징으로 하는 전력용 인버터 장치.
  25. 절연막과, 절연판의 한 표면상에 설치하는 제1도전층과, 절연판의 제l도전층에 대향하는 위치에 설치하는 제2도전층과, 제1도전층과 제2도전층을 전기적으로 접속하는 도전에를 구비하는 것을 특징으로 하는 회로기판.
  26. 제25항에 있어서, 상기 제1도전층과 상기 제2도전층과의 사이에 끼우는 유전체를 구비하는 것을 특징으로 하는 회로 기판.
  27. 제25항에 있어서, 상기 제2도전층 단부의 위치가 상기 제1도전충 단부의 위치 혹은 상기 제1도전층 단부와 상기 절연판 단부와의 사이의 위치에 존제하는 것을 특징으로 하는 회로 기판.
  28. 제25항에 있어서, 상기 제2도전층이 텅스텐의 메탈라이즈층, 몰리브덴과 망간을 포함하는 메탈라이즈층, 텅스텐의 메탈라이즈층에 도금을 실시한 층, 몰리브덴과 망간을 포함하는 메탈라이즈층 중 어느 하나를 포함하는 것을 특징으로 하는 회로 기판.
  29. 절연판과, 절연판의 한 표면상에 설치하는 제1도전층과, 절연판의 제1도전층으로부터 격리하여 설치하는 제2도전층과, 제1도전층과 제2도전층을 전기적으로 접속하는 도전체를 구비하는 것을 특징으로 하는 회로기판.
  30. 절연판과, 절연판의 표면상에 위치하는 도전체층과, 절연판과 도전체층과의 사이의 공간부에 설치되는 유전제층을 구비하고, 유전제층의 비유전율 & 절연판의 비유전율εb, 공간부의 두께 L & 및 절연판의 두께 Lb의 사이에, ε.≥다×(L↙Lb)라는 관계를 갖는 것을 특징으로 하는 회로 기판.
  31. 동종의 반도체 소자가 복수 탑제되어 있는 반도체 모듈에 있어서, 절연제로 형성된 기판과, 상기 절연기판상에 배치되는 복수의 상기 반도체 소자와, 외부 기기와 전기적으로 접속되는 외부절연 기판상에 형성되고, 상기 외부 접속 단자가 접합됨과 동시에 복수의 상기 반도체 소자의 전극과 전기적으로 병렬 접속되고, 상기 외부 접속 단자로부터 복수의 상기 반도체 소자의 전극까지의 전류 경로로 이루어지는 도체 패턴을 구비하고, 상기 도체 패턴은 상기 절연 기판의 특정한 가상선을 중심으로 하여 대상으로 형성되어 있음과 동시에, 상기 가상선상 또는 상기 가상선을 중심으로 하여 대상인 복수의 위치가 상기 외부 접속 단자의 접합 영역으로 이루어지고, 복수의 상기 반도체 소자 중, 각각의 전극으로부터 상기 접합 영역까지의 거리(하나의 반도체 소자에 복수이 전극이 있는 경우 또는 일정한 넓이를 갖는 전극이 있는 경우에는 상기 접합 영역까지의 평균 거리)가 다른 반도체 소자보다도 짧아지는 반도체 소자와 상기 접합 영역과의 사이가 절단되고, 이 사이를 흐르는 전류를 우회시켜 복수의 상기 반도체 소자마다의 각 전류 경로의 길이를 거의 같게하는 전류 우회부가 형성되어 있는 것을 특징으로 하는 반도체 모듈.
  32. 제31항에 있어서, 동종의 상기 반도체 소자가 3개 탑제되고, 3개의 상기 반도체 소자 중, 1개의 특정반도체 소자는 그 무게 중심이 상기 가상선상에 위치하도록 배치되고, 나머지 2개의 반도체 소자는 각각의 무게 중심이 상기 가상선을 중심으로 하여 대칭을 이루고 또한 상기 특정 반도체 소자의 무게 중심을 정점을하는 이둥변 삼각형의 저각(底角)의 각에 위치하도록 배치되어 있는 것을 특징으로 하는 반도체 모듈.
  33. 동종의 반도체 소자가 복수 탑제되어 있는 반도체 모듈에 있어서, 절연체로 형성된 기판과, 상기 절연기판상에 배치되는 복수의 상기 반도체 소자와, 외부 기기와 전기적으로 접속되는 외부 접속 단자와, 상기 절연 기판상에 형성되고, 상기 외부 접속 단자가 접합됨과 동시에 복수의 상기 반도체 소자의 전극과 전기적으로 병렬 접속되며, 상기 외부 접속 단자로부터 복수의 상기 반도체 소자의 전극까지의 전류 경로로 이루어지는 도체 패턴을 구비하고, 상기 외부 접속 단자는 상기 도체 패턴상에서 복수의 상기 반도체 소자마다의 각 전류 경로로 이루어지는 영역과 평행이고, 또한 대향하고, 각 전류 경로를 흐르는 전류의 방향과 역방향의 전류가 흐르는 대향부를 구비하고 있는 것을 특징으로 하는 반도체 모듈.
  34. 제33항에 있어서, 복수의 상기 반도체 소자는 상기 기판상에 직선상으로 배치되고, 상기 도체 패턴은 직선상에 배치된 복수의 상기 반도체 소자 중, 한쪽 단부의 반도체 소자로부터 다른쪽 단부의 반도체 소자까지 의 사이에서 복수의 상기 반도체 소자에 연하여 형성되고, 상기 외부 접속 단자는 상기 도체 패턴의 상기 한쪽의 반도체 소자측 부분에 접합되고, 상기 대향부가 복수의 상기 반도체 소자가 나란한 방향에서, 상기 한쪽 반도체 소자의 위치에 해당하는 위치로부터 상기 다른쪽 단부의 반도체 소자의 위치에 해당하는 위치까지 신장되어 있는 것을 특징으로 하는 반도체 모듈.
  35. 제31항에 있어서, 복수의 상기 반도체 소자는 상기 전극으로서, 각각에 전류가 유입되는 입력 전극과 전류가 유출되는 출력 전극을 구비하고, 상기 외부 접속 단자로서 외부 기기로부터 전류가 유입되는 입력측 접속 단자와, 외부 기기에 전류가 유출되는 출력측 접속 단자를 구비하고. 상기 도체 패턴으로서, 상기 입력측 접속 단자가 접합됨과 동시에 복수의 상기 반도체 소자의 입력 전극과 전기적으로 병렬 접속되는 입력측 도체패턴과, 상기 출력측 접속 단자가 접합됨과 동시에 복수의 반도체 소자의 상기 출력 전극과 전기적으로 병렬로 접속되는 출력측 도체 패턴을 구비하고, 상기 입력측 접속 단자 및 상기 출력측 접속 단자를 일정한 간격으로 서로 대향하고 또한 평행한 입출력 대향부를 갖는 것을 특징으로 하는 반도체 모듈.
  36. 제35항에 있어서, 상기 입력측 접속 단자의 상기 입출력 대향부와 상기 입출력 접속 단자와 상기 입출력 대향부와의 간격은 10㎜ 이하인 것을 특징으로 하는 반도체 모듈.
  37. 제31항에 있어서, 복수의 상기 반도체 소자는 바이폴라 트랜지스터이고, 각각에 전류가 유입되는 입력 전극과, 전류가 유출되는 출력 전극과, 상기 입력 전극으로부터 상기 출력 전극으로 유출되는 전류량을 제어하기 위한 전압이 걸리는 제어 전극을 구비하고, 상기 외부 접속 단자로서, 외부 기기로부터의 전류가 유입되는 입력측 접속 단자와, 외부 기기로 전류가 유출되는 출력측 접속 단자와, 외부 기기로부터의 전압이 걸리는 제어 접속 단자를 구비하고, 상기 도체 패턴으로서, 상기 입력측 접속 단자가 접합됨과 동시에 복수의 상기 반도체 소자의 입력 전극과 전기적으로 병렬 접속되는 입력측 도체 패턴과, 상기 출력측 접속 단자가 접합됨과 동시에 복수의 반도체 소자의 상기 출력 전극과 전기적으로 병렬 접속되는 출력측 도체 패턴과, 상기 제어 접속 단자가 접합됨과 동시에 복수의 상기 반도체 소자의 상기 제어 전극과 전기적으로 병렬 접속되는 제어 도체 패턴을 구비하고, 상기 제어 접속 단자는 상기 입력측 접속 단자 및 상기 출력측 접속 단자와 교차하지 않고 또한, 상기 입력측 접속 단자와 상기 출력측 접속 단자와의 사이의 거리보다도 양 접속 단자까지의 거리가 커지게 되도록 형성되어 있음과 동시에 배치되어 있는 것을 특징으로 하는 반도체 모듈.
  38. 제37항에 있어서, 전류가 유입되는 입력 전극과 전류가 유출되는 출력 전극을 갖는 다이오드 소자를 구비하고, 상기 다이오드 소자의 입력 전극은 상기 입력을 도체 패턴과 전기적으로 접속되고, 상기 다이오드 소자의 출력 전극은 상기 출력측 도체 패턴과 전기적으로 접속되고, 상기 입력측 도체 패턴상의 상기 입력측 접속 단자의 접합 영역은 상기 접합 영역으로부터 상기 바이폴라 트랜지스터의 상기 입력 전극까지의 전류 경로 길이보다 상기 접합 영역으로부더 상기 다이오드 소자의 입력 전극까지의 전류류 경로 길이의 쪽이 짧아지는 위치에 존제하는 것을 특징으로 하는 반도체 모듈.
  39. 제31항에 있어서, 상기 외부 접속 단자는 일정 방향으로 연장된 후, 그 단부로부터 상기 일정 방향과는 역방향으로 연장되는 곡절부를 구비하고 있는 것을 특징으로 하는 반도체 모듈.
  40. 제39항에 있어서, 상기 도체 패턴과 상기 반도체 소자의 전극을 접속하는 금속 와이어를 구비하고, 상기 외부 접속 단자의 상기 곡절부는 상기 금속 와이어와 상하로 중첩되지 않도록 형성되어 있는 것을 특징으로 하는 반도체 모듈.
  41. 제31항에 있어서, 상기 절연 기판의 상기 반도체 소자 및 상기 도체 패턴이 배치되는 측에 공간이 형성되도록 상기 절연 기판을 피복하는 케이싱과, 상기 케이싱의 상기 공간내에 충전되는 실리콘 겔을 구비하고, 상기 실리콘 겔은 상기 케이싱의 상기 공간내에 공기층이 형성되도록 상기 공간내에 충전되어 있는 것을 특징으로 하는 반도체 모듈.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019950034252A 1994-10-07 1995-10-06 반도체장치 KR100359051B1 (ko)

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JP06243654A JP3129113B2 (ja) 1994-10-07 1994-10-07 半導体電流制御装置
JP94-243654 1994-10-07
JP94-326640 1994-12-28
JP94-326633 1994-12-28
JP6326633A JPH08186193A (ja) 1994-12-28 1994-12-28 回路基板及びそれを用いた半導体装置
JP32664094A JP3250399B2 (ja) 1994-12-28 1994-12-28 回路基板及び半導体装置
JP00281895A JP3222341B2 (ja) 1995-01-11 1995-01-11 半導体モジュール
JP95-002818 1995-01-11

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