KR950019896A - 방사선 감응성 수지 조성물 - Google Patents

방사선 감응성 수지 조성물 Download PDF

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Publication number
KR950019896A
KR950019896A KR1019940032525A KR19940032525A KR950019896A KR 950019896 A KR950019896 A KR 950019896A KR 1019940032525 A KR1019940032525 A KR 1019940032525A KR 19940032525 A KR19940032525 A KR 19940032525A KR 950019896 A KR950019896 A KR 950019896A
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South Korea
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polymer
resin composition
radiation
sensitive resin
radiation sensitive
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KR1019940032525A
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English (en)
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KR100365461B1 (ko
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미끼오 야마찌까
에이이찌 고바야시
도시유끼 오오다
아끼라 쓰지
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마쯔모또 에이이찌
니혼 고오세이 고무 가부시끼가이샤
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Application filed by 마쯔모또 에이이찌, 니혼 고오세이 고무 가부시끼가이샤 filed Critical 마쯔모또 에이이찌
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/11—Vinyl alcohol polymer or derivative
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

본 발명은 산의 존재하에 알칼리 가용성이 되는 중합체 및 방사선의 조사에 의해 산을 발생하는 방사선 감응선 산 발생제를 함유하는 방사선 감응선 수지 조성물에 있어서, 중합체가 하기 일반식(Ⅰ)및 일반식(2)로 표시되는 2종의 반복 단위와 방사선 조사후의 알칼리 현상액에 대한 중합체의 용해성을 감소시키는 반복 단위로 이루어지는 중합체를 함유하는 것을 특징으로 하는 방사선 감응성 수지 조성물에 관한 것이다.
상기식에서, R1및 R2는 수소 원자 또는 메틸기이다.
본 발명의 방사선 감응성 수지 조성물은 미세 패턴을 양호한 패턴 형상으로 형성하는 화학 중폭형 포지형 레지스트로서 사용될 수 있다. 이 포지형 레지스트는 체적 수축이나 박리 및 접착 불량이 없이, 드라이에칭 내성이 우수하고, 더욱 각종 방사선에 유효하게 감응하여 석판 인쇄 가공 안전성이 우수할뿐 아니라, 특히 미세 패턴의 형성에 있어서 상부로 가늘어지는 현상이 없는 양호한 형상을 제공하는 잇점을 갖는다.

Description

방사선 감응성 수지 조성물
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (1)

  1. 산의 존재하에 알칼리 가용성이 되는 중합체(a)및 방사선의 조사에 의해 산을 발생하는 방사선 감응선 산 발생제(b)를 함유하는 방사선 감응성 수지조성물에 있어서, 중합체(a)가 하기 일반식(1)및 일반식(2)로 표시되는 2종의 반복 단위와 방사선 조사후의 알칼리 현상액에 대한 중합체의 용해성을 감소시키는 반복 단위로 이루어지는 중합체를 함유하는 것을 특징으로 하는 방사선 감응성 수지 조성물.
    상기 식에서, R1및 R2는 수소 원자 또는 메틸기이다.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940032525A 1993-12-03 1994-12-02 방사선감응성수지조성물 KR100365461B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP33949093 1993-12-03
JP93-339490 1993-12-03
JP06270332A JP3116751B2 (ja) 1993-12-03 1994-10-07 感放射線性樹脂組成物
JP94-270332 1994-10-07

Publications (2)

Publication Number Publication Date
KR950019896A true KR950019896A (ko) 1995-07-24
KR100365461B1 KR100365461B1 (ko) 2003-03-12

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US (2) US5679495A (ko)
JP (1) JP3116751B2 (ko)
KR (1) KR100365461B1 (ko)

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JP3116751B2 (ja) 2000-12-11
USRE37179E1 (en) 2001-05-15
JPH07209868A (ja) 1995-08-11
KR100365461B1 (ko) 2003-03-12
US5679495A (en) 1997-10-21

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