JP3694692B2 - レジスト用ポリマー溶液およびその製造方法 - Google Patents
レジスト用ポリマー溶液およびその製造方法 Download PDFInfo
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- JP3694692B2 JP3694692B2 JP2003413627A JP2003413627A JP3694692B2 JP 3694692 B2 JP3694692 B2 JP 3694692B2 JP 2003413627 A JP2003413627 A JP 2003413627A JP 2003413627 A JP2003413627 A JP 2003413627A JP 3694692 B2 JP3694692 B2 JP 3694692B2
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- 229920000642 polymer Polymers 0.000 title claims description 103
- 238000004519 manufacturing process Methods 0.000 title claims description 21
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- 238000009835 boiling Methods 0.000 claims description 40
- 239000012535 impurity Substances 0.000 claims description 34
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- 238000000034 method Methods 0.000 claims description 27
- 239000002253 acid Substances 0.000 claims description 25
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 22
- 239000000203 mixture Substances 0.000 claims description 19
- 239000011248 coating agent Substances 0.000 claims description 16
- 238000000576 coating method Methods 0.000 claims description 16
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 12
- 239000007787 solid Substances 0.000 claims description 11
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 10
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 claims description 8
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 5
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- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 239000003377 acid catalyst Substances 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- FYGUSUBEMUKACF-UHFFFAOYSA-N bicyclo[2.2.1]hept-2-ene-5-carboxylic acid Chemical compound C1C2C(C(=O)O)CC1C=C2 FYGUSUBEMUKACF-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 2
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 2
- 235000021463 dry cake Nutrition 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
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- 238000010528 free radical solution polymerization reaction Methods 0.000 description 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 2
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- 125000002768 hydroxyalkyl group Chemical group 0.000 description 2
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- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
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- XBFJAVXCNXDMBH-UHFFFAOYSA-N tetracyclo[6.2.1.1(3,6).0(2,7)]dodec-4-ene Chemical group C1C(C23)C=CC1C3C1CC2CC1 XBFJAVXCNXDMBH-UHFFFAOYSA-N 0.000 description 2
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 2
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- DCTVCFJTKSQXED-UHFFFAOYSA-N (2-ethyl-2-adamantyl) 2-methylprop-2-enoate Chemical compound C1C(C2)CC3CC1C(CC)(OC(=O)C(C)=C)C2C3 DCTVCFJTKSQXED-UHFFFAOYSA-N 0.000 description 1
- OOIBFPKQHULHSQ-UHFFFAOYSA-N (3-hydroxy-1-adamantyl) 2-methylprop-2-enoate Chemical compound C1C(C2)CC3CC2(O)CC1(OC(=O)C(=C)C)C3 OOIBFPKQHULHSQ-UHFFFAOYSA-N 0.000 description 1
- PFJYHIAMWIVDMI-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoro-2-(4-methyl-2-bicyclo[2.2.1]hept-5-enyl)propan-2-ol Chemical compound C1C2C=CC1(C)CC2C(O)(C(F)(F)F)C(F)(F)F PFJYHIAMWIVDMI-UHFFFAOYSA-N 0.000 description 1
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- 239000002184 metal Substances 0.000 description 1
- JESXATFQYMPTNL-UHFFFAOYSA-N mono-hydroxyphenyl-ethylene Natural products OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- UMRZSTCPUPJPOJ-KNVOCYPGSA-N norbornane Chemical group C1C[C@H]2CC[C@@H]1C2 UMRZSTCPUPJPOJ-KNVOCYPGSA-N 0.000 description 1
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- 125000003518 norbornenyl group Chemical group C12(C=CC(CC1)C2)* 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- WYKYCHHWIJXDAO-UHFFFAOYSA-N tert-butyl 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOC(C)(C)C WYKYCHHWIJXDAO-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000005931 tert-butyloxycarbonyl group Chemical group [H]C([H])([H])C(OC(*)=O)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- ZESXUEKAXSBANL-UHFFFAOYSA-N trifluoromethyl prop-2-enoate Chemical compound FC(F)(F)OC(=O)C=C ZESXUEKAXSBANL-UHFFFAOYSA-N 0.000 description 1
- DGVVWUTYPXICAM-UHFFFAOYSA-N β‐Mercaptoethanol Chemical compound OCCS DGVVWUTYPXICAM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
Description
(1)レジスト用ポリマーを含有する固形物を、少なくとも1種以上の溶媒(a)及び
/又は溶媒(b)
(a)塗膜形成用溶媒
(b)常圧における沸点が、溶媒(a)の沸点以下である溶媒
を含む溶媒に再溶解させる再溶解工程
(2)必要に応じて溶媒(a)を加えながら、上記工程(1)で得られた再溶解液から
、溶媒(b)及び/又は過剰量の溶媒(a)を減圧下で留去する不純物除去工程
を含むレジスト用ポリマー溶液の製造方法を提供するものである。
(1)レジスト用ポリマーを含有する固形物を、少なくとも1種以上の溶媒(a)及び
/又は溶媒(b)
(a)塗膜形成用溶媒
(b)常圧における沸点が、溶媒(a)の沸点以下である溶媒
を含む溶媒に再溶解させる再溶解工程
(2)必要に応じて溶媒(a)を加えながら、上記工程(1)で得られた再溶解液から
、溶媒(b)及び/又は過剰量の溶媒(a)を減圧下で留去する不純物除去工程
を含む工程により、混入した溶媒や未反応モノマー等の低沸点不純物をさらに取り除き、最終的にこれら不純物をレジスト用ポリマーに対し1質量%以下とした溶液として得ることが可能になる。
窒素雰囲気に保ったモノマー溶液調製槽に、メチルエチルケトン(以下「MEK」と略記する)6.80kg、5−アクリロイルオキシ−2,6−ノルボルナンカルボラクトン(以下「NLA」と略記する)2.91g及び2−エチル−2−アダマンチルメタクリレート(以下「EAM」と略記する)3.47kgを仕込んで溶解し、モノマー溶液を調製した。また、窒素置換した重合開始剤溶液調製槽に、MEK1.00kg及びアゾビスイソブチロニトリル(以下「AIBN」と略記する)0.11kgを仕込んで溶解し、重合開始剤溶液を調製した。
窒素雰囲気に保ったモノマー溶液調製槽に、MEK9.00kg、5−メタクリロイルオキシ−2,6−ノルボルナンカルボラクトン(以下「NLM」と略記する)1.85kg、1−エチルシクロペンチルメタクリレート(以下「ECpM」と略記する)1.40kg及び3−ヒドロキシ−1−アダマンチルメタクリレート(以下「HAM」と略記する)1.33kgを仕込んで溶解し、モノマー溶液を調製した。また、窒素置換した重合開始剤溶液調製槽に、MAKを0.80kg、AIBNを0.15kg仕込んで溶解し、重合開始剤溶液を調製した。
窒素雰囲気に保ったモノマー溶液調製槽にp−ヒドロキシスチレン(以下「PHS」と略記する)23%、メタノール23%、水10%を含むp−エチルフェノール溶液19.30kg、EAM2.00kg及びAIBNを0.40kgを仕込んで溶解し、モノマー溶液を調製した。このモノマー溶液5.00kgを重合槽に移送し、撹拌しながら80℃に昇温した後、残りのモノマー溶液を2時間かけて80℃に保った重合槽内に供給して重合させた。供給終了後、重合温度を80℃に保ったまま2時間熟成させ、室温まで冷却した。
実施例1と同様に重合、精製工程を実施して得られたウエットケーキをMEKに再溶解することなく取り出して、溶剤置換工程の代わりに棚段式真空乾燥機にて、最高真空度0.7kPa、内温75℃で72時間かけて乾燥し、得られたドライケーキをPGMEA15kgに溶解してポリマー25%を含むPGEMA溶液20kgを調製した。結果を後記表1および表2に示した。
実施例2と同様に重合、精製工程を実施して得られたウエットケーキをMEKに再溶解することなく取り出して、溶剤置換工程の代わりに棚段式真空乾燥機にて、最高真空度0.7kPa、内温75℃で72時間かけて乾燥し、得られたドライケーキをPGMEA11kgに溶解してポリマー25%を含むPGEMA溶液15kgを調製した。結果を後記表1および表2に示した。
実施例3と同様に重合、精製工程を実施して得られたウエットケーキをアセトンに再溶解することなく取り出して、溶剤置換工程の代わりに棚段式真空乾燥機にて、最高真空度0.7kPa、内温75℃で72時間かけて乾燥し、得られたドライケーキをEL11.6kgに溶解してポリマー25%を含むEL溶液17kgを調製した。結果を後記表1および表2に示した。
また、低沸点不純物の量は、レジスト用ポリマーに対する含有量(質量%)を示す。
以 上
Claims (6)
- 少なくとも酸の作用で分解してアルカリ可溶性になる繰り返し単位と、極性基を含有する繰り返し単位とを含むレジスト用ポリマーを、少なくとも1種以上の塗膜形成用溶媒に溶解したレジスト用ポリマー溶液の製造方法において、次の工程(1)及び工程(2)
(1)レジスト用ポリマーを含有する固形物を、少なくとも1種以上の溶媒(a)及び
/又は溶媒(b)
(a)塗膜形成用溶媒
(b)常圧における沸点が、溶媒(a)の沸点以下である溶媒
を含む溶媒に再溶解させる再溶解工程
(2)必要に応じて溶媒(a)を加えながら、上記工程(1)で得られた再溶解液から
、溶媒(b)及び/又は過剰量の溶媒(a)を70℃以下の温度に制御した減圧下で留去する不純物除去工程を含むことを特徴とする、当該溶液中の常圧における沸点が該塗膜形成用溶媒の沸点以下である不純物の量が、レジスト用ポリマーに対して1質量%以下であることを特徴とするレジスト用ポリマー溶液の製造方法。 - 工程(1)において、再溶解に用いる溶媒が、少なくとも1種以上の溶媒(b)を含む溶媒である請求項1記載のレジスト用ポリマー溶液の製造方法。
- 溶媒(b)のレジスト用ポリマーを溶解させる速度が、溶媒(a)のレジスト用ポリマーを溶解させる速度より速い請求項1または請求項2記載のレジスト用ポリマー溶液の製造方法。
- 溶媒(b)が、アセトン、メチルエチルケトン、テトラヒドロフラン、エチレングリコールジメチルエーテル又は酢酸エチルである請求項1ないし請求項3の何れかの請求項記載のレジスト用ポリマー溶液の製造方法。
- 請求項1ないし請求項4の何れかの請求項記載の製造方法で製造されたレジスト用ポリマー溶液。
- 請求項5記載のレジスト用ポリマー溶液を含むレジスト組成物。
Priority Applications (4)
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---|---|---|---|
JP2003413627A JP3694692B2 (ja) | 2003-12-11 | 2003-12-11 | レジスト用ポリマー溶液およびその製造方法 |
US10/582,513 US8119321B2 (en) | 2003-12-11 | 2004-12-10 | Resist polymer solution and process for producing the same |
KR1020067013865A KR101020609B1 (ko) | 2003-12-11 | 2004-12-10 | 레지스트용 중합체 용액 및 그 제조방법 |
PCT/JP2004/018494 WO2005057288A1 (ja) | 2003-12-11 | 2004-12-10 | レジスト用ポリマー溶液およびその製造方法 |
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JP2003413627A JP3694692B2 (ja) | 2003-12-11 | 2003-12-11 | レジスト用ポリマー溶液およびその製造方法 |
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JP3694692B2 true JP3694692B2 (ja) | 2005-09-14 |
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US (1) | US8119321B2 (ja) |
JP (1) | JP3694692B2 (ja) |
KR (1) | KR101020609B1 (ja) |
WO (1) | WO2005057288A1 (ja) |
Cited By (1)
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JP2010202698A (ja) * | 2009-02-27 | 2010-09-16 | Maruzen Petrochem Co Ltd | 半導体リソグラフィー用共重合体の製造方法 |
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-
2003
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-
2004
- 2004-12-10 KR KR1020067013865A patent/KR101020609B1/ko active IP Right Grant
- 2004-12-10 WO PCT/JP2004/018494 patent/WO2005057288A1/ja active Application Filing
- 2004-12-10 US US10/582,513 patent/US8119321B2/en active Active
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---|---|---|---|---|
JP2010202698A (ja) * | 2009-02-27 | 2010-09-16 | Maruzen Petrochem Co Ltd | 半導体リソグラフィー用共重合体の製造方法 |
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KR20060107846A (ko) | 2006-10-16 |
KR101020609B1 (ko) | 2011-03-09 |
US8119321B2 (en) | 2012-02-21 |
JP2005173252A (ja) | 2005-06-30 |
US20070111137A1 (en) | 2007-05-17 |
WO2005057288A1 (ja) | 2005-06-23 |
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