KR930702238A - 엑시머레이저용 합성석영유리 광학부재 및 그의 제조방법 - Google Patents
엑시머레이저용 합성석영유리 광학부재 및 그의 제조방법Info
- Publication number
- KR930702238A KR930702238A KR1019930700573A KR930700573A KR930702238A KR 930702238 A KR930702238 A KR 930702238A KR 1019930700573 A KR1019930700573 A KR 1019930700573A KR 930700573 A KR930700573 A KR 930700573A KR 930702238 A KR930702238 A KR 930702238A
- Authority
- KR
- South Korea
- Prior art keywords
- manufacturing
- optical member
- quartz glass
- excimer laser
- synthetic quartz
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
- C03B2201/075—Hydroxyl ion (OH)
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2203/00—Fibre product details, e.g. structure, shape
- C03B2203/10—Internal structure or shape details
- C03B2203/22—Radial profile of refractive index, composition or softening point
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/32—Non-halide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/08—Doped silica-based glasses containing boron or halide
- C03C2201/11—Doped silica-based glasses containing boron or halide containing chlorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/40—Gas-phase processes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S501/00—Compositions: ceramic
- Y10S501/90—Optical glass, e.g. silent on refractive index and/or ABBE number
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S65/00—Glass manufacturing
- Y10S65/08—Quartz
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Public Health (AREA)
- General Physics & Mathematics (AREA)
- Epidemiology (AREA)
- Environmental & Geological Engineering (AREA)
- Thermal Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Glass Compositions (AREA)
- Glass Melting And Manufacturing (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP182858/1991 | 1991-06-29 | ||
JP3182858A JP2835540B2 (ja) | 1991-06-29 | 1991-06-29 | エキシマレーザー用石英ガラス部材の製造方法 |
JP299997/1991 | 1991-08-31 | ||
JP3299997A JPH0742133B2 (ja) | 1991-08-31 | 1991-08-31 | 紫外線レーザー用合成石英ガラス光学部材 |
PCT/JP1992/000821 WO1993000307A1 (en) | 1991-06-29 | 1992-06-29 | Synthetic quartz glass optical member for excimer laser and production thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
KR930702238A true KR930702238A (ko) | 1993-09-08 |
KR0165695B1 KR0165695B1 (ko) | 1998-12-15 |
Family
ID=26501495
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019930700573A KR0165695B1 (ko) | 1991-06-29 | 1992-06-29 | 엑시머레이저용 합성석영유리 광학부재 및 그의 제조방법 |
Country Status (5)
Country | Link |
---|---|
US (2) | US5364433A (ko) |
EP (1) | EP0546196B1 (ko) |
KR (1) | KR0165695B1 (ko) |
DE (1) | DE69219445T2 (ko) |
WO (1) | WO1993000307A1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100811391B1 (ko) * | 2004-03-25 | 2008-03-07 | 우시오덴키 가부시키가이샤 | 엑시머 램프 |
Families Citing this family (88)
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WO1993000307A1 (en) * | 1991-06-29 | 1993-01-07 | Shin-Etsu Quartz Products Company Limited | Synthetic quartz glass optical member for excimer laser and production thereof |
JP2888079B2 (ja) * | 1993-02-04 | 1999-05-10 | 信越半導体株式会社 | シリコン単結晶引上げ用ルツボ |
US5702495A (en) * | 1993-02-10 | 1997-12-30 | Nikon Corporation | Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production |
JP3369730B2 (ja) * | 1994-06-16 | 2003-01-20 | 株式会社ニコン | 光リソグラフィー用光学部材の評価方法 |
US5679125A (en) | 1994-07-07 | 1997-10-21 | Nikon Corporation | Method for producing silica glass for use with light in a vacuum ultraviolet wavelength range |
US6087283A (en) * | 1995-01-06 | 2000-07-11 | Nikon Corporation | Silica glass for photolithography |
US5707908A (en) * | 1995-01-06 | 1998-01-13 | Nikon Corporation | Silica glass |
US6518210B1 (en) * | 1995-01-06 | 2003-02-11 | Nikon Corporation | Exposure apparatus including silica glass and method for producing silica glass |
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DE69635662T2 (de) * | 1995-09-12 | 2006-08-10 | Corning Inc. | Verfahren und Ofen zur Herstellung von Quarzglas mit reduziertem Gehalt an Schlieren |
EP1524246A1 (en) * | 1995-09-12 | 2005-04-20 | Corning Incorporated | Boule oscillation patterns for producing fused silica glass |
US5698484A (en) * | 1995-09-12 | 1997-12-16 | Corning Incorporated | Method and containment vessel for producing fused silica glass and the fused silica blank produced |
JP3205767B2 (ja) * | 1995-09-13 | 2001-09-04 | キヤノン株式会社 | 透過型液晶表示装置 |
JP3820486B2 (ja) * | 1995-09-18 | 2006-09-13 | Hoya株式会社 | ガラス光学素子の製造方法 |
JP3472024B2 (ja) * | 1996-02-26 | 2003-12-02 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
JP3203178B2 (ja) * | 1996-02-27 | 2001-08-27 | 日立電線株式会社 | 光導波路、光モジュール及び光システム |
US5994619A (en) * | 1996-04-01 | 1999-11-30 | University Of Massachusetts, A Public Institution Of Higher Education Of The Commonwealth Of Massachusetts, As Represented By Its Amherst Campus | Production of chimeric bovine or porcine animals using cultured inner cell mass cells |
US6291377B1 (en) * | 1997-08-21 | 2001-09-18 | Nikon Corporation | Silica glass and its manufacturing method |
JP2000517284A (ja) * | 1996-08-29 | 2000-12-26 | コーニング インコーポレイテッド | 石英ガラスのレーザ誘起圧密決定方法 |
US6309991B1 (en) * | 1996-08-29 | 2001-10-30 | Corning Incorporated | Silica with low compaction under high energy irradiation |
US6333283B1 (en) | 1997-05-16 | 2001-12-25 | Sumitomo Electric Industries, Ltd. | Silica glass article and manufacturing process therefor |
US6143676A (en) * | 1997-05-20 | 2000-11-07 | Heraeus Quarzglas Gmbh | Synthetic silica glass used with uv-rays and method producing the same |
JPH10330124A (ja) | 1997-05-30 | 1998-12-15 | Toshiba Corp | 石英ガラスおよびその製造方法、ならびにその石英ガラスを用いた熱処理装置および熱処理方法 |
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KR100554091B1 (ko) | 1997-12-08 | 2006-05-16 | 가부시키가이샤 니콘 | 엑시머레이저내성을향상시킨석영글래스의제조방법및석영글래스부재 |
US6376401B1 (en) * | 1998-09-07 | 2002-04-23 | Tosoh Corporation | Ultraviolet ray-transparent optical glass material and method of producing same |
US6499317B1 (en) | 1998-10-28 | 2002-12-31 | Asahi Glass Company, Limited | Synthetic quartz glass and method for production thereof |
DE19850736C2 (de) * | 1998-11-04 | 2003-04-17 | Heraeus Tenevo Ag | Kernglas für eine Vorform für eine optische Faser, unter Verwendung des Kernglases hergestellte Vorform, sowie Verfahren zur Herstellung des Kernglases einer Vorform für eine optische Faser |
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US6265115B1 (en) | 1999-03-15 | 2001-07-24 | Corning Incorporated | Projection lithography photomask blanks, preforms and methods of making |
US6242136B1 (en) | 1999-02-12 | 2001-06-05 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
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US6319634B1 (en) * | 1999-03-12 | 2001-11-20 | Corning Incorporated | Projection lithography photomasks and methods of making |
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US6682859B2 (en) * | 1999-02-12 | 2004-01-27 | Corning Incorporated | Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass |
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WO2000064826A1 (fr) * | 1999-04-21 | 2000-11-02 | Nikon Corporation | Element en verre de silice, procede de production et aligneur de projection l'utilisant |
KR100667636B1 (ko) * | 1999-06-10 | 2007-01-12 | 아사히 가라스 가부시키가이샤 | 합성석영유리와 그의 제조방법 |
JP2001010833A (ja) * | 1999-06-21 | 2001-01-16 | Nikon Corp | 石英ガラス部材 |
ATE283503T1 (de) * | 1999-09-13 | 2004-12-15 | Asahi Glass Co Ltd | Membranabdeckung |
EP1101741B1 (de) * | 1999-11-15 | 2005-07-13 | Heraeus Quarzglas GmbH & Co. KG | Quarzglaskörper für ein optisches Bauteil und Verfahren zu seiner Herstellung |
JP2001270731A (ja) * | 2000-03-28 | 2001-10-02 | Nikon Corp | 合成石英ガラス部材及びこれを用いた光リソグラフィー装置 |
KR100418426B1 (ko) * | 2000-05-01 | 2004-02-11 | 신에쯔 세끼에이 가부시키가이샤 | 석영유리속에 함유되는 미량오에이치기농도의 측정방법 |
US6378337B1 (en) | 2000-09-15 | 2002-04-30 | Corning Incorporated | Method for producing bulk fused silica |
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US7797966B2 (en) | 2000-12-29 | 2010-09-21 | Single Crystal Technologies, Inc. | Hot substrate deposition of fused silica |
EP1288169A1 (de) * | 2001-08-30 | 2003-03-05 | Schott Glas | Verfahren zur Wasserstoffbeladung von Quarzglaskörpern zur Verbesserung der Brechzahlhomogenität und der Laserfestigkeit bei gleichzeitiger Einhaltung einer vorgegebenen Spannungsdoppelbrechung und danach hergestellte Quarzglaskörper |
JP2005504699A (ja) * | 2001-09-27 | 2005-02-17 | コーニング インコーポレイテッド | 内部透過率が高く、複屈折が低い石英ガラス |
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US7534733B2 (en) * | 2004-02-23 | 2009-05-19 | Corning Incorporated | Synthetic silica glass optical material having high resistance to laser induced damage |
DE102004009577B3 (de) | 2004-02-25 | 2005-03-03 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung eines optischen Bauteils |
DE102004017031B4 (de) * | 2004-04-02 | 2008-10-23 | Heraeus Quarzglas Gmbh & Co. Kg | Optisches Bauteil aus Quarzglas, Verfahren zur Herstellung des Bauteils und Verwendung desselben |
WO2005105685A1 (en) * | 2004-04-28 | 2005-11-10 | Asahi Glass Company, Limited | Optical member made of synthetic quartz glass, and process for its production |
DE102004024808B4 (de) * | 2004-05-17 | 2006-11-09 | Heraeus Quarzglas Gmbh & Co. Kg | Quarzglasrohling für ein optisches Bauteil zur Übertragung extrem kurzwelliger ultravioletter Strahlung |
US7589039B2 (en) * | 2004-12-29 | 2009-09-15 | Corning Incorporated | Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same |
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-
1992
- 1992-06-29 WO PCT/JP1992/000821 patent/WO1993000307A1/ja active IP Right Grant
- 1992-06-29 EP EP92913798A patent/EP0546196B1/en not_active Expired - Lifetime
- 1992-06-29 DE DE69219445T patent/DE69219445T2/de not_active Expired - Fee Related
- 1992-06-29 KR KR1019930700573A patent/KR0165695B1/ko not_active IP Right Cessation
- 1992-06-29 US US07/977,397 patent/US5364433A/en not_active Expired - Lifetime
-
1994
- 1994-08-05 US US08/286,538 patent/US5523266A/en not_active Expired - Lifetime
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Publication number | Priority date | Publication date | Assignee | Title |
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KR100811391B1 (ko) * | 2004-03-25 | 2008-03-07 | 우시오덴키 가부시키가이샤 | 엑시머 램프 |
Also Published As
Publication number | Publication date |
---|---|
KR0165695B1 (ko) | 1998-12-15 |
EP0546196B1 (en) | 1997-05-02 |
US5523266A (en) | 1996-06-04 |
DE69219445T2 (de) | 1997-08-07 |
US5364433A (en) | 1994-11-15 |
DE69219445D1 (de) | 1997-06-05 |
WO1993000307A1 (en) | 1993-01-07 |
EP0546196A1 (en) | 1993-06-16 |
EP0546196A4 (ko) | 1994-12-28 |
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