ATE283503T1 - Membranabdeckung - Google Patents

Membranabdeckung

Info

Publication number
ATE283503T1
ATE283503T1 AT00961001T AT00961001T ATE283503T1 AT E283503 T1 ATE283503 T1 AT E283503T1 AT 00961001 T AT00961001 T AT 00961001T AT 00961001 T AT00961001 T AT 00961001T AT E283503 T1 ATE283503 T1 AT E283503T1
Authority
AT
Austria
Prior art keywords
membrane cover
ppm
group concentration
wavelength
image
Prior art date
Application number
AT00961001T
Other languages
English (en)
Inventor
Yoshiaki Ikuta
Shinya Kikugawa
Hitoshi Mito Mishiro
Oaza Tabiko Yoriishinden
Hiroshi Arishima
Kaname Okada
Katsuhiro Matsumoto
Tsurumi-Ku Suehiro-Cho
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP25916199A external-priority patent/JP2001083690A/ja
Priority claimed from JP33012099A external-priority patent/JP2001147519A/ja
Priority claimed from JP2000131268A external-priority patent/JP2001312047A/ja
Priority claimed from JP2000170770A external-priority patent/JP2001350251A/ja
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Application granted granted Critical
Publication of ATE283503T1 publication Critical patent/ATE283503T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00—Severing cooled glass
    • C03B33/08—Severing cooled glass by fusing, i.e. by melting through the glass
    • C03B33/082—Severing cooled glass by fusing, i.e. by melting through the glass using a focussed radiation beam, e.g. laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C03B2201/03—Impurity concentration specified
    • C03B2201/04—Hydroxyl ion (OH)
AT00961001T 1999-09-13 2000-09-13 Membranabdeckung ATE283503T1 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP25916199A JP2001083690A (ja) 1999-09-13 1999-09-13 ペリクル
JP33012099A JP2001147519A (ja) 1999-11-19 1999-11-19 ペリクルおよびペリクル板の製造方法
JP2000131268A JP2001312047A (ja) 2000-04-28 2000-04-28 ペリクルおよびその製造方法
JP2000170770A JP2001350251A (ja) 2000-06-07 2000-06-07 ペリクル
PCT/JP2000/006286 WO2001020401A1 (fr) 1999-09-13 2000-09-13 Pellicule et son procede de fabrication

Publications (1)

Publication Number Publication Date
ATE283503T1 true ATE283503T1 (de) 2004-12-15

Family

ID=27478503

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00961001T ATE283503T1 (de) 1999-09-13 2000-09-13 Membranabdeckung

Country Status (7)

Country Link
US (1) US6475575B1 (de)
EP (1) EP1164431B1 (de)
KR (1) KR100696152B1 (de)
AT (1) ATE283503T1 (de)
DE (1) DE60016185T2 (de)
TW (1) TW507267B (de)
WO (1) WO2001020401A1 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8402786B2 (en) * 1998-01-30 2013-03-26 Asahi Glass Company, Limited Synthetic silica glass optical component and process for its production
WO2000024685A1 (en) * 1998-10-28 2000-05-04 Asahi Glass Company Ltd. Synthetic quartz glass and method for production thereof
US6978437B1 (en) * 2000-10-10 2005-12-20 Toppan Photomasks, Inc. Photomask for eliminating antenna effects in an integrated circuit and integrated circuit manufacture with same
US6593035B1 (en) 2001-01-26 2003-07-15 Advanced Micro Devices, Inc. Pellicle for use in small wavelength lithography and a method for making such a pellicle using polymer films
US6544693B2 (en) 2001-01-26 2003-04-08 Advanced Micro Devices, Inc. Pellicle for use in small wavelength lithography and a method for making such a pellicle
JP2003043670A (ja) * 2001-07-30 2003-02-13 Asahi Glass Co Ltd ペリクル
DE10310790A1 (de) 2003-03-12 2004-09-23 Robert Bosch Gmbh Brennstoffeinspritzventil
US7754999B2 (en) * 2003-05-13 2010-07-13 Hewlett-Packard Development Company, L.P. Laser micromachining and methods of same
US20050025959A1 (en) * 2003-07-31 2005-02-03 Bellman Robert A. Hard pellicle and fabrication thereof
US20050042524A1 (en) * 2003-08-22 2005-02-24 Bellman Robert A. Process for making hard pellicles
JP4470479B2 (ja) * 2003-12-17 2010-06-02 旭硝子株式会社 光学部材用合成石英ガラスおよびその製造方法
KR100819638B1 (ko) * 2005-07-28 2008-04-04 주식회사 하이닉스반도체 펠리클 장치 및 이를 이용한 패턴 형성 방법
US7416820B2 (en) 2007-01-31 2008-08-26 International Business Machines Corporation Pellicle film optimized for immersion lithography systems with NA>1
US8268514B2 (en) * 2009-01-26 2012-09-18 Taiwan Semiconductor Manufacturing Co., Ltd. Pellicle mounting method and apparatus
EP2508492A4 (de) * 2009-12-04 2014-07-30 Asahi Glass Co Ltd Verfahren zur herstellung eines glassubstrats auf siliciumbasis für eine prägeform und verfahren zur herstellung der prägeform
EP2757077B1 (de) 2011-09-15 2019-02-27 Nippon Electric Glass Co., Ltd. Verfahren zum schneiden von glasscheiben und nutzung einer vorrichtung zum schneiden von glasscheiben
CN107003602B (zh) 2015-02-24 2021-03-12 三井化学株式会社 防护膜组件膜、防护膜组件框体、防护膜组件及其制造方法
KR101714908B1 (ko) * 2015-10-23 2017-03-10 한양대학교 에리카산학협력단 극자외선 리소그래피용 펠리클 구조체
JP6632057B2 (ja) * 2016-01-07 2020-01-15 信越化学工業株式会社 ペリクル
JP6812714B2 (ja) * 2016-09-20 2021-01-13 日本軽金属株式会社 ペリクル用支持枠及びペリクル並びにその製造方法
KR20190038369A (ko) * 2017-09-29 2019-04-08 아사히 가세이 가부시키가이샤 펠리클

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5878151A (ja) * 1981-11-04 1983-05-11 Nec Kyushu Ltd フオトマスク
JPS636553A (ja) 1986-06-27 1988-01-12 Canon Inc レチクルの塵埃付着防止方法
US5191738A (en) * 1989-06-16 1993-03-09 Shin-Etsu Handotai Co., Ltd. Method of polishing semiconductor wafer
JPH03276154A (ja) * 1990-03-27 1991-12-06 Mitsui Petrochem Ind Ltd 高光線透過性防塵体の製造方法
DE69219445T2 (de) * 1991-06-29 1997-08-07 Shinetsu Quartz Prod Synthetisches optisches element aus quarzglas für excimer-laser und seine herstellung
US5326729A (en) * 1992-02-07 1994-07-05 Asahi Glass Company Ltd. Transparent quartz glass and process for its production
JPH05326468A (ja) * 1992-05-21 1993-12-10 Kawasaki Steel Corp ウェーハの研磨方法
KR100298167B1 (ko) * 1994-07-07 2001-10-24 오노 시게오 진공자외선파장대광선용실리카유리의제조방법,및그에의해제조된실리카유리및광학부재
JP3277719B2 (ja) * 1994-09-21 2002-04-22 住友金属工業株式会社 紫外光透過用合成石英ガラスおよびその製造方法
JP3188624B2 (ja) * 1995-12-27 2001-07-16 信越石英株式会社 遠紫外線用高純度合成シリカガラス及びその製造方法
US5876273A (en) * 1996-04-01 1999-03-02 Kabushiki Kaisha Toshiba Apparatus for polishing a wafer
US5734112A (en) 1996-08-14 1998-03-31 Micro Motion, Inc. Method and apparatus for measuring pressure in a coriolis mass flowmeter
US5820950A (en) * 1996-10-30 1998-10-13 Micro Lithography, Inc. Optical pellicle and package
US5772817A (en) * 1997-02-10 1998-06-30 Micro Lithography, Inc. Optical pellicle mounting system
US6143676A (en) * 1997-05-20 2000-11-07 Heraeus Quarzglas Gmbh Synthetic silica glass used with uv-rays and method producing the same
JP3077652B2 (ja) * 1997-11-20 2000-08-14 日本電気株式会社 ウエーファの研磨方法及びその装置
JP2862001B2 (ja) * 1998-04-03 1999-02-24 旭硝子株式会社 石英ガラス光学部材の製造方法
US6190743B1 (en) * 1998-07-06 2001-02-20 Micro Lithography, Inc. Photomask protection system

Also Published As

Publication number Publication date
EP1164431A4 (de) 2003-04-09
DE60016185T2 (de) 2006-03-02
WO2001020401A1 (fr) 2001-03-22
KR20010112215A (ko) 2001-12-20
EP1164431A1 (de) 2001-12-19
TW507267B (en) 2002-10-21
US6475575B1 (en) 2002-11-05
DE60016185D1 (de) 2004-12-30
KR100696152B1 (ko) 2007-03-20
EP1164431B1 (de) 2004-11-24

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Legal Events

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