KR930006035A - 알킬비스아실포스핀옥사이드 광개시제 및 이를 함유하는 조성물 - Google Patents
알킬비스아실포스핀옥사이드 광개시제 및 이를 함유하는 조성물 Download PDFInfo
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- KR930006035A KR930006035A KR1019920016952A KR920016952A KR930006035A KR 930006035 A KR930006035 A KR 930006035A KR 1019920016952 A KR1019920016952 A KR 1019920016952A KR 920016952 A KR920016952 A KR 920016952A KR 930006035 A KR930006035 A KR 930006035A
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- 239000000203 mixture Substances 0.000 title claims 12
- 150000001875 compounds Chemical class 0.000 claims abstract 26
- 125000000217 alkyl group Chemical group 0.000 claims abstract 9
- 125000001997 phenyl group Chemical class [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract 8
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims abstract 7
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 claims abstract 3
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims abstract 2
- 229910052736 halogen Inorganic materials 0.000 claims abstract 2
- 150000002367 halogens Chemical class 0.000 claims abstract 2
- 238000004519 manufacturing process Methods 0.000 claims 16
- 238000000576 coating method Methods 0.000 claims 6
- -1 6-substituted phenyl Chemical group 0.000 claims 5
- 229910052739 hydrogen Inorganic materials 0.000 claims 5
- 239000001257 hydrogen Substances 0.000 claims 5
- 125000003545 alkoxy group Chemical group 0.000 claims 4
- 239000011248 coating agent Substances 0.000 claims 4
- 238000000034 method Methods 0.000 claims 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 3
- 239000003973 paint Substances 0.000 claims 3
- 229920002120 photoresistant polymer Polymers 0.000 claims 3
- 238000007639 printing Methods 0.000 claims 3
- 239000000853 adhesive Substances 0.000 claims 2
- 230000001070 adhesive effect Effects 0.000 claims 2
- 229910052799 carbon Inorganic materials 0.000 claims 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 2
- 239000002131 composite material Substances 0.000 claims 2
- 150000002431 hydrogen Chemical class 0.000 claims 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 claims 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 2
- 239000013307 optical fiber Substances 0.000 claims 2
- 125000001424 substituent group Chemical group 0.000 claims 2
- 239000002966 varnish Substances 0.000 claims 2
- KLIDCXVFHGNTTM-UHFFFAOYSA-N 2,6-dimethoxyphenol Chemical group COC1=CC=CC(OC)=C1O KLIDCXVFHGNTTM-UHFFFAOYSA-N 0.000 claims 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 1
- 239000000654 additive Substances 0.000 claims 1
- 229910052801 chlorine Inorganic materials 0.000 claims 1
- 239000000460 chlorine Substances 0.000 claims 1
- 239000006185 dispersion Substances 0.000 claims 1
- 238000005538 encapsulation Methods 0.000 claims 1
- 238000005516 engineering process Methods 0.000 claims 1
- 239000000945 filler Substances 0.000 claims 1
- 239000000976 ink Substances 0.000 claims 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 150000002739 metals Chemical class 0.000 claims 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims 1
- 238000002360 preparation method Methods 0.000 claims 1
- 238000007650 screen-printing Methods 0.000 claims 1
- 239000007787 solid Substances 0.000 claims 1
- 239000002023 wood Substances 0.000 claims 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
- C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/126—Halogen compound containing
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- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Abstract
본발명은 에틸렌형, 불포화 이중결합을 함유하는 화합물을 광중합시키는데 적합한 하기 일반식(Ⅰ)의 화합물에 관한 것이다:
상기식에서, R1은 C1-C18알킬, 시클로펜틸 또는 시클로헥실이고, R2와 R3은 서로 독립적으로, 비치환되거나 할로겐, C1-C4알킬 및/또는 C1-C4알콕시에 의해 일치환 내지 사치환된 페닐이며, 단, R2와 R3이 염소-치환 페닐인 경우 R1은 데실이 아니어야 한다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (20)
- 하기 일반식(Ⅰ)의 화합물:상기식에서, R1은 C1-C18알킬, 시클로펜틸 또는 시클로헥실이고, R2와 R3은 서로 독립적으로, 비치환되거나 할로겐, C1-C4알킬 및/또는 C1-C4알콕시에서 1, 2, 3 또는 4개의 치환기를 갖는 페닐이며, 단, R2와 R3이 염소-치환 페닐인 경우 R1은 데실이 아니어야 한다.
- 제1항에 있어서, R2와 R3이 동일한 화합물.
- 제2항에 있어서, R1이 C1-C18또는 시클로헥실이고, R2와 R3이 염소, C1-C4알킬 및 C1-C4알콕시에서 1, 2, 3 또는 4개의 치환기를 갖는 페닐인 화합물.
- 제2항에 있어서, R1이 시클로펜틸, 시클로헥실이고, C1-C8알킬이고, R2와 R3이 할로겐-치환 페닐인 화합물.
- 제3항에 있어서, R1이 C4-C8알킬 또는 시클로헥실인 화합물.
- 제2항에 있어서, R2와 R3이 2, 6-또는 2, 4, 6-치환 페닐인 화합물.
- 제2항에 있어서, R2와 R3이 C1-C4알콕시 및/또는 C1-C4알킬에 의해 치환된 페닐인 화합물.
- 제7항에 있어서, R2와 R3이 C1-C4알콕시, 특히 메톡시에 의해 치환된 페닐인 화합물.
- (a) 에틸렌형 불포화 광중합성 화합물 하나 이상과, (b) 광개시제로서 제1항에 따를 일반식(Ⅰ)의 화합물 하나 이상을 포함하는 조성물.
- 제9항에 있어서, 성분 (b)외에도 다른 광개시제 및/또는 첨가제가 존재하는 조성물.
- 제9항에 있어서, 성분 (b)가 조성물의 총 고체함량을 기준으로 0.05 내지 15종량%의 양으로 존재하는 조성물.
- 제10항에 있어서, 추가의 광개시제가 일반식(Ⅱ)의 화합물 및/또는 하기 일반식(Ⅲ)의 화합물 또는 그의 혼합물인 조성물:상기식에서, R4는 수소, C1-C18알킬, C1-C18알콕시, -OCH2CH2-OR8,또는기이고, 여기서 n은 2내지 10의 값이며, G는 하기식의 라디칼이고:R5와 R6은 서로 독립적으로, 수소, C1-C16알킬, 페닐, C1-C16알콕시 또는 -O(CH2CH2O)n-C1-C16알킬이고, m은 1내지 20의 수이며, 또는 R5와 R6은, 이들이 붙어있는 탄소원자와 함께 시클로헥실 고리를 형성하고, R7은 히드록시, C1-C16알콕시 또는 -O(CH2CH2O)n-C1-C16알킬이고, R8은 수소 또는 하기식의 기이며:단, R5, R6및 R7이 모두 동시에 C1-C16알콕시 또는 -O(CH2CH2O)n-C1-C16알킬이어서는 않되며, R9, R10및 R11은 서로 독립적으로 수소 또는 메틸이다.
- 제12항에 있어서, 일반식(Ⅱ)의 R5와 R6이 서로 독립적으로, C1-C16이거나, 또는 이들이 붙어 있는 탄소원자와 함께 시클로헥실 고리를 형성하고, R7이 히드록시인 조성물.
- 제12항에 있어서, 일반식(Ⅰ)의 화합물과 일반식(Ⅱ) 및/또는 (Ⅲ)의 화합물과의 혼합물내에서 일반식(Ⅰ)의 화합물의 비율이 5 내지 95%인 조성물.
- 제12항에 있어서, 일반식(Ⅰ)의 R1이 n-부틸, 이소부틸 또는 2, 4, 4-트리메틸-1-펜틸이고, R2와 R3이 서로 동일한 것으로, 2, 6-디메톡시페닐 또는 2, 4, 6-트리메틸페닐이고, 일반식(Ⅱ)의 R5와 R6이 서로 동일한 것으로서 메틸이며, R7이 히드록시 또는 이소프로폭시인 조성물.
- 제12항에 있어서, R1이 n-부틸, 이소부틸 또는 2, 4, 4-트리메틸-1-펜틸이고, R2와 R3이 서로 동일한 것으로, 2, 6-디메톡시페닐 또는 2, 4, 6-트리메틸페닐인 일반식(Ⅰ)의 화합물과, R9및 R10이 수소이고, R11이 메틸인 일반식(Ⅲ)의 화합물 20%와 일반식(Ⅲ)의 R9및 R10및 R11이 메틸인 일반식(Ⅲ)의 화합물 80%로 된 일반식(Ⅲ) 화합물의 혼합물이 존재하는 조성물.
- 제9항 내지 제16항중 어느 하나에 따를 조성물을 200내지 60nm범위의 빛에 노출시켜서, 에틸렌형 불포화 이중결합을 함유한 화합물을 광중합시키는 방법.
- 제17항에 있어서, 도료 또는 와니스 제조, 채색 코팅 제조, 투명 또는 채색 수성 분산액 제조, 인쇄 잉크 제조, 벌크 경화 또는 입체평판법에 의한 3차원 물품생산, 치과용 충진재 제조, 복합재 제조, 인쇄판 생산, 스크린 인쇄용 마스크 생산, 인쇄 전자회로용 감광성내시막 제조, 접착제 제조, 광학섬유용 코팅 제조, 또는 전자부품의 코팅 또는 봉입을 위한 방법.
- 제17항에 있어서, 목재 및 금속을 코팅시키기 위한 백색 도료 또는 와니스 제조, 건물 마무리칠 및 도로표시용 일광-경화성 도료 제조, 복합재 제조, 인쇄판 생산, 스크린 인쇄용 마스크 생산, 인쇄 전자회로용 감광성내식막 제조, 접착제 제조, 광학섬유용 코팅 제조, 또는 전자부품의 코팅 또는 봉입을 위한 방법.
- 제17항에 있어서, 벌크 경화 또는 입체평판기술에 의해 실시되는 방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH280991 | 1991-09-23 | ||
| CH91-8/2809 | 1991-09-23 | ||
| CH3322/91A CH682666A5 (de) | 1991-11-14 | 1991-11-14 | Alkyl-Bisacylphosphinoxide. |
| CH91-7/3322 | 1991-11-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR930006035A true KR930006035A (ko) | 1993-04-20 |
| KR100236584B1 KR100236584B1 (ko) | 2000-02-01 |
Family
ID=25691451
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019920016952A KR100236584B1 (ko) | 1991-09-23 | 1992-09-17 | 알킬비스아실포스핀옥사이드 광개시제 및 이를 함유하는 조성물 |
Country Status (20)
| Country | Link |
|---|---|
| US (2) | US5399770A (ko) |
| JP (1) | JP3211039B2 (ko) |
| KR (1) | KR100236584B1 (ko) |
| AT (1) | AT401265B (ko) |
| AU (1) | AU655675B2 (ko) |
| BE (1) | BE1006011A4 (ko) |
| BR (1) | BR9203707A (ko) |
| CA (1) | CA2078722C (ko) |
| CZ (1) | CZ292028B6 (ko) |
| DE (1) | DE4231579C2 (ko) |
| ES (1) | ES2050607B1 (ko) |
| FR (1) | FR2681599B1 (ko) |
| GB (1) | GB2259704B (ko) |
| HK (1) | HK1000208A1 (ko) |
| IT (1) | IT1255509B (ko) |
| MX (1) | MX9205345A (ko) |
| NL (1) | NL194946C (ko) |
| RU (1) | RU2091385C1 (ko) |
| SE (2) | SE503060C2 (ko) |
| SK (2) | SK281581B6 (ko) |
Families Citing this family (136)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4336748C3 (de) * | 1992-11-17 | 2001-09-06 | Ciba Sc Holding Ag | Verfahren zur Blitztrocknung und Blitzhärtung, Verwendung des Verfahrens und dafür geeignete Vorrichtungen |
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| DE59201477D1 (de) * | 1991-01-14 | 1995-04-06 | Ciba Geigy Ag | Bisacylphosphinsulfide. |
-
1992
- 1992-09-03 RU SU925053215A patent/RU2091385C1/ru active
- 1992-09-14 GB GB9219402A patent/GB2259704B/en not_active Expired - Fee Related
- 1992-09-16 SE SE9202668A patent/SE503060C2/sv not_active IP Right Cessation
- 1992-09-17 US US07/947,653 patent/US5399770A/en not_active Expired - Lifetime
- 1992-09-17 KR KR1019920016952A patent/KR100236584B1/ko not_active IP Right Cessation
- 1992-09-21 AU AU25251/92A patent/AU655675B2/en not_active Ceased
- 1992-09-21 MX MX9205345A patent/MX9205345A/es not_active IP Right Cessation
- 1992-09-21 CA CA002078722A patent/CA2078722C/en not_active Expired - Fee Related
- 1992-09-21 DE DE4231579A patent/DE4231579C2/de not_active Expired - Lifetime
- 1992-09-22 FR FR9211250A patent/FR2681599B1/fr not_active Expired - Fee Related
- 1992-09-22 JP JP27820092A patent/JP3211039B2/ja not_active Expired - Fee Related
- 1992-09-22 SK SK2905-92A patent/SK281581B6/sk unknown
- 1992-09-22 NL NL9201641A patent/NL194946C/nl not_active IP Right Cessation
- 1992-09-22 AT AT0188592A patent/AT401265B/de not_active IP Right Cessation
- 1992-09-22 SK SK1371-99A patent/SK281582B6/sk unknown
- 1992-09-22 ES ES09201889A patent/ES2050607B1/es not_active Expired - Lifetime
- 1992-09-22 BE BE9200823A patent/BE1006011A4/fr not_active IP Right Cessation
- 1992-09-22 CZ CS19922905A patent/CZ292028B6/cs not_active IP Right Cessation
- 1992-09-22 IT ITMI922173A patent/IT1255509B/it active IP Right Grant
- 1992-09-23 BR BR929203707A patent/BR9203707A/pt not_active IP Right Cessation
-
1994
- 1994-04-28 US US08/234,887 patent/US5472992A/en not_active Expired - Lifetime
-
1995
- 1995-04-12 SE SE9501365A patent/SE509829C2/sv not_active IP Right Cessation
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1997
- 1997-09-05 HK HK97101725A patent/HK1000208A1/xx not_active IP Right Cessation
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