KR20060041696A - 다층 플라스틱 기판 및 그 제조방법 - Google Patents
다층 플라스틱 기판 및 그 제조방법 Download PDFInfo
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- KR20060041696A KR20060041696A KR1020050010375A KR20050010375A KR20060041696A KR 20060041696 A KR20060041696 A KR 20060041696A KR 1020050010375 A KR1020050010375 A KR 1020050010375A KR 20050010375 A KR20050010375 A KR 20050010375A KR 20060041696 A KR20060041696 A KR 20060041696A
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- South Korea
- Prior art keywords
- organic
- plastic substrate
- inorganic hybrid
- layer
- buffer layer
- Prior art date
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- 239000000758 substrate Substances 0.000 title claims abstract description 99
- 239000004033 plastic Substances 0.000 title claims abstract description 73
- 229920003023 plastic Polymers 0.000 title claims abstract description 73
- 238000000034 method Methods 0.000 title claims abstract description 46
- 239000000872 buffer Substances 0.000 claims abstract description 92
- 230000004888 barrier function Effects 0.000 claims abstract description 66
- 229920006255 plastic film Polymers 0.000 claims abstract description 42
- 239000002985 plastic film Substances 0.000 claims abstract description 42
- 238000004519 manufacturing process Methods 0.000 claims abstract description 17
- 239000011521 glass Substances 0.000 claims abstract description 14
- 239000007789 gas Substances 0.000 claims description 59
- 238000000576 coating method Methods 0.000 claims description 38
- 239000000203 mixture Substances 0.000 claims description 37
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 36
- 239000011248 coating agent Substances 0.000 claims description 36
- 229910052760 oxygen Inorganic materials 0.000 claims description 36
- 239000001301 oxygen Substances 0.000 claims description 36
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 21
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 19
- 125000004432 carbon atom Chemical group C* 0.000 claims description 18
- -1 carboxy, mercapto Chemical class 0.000 claims description 18
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
- 229920000642 polymer Polymers 0.000 claims description 16
- 125000000217 alkyl group Chemical group 0.000 claims description 12
- 239000004927 clay Substances 0.000 claims description 12
- 229910010272 inorganic material Inorganic materials 0.000 claims description 11
- 239000011147 inorganic material Substances 0.000 claims description 11
- 125000003545 alkoxy group Chemical group 0.000 claims description 10
- 229910052736 halogen Inorganic materials 0.000 claims description 9
- 150000002367 halogens Chemical class 0.000 claims description 9
- 239000002131 composite material Substances 0.000 claims description 8
- 150000001282 organosilanes Chemical class 0.000 claims description 8
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 6
- 125000004423 acyloxy group Chemical group 0.000 claims description 6
- 150000004703 alkoxides Chemical class 0.000 claims description 6
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 6
- 125000004448 alkyl carbonyl group Chemical group 0.000 claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 6
- 239000000843 powder Substances 0.000 claims description 6
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical group [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 5
- 239000000945 filler Substances 0.000 claims description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 5
- 239000000654 additive Substances 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 claims description 4
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims description 3
- 239000004593 Epoxy Substances 0.000 claims description 3
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical class NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 3
- 229930194542 Keto Chemical class 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 3
- 230000000996 additive effect Effects 0.000 claims description 3
- 150000001299 aldehydes Chemical class 0.000 claims description 3
- 125000005024 alkenyl aryl group Chemical group 0.000 claims description 3
- 125000003342 alkenyl group Chemical group 0.000 claims description 3
- 125000002877 alkyl aryl group Chemical group 0.000 claims description 3
- 125000000304 alkynyl group Chemical group 0.000 claims description 3
- 125000005025 alkynylaryl group Chemical group 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 3
- 125000005018 aryl alkenyl group Chemical group 0.000 claims description 3
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 3
- 125000005015 aryl alkynyl group Chemical group 0.000 claims description 3
- 229910003460 diamond Inorganic materials 0.000 claims description 3
- 239000010432 diamond Substances 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 3
- 125000000468 ketone group Chemical class 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 3
- 229920002554 vinyl polymer Polymers 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- IRPGOXJVTQTAAN-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanal Chemical compound FC(F)(F)C(F)(F)C=O IRPGOXJVTQTAAN-UHFFFAOYSA-N 0.000 claims description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 2
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminum fluoride Inorganic materials F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 claims description 2
- 239000003522 acrylic cement Substances 0.000 claims description 2
- 229910052916 barium silicate Inorganic materials 0.000 claims description 2
- HMOQPOVBDRFNIU-UHFFFAOYSA-N barium(2+);dioxido(oxo)silane Chemical compound [Ba+2].[O-][Si]([O-])=O HMOQPOVBDRFNIU-UHFFFAOYSA-N 0.000 claims description 2
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 claims description 2
- 239000001506 calcium phosphate Substances 0.000 claims description 2
- 229910000389 calcium phosphate Inorganic materials 0.000 claims description 2
- 235000011010 calcium phosphates Nutrition 0.000 claims description 2
- 239000000378 calcium silicate Substances 0.000 claims description 2
- 229910052918 calcium silicate Inorganic materials 0.000 claims description 2
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 claims description 2
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 claims description 2
- GVALZJMUIHGIMD-UHFFFAOYSA-H magnesium phosphate Chemical compound [Mg+2].[Mg+2].[Mg+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O GVALZJMUIHGIMD-UHFFFAOYSA-H 0.000 claims description 2
- 239000004137 magnesium phosphate Substances 0.000 claims description 2
- 229910000157 magnesium phosphate Inorganic materials 0.000 claims description 2
- 229960002261 magnesium phosphate Drugs 0.000 claims description 2
- 235000010994 magnesium phosphates Nutrition 0.000 claims description 2
- 239000000391 magnesium silicate Substances 0.000 claims description 2
- 229910052919 magnesium silicate Inorganic materials 0.000 claims description 2
- 235000019792 magnesium silicate Nutrition 0.000 claims description 2
- 239000011159 matrix material Substances 0.000 claims description 2
- 239000002114 nanocomposite Substances 0.000 claims description 2
- 239000002086 nanomaterial Substances 0.000 claims description 2
- 239000002685 polymerization catalyst Substances 0.000 claims description 2
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 claims description 2
- 229910052788 barium Inorganic materials 0.000 claims 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims 1
- 229910052570 clay Inorganic materials 0.000 claims 1
- 150000004679 hydroxides Chemical class 0.000 claims 1
- 229920002959 polymer blend Polymers 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 5
- 239000005022 packaging material Substances 0.000 abstract description 4
- 239000010410 layer Substances 0.000 description 111
- 239000010408 film Substances 0.000 description 40
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 32
- 238000002834 transmittance Methods 0.000 description 25
- 239000010409 thin film Substances 0.000 description 21
- 230000005540 biological transmission Effects 0.000 description 19
- 230000000052 comparative effect Effects 0.000 description 19
- 230000008569 process Effects 0.000 description 17
- 239000011247 coating layer Substances 0.000 description 15
- 238000006243 chemical reaction Methods 0.000 description 13
- 229920002799 BoPET Polymers 0.000 description 12
- 238000005259 measurement Methods 0.000 description 11
- 229920000139 polyethylene terephthalate Polymers 0.000 description 11
- 239000005020 polyethylene terephthalate Substances 0.000 description 11
- 238000000151 deposition Methods 0.000 description 10
- 230000000704 physical effect Effects 0.000 description 10
- 238000001723 curing Methods 0.000 description 9
- 230000035699 permeability Effects 0.000 description 9
- 229920000307 polymer substrate Polymers 0.000 description 9
- 239000002904 solvent Substances 0.000 description 8
- 230000007547 defect Effects 0.000 description 7
- 230000008021 deposition Effects 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 238000004132 cross linking Methods 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 238000010030 laminating Methods 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 229920006254 polymer film Polymers 0.000 description 4
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 3
- 238000003848 UV Light-Curing Methods 0.000 description 3
- 239000012790 adhesive layer Substances 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 238000005336 cracking Methods 0.000 description 3
- 239000012153 distilled water Substances 0.000 description 3
- 238000001125 extrusion Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- XPGAWFIWCWKDDL-UHFFFAOYSA-N propan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCC[O-].CCC[O-].CCC[O-].CCC[O-] XPGAWFIWCWKDDL-UHFFFAOYSA-N 0.000 description 3
- 239000013557 residual solvent Substances 0.000 description 3
- 230000035882 stress Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- WOZZOSDBXABUFO-UHFFFAOYSA-N tri(butan-2-yloxy)alumane Chemical compound [Al+3].CCC(C)[O-].CCC(C)[O-].CCC(C)[O-] WOZZOSDBXABUFO-UHFFFAOYSA-N 0.000 description 3
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 229920000089 Cyclic olefin copolymer Polymers 0.000 description 2
- 239000004713 Cyclic olefin copolymer Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- DRUOQOFQRYFQGB-UHFFFAOYSA-N ethoxy(dimethyl)silicon Chemical compound CCO[Si](C)C DRUOQOFQRYFQGB-UHFFFAOYSA-N 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 238000011416 infrared curing Methods 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 229920000636 poly(norbornene) polymer Polymers 0.000 description 2
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- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 239000002987 primer (paints) Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
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- 238000004381 surface treatment Methods 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- UQJIGSKKIVHXJB-UHFFFAOYSA-N (4-aminophenyl)silicon Chemical compound NC1=CC=C([Si])C=C1 UQJIGSKKIVHXJB-UHFFFAOYSA-N 0.000 description 1
- DOYKFSOCSXVQAN-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(OCC)CCCOC(=O)C(C)=C DOYKFSOCSXVQAN-UHFFFAOYSA-N 0.000 description 1
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 1
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 241000532412 Vitex Species 0.000 description 1
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- RQPZNWPYLFFXCP-UHFFFAOYSA-L barium dihydroxide Chemical compound [OH-].[OH-].[Ba+2] RQPZNWPYLFFXCP-UHFFFAOYSA-L 0.000 description 1
- 229910001863 barium hydroxide Inorganic materials 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000000440 bentonite Substances 0.000 description 1
- 229910000278 bentonite Inorganic materials 0.000 description 1
- SVPXDRXYRYOSEX-UHFFFAOYSA-N bentoquatam Chemical compound O.O=[Si]=O.O=[Al]O[Al]=O SVPXDRXYRYOSEX-UHFFFAOYSA-N 0.000 description 1
- LJWBIAMZBJWAOW-UHFFFAOYSA-N benzhydryloxysilane Chemical compound C=1C=CC=CC=1C(O[SiH3])C1=CC=CC=C1 LJWBIAMZBJWAOW-UHFFFAOYSA-N 0.000 description 1
- 239000007853 buffer solution Substances 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
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- 239000012611 container material Substances 0.000 description 1
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- 230000002950 deficient Effects 0.000 description 1
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical compound O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 1
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 description 1
- GAURFLBIDLSLQU-UHFFFAOYSA-N diethoxy(methyl)silicon Chemical compound CCO[Si](C)OCC GAURFLBIDLSLQU-UHFFFAOYSA-N 0.000 description 1
- BODAWKLCLUZBEZ-UHFFFAOYSA-N diethoxy(phenyl)silicon Chemical compound CCO[Si](OCC)C1=CC=CC=C1 BODAWKLCLUZBEZ-UHFFFAOYSA-N 0.000 description 1
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 1
- MNFGEHQPOWJJBH-UHFFFAOYSA-N diethoxy-methyl-phenylsilane Chemical compound CCO[Si](C)(OCC)C1=CC=CC=C1 MNFGEHQPOWJJBH-UHFFFAOYSA-N 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- PKTOVQRKCNPVKY-UHFFFAOYSA-N dimethoxy(methyl)silicon Chemical compound CO[Si](C)OC PKTOVQRKCNPVKY-UHFFFAOYSA-N 0.000 description 1
- CIQDYIQMZXESRD-UHFFFAOYSA-N dimethoxy(phenyl)silane Chemical compound CO[SiH](OC)C1=CC=CC=C1 CIQDYIQMZXESRD-UHFFFAOYSA-N 0.000 description 1
- CVQVSVBUMVSJES-UHFFFAOYSA-N dimethoxy-methyl-phenylsilane Chemical compound CO[Si](C)(OC)C1=CC=CC=C1 CVQVSVBUMVSJES-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- MBGQQKKTDDNCSG-UHFFFAOYSA-N ethenyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(C=C)OCC MBGQQKKTDDNCSG-UHFFFAOYSA-N 0.000 description 1
- FJKCDSVHCNEOOS-UHFFFAOYSA-N ethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[SiH](OCC)C1=CC=CC=C1 FJKCDSVHCNEOOS-UHFFFAOYSA-N 0.000 description 1
- RSIHJDGMBDPTIM-UHFFFAOYSA-N ethoxy(trimethyl)silane Chemical compound CCO[Si](C)(C)C RSIHJDGMBDPTIM-UHFFFAOYSA-N 0.000 description 1
- ZVJXKUWNRVOUTI-UHFFFAOYSA-N ethoxy(triphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(OCC)C1=CC=CC=C1 ZVJXKUWNRVOUTI-UHFFFAOYSA-N 0.000 description 1
- FIHCECZPYHVEJO-UHFFFAOYSA-N ethoxy-dimethyl-phenylsilane Chemical compound CCO[Si](C)(C)C1=CC=CC=C1 FIHCECZPYHVEJO-UHFFFAOYSA-N 0.000 description 1
- ADLWTVQIBZEAGJ-UHFFFAOYSA-N ethoxy-methyl-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](C)(OCC)C1=CC=CC=C1 ADLWTVQIBZEAGJ-UHFFFAOYSA-N 0.000 description 1
- 229920001002 functional polymer Polymers 0.000 description 1
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- 238000007756 gravure coating Methods 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 229910001872 inorganic gas Inorganic materials 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 239000002651 laminated plastic film Substances 0.000 description 1
- 229940094522 laponite Drugs 0.000 description 1
- XCOBTUNSZUJCDH-UHFFFAOYSA-B lithium magnesium sodium silicate Chemical compound [Li+].[Li+].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Na+].[Na+].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].[Mg+2].O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3.O1[Si](O2)([O-])O[Si]3([O-])O[Si]1([O-])O[Si]2([O-])O3 XCOBTUNSZUJCDH-UHFFFAOYSA-B 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- BKXVGDZNDSIUAI-UHFFFAOYSA-N methoxy(triphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(OC)C1=CC=CC=C1 BKXVGDZNDSIUAI-UHFFFAOYSA-N 0.000 description 1
- REQXNMOSXYEQLM-UHFFFAOYSA-N methoxy-dimethyl-phenylsilane Chemical compound CO[Si](C)(C)C1=CC=CC=C1 REQXNMOSXYEQLM-UHFFFAOYSA-N 0.000 description 1
- ALPYWOWTSPQXHR-UHFFFAOYSA-N methoxy-methyl-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](C)(OC)C1=CC=CC=C1 ALPYWOWTSPQXHR-UHFFFAOYSA-N 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 229910052901 montmorillonite Inorganic materials 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229920013655 poly(bisphenol-A sulfone) Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000010079 rubber tapping Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910021647 smectite Inorganic materials 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 description 1
- 238000000870 ultraviolet spectroscopy Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133302—Rigid substrates, e.g. inorganic substrates
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Abstract
Description
산소투과율a) (cc/㎡/day/atm) | 수증기 투과율b) (g/㎡/day) | 선팽창계수 (ppm/K) | 광투과도 (400nm) | 헤이즈 (%) | 연필경도 | |
실시예1 | < 0.05 기기측정범위 이하 | < 0.005 기기측정범위 이하 | 3.4 | > 85% | < 0.3 | >3H |
산소투과율 (cc/㎡/day/atm) | 수증기 투과율 (g/㎡/day) | 선팽창계수 (ppm/K) | 광투과도 (400nm) | 헤이즈 (%) | 연필경도 | |
실시예2 | < 0.05 | < 0.005 | 6.5 | > 85% | < 0.3 | >3H |
산소투과율 (cc/㎡/day/atm) | 수증기 투과율 (g/㎡/day) | 선팽창계수 (ppm/K) | 광투과도 (400nm) | 헤이즈 (%) | 연필경도 | |
실시예3 | < 0.05 | < 0.005 | 4.0 | > 85% | < 0.3 | >3H |
산소투과율 (cc/㎡/day/atm) | 수증기 투과율 (g/㎡/day) | 선팽창계수 (ppm/K) | 광투과도 (400nm) | 헤이즈 (%) | |
비교예1 | < 0.05 | < 0.005 | 22.0 | > 85% | < 0.3 |
산소투과율 (cc/㎡/day/atm) | 수증기 투과율 (g/㎡/day) | 선팽창계수 (ppm/K) | 광투과도 (400nm) | 헤이즈 (%) | |
비교예2 | < 0.05 | < 0.005 | 22.2 | > 85% | < 0.3 |
산소투과율 (cc/㎡/day/atm) | 수증기 투과율 (g/㎡/day) | 선팽창계수 (ppm/K) | 광투과도 (400nm) | 헤이즈 (%) | |
비교예3 | 1.1 | 2.0 | 22.1 | > 85% | < 0.3 |
산소투과율 (cc/㎡/day/atm) | 증기 투과율 (g/㎡/day) | 선팽창계수 (ppm/K) | 광투과도 (400nm) | 헤이즈 (%) | |
비교예4 | 3.1 | 3.0 | 22.0 | > 85% | < 0.3 |
산소투과율 (cc/㎡/day/atm) | 증기 투과율 (g/㎡/day) | 선팽창계수 (ppm/K) | 광투과도 (400nm) | 헤이즈 (%) | |
비교예5 | < 0.05 | < 0.005 | 22.2 | > 85% | < 0.3 |
산소투과율 (cc/㎡/day/atm) | 증기 투과율 (g/㎡/day) | 선팽창계수 (ppm/K) | 광투과도 (400nm) | 헤이즈 (%) | |
비교예6 | 0.08 | 0.01 | 22.3 | > 85% | < 0.3 |
Claims (11)
- 접합된 플라스틱 필름, 및상기 접합된 플라스틱 필름의 양측면에 제1 유기-무기 하이브리드 버퍼층, 가스배리어층, 및 제2 유기-무기 하이브리드 버퍼층이순차적으로 적층되어 플라스틱 필름을 중심으로 대칭 구조를 이루는다층구조의 플라스틱 기판.
- 제 1항에 있어서, 상기 플라스틱 필름은 단일 고분자, 1 종 이상의 고분자 블랜드, 및 유기 또는 무기 첨가물이 함유된 고분자 복합 재료로 이루어진 군으로부터 1종 이상 선택되는 것인 플라스틱 기판.
- 제 2항에 있어서, 상기 무기 첨가물이 함유된 고분자 복합 재료는 클레이 나노물질이 고분자 매트릭스에 분산된 폴리머-클레이 나노복합체인 플라스틱 기판.
- 제 1항에 있어서, 상기 가스 배리어층은 SiOx(여기서, x는 1 내지 4의 정수), SiOxNy(여기서, x 및 y는 각각 1 내지 3의 정수), Al2O3 및 ITO로 이루어진 군으로부터 1종 이상 선택되는 무기물로부터 형성된 것인 플라스틱 기판.
- 제 1항에 있어서, 상기 가스 배리어층은 두께가 5 내지 1000 nm인 플라스틱 기판.
- 제 1항에 있어서, 상기 제1 유기-무기 하이브리드 버퍼층과 제2 유기-무기 하이브리드 버퍼층은, 하기 화학식 1로 표시되는 화합물로 이루어진 군으로부터 1종 이상 선택되는 유기실란 20 내지 99.99 중량%, 및 하기 화학식 2로 표시되는 화합물로 이루어진 군으로부터 1종 이상 선택되는 금속알콕시드 0.01 내지 80 중량%를 포함하는 버퍼조성물의 부분가수분해물로부터 형성된 것인 플라스틱 기판.[화학식 1](R1)m-Si-X(4-m)상기 식에서, X는 서로 같거나 다를 수 있으며, 수소, 할로겐, 탄소수 1 내지 12의 알콕시, 아실옥시, 알킬카보닐, 알콕시카보닐, 또는 -N(R2)2(여기서 R2 는 H, 또는 탄소수 1 내지 12의 알킬)이고,R1은 서로 같거나 다를 수 있으며, 탄소수 1 내지 12의 알킬, 알케닐, 알키닐, 아릴, 아릴알킬, 알킬아릴, 아릴알케닐, 알케닐아릴, 아릴알키닐, 알키닐아릴그룹, 할로겐, 치환된 아미노, 아마이드, 알데히드, 케토, 알킬카보닐, 카르복시, 머캅토, 시아노, 하이드록시, 탄소수 1 내지 12의 알콕시, 탄소수 1 내지 12의 알콕시카보닐, 설폰산, 인산, 아크릴옥시, 메타크릴옥시, 에폭시 또는 비닐기이고,이때 산소 또는 -NR2(여기서 R2는 H, 또는 탄소수 1 내지 12의 알킬)가 라디 칼 R1과 Si사이에 삽입되어 -(R1)m-O-Si-X(4-m) 혹은 (R1 )m-NR2-Si-X(4-m)로 될 수도 있으며, m은 1 내지 3의 정수이다.[화학식 2]M-(R3)z상기 식에서, M은 알루미늄, 지르코늄, 및 티타늄으로 이루어진 군으로부터 선택되는 금속을 나타내며, R3는 서로 같거나 다를 수 있으며, 할로겐, 탄소수 1 내지 12의 알킬, 알콕시, 아실옥시, 또는 하이드록시기이며, Z는 3 또는 4의 정수이다.
- 제 6항에 있어서, 상기 버퍼조성물은 금속, 유리분말 다이아몬드분말, 실리콘옥시드, 클레이, 칼슘포스페이트, 마그네슘포스페이트, 바리움설페이트, 알루미늄 프루오라이드, 칼슘실리케이트, 마그네슘 실리케이트, 바리움실리케이트, 바리움카보네이트, 바리움히드록시드, 및 알루미늄실리케이트로 이루어진 군으로부터 1 종 이상 선택되는 충전제; 용매; 및 중합 촉매를 더욱 포함하는 것인 플라스틱 기판.
- 제 1항에 있어서, 상기 제1 유기-무기 하이브리드 버퍼층과 제2 유기-무기 하이브리드 버퍼층은 두께가 0.5 내지 20 마이크론 (㎛)인 것인 플라스틱 기판.
- a) 플라스틱 필름의 한쪽 면에 졸상태의 버퍼 조성물을 코팅하고 경화하여 제1 유기-무기 하이브리드 버퍼층을 형성하고,b) 상기 제1 유기-무기 하이브리드층 위에 무기물을 코팅하여 가스 배리어층을 형성하고,c) 상기 가스 배리어층 위에 a)의 버퍼 조성물을 코팅하고 경화하여 제2 유기-무기 하이브리드 버퍼층을 형성하여 다층 필름을 제조하고,d) 상기 a) 내지 c) 단계의 과정을 반복하여 c)와 동일한 구조의 다층필름을 1종 더 제조하고,e) 상기 c)와 d)의 각 다층필름의 층이 형성되지 않은 플라스틱 필름의 면끼리 서로 접합하여 대칭 구조를 이루게 하는 단계를 포함하는 다층 구조의 플라스틱 기판의 제조방법.
- 제 9항에 있어서, 상기 e)의 접합방법은 아크릴계 접착제 또는 열접합방법에 의해 이루어지는 플라스틱 기판의 제조방법.
- 제 9항에 있어서, 상기 제1 유기-무기 하이브리드 버퍼층과 제2 유기-무기 하이브리드 버퍼층은, 하기 화학식 1로 표시되는 화합물로 이루어진 군으로부터 1종 이상 선택되는 유기실란 20 내지 99.99 중량%, 및 하기 화학식 2로 표시되는 화합물로 이루어진 군으로부터 1종 이상 선택되는 금속알콕시드 0.01 내지 80 중량% 를 포함하는 버퍼조성물의 부분가수분해물로부터 형성된 것인 플라스틱 기판.[화학식 1](R1)m-Si-X(4-m)상기 식에서, X는 서로 같거나 다를 수 있으며, 수소, 할로겐, 탄소수 1 내지 12의 알콕시, 아실옥시, 알킬카보닐, 알콕시카보닐, 또는 -N(R2)2(여기서 R2 는 H, 또는 탄소수 1 내지 12의 알킬)이고,R1은 서로 같거나 다를 수 있으며, 탄소수 1 내지 12의 알킬, 알케닐, 알키닐, 아릴, 아릴알킬, 알킬아릴, 아릴알케닐, 알케닐아릴, 아릴알키닐, 알키닐아릴그룹, 할로겐, 치환된 아미노, 아마이드, 알데히드, 케토, 알킬카보닐, 카르복시, 머캅토, 시아노, 하이드록시, 탄소수 1 내지 12의 알콕시, 탄소수 1 내지 12의 알콕시카보닐, 설폰산, 인산, 아크릴옥시, 메타크릴옥시, 에폭시 또는 비닐기이고,이때 산소 또는 -NR2(여기서 R2는 H, 또는 탄소수 1 내지 12의 알킬)가 라디칼 R1과 Si사이에 삽입되어 -(R1)m-O-Si-X(4-m) 혹은 (R1 )m-NR2-Si-X(4-m)로 될 수도 있으며, m은 1 내지 3의 정수이다.[화학식 2]M-(R3)z상기 식에서, M은 알루미늄, 지르코늄, 및 티타늄으로 이루어진 군으로부터 선택되는 금속을 나타내며, R3는 서로 같거나 다를 수 있으며, 할로겐, 탄소수 1 내지 12의 알킬, 알콕시, 아실옥시, 또는 하이드록시기이며, Z는 3 또는 4의 정수이다.
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AT05710857T ATE430022T1 (de) | 2004-02-06 | 2005-02-04 | Kunststoffträger mit mehrlagiger struktur und verfahren zu dessen herstellung |
JP2006552054A JP4376909B2 (ja) | 2004-02-06 | 2005-02-04 | 多層プラスチック基板及びその製造方法 |
TW94103730A TWI252325B (en) | 2004-02-06 | 2005-02-04 | Plastic substrate having multi-layer structure and method for preparing the same |
DE200560014199 DE602005014199D1 (de) | 2004-02-06 | 2005-02-04 | Kunststoffträger mit mehrlagiger struktur und verfahren zu dessen herstellung |
EP20050710857 EP1711338B1 (en) | 2004-02-06 | 2005-02-04 | Plastic substrate having multi-layer structure and method for preparing the same |
PCT/KR2005/000352 WO2005074398A2 (en) | 2004-02-06 | 2005-02-04 | Plastic substrate having multi-layer structure and method for preparing the same |
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US11/049,939 US7393581B2 (en) | 2004-02-06 | 2005-02-04 | Plastic substrate having multi-layer structure and method for preparing the same |
CN2005800041195A CN1918002B (zh) | 2004-02-06 | 2005-02-04 | 具有多层结构的塑料基板及其制备方法 |
US11/882,114 US7857931B2 (en) | 2004-02-06 | 2007-07-30 | Plastic substrate having multi-layer structure and method for preparing the same |
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Also Published As
Publication number | Publication date |
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US7393581B2 (en) | 2008-07-01 |
WO2005074398A3 (en) | 2005-10-06 |
CN1918002B (zh) | 2010-10-13 |
US20050175831A1 (en) | 2005-08-11 |
EP1711338B1 (en) | 2009-04-29 |
EP1711338A2 (en) | 2006-10-18 |
US7857931B2 (en) | 2010-12-28 |
CN1918002A (zh) | 2007-02-21 |
ATE430022T1 (de) | 2009-05-15 |
KR100646252B1 (ko) | 2006-11-23 |
TW200532237A (en) | 2005-10-01 |
TWI252325B (en) | 2006-04-01 |
US8034439B2 (en) | 2011-10-11 |
JP4376909B2 (ja) | 2009-12-02 |
JP2007523769A (ja) | 2007-08-23 |
US20070267135A1 (en) | 2007-11-22 |
DE602005014199D1 (de) | 2009-06-10 |
US20100062246A1 (en) | 2010-03-11 |
WO2005074398A2 (en) | 2005-08-18 |
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