KR20060041322A - 반도체용 본딩 와이어 및 그 제조 방법 - Google Patents
반도체용 본딩 와이어 및 그 제조 방법 Download PDFInfo
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- KR20060041322A KR20060041322A KR1020067007647A KR20067007647A KR20060041322A KR 20060041322 A KR20060041322 A KR 20060041322A KR 1020067007647 A KR1020067007647 A KR 1020067007647A KR 20067007647 A KR20067007647 A KR 20067007647A KR 20060041322 A KR20060041322 A KR 20060041322A
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C5/00—Alloys based on noble metals
- C22C5/02—Alloys based on gold
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21C—MANUFACTURE OF METAL SHEETS, WIRE, RODS, TUBES OR PROFILES, OTHERWISE THAN BY ROLLING; AUXILIARY OPERATIONS USED IN CONNECTION WITH METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL
- B21C37/00—Manufacture of metal sheets, bars, wire, tubes or like semi-manufactured products, not otherwise provided for; Manufacture of tubes of special shape
- B21C37/04—Manufacture of metal sheets, bars, wire, tubes or like semi-manufactured products, not otherwise provided for; Manufacture of tubes of special shape of bars or wire
- B21C37/042—Manufacture of coated wire or bars
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- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
- B23K35/02—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by mechanical features, e.g. shape
- B23K35/0255—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by mechanical features, e.g. shape for use in welding
- B23K35/0261—Rods, electrodes, wires
- B23K35/0272—Rods, electrodes, wires with more than one layer of coating or sheathing material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
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- C22C21/02—Alloys based on aluminium with silicon as the next major constituent
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Abstract
Description
Claims (17)
- 도전성 금속으로 이루어지는 외주부와, 상기 금속을 주성분으로 하는 합금으로 이루어지는 심선과, 또한 그 심선과 외주부 사이에 농도 구배를 적어도 일부에 갖는 두께가 0.05 ㎛ 이상 3 ㎛ 미만인 확산층을 갖는 것을 특징으로 하는 반도체용 본딩 와이어.
- 도전성 금속으로 이루어지는 심선과, 상기 금속을 주성분으로 하는 합금으로 이루어지는 외주부와, 또한 그 심선과 외주부 사이에 농도 구배를 적어도 일부에 갖는 두께가 0.05 ㎛ 이상 3 ㎛ 미만인 확산층을 갖는 것을 특징으로 하는 반도체용 본딩 와이어.
- 외주부와 심선이 동종의 도전성 금속을 주성분으로 하는 합금으로 이루어지고, 더욱이 각각의 합금중에 함유되는 합금화 원소의 종류 또는 농도가, 적어도 1종 이상은 다르며, 또한 그 심선과 외주부 사이에 농도 구배를 적어도 일부에 갖는 두께가 0.05 ㎛ 이상 3 ㎛ 미만인 확산층을 갖는 것을 특징으로 하는 반도체용 본딩 와이어.
- 도전성 금속으로 이루어지는 외주부와, 상기 금속을 주성분으로 하는 합금으로 이루어지는 심선과, 또한 그 심선과 외주부 사이에 농도 구배를 적어도 일부에 갖는 확산층을 갖고, 또한 외주부의 더욱 외측에 심선 및 외주부의 주요 원소와 동종의 금속으로 이루어지는 최표면층을 갖는 것을 특징으로 하는 반도체용 본딩 와이어.
- 외주부와 심선이 동종의 도전성 금속을 주성분으로 하는 합금으로 이루어지고, 더욱이 각각의 합금중에 함유되는 합금화 원소의 종류 또는 농도가 적어도 1종 이상은 다르며, 또한 그 심선과 외주부 사이에 농도 구배를 적어도 일부에 갖는 확산층을 갖고, 또한 외주부의 더욱 외측에 심선 및 외주부의 주요 원소와 동종의 금속으로 이루어지는 최표면층을 갖는 것을 특징으로 하는 반도체용 본딩 와이어.
- 도전성 금속으로 이루어지는 외주부와, 상기 금속을 주성분으로 하는 합금으로 이루어지는 심선과, 또한 그 심선과 외주부 사이에 농도 구배를 적어도 일부에 갖는 확산층을 갖고, 또한 외주부의 더욱 외측에 심선 및 외주부의 주요 원소와 동종의 금속으로 이루어지는 최표면층을 갖고, 외주부와 최표면층 사이에 확산층을 갖는 것을 특징으로 하는 반도체용 본딩 와이어.
- 외주부와 심선이 동종의 도전성 금속을 주성분으로 하는 합금으로 이루어지고, 더욱이 각각의 합금중에 함유되는 합금화 원소의 종류 또는 농도가 적어도 1종 이상은 다르며, 또한 그 심선과 외주부 사이에 농도 구배를 적어도 일부에 갖는 확산층을 갖고, 또한 외주부의 더욱 외측에 심선 및 외주부의 주요 원소와 동종의 금 속으로 이루어지는 최표면층을 갖고, 외주부와 최표면층 사이에 확산층을 갖는 것을 특징으로 하는 반도체용 본딩 와이어.
- 도전성 금속으로 이루어지는 외주부와, 상기 금속을 주성분으로 하는 합금으로 이루어지는 심선과, 또한 그 심선과 외주부 사이에 농도 구배를 적어도 일부에 갖는 확산층을 갖고, 또한 외주부의 더욱 외측에 심선 및 외주부의 주요 원소와는 다른, 외주부보다 산화가 적은 금속으로 이루어지는 최표면층을 갖는 것을 특징으로 하는 반도체용 본딩 와이어.
- 도전성 금속으로 이루어지는 심선과, 상기 금속을 주성분으로 하는 합금으로 이루어지는 외주부와, 또한 그 심선과 외주부 사이에 농도 구배를 적어도 일부에 갖는 확산층을 갖고, 또한 외주부의 더욱 외측에 심선 및 외주부의 주요 원소와는 다른, 외주부보다 산화가 적은 금속으로 이루어지는 최표면층을 갖는 것을 특징으로 하는 반도체용 본딩 와이어.
- 외주부와 심선이 동종의 도전성 금속을 주성분으로 하는 합금으로 이루어지고, 더욱이 각각의 합금중에 함유되는 합금화 원소의 종류 또는 농도가 적어도 1종 이상은 다르며, 또한 그 심선과 외주부 사이에 농도 구배를 적어도 일부에 갖는 확산층을 갖고, 또한 외주부의 더욱 외측에 심선 및 외주부의 주요 원소와는 다른, 외주부보다 산화가 적은 금속으로 이루어지는 최표면층을 갖는 것을 특징으로 하는 반도체용 본딩 와이어.
- 외주부와 심선이 동종의 도전성 금속을 주성분으로 하는 합금으로 이루어지고, 더욱이 각각의 합금중에 함유되는 합금화 원소의 종류 또는 농도가 적어도 1종 이상은 다르며, 또한 그 심선과 외주부 사이에 농도 구배를 적어도 일부에 갖는 확산층 및 금속간 화합물층을 갖고, 또한 외주부의 더욱 외측에 심선 및 외주부의 주요 원소와는 다른, 외주부보다 산화가 적은 금속으로 이루어지는 최표면층을 갖는 것을 특징으로 하는 반도체용 본딩 와이어.
- 도전성 금속으로 이루어지는 외주부와, 상기 금속을 주성분으로 하는 합금으로 이루어지는 심선과, 또한 그 심선과 외주부 사이에 농도 구배를 적어도 일부에 갖는 확산층을 갖고, 또한 외주부의 더욱 외측에 심선 및 외주부의 주요 원소와 동종의 금속으로 이루어지는 최표면층을 갖고, 외주부와 최표면층 사이에 확산층 또는 금속간 화합물을 갖는 것을 특징으로 하는 반도체용 본딩 와이어.
- 외주부와 심선이 동종의 도전성 금속을 주성분으로 하는 합금으로 이루어지고, 더욱이 각각의 합금중에 함유되는 합금화 원소의 종류 또는 농도가 적어도 1종 이상은 다르며, 또한 그 심선과 외주부 사이에 농도 구배를 적어도 일부에 함유하는 확산층을 갖고, 또한 외주부의 더욱 외측에 심선 및 외주부의 주요 원소와는 다른, 외주부보다 산화가 적은 금속으로 이루어지는 동종의 금속으로 이루어지는 최 표면층을 갖고, 외주부와 최표면층 사이에 확산층 또는 금속간 화합물층을 갖는 것을 특징으로 하는 반도체용 본딩 와이어.
- 제4항 내지 제13항 중 어느 한 항에 있어서, 상기 확산층의 두께가 0.05 ㎛ 이상 3 ㎛ 미만인 것을 특징으로 하는 반도체용 본딩 와이어.
- 도전성을 갖는 제1 금속 또는 상기 제1 금속을 주성분으로 하는 합금으로 이루어지는 심선과, 상기 심선의 제1 금속과는 다른 도전성을 갖는 제2 금속 또는 상기 제2 금속 또는 상기 제2 금속을 주성분으로 하는 합금으로 이루어지는 외주부, 또한 그 심선과 외주부 사이에 농도 구배를 적어도 일부에 갖는 두께가 0.05 ㎛ 이상 3 ㎛ 미만인 확산층을 갖는 것을 특징으로 하는 반도체용 본딩 와이어.
- 도전성을 갖는 제1 금속 또는 상기 제1 금속을 주성분으로 하는 합금으로 이루어지는 심선과, 상기 심선의 제1 금속과는 다른 도전성을 갖는 제2 금속 또는 상기 제2 금속 또는 상기 제2 금속을 주성분으로 하는 합금으로 이루어지는 외주부, 또한 그 심선과 외주부 사이에, 농도 구배를 적어도 일부에 갖는 두께가 0.05 ㎛ 이상 3 ㎛ 미만인 확산층 및 금속간 화합물층을 갖는 것을 특징으로 하는 반도체용 본딩 와이어.
- 도전성을 갖는 제1 금속 또는 상기 제1 금속을 주성분으로 하는 합금으로 이 루어지는 심선과, 상기 심선의 제1 금속과는 다른 도전성을 갖는 제2 금속 또는 상기 제2 금속 또는 상기 제2 금속을 주성분으로 하는 합금으로 이루어지는 중층과, 상기 중층의 제2 금속과는 다른 도전성 금속 또는 그 합금으로 이루어지는 외주부로 구성되고, 또한 그 심선과 중층 사이 및 중층과 외주부 사이에는 농도 구배를 적어도 일부에 갖는 두께 0.05 ㎛ 이상 3 ㎛ 미만의 확산층 및 금속간 화합물층을 갖는 것을 특징으로 하는 반도체용 본딩 와이어.
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Cited By (2)
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WO2014038850A1 (ko) * | 2012-09-05 | 2014-03-13 | 엠케이전자 주식회사 | 반도체 장치용 본딩 와이어 및 그의 제조 방법 |
KR101503462B1 (ko) * | 2012-09-05 | 2015-03-18 | 엠케이전자 주식회사 | 반도체 장치용 본딩 와이어 및 그의 제조 방법 |
Also Published As
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MY137479A (en) | 2009-01-30 |
JP5451908B2 (ja) | 2014-03-26 |
JP5506959B2 (ja) | 2014-05-28 |
JPWO2002023618A1 (ja) | 2004-01-22 |
KR100717667B1 (ko) | 2007-05-11 |
US20040014266A1 (en) | 2004-01-22 |
WO2002023618A1 (fr) | 2002-03-21 |
JP4868694B2 (ja) | 2012-02-01 |
JP2013140986A (ja) | 2013-07-18 |
JP5349382B2 (ja) | 2013-11-20 |
KR100739378B1 (ko) | 2007-07-16 |
JP5349383B2 (ja) | 2013-11-20 |
JP5409673B2 (ja) | 2014-02-05 |
JP2013080960A (ja) | 2013-05-02 |
US7969021B2 (en) | 2011-06-28 |
JP2010166080A (ja) | 2010-07-29 |
JP2010166079A (ja) | 2010-07-29 |
KR20030033066A (ko) | 2003-04-26 |
JP2011124611A (ja) | 2011-06-23 |
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