KR20020040677A - 전자전기기기부품용 동합금재 - Google Patents
전자전기기기부품용 동합금재 Download PDFInfo
- Publication number
- KR20020040677A KR20020040677A KR1020017016149A KR20017016149A KR20020040677A KR 20020040677 A KR20020040677 A KR 20020040677A KR 1020017016149 A KR1020017016149 A KR 1020017016149A KR 20017016149 A KR20017016149 A KR 20017016149A KR 20020040677 A KR20020040677 A KR 20020040677A
- Authority
- KR
- South Korea
- Prior art keywords
- mass
- electronic
- copper alloy
- alloy material
- electronic device
- Prior art date
Links
- 229910000881 Cu alloy Inorganic materials 0.000 title claims abstract description 106
- 239000000956 alloy Substances 0.000 title claims abstract description 104
- 239000013078 crystal Substances 0.000 claims abstract description 53
- 238000010304 firing Methods 0.000 claims abstract description 31
- 239000010949 copper Substances 0.000 claims abstract description 29
- 230000003746 surface roughness Effects 0.000 claims abstract description 23
- 239000012535 impurity Substances 0.000 claims abstract description 15
- 229910052802 copper Inorganic materials 0.000 claims abstract description 9
- 238000007747 plating Methods 0.000 claims description 100
- 229910052718 tin Inorganic materials 0.000 claims description 27
- 239000000463 material Substances 0.000 claims description 20
- 229910001128 Sn alloy Inorganic materials 0.000 claims description 15
- 229910052759 nickel Inorganic materials 0.000 claims description 14
- 229910052725 zinc Inorganic materials 0.000 claims description 9
- 229910052804 chromium Inorganic materials 0.000 claims description 7
- 229910001020 Au alloy Inorganic materials 0.000 claims description 6
- 229910052737 gold Inorganic materials 0.000 claims description 6
- 229910052709 silver Inorganic materials 0.000 claims description 6
- 229910000990 Ni alloy Inorganic materials 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 230000035882 stress Effects 0.000 description 35
- 238000005452 bending Methods 0.000 description 34
- 229910045601 alloy Inorganic materials 0.000 description 21
- 238000005097 cold rolling Methods 0.000 description 16
- 238000005096 rolling process Methods 0.000 description 16
- 238000000034 method Methods 0.000 description 15
- 238000010438 heat treatment Methods 0.000 description 13
- 239000010410 layer Substances 0.000 description 12
- 238000012360 testing method Methods 0.000 description 12
- 230000000694 effects Effects 0.000 description 11
- 238000012545 processing Methods 0.000 description 10
- 229910052710 silicon Inorganic materials 0.000 description 10
- 230000032683 aging Effects 0.000 description 8
- 238000005275 alloying Methods 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 230000008569 process Effects 0.000 description 7
- 230000001105 regulatory effect Effects 0.000 description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 5
- 238000005260 corrosion Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000000137 annealing Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 4
- 238000004090 dissolution Methods 0.000 description 4
- 230000006872 improvement Effects 0.000 description 4
- 229910052749 magnesium Inorganic materials 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 230000002265 prevention Effects 0.000 description 4
- 229910017518 Cu Zn Inorganic materials 0.000 description 3
- 229910017755 Cu-Sn Inorganic materials 0.000 description 3
- 229910017752 Cu-Zn Inorganic materials 0.000 description 3
- 229910017927 Cu—Sn Inorganic materials 0.000 description 3
- 229910017943 Cu—Zn Inorganic materials 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- TVZPLCNGKSPOJA-UHFFFAOYSA-N copper zinc Chemical compound [Cu].[Zn] TVZPLCNGKSPOJA-UHFFFAOYSA-N 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- -1 Cu-Sn compound Chemical class 0.000 description 2
- 229910017827 Cu—Fe Inorganic materials 0.000 description 2
- 229910017876 Cu—Ni—Si Inorganic materials 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 239000012776 electronic material Substances 0.000 description 2
- 238000005098 hot rolling Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000005461 lubrication Methods 0.000 description 2
- 238000013508 migration Methods 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000007614 solvation Methods 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 229910002708 Au–Cu Inorganic materials 0.000 description 1
- 229910000906 Bronze Inorganic materials 0.000 description 1
- 229910020711 Co—Si Inorganic materials 0.000 description 1
- 229910017770 Cu—Ag Inorganic materials 0.000 description 1
- 229910018054 Ni-Cu Inorganic materials 0.000 description 1
- 229910003271 Ni-Fe Inorganic materials 0.000 description 1
- 229910018098 Ni-Si Inorganic materials 0.000 description 1
- 229910018481 Ni—Cu Inorganic materials 0.000 description 1
- 229910018529 Ni—Si Inorganic materials 0.000 description 1
- 229910017847 Sb—Cu Inorganic materials 0.000 description 1
- 229910020816 Sn Pb Inorganic materials 0.000 description 1
- 229910020922 Sn-Pb Inorganic materials 0.000 description 1
- 229910008783 Sn—Pb Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000002730 additional effect Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000004881 precipitation hardening Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 235000019633 pungent taste Nutrition 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
- C22C9/02—Alloys based on copper with tin as the next major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
- C22C9/04—Alloys based on copper with zinc as the next major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
- C22C9/06—Alloys based on copper with nickel or cobalt as the next major constituent
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12708—Sn-base component
- Y10T428/12715—Next to Group IB metal-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12889—Au-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12993—Surface feature [e.g., rough, mirror]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Conductive Materials (AREA)
- Contacts (AREA)
- Non-Insulated Conductors (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
Claims (14)
- Ni를 1.0∼3.0 질량%, Si를 0.2∼0.7 질량%, Mg을 0.01∼0.2 질량%, Sn을 0.05∼1.5 질량%, Zn을 0.2∼1.5 질량%, S를 0.005 질량% 미만(0질량%를 포함한다) 함유하고, 잔부가 Cu 및 불가피한 불순물을 포함하여 구성되는 동합금재로서, 결정입자지름이 0.001 mm을 넘고 0.025 mm 이하이며, 또한 최종소성가공방향과 평행한 단면에 있어서의 결정입자의 긴 지름a와 최종소성가공방향과 직각인 단면에 있어서의 결정입자의 긴 지름b의 비(a/b)가 1.5이하인 것을 특징으로 하는 전자전기기기부품용 동합금재.
- Ni를 1.0∼3.0 질량%, Si를 0.2∼0.7 질량%, Mg을 0.01∼0.2 질량%, Sn을 0.05∼1.5 질량%, Zn을 0.2∼1.5 질량%, Ag, Co 및 Cr로 이루어지는 군에서 선택되는 1종 이상을 총량으로 0.005∼2.0 질량%(단지 Cr는 0.2 질량% 이하), S를 0.005 질량% 미만(0질량%를 포함한다) 함유하고, 잔부가 Cu 및 불가피한 불순물을 포함하여 구성되는 동합금재로서, 결정입자지름이 0.001 mm을 넘고 0.025 mm 이하이고, 또한 최종소성가공방향과 평행한 단면에 있어서의 결정입자의 긴 지름a와 최종소성가공방향과 직각인 단면에 있어서의 결정입자의 긴 지름b의 비(a/b)가 1.5이하인 것을 특징으로 하는 전자전기기기부품용 동합금재.
- Ni를 1.0∼3.0 질량%, Si를 0.2∼0.7 질량%, Mg을 0.01∼0.2 질량%, Sn을0.05∼1.5 질량%, Zn을 0.2∼1.5 질량%, S를 0.005 질량% 미만(0질량%를 포함한다) 함유하고, 잔부가 Cu 및 불가피한 불순물을 포함하여 구성되는 동합금재로서, 최종소성가공후의, 표면거침정도 Ra가 0 ㎛을 넘고 0.1 ㎛ 미만이거나, 또는 표면거침정도 Rmax가 0 ㎛을 넘고 2.0 ㎛ 미만인 것을 특징으로 하는 전자전기기기부품용 동합금재.
- 제 3 항에 있어서, 상기 전자전기기기부품용 동합금재에, Sn 또는 Sn 합금도금이 실시되고 있는 것을 특징으로 하는 전자전기기기부품용 동합금재.
- 제 3 항에 있어서, 상기 전자전기기기부품용 동합금재에, Sn 또는 Sn 합금도금이 실시되고, 또한, 리플로우처리가 행하여지고 있는 것을 특징으로 하는 전자전기기기부품용 동합금재.
- 제 3 항에 있어서, 상기 전자전기기기부품용 동합금재에, 바탕 Cu 또는 Cu 합금도금이 실시되고, 또한 그 위에 Sn 또는 Sn 합금도금이 실시되고 있는 것을 특징으로 하는 전자전기기기부품용 동합금재.
- 제 3 항에 있어서, 상기 전자전기기기부품용 동합금재에, 바탕 Cu 또는 Cu 합금도금이 실시되고, 또한 그 위에 Sn 또는 Sn 합금도금이 실시되고, 또한, 리플로우처리가 행하여지고 있는 것을 특징으로 하는 전자전기기기부품용 동합금재.
- 제 3 항에 있어서, 상기 전자전기기기부품용 동합금재에, 바탕 Ni 또는 Ni 합금도금이 실시되고, 또한 그 위에 Au 또는 Au 합금도금이 실시되고 있는 것을 특징으로 하는 전자전기기기부품용 동합금재.
- Ni를 1.0∼3.0 질량%, Si를 0.2∼0.7 질량%, Mg을 0.01∼0.2 질량%, Sn을 0.05∼1.5 질량%, Zn을∼1.5 질량%, Ag, Co 및 Cr로 이루어지는 군에서 선택되는 1종 이상을 총량으로 0.005∼2.0 질량%(단지 Cr는 0.2 질량% 이하), S를 0.005 질량% 미만(0질량%를 포함한다) 함유하고, 잔부가 Cu 및 불가피한 불순물을 포함하여 구성되는 동합금재로서, 최종소성가공후의, 표면거침정도 Ra가 0 ㎛을 넘고 0.1 ㎛ 미만이거나, 또는 표면거침정도 Rmax가 0 ㎛을 넘고 2.0 ㎛ 미만인 것을 특징으로 하는 전자전기기기부품용 동합금재.
- 제 9 항에 있어서, 상기 전자전기기기부품용 동합금재에, Sn 또는 Sn 합금도금이 실시되고 있는 것을 특징으로 하는 전자전기기기부품용 동합금재.
- 제 9 항에 있어서, 상기 전자전기기기부품용 동합금재에, Sn 또는 Sn 합금도금이 실시되고, 또한, 리플로우처리가 행하여지고 있는 것을 특징으로 하는 전자전기기기부품용 동합금재.
- 제 9 항에 있어서, 상기 전자전기기기부품용 동합금재에, 바탕 Cu 또는 Cu 합금도금이 실시되고, 또한 그 위에 Sn 또는 Sn 합금도금이 실시되고 있는 것을 특징으로 하는 전자전기기기부품용 동합금재.
- 제 9 항에 있어서, 상기 전자전기기기부품용 동합금재에, 바탕 Cu 또는 Cu 합금도금이 실시되고, 또한 그 위에 Sn 또는 Sn 합금도금이 실시되고, 또한, 리플로우처리가 행하여지고 있는 것을 특징으로 하는 전자전기기기부품용 동합금재.
- 제 9 항에 있어서, 상기 전자전기기기부품용 동합금재에, 바탕 Ni 또는 Ni 합금도금이 실시되고, 또한 그 위에 Au 또는 Au 합금도금이 실시되고 있는 것을 특징으로 하는 전자전기기기부품용 동합금재.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000224425A JP3520034B2 (ja) | 2000-07-25 | 2000-07-25 | 電子電気機器部品用銅合金材 |
JPJP-P-2000-00224425 | 2000-07-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20020040677A true KR20020040677A (ko) | 2002-05-30 |
KR100519850B1 KR100519850B1 (ko) | 2005-10-07 |
Family
ID=18718391
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2001-7016149A KR100519850B1 (ko) | 2000-07-25 | 2001-05-24 | 전자전기기기부품용 동합금재 |
Country Status (8)
Country | Link |
---|---|
US (3) | US20020127133A1 (ko) |
EP (1) | EP1325964B1 (ko) |
JP (1) | JP3520034B2 (ko) |
KR (1) | KR100519850B1 (ko) |
CN (1) | CN1183263C (ko) |
DE (1) | DE60131763T2 (ko) |
TW (1) | TWI225519B (ko) |
WO (1) | WO2002008479A1 (ko) |
Families Citing this family (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3520034B2 (ja) * | 2000-07-25 | 2004-04-19 | 古河電気工業株式会社 | 電子電気機器部品用銅合金材 |
JP3520046B2 (ja) | 2000-12-15 | 2004-04-19 | 古河電気工業株式会社 | 高強度銅合金 |
US7090732B2 (en) | 2000-12-15 | 2006-08-15 | The Furukawa Electric, Co., Ltd. | High-mechanical strength copper alloy |
JP4584692B2 (ja) * | 2004-11-30 | 2010-11-24 | 株式会社神戸製鋼所 | 曲げ加工性に優れた高強度銅合金板およびその製造方法 |
JP2006286604A (ja) * | 2005-03-07 | 2006-10-19 | Furukawa Electric Co Ltd:The | 配線接続器具用金属材 |
JP4494258B2 (ja) | 2005-03-11 | 2010-06-30 | 三菱電機株式会社 | 銅合金およびその製造方法 |
US8317948B2 (en) * | 2005-03-24 | 2012-11-27 | Jx Nippon Mining & Metals Corporation | Copper alloy for electronic materials |
WO2006109801A1 (ja) * | 2005-04-12 | 2006-10-19 | Sumitomo Metal Industries, Ltd. | 銅合金およびその製造方法 |
JP5306591B2 (ja) * | 2005-12-07 | 2013-10-02 | 古河電気工業株式会社 | 配線用電線導体、配線用電線、及びそれらの製造方法 |
JP4986499B2 (ja) * | 2006-04-26 | 2012-07-25 | Jx日鉱日石金属株式会社 | Cu−Ni−Si合金すずめっき条の製造方法 |
ES2362346T3 (es) * | 2006-06-30 | 2011-07-01 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Placas conductoras para elementos de célula de combustible. |
US20080190523A1 (en) * | 2007-02-13 | 2008-08-14 | Weilin Gao | Cu-Ni-Si-based copper alloy sheet material and method of manufacturing same |
EP1967596B1 (en) * | 2007-02-13 | 2010-06-16 | Dowa Metaltech Co., Ltd. | Cu-Ni-Si-based copper alloy sheet material and method of manufacturing same |
JP5170881B2 (ja) * | 2007-03-26 | 2013-03-27 | 古河電気工業株式会社 | 電気・電子機器用銅合金材およびその製造方法 |
CN101541987B (zh) * | 2007-09-28 | 2011-01-26 | Jx日矿日石金属株式会社 | 电子材料用Cu-Ni-Si-Co系铜合金及其制造方法 |
CN101809177B (zh) * | 2007-10-03 | 2011-09-07 | 古河电气工业株式会社 | 电气电子部件用铜合金板材 |
EP2221390B1 (en) * | 2007-11-01 | 2014-06-18 | The Furukawa Electric Co., Ltd. | Method for producing a copper alloy sheet excellent in strength, bending workability and stress relaxation resistance |
US20100316879A1 (en) * | 2008-02-08 | 2010-12-16 | Kuniteru Mihara | Copper alloy material for electric/electronic components |
CN101946014A (zh) | 2008-02-18 | 2011-01-12 | 古河电气工业株式会社 | 铜合金材料 |
KR101114147B1 (ko) * | 2008-03-31 | 2012-03-13 | 후루카와 덴키 고교 가부시키가이샤 | 전기전자기기용 동합금 재료 및 전기전자부품 |
JP2010018885A (ja) * | 2008-06-12 | 2010-01-28 | Furukawa Electric Co Ltd:The | 電解銅皮膜、その製造方法及び銅電解皮膜製造用の銅電解液 |
CN101440444B (zh) * | 2008-12-02 | 2010-05-12 | 路达(厦门)工业有限公司 | 无铅易切削高锌硅黄铜合金及其制造方法 |
JP4708485B2 (ja) * | 2009-03-31 | 2011-06-22 | Jx日鉱日石金属株式会社 | 電子材料用Cu−Co−Si系銅合金及びその製造方法 |
JP5476149B2 (ja) * | 2010-02-10 | 2014-04-23 | 株式会社神戸製鋼所 | 強度異方性が小さく曲げ加工性に優れた銅合金 |
WO2011125153A1 (ja) * | 2010-04-02 | 2011-10-13 | Jx日鉱日石金属株式会社 | 電子材料用Cu-Ni-Si系合金 |
WO2012160684A1 (ja) * | 2011-05-25 | 2012-11-29 | 三菱伸銅株式会社 | 深絞り加工性に優れたCu-Ni-Si系銅合金板及びその製造方法 |
KR20140025607A (ko) | 2011-08-04 | 2014-03-04 | 가부시키가이샤 고베 세이코쇼 | 구리 합금 |
JP5827090B2 (ja) * | 2011-09-29 | 2015-12-02 | 三菱伸銅株式会社 | 導電性、耐熱性及び曲げ加工性に優れたCu−Fe−P系銅合金板及びその製造方法 |
JP5610643B2 (ja) * | 2012-03-28 | 2014-10-22 | Jx日鉱日石金属株式会社 | Cu−Ni−Si系銅合金条及びその製造方法 |
WO2014016934A1 (ja) * | 2012-07-26 | 2014-01-30 | 三菱電機株式会社 | 銅合金及びその製造方法 |
JP5501495B1 (ja) * | 2013-03-18 | 2014-05-21 | 三菱マテリアル株式会社 | 電子・電気機器用銅合金、電子・電気機器用銅合金薄板、電子・電気機器用導電部品及び端子 |
JP6166414B1 (ja) * | 2016-03-30 | 2017-07-19 | 株式会社神戸製鋼所 | ベーパチャンバー用銅又は銅合金条 |
RU2618955C1 (ru) * | 2016-07-11 | 2017-05-11 | Юлия Алексеевна Щепочкина | Сплав на основе меди |
JP6302009B2 (ja) * | 2016-07-12 | 2018-03-28 | 古河電気工業株式会社 | 銅合金圧延材及びその製造方法並びに電気電子部品 |
CN106222480A (zh) * | 2016-08-29 | 2016-12-14 | 芜湖楚江合金铜材有限公司 | 一种环保的高耐磨铜线及其加工工艺 |
CN106119596A (zh) * | 2016-08-30 | 2016-11-16 | 芜湖楚江合金铜材有限公司 | 一种环保无铅高性能的铜合金线材及其加工工艺 |
RU2629403C1 (ru) * | 2016-12-06 | 2017-08-29 | Юлия Алексеевна Щепочкина | Спеченный сплав на основе меди |
MX2017001955A (es) * | 2017-02-10 | 2018-08-09 | Nac De Cobre S A De C V | Aleaciones de cobre bajas en plomo. |
JP7296757B2 (ja) * | 2019-03-28 | 2023-06-23 | Jx金属株式会社 | 銅合金、伸銅品及び電子機器部品 |
Family Cites Families (48)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5841782B2 (ja) * | 1978-11-20 | 1983-09-14 | 玉川機械金属株式会社 | Ic用リ−ド材 |
JPS5853059B2 (ja) | 1979-12-25 | 1983-11-26 | 日本鉱業株式会社 | 析出硬化型銅合金 |
US4425168A (en) * | 1982-09-07 | 1984-01-10 | Cabot Corporation | Copper beryllium alloy and the manufacture thereof |
JPS59193233A (ja) | 1983-04-15 | 1984-11-01 | Toshiba Corp | 銅合金 |
EP0132415B1 (en) * | 1983-07-26 | 1988-11-02 | Oki Electric Industry Company, Limited | Printing system for a dot printer |
US4612167A (en) * | 1984-03-02 | 1986-09-16 | Hitachi Metals, Ltd. | Copper-base alloys for leadframes |
JPS61127842A (ja) | 1984-11-24 | 1986-06-16 | Kobe Steel Ltd | 端子・コネクタ−用銅合金およびその製造方法 |
US4656003A (en) * | 1984-10-20 | 1987-04-07 | Kabushiki Kaisha Kobe Seiko Sho | Copper alloy and production of the same |
DE3660351D1 (en) * | 1985-02-01 | 1988-08-04 | Kobe Steel Ltd | Lead material for ceramic package ic |
US4728372A (en) | 1985-04-26 | 1988-03-01 | Olin Corporation | Multipurpose copper alloys and processing therefor with moderate conductivity and high strength |
US4594221A (en) | 1985-04-26 | 1986-06-10 | Olin Corporation | Multipurpose copper alloys with moderate conductivity and high strength |
JPS63130739A (ja) | 1986-11-20 | 1988-06-02 | Nippon Mining Co Ltd | 半導体機器リ−ド材又は導電性ばね材用高力高導電銅合金 |
JPH01180932A (ja) * | 1988-01-11 | 1989-07-18 | Kobe Steel Ltd | ピン・グリッド・アレイicリードピン用高力高導電性銅合金 |
JPH01272733A (ja) | 1988-04-25 | 1989-10-31 | Mitsubishi Shindoh Co Ltd | 半導体装置用Cu合金製リードフレーム材 |
JPH02118037A (ja) | 1988-10-28 | 1990-05-02 | Nippon Mining Co Ltd | 酸化膜密着性に優れた高力高導電性銅合金 |
JP2714560B2 (ja) | 1988-12-24 | 1998-02-16 | 日鉱金属株式会社 | ダイレクトボンディング性の良好な銅合金 |
US5028391A (en) | 1989-04-28 | 1991-07-02 | Amoco Metal Manufacturing Inc. | Copper-nickel-silicon-chromium alloy |
JPH03188247A (ja) | 1989-12-14 | 1991-08-16 | Nippon Mining Co Ltd | 曲げ加工性の良好な高強度高導電銅合金の製造方法 |
JP2977845B2 (ja) * | 1990-01-30 | 1999-11-15 | 株式会社神戸製鋼所 | ばね特性、強度及び導電性に優れた耐マイグレーション性端子・コネクタ用銅合金 |
JP2503793B2 (ja) * | 1991-03-01 | 1996-06-05 | 三菱伸銅株式会社 | 打抜金型の摩耗抑制効果を有する電気電子部品用Cu合金板材 |
JPH0830235B2 (ja) * | 1991-04-24 | 1996-03-27 | 日鉱金属株式会社 | 導電性ばね用銅合金 |
JPH051367A (ja) * | 1991-06-24 | 1993-01-08 | Mitsubishi Electric Corp | 電気・電子機器用銅合金材料 |
JPH05311278A (ja) | 1991-11-28 | 1993-11-22 | Nikko Kinzoku Kk | 応力緩和特性を改善した銅合金 |
JP3094045B2 (ja) | 1991-12-16 | 2000-10-03 | 富士写真フイルム株式会社 | ディジタル電子スチル・カメラおよびその制御方法 |
US5463247A (en) * | 1992-06-11 | 1995-10-31 | Mitsubishi Shindoh Co., Ltd. | Lead frame material formed of copper alloy for resin sealed type semiconductor devices |
JP2797846B2 (ja) | 1992-06-11 | 1998-09-17 | 三菱伸銅株式会社 | 樹脂封止型半導体装置のCu合金製リードフレーム材 |
JP3275377B2 (ja) | 1992-07-28 | 2002-04-15 | 三菱伸銅株式会社 | 微細組織を有する電気電子部品用Cu合金板材 |
JP2501275B2 (ja) | 1992-09-07 | 1996-05-29 | 株式会社東芝 | 導電性および強度を兼備した銅合金 |
JPH06100983A (ja) * | 1992-09-22 | 1994-04-12 | Nippon Steel Corp | 高ヤング率・高降伏強度を有するtabテープ用金属箔およびその製造方法 |
KR940010455B1 (ko) | 1992-09-24 | 1994-10-22 | 김영길 | 고강도, 우수한 전기전도도 및 열적안정성을 갖는 동(Cu)합금 및 그 제조방법 |
US5508001A (en) | 1992-11-13 | 1996-04-16 | Mitsubishi Sindoh Co., Ltd. | Copper based alloy for electrical and electronic parts excellent in hot workability and blankability |
JP3511648B2 (ja) | 1993-09-27 | 2004-03-29 | 三菱伸銅株式会社 | 高強度Cu合金薄板条の製造方法 |
DE4415067C2 (de) | 1994-04-29 | 1996-02-22 | Diehl Gmbh & Co | Verfahren zur Herstellung einer Kupfer-Nickel-Silizium-Legierung und deren Verwendung |
JP3728776B2 (ja) | 1995-08-10 | 2005-12-21 | 三菱伸銅株式会社 | めっき予備処理工程中にスマットが発生することのない高強度銅合金 |
KR0157257B1 (ko) * | 1995-12-08 | 1998-11-16 | 정훈보 | 석출물 성장 억제형 고강도, 고전도성 동합금 및 그 제조방법 |
US5833920A (en) | 1996-02-20 | 1998-11-10 | Mitsubishi Denki Kabushiki Kaisha | Copper alloy for electronic parts, lead-frame, semiconductor device and connector |
JP3408929B2 (ja) * | 1996-07-11 | 2003-05-19 | 同和鉱業株式会社 | 銅基合金およびその製造方法 |
JP3344924B2 (ja) | 1997-03-31 | 2002-11-18 | 日鉱金属株式会社 | 酸化膜密着性の高いリードフレーム用銅合金 |
JP3800269B2 (ja) | 1997-07-23 | 2006-07-26 | 株式会社神戸製鋼所 | スタンピング加工性及び銀めっき性に優れる高力銅合金 |
JP4308931B2 (ja) * | 1997-11-04 | 2009-08-05 | 三菱伸銅株式会社 | SnまたはSn合金メッキ銅合金薄板およびその薄板で製造したコネクタ |
JP3510469B2 (ja) * | 1998-01-30 | 2004-03-29 | 古河電気工業株式会社 | 導電性ばね用銅合金及びその製造方法 |
JP3797786B2 (ja) * | 1998-03-06 | 2006-07-19 | 株式会社神戸製鋼所 | 電気・電子部品用銅合金 |
JP3739214B2 (ja) * | 1998-03-26 | 2006-01-25 | 株式会社神戸製鋼所 | 電子部品用銅合金板 |
TW448235B (en) | 1998-12-29 | 2001-08-01 | Ind Tech Res Inst | High-strength and high-conductivity Cu-(Ni, Co)-Si copper alloy for use in leadframes and method of making the same |
JP3520034B2 (ja) | 2000-07-25 | 2004-04-19 | 古河電気工業株式会社 | 電子電気機器部品用銅合金材 |
JP3520046B2 (ja) | 2000-12-15 | 2004-04-19 | 古河電気工業株式会社 | 高強度銅合金 |
US7090732B2 (en) * | 2000-12-15 | 2006-08-15 | The Furukawa Electric, Co., Ltd. | High-mechanical strength copper alloy |
JP3824884B2 (ja) | 2001-05-17 | 2006-09-20 | 古河電気工業株式会社 | 端子ないしはコネクタ用銅合金材 |
-
2000
- 2000-07-25 JP JP2000224425A patent/JP3520034B2/ja not_active Expired - Fee Related
-
2001
- 2001-05-24 DE DE60131763T patent/DE60131763T2/de not_active Expired - Lifetime
- 2001-05-24 TW TW090112482A patent/TWI225519B/zh not_active IP Right Cessation
- 2001-05-24 KR KR10-2001-7016149A patent/KR100519850B1/ko active IP Right Grant
- 2001-05-24 WO PCT/JP2001/004351 patent/WO2002008479A1/ja active IP Right Grant
- 2001-05-24 CN CNB018009425A patent/CN1183263C/zh not_active Expired - Lifetime
- 2001-05-24 EP EP01934329A patent/EP1325964B1/en not_active Expired - Lifetime
- 2001-11-02 US US10/005,880 patent/US20020127133A1/en not_active Abandoned
-
2003
- 2003-01-30 US US10/354,151 patent/US7172662B2/en not_active Expired - Fee Related
-
2005
- 2005-05-17 US US11/130,134 patent/US20050208323A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
JP2002038228A (ja) | 2002-02-06 |
KR100519850B1 (ko) | 2005-10-07 |
JP3520034B2 (ja) | 2004-04-19 |
TWI225519B (en) | 2004-12-21 |
EP1325964A4 (en) | 2003-07-30 |
DE60131763T2 (de) | 2008-10-30 |
CN1183263C (zh) | 2005-01-05 |
US20020127133A1 (en) | 2002-09-12 |
WO2002008479A1 (fr) | 2002-01-31 |
DE60131763D1 (de) | 2008-01-17 |
US20030165708A1 (en) | 2003-09-04 |
EP1325964B1 (en) | 2007-12-05 |
US7172662B2 (en) | 2007-02-06 |
CN1366556A (zh) | 2002-08-28 |
US20050208323A1 (en) | 2005-09-22 |
EP1325964A1 (en) | 2003-07-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100519850B1 (ko) | 전자전기기기부품용 동합금재 | |
KR101113356B1 (ko) | 동합금 재료, 전기전자 부품 및 동합금 재료의 제조방법 | |
EP1997920B1 (en) | Copper alloy for electric and electronic equipments | |
JP6052829B2 (ja) | 電気電子部品用銅合金材 | |
WO2009104615A1 (ja) | 銅合金材 | |
US6893514B2 (en) | High-mechanical strength copper alloy | |
KR950004935B1 (ko) | 전자 기기용 구리 합금 | |
JPWO2009057788A1 (ja) | 強度、曲げ加工性、耐応力緩和特性に優れる銅合金材およびその製造方法 | |
EP2221391B1 (en) | Copper alloy sheet | |
JP3824884B2 (ja) | 端子ないしはコネクタ用銅合金材 | |
JP2001207229A (ja) | 電子材料用銅合金 | |
KR100329153B1 (ko) | 단자 및 커넥터용 구리합금 및 그 제조방법 | |
JP3717321B2 (ja) | 半導体リードフレーム用銅合金 | |
JP2012207261A (ja) | 電気電子部品用銅合金板 | |
JP3748709B2 (ja) | 耐応力緩和特性に優れた銅合金板及びその製造方法 | |
US20040045640A1 (en) | High-mechanical strength copper alloy | |
JPH10195562A (ja) | 打抜加工性に優れた電気電子機器用銅合金およびその製造方法 | |
JP2007246931A (ja) | 電気伝導性に優れた電子電気機器部品用銅合金 | |
JP2007169764A (ja) | 銅合金 | |
JP3094045U (ja) | 銅合金製導電性ばね | |
US20200321719A1 (en) | Terminal fitting | |
JP2006176886A (ja) | 端子ないしはコネクタ用銅合金材 | |
KR20100129778A (ko) | 전기전자기기용 동합금 재료 및 전기전자부품 | |
JPH08209271A (ja) | はんだ接合強度に優れた電子機器用銅合金とその製造法 | |
JPS6286135A (ja) | 電子機器用銅合金 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
AMND | Amendment | ||
E601 | Decision to refuse application | ||
J201 | Request for trial against refusal decision | ||
AMND | Amendment | ||
B701 | Decision to grant | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20120907 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20130903 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20140901 Year of fee payment: 10 |
|
FPAY | Annual fee payment |
Payment date: 20150827 Year of fee payment: 11 |
|
FPAY | Annual fee payment |
Payment date: 20160831 Year of fee payment: 12 |
|
FPAY | Annual fee payment |
Payment date: 20170830 Year of fee payment: 13 |
|
FPAY | Annual fee payment |
Payment date: 20180920 Year of fee payment: 14 |
|
FPAY | Annual fee payment |
Payment date: 20190919 Year of fee payment: 15 |