KR101297917B1 - 대안적인 불화 붕소 전구체를 이용한 붕소 이온 주입 방법,및 주입을 위한 대형 수소화붕소의 형성 방법 - Google Patents

대안적인 불화 붕소 전구체를 이용한 붕소 이온 주입 방법,및 주입을 위한 대형 수소화붕소의 형성 방법 Download PDF

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KR101297917B1
KR101297917B1 KR1020087007729A KR20087007729A KR101297917B1 KR 101297917 B1 KR101297917 B1 KR 101297917B1 KR 1020087007729 A KR1020087007729 A KR 1020087007729A KR 20087007729 A KR20087007729 A KR 20087007729A KR 101297917 B1 KR101297917 B1 KR 101297917B1
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boron
reactor
containing ions
substrate
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KR20080042912A (ko
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칼 엠 올랜더
호세 아이 아노
로버트 케임
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어드밴스드 테크놀러지 머티리얼즈, 인코포레이티드
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    • H10P30/20
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08Ion sources; Ion guns
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H10P30/204
    • H10P30/21
    • H10P30/224
    • H10P30/225
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/006Details of gas supplies, e.g. in an ion source, to a beam line, to a specimen or to a workpiece
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06Sources
    • H01J2237/08Ion sources
    • H01J2237/0815Methods of ionisation
    • H01J2237/082Electron beam

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  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
KR1020087007729A 2005-08-30 2006-08-30 대안적인 불화 붕소 전구체를 이용한 붕소 이온 주입 방법,및 주입을 위한 대형 수소화붕소의 형성 방법 Active KR101297917B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US71264705P 2005-08-30 2005-08-30
US60/712,647 2005-08-30
PCT/US2006/033899 WO2007027798A2 (en) 2005-08-30 2006-08-30 Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantation

Related Child Applications (1)

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KR1020127004010A Division KR101297964B1 (ko) 2005-08-30 2006-08-30 대안적인 불화 붕소 전구체를 이용한 붕소 이온 주입 방법, 및 주입을 위한 대형 수소화붕소의 형성 방법

Publications (2)

Publication Number Publication Date
KR20080042912A KR20080042912A (ko) 2008-05-15
KR101297917B1 true KR101297917B1 (ko) 2013-08-27

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KR1020087007729A Active KR101297917B1 (ko) 2005-08-30 2006-08-30 대안적인 불화 붕소 전구체를 이용한 붕소 이온 주입 방법,및 주입을 위한 대형 수소화붕소의 형성 방법
KR1020127004010A Active KR101297964B1 (ko) 2005-08-30 2006-08-30 대안적인 불화 붕소 전구체를 이용한 붕소 이온 주입 방법, 및 주입을 위한 대형 수소화붕소의 형성 방법

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Country Status (8)

Country Link
US (3) US7943204B2 (enExample)
EP (2) EP1933992B1 (enExample)
JP (3) JP5591470B2 (enExample)
KR (2) KR101297917B1 (enExample)
CN (2) CN103170447B (enExample)
SG (2) SG165321A1 (enExample)
TW (4) TWI450994B (enExample)
WO (1) WO2007027798A2 (enExample)

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