KR101041306B1 - 기판처리장치 및 이에 사용되는 기판지지부재 - Google Patents
기판처리장치 및 이에 사용되는 기판지지부재 Download PDFInfo
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- KR101041306B1 KR101041306B1 KR1020090005330A KR20090005330A KR101041306B1 KR 101041306 B1 KR101041306 B1 KR 101041306B1 KR 1020090005330 A KR1020090005330 A KR 1020090005330A KR 20090005330 A KR20090005330 A KR 20090005330A KR 101041306 B1 KR101041306 B1 KR 101041306B1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
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- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Chemical & Material Sciences (AREA)
- Weting (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
Description
Claims (10)
- 기판을 지지하는 지지부, 및 이 지지부에 지지된 기판의 일(一) 주면(主面)의 측방을 둘러싸고, 해당 주면과 이어지도록 형성된 연장면을 갖는 기판보유지지기구와,상기 기판보유지지기구를 회전시키는 회전기구와,상기 기판보유지지기구에 보유지지된 기판의 상기 주면 위에 에칭액을 공급하는 에칭액 공급기구를 포함하고,상기 지지부가, 기판을 수평자세로 지지하는 것이며,상기 지지부가, 상기 지지부에 지지된 기판의 상기 주면이 상기 연장면보다 높아지도록 설치되어 있는 기판처리장치.
- 제1항에 있어서,상기 기판보유지지기구가, 기판지지부재와, 상기 기판지지부재를 지지하는 베이스부재를 갖추고,상기 지지부 및 상기 연장면이 상기 기판지지부재에 설치되어 있으며,상기 회전기구가, 상기 베이스부재를 상기 기판지지부재째로 회전시키는 베이스부재 회전기구를 포함하는 기판처리장치.
- 제1항에 있어서,상기 기판보유지지기구가, 상기 지지부 및 상기 연장면을 갖는 베이스부재를 갖추고,상기 회전기구가, 상기 베이스부재를 회전시키는 베이스부재 회전기구를 포 함하는 기판처리장치.
- 제1항에 있어서,상기 연장면이, 상기 지지부에 지지되는 기판의 상기 주면보다 에칭액에 대한 친액성이 높은 표면인 기판처리장치.
- 삭제
- 제1항에 있어서,상기 지지부가, 상기 지지부에 지지된 기판에 대해 에칭액을 사용한 처리가 행해진 후의 기판의 상기 주면이 상기 연장면보다 높아지도록 설치되어 있는 기판처리장치.
- 제1항에 있어서,상기 지지부가, 기판을 수평자세로 지지하는 것이며,상기 기판보유지지기구가, 상기 연장면에 있어서의 기판의 회전반경방향의 바깥쪽으로 이어져서, 기판의 회전반경방향의 바깥쪽을 향함에 따라 낮아지는 테이 퍼면을 더 포함하는 기판처리장치.
- 제1항에 있어서,상기 에칭액 공급기구가, 상기 회전기구에 의해 회전되는 기판의 상기 주면 위의 전역을 주사(走査)하도록 에칭액을 공급하는 기판처리장치.
- 제8항에 있어서,상기 에칭액 공급기구가, 상기 회전기구에 의해 회전되는 기판의 주면 위 뿐만이 아니라, 해당 기판의 주단(周端)위치보다 기판의 회전반경방향의 바깥쪽 위치까지 주사되는 기판처리장치.
- 에칭액을 사용하여 기판을 처리하는 기판처리장치에 사용되고, 기판을 지지하기 위한 기판지지부재로서,기판을 지지하는 지지부, 및 이 지지부에 지지된 기판의 일 주면의 측방을 둘러싸고, 해당 주면과 이어지도록 형성된 연장면을 포함하고,상기 지지부가, 기판을 수평자세로 지지하는 것이며,상기 지지부가, 상기 지지부에 지지된 기판의 상기 주면이 상기 연장면보다 높아지도록 설치되어 있는 기판지지부재.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
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JPJP-P-2008-021776 | 2008-01-31 | ||
JP2008021776 | 2008-01-31 | ||
JPJP-P-2008-307995 | 2008-12-02 | ||
JP2008307995A JP5312923B2 (ja) | 2008-01-31 | 2008-12-02 | 基板処理装置 |
Publications (2)
Publication Number | Publication Date |
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KR20090084688A KR20090084688A (ko) | 2009-08-05 |
KR101041306B1 true KR101041306B1 (ko) | 2011-06-14 |
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Application Number | Title | Priority Date | Filing Date |
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KR1020090005330A KR101041306B1 (ko) | 2008-01-31 | 2009-01-22 | 기판처리장치 및 이에 사용되는 기판지지부재 |
Country Status (5)
Country | Link |
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US (2) | US20090194234A1 (ko) |
JP (1) | JP5312923B2 (ko) |
KR (1) | KR101041306B1 (ko) |
CN (1) | CN101499418B (ko) |
TW (1) | TWI388032B (ko) |
Families Citing this family (27)
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JP5312923B2 (ja) | 2008-01-31 | 2013-10-09 | 大日本スクリーン製造株式会社 | 基板処理装置 |
JP5276420B2 (ja) * | 2008-01-31 | 2013-08-28 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理方法 |
JP5236553B2 (ja) * | 2009-03-30 | 2013-07-17 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理方法 |
CN101773917B (zh) * | 2010-03-05 | 2015-01-07 | 上海集成电路研发中心有限公司 | 硅片清洗装置及方法 |
JP5291039B2 (ja) * | 2010-03-31 | 2013-09-18 | 大日本スクリーン製造株式会社 | 基板保持回転装置および基板処理装置 |
WO2011135655A1 (ja) * | 2010-04-26 | 2011-11-03 | 三菱電機株式会社 | ウェットエッチング用治具 |
JP5795917B2 (ja) * | 2010-09-27 | 2015-10-14 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
CN102453915B (zh) * | 2010-10-27 | 2014-03-12 | 富葵精密组件(深圳)有限公司 | 蚀刻装置及使用该蚀刻装置蚀刻基板的方法 |
JP5782279B2 (ja) | 2011-01-20 | 2015-09-24 | 株式会社Screenホールディングス | 基板処理方法および基板処理装置 |
JP5795920B2 (ja) * | 2011-09-21 | 2015-10-14 | 株式会社Screenホールディングス | 基板処理装置 |
JP5844104B2 (ja) * | 2011-09-28 | 2016-01-13 | 株式会社Screenホールディングス | スリットノズルおよび基板処理装置 |
US20140041803A1 (en) * | 2012-08-08 | 2014-02-13 | Lam Research Ag | Method and apparatus for liquid treatment of wafer shaped articles |
US10593521B2 (en) * | 2013-03-12 | 2020-03-17 | Applied Materials, Inc. | Substrate support for plasma etch operations |
JP6182347B2 (ja) * | 2013-04-19 | 2017-08-16 | 株式会社荏原製作所 | 基板処理装置 |
JP2015216255A (ja) * | 2014-05-12 | 2015-12-03 | キヤノン株式会社 | エッチングチャンバー、および基板の製造方法 |
US9799539B2 (en) * | 2014-06-16 | 2017-10-24 | Lam Research Ag | Method and apparatus for liquid treatment of wafer shaped articles |
JP6389089B2 (ja) * | 2014-09-18 | 2018-09-12 | 株式会社Screenホールディングス | 基板処理装置および基板処理方法 |
JP6373803B2 (ja) * | 2015-06-23 | 2018-08-15 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法および記憶媒体 |
JP6596396B2 (ja) | 2016-08-09 | 2019-10-23 | 東芝メモリ株式会社 | 基板の洗浄方法および洗浄装置 |
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JP5312923B2 (ja) | 2013-10-09 |
CN101499418A (zh) | 2009-08-05 |
TWI388032B (zh) | 2013-03-01 |
TW200939390A (en) | 2009-09-16 |
US20150325449A1 (en) | 2015-11-12 |
JP2009206485A (ja) | 2009-09-10 |
US9401283B2 (en) | 2016-07-26 |
CN101499418B (zh) | 2012-08-15 |
KR20090084688A (ko) | 2009-08-05 |
US20090194234A1 (en) | 2009-08-06 |
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