KR100967823B1 - 액정표시장치 - Google Patents

액정표시장치 Download PDF

Info

Publication number
KR100967823B1
KR100967823B1 KR1020030011674A KR20030011674A KR100967823B1 KR 100967823 B1 KR100967823 B1 KR 100967823B1 KR 1020030011674 A KR1020030011674 A KR 1020030011674A KR 20030011674 A KR20030011674 A KR 20030011674A KR 100967823 B1 KR100967823 B1 KR 100967823B1
Authority
KR
South Korea
Prior art keywords
island
substrate
transparent conductive
conductive film
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020030011674A
Other languages
English (en)
Korean (ko)
Other versions
KR20030071627A (ko
Inventor
야마자키순페이
에구치신고
시오노이리유타카
후지모토에쓰코
Original Assignee
가부시키가이샤 한도오따이 에네루기 켄큐쇼
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 한도오따이 에네루기 켄큐쇼 filed Critical 가부시키가이샤 한도오따이 에네루기 켄큐쇼
Publication of KR20030071627A publication Critical patent/KR20030071627A/ko
Application granted granted Critical
Publication of KR100967823B1 publication Critical patent/KR100967823B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133553Reflecting elements
    • G02F1/133555Transflectors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1343Electrodes
    • G02F1/134309Electrodes characterised by their geometrical arrangement
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1343Electrodes
    • G02F1/13439Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/136227Through-hole connection of the pixel electrode to the active element through an insulation layer
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/1368Active matrix addressed cells in which the switching element is a three-electrode device
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/6729Thin-film transistors [TFT] characterised by the electrodes
    • H10D30/673Thin-film transistors [TFT] characterised by the electrodes characterised by the shapes, relative sizes or dispositions of the gate electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/481Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs integrated with passive devices, e.g. auxiliary capacitors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/12Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode
    • G02F2201/123Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode pixel

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Liquid Crystal (AREA)
  • Geometry (AREA)
  • Thin Film Transistor (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
KR1020030011674A 2002-03-01 2003-02-25 액정표시장치 Expired - Fee Related KR100967823B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2002-00055830 2002-03-01
JP2002055830A JP4101533B2 (ja) 2002-03-01 2002-03-01 半透過型の液晶表示装置の作製方法

Publications (2)

Publication Number Publication Date
KR20030071627A KR20030071627A (ko) 2003-09-06
KR100967823B1 true KR100967823B1 (ko) 2010-07-05

Family

ID=27800058

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020030011674A Expired - Fee Related KR100967823B1 (ko) 2002-03-01 2003-02-25 액정표시장치

Country Status (5)

Country Link
US (3) US7053969B2 (https=)
JP (1) JP4101533B2 (https=)
KR (1) KR100967823B1 (https=)
CN (2) CN1442741B (https=)
TW (1) TWI308235B (https=)

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4087620B2 (ja) * 2002-03-01 2008-05-21 株式会社半導体エネルギー研究所 液晶表示装置の作製方法
JP4237442B2 (ja) 2002-03-01 2009-03-11 株式会社半導体エネルギー研究所 半透過型液晶表示装置
JP4101533B2 (ja) * 2002-03-01 2008-06-18 株式会社半導体エネルギー研究所 半透過型の液晶表示装置の作製方法
WO2004011522A1 (ja) * 2002-07-30 2004-02-05 Toagosei Co., Ltd. ホログラム記録用組成物およびその硬化方法ならびに硬化物
CN100395607C (zh) * 2002-09-20 2008-06-18 株式会社日立显示器 半透过反射型液晶显示器件
KR100752214B1 (ko) * 2003-10-16 2007-08-28 엘지.필립스 엘시디 주식회사 반투과형 액정표시소자의 제조방법
KR101013715B1 (ko) * 2003-12-23 2011-02-10 엘지디스플레이 주식회사 액정표시소자 및 그 제조방법
JP2005266206A (ja) * 2004-03-18 2005-09-29 Hitachi Chem Co Ltd 液晶表示装置
US7177000B2 (en) * 2004-05-18 2007-02-13 Automotive Systems Laboratory, Inc. Liquid crystal display cell structure and manufacture process of a liquid crystal display comprising an opening formed through the color filter and partially the buffer layer
JP4817730B2 (ja) * 2004-07-09 2011-11-16 株式会社半導体エネルギー研究所 表示装置
US7554260B2 (en) * 2004-07-09 2009-06-30 Semiconductor Energy Laboratory Co., Ltd. Display device provided with a conductive film connection between a wiring component and a metal electrode film
KR101048903B1 (ko) * 2004-08-26 2011-07-12 엘지디스플레이 주식회사 액정표시소자 및 그 제조방법
JP4622430B2 (ja) * 2004-09-30 2011-02-02 セイコーエプソン株式会社 液晶表示装置
US8149346B2 (en) * 2005-10-14 2012-04-03 Semiconductor Energy Laboratory Co., Ltd. Display device and manufacturing method thereof
EP2261729B1 (en) * 2005-10-18 2014-05-07 Semiconductor Energy Laboratory Co, Ltd. Liquid crystal display device and electronic apparatus
US7821613B2 (en) 2005-12-28 2010-10-26 Semiconductor Energy Laboratory Co., Ltd. Display device and manufacturing method thereof
JP2007183452A (ja) * 2006-01-10 2007-07-19 Epson Imaging Devices Corp 半透過型液晶表示装置
JP5252334B2 (ja) * 2006-06-02 2013-07-31 Nltテクノロジー株式会社 半透過型液晶表示装置
EP2085814A4 (en) * 2006-10-18 2010-05-19 Sharp Kk Liquid crystal display arrangement and method for producing a liquid crystal display
CN102598280B (zh) 2009-10-21 2016-05-18 株式会社半导体能源研究所 液晶显示器件及包括该液晶显示器件的电子设备
WO2011081041A1 (en) 2009-12-28 2011-07-07 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for manufacturing the semiconductor device
WO2011081011A1 (en) * 2009-12-28 2011-07-07 Semiconductor Energy Laboratory Co., Ltd. Liquid crystal display device and manufacturing method thereof
KR101842865B1 (ko) * 2009-12-28 2018-03-28 가부시키가이샤 한도오따이 에네루기 켄큐쇼 액정 표시 장치 및 전자 기기
WO2011081010A1 (en) * 2009-12-28 2011-07-07 Semiconductor Energy Laboratory Co., Ltd. Liquid crystal display device and electronic device
KR102008754B1 (ko) 2010-01-24 2019-08-09 가부시키가이샤 한도오따이 에네루기 켄큐쇼 표시 장치와 이의 제조 방법
US8879010B2 (en) 2010-01-24 2014-11-04 Semiconductor Energy Laboratory Co., Ltd. Display device
US9000438B2 (en) 2010-02-26 2015-04-07 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
WO2011145537A1 (en) 2010-05-21 2011-11-24 Semiconductor Energy Laboratory Co., Ltd. Liquid crystal display device
JP5852793B2 (ja) 2010-05-21 2016-02-03 株式会社半導体エネルギー研究所 液晶表示装置の作製方法
WO2012086513A1 (ja) * 2010-12-20 2012-06-28 シャープ株式会社 半導体装置および表示装置
JPWO2013008359A1 (ja) * 2011-07-13 2015-02-23 パナソニック株式会社 液晶表示装置およびその製造方法
CN102637638B (zh) * 2012-04-28 2014-02-26 深圳市华星光电技术有限公司 一种薄膜晶体管阵列基板及其制作方法
JP2017062299A (ja) * 2015-09-24 2017-03-30 セイコーエプソン株式会社 電気光学装置および電子機器
WO2017064593A1 (en) 2015-10-12 2017-04-20 Semiconductor Energy Laboratory Co., Ltd. Display device and manufacturing method thereof
CN105304650A (zh) * 2015-11-04 2016-02-03 深圳市华星光电技术有限公司 薄膜晶体管阵列基板及其制备方法、显示装置
WO2017081575A1 (en) 2015-11-11 2017-05-18 Semiconductor Energy Laboratory Co., Ltd. Display device and method for manufacturing the same
KR101786884B1 (ko) * 2015-11-30 2017-10-18 엘지디스플레이 주식회사 홀을 구비한 이형 디스플레이
JP2017138403A (ja) * 2016-02-02 2017-08-10 株式会社ジャパンディスプレイ 表示装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11258596A (ja) 1998-03-11 1999-09-24 Nec Corp 反射型液晶表示装置及びその製造方法
JP2000305099A (ja) 1999-04-23 2000-11-02 Toshiba Corp 液晶表示装置
JP2001108984A (ja) 1999-10-08 2001-04-20 Matsushita Electric Ind Co Ltd 反射型液晶画像表示装置と画像表示装置用半導体装置の製造方法
KR20010072492A (ko) * 1999-07-07 2001-07-31 모리시타 요이찌 반투과형 액정 표시장치

Family Cites Families (95)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4040727A (en) * 1975-09-10 1977-08-09 Rockwell International Corporation Transflector
AT356190B (de) * 1976-06-16 1980-04-10 Bbc Brown Boveri & Cie Fluessigkristallanzeige
JPS55103583A (en) 1979-01-31 1980-08-07 Nippon Electric Co Reflecting transmission body
JPS6124102A (ja) 1984-07-12 1986-02-01 旭硝子株式会社 導体
GB2203881B (en) * 1987-04-16 1991-03-27 Philips Electronic Associated Liquid crystal display device
JP2604867B2 (ja) * 1990-01-11 1997-04-30 松下電器産業株式会社 反射型液晶表示デバイス
US5136351A (en) * 1990-03-30 1992-08-04 Sharp Kabushiki Kaisha Photovoltaic device with porous metal layer
JP2652087B2 (ja) * 1990-03-30 1997-09-10 シャープ株式会社 光起電力装置とその製造方法
JP3111478B2 (ja) * 1991-02-06 2000-11-20 三菱電機株式会社 金属薄膜のテーパーエッチング方法及び薄膜トランジスタ
US5424244A (en) * 1992-03-26 1995-06-13 Semiconductor Energy Laboratory Co., Ltd. Process for laser processing and apparatus for use in the same
JP3156400B2 (ja) 1992-11-09 2001-04-16 富士通株式会社 反射型液晶表示デバイス
JP3028271B2 (ja) 1993-07-09 2000-04-04 キヤノン株式会社 液晶表示素子及びその製造方法
US5629783A (en) * 1993-10-05 1997-05-13 Casio Computer Co., Ltd. Active matrix polymer dispersed liquid crystal display device with flourescent film
US5869362A (en) * 1993-12-02 1999-02-09 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing semiconductor device
US5753937A (en) * 1994-05-31 1998-05-19 Casio Computer Co., Ltd. Color liquid crystal display device having a semitransparent layer on the inner surface of one of the substrates
JP3301219B2 (ja) * 1994-06-09 2002-07-15 カシオ計算機株式会社 液晶表示装置
JP3464287B2 (ja) 1994-09-05 2003-11-05 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP3097945B2 (ja) 1994-10-03 2000-10-10 シャープ株式会社 反射型液晶表示装置の製造方法
JP3132310B2 (ja) * 1994-11-18 2001-02-05 株式会社日立製作所 アクティブマトリクス型液晶表示装置
US5814529A (en) * 1995-01-17 1998-09-29 Semiconductor Energy Laboratory Co., Ltd. Method for producing a semiconductor integrated circuit including a thin film transistor and a capacitor
KR100359795B1 (ko) * 1995-08-22 2003-01-14 엘지.필립스 엘시디 주식회사 액정표시장치및그제조방법
US5990988A (en) * 1995-09-01 1999-11-23 Pioneer Electric Corporation Reflection liquid crystal display and a semiconductor device for the display
JP3007559B2 (ja) 1995-09-21 2000-02-07 松下電器産業株式会社 液晶表示素子及びその製造方法
US5917563A (en) * 1995-10-16 1999-06-29 Sharp Kabushiki Kaisha Liquid crystal display device having an insulation film made of organic material between an additional capacity and a bus line
JPH1048610A (ja) * 1996-07-31 1998-02-20 Furontetsuku:Kk 液晶表示素子
US6016178A (en) * 1996-09-13 2000-01-18 Sony Corporation Reflective guest-host liquid-crystal display device
JPH10228035A (ja) * 1996-12-10 1998-08-25 Fujitsu Ltd 液晶表示装置及びその製造方法
JPH10268300A (ja) * 1997-03-21 1998-10-09 Sony Corp 反射型ゲストホスト液晶表示装置
JP3566028B2 (ja) * 1997-05-15 2004-09-15 シャープ株式会社 液晶表示装置及びその製造方法
US6130736A (en) * 1997-06-13 2000-10-10 Alps Electric Co., Ltd. Liquid crystal display with corrugated reflective surface
JP3297372B2 (ja) 1997-06-17 2002-07-02 シャープ株式会社 反射型液晶表示装置の製造方法
US6195140B1 (en) * 1997-07-28 2001-02-27 Sharp Kabushiki Kaisha Liquid crystal display in which at least one pixel includes both a transmissive region and a reflective region
US6330047B1 (en) * 1997-07-28 2001-12-11 Sharp Kabushiki Kaisha Liquid crystal display device and method for fabricating the same
JP2955277B2 (ja) 1997-07-28 1999-10-04 シャープ株式会社 液晶表示装置
DE69810408T2 (de) * 1997-09-17 2003-09-25 Matsushita Electric Ind Co Ltd Reflektive Flüssigkristall-Anzeigevorrichtung
US6011274A (en) * 1997-10-20 2000-01-04 Ois Optical Imaging Systems, Inc. X-ray imager or LCD with bus lines overlapped by pixel electrodes and dual insulating layers therebetween
JPH11133399A (ja) * 1997-10-27 1999-05-21 Hitachi Ltd 反射型液晶表示装置とその製造方法
JP3794802B2 (ja) * 1997-10-28 2006-07-12 株式会社半導体エネルギー研究所 表示パネル駆動回路および表示パネル
JP3738549B2 (ja) 1997-12-22 2006-01-25 カシオ計算機株式会社 液晶表示素子
US6295109B1 (en) * 1997-12-26 2001-09-25 Sharp Kabushiki Kaisha LCD with plurality of pixels having reflective and transmissive regions
JP3410656B2 (ja) 1998-03-31 2003-05-26 シャープ株式会社 液晶表示装置及びその製造方法
JPH11287989A (ja) 1998-04-03 1999-10-19 Toshiba Corp 反射型液晶表示装置及びその製造方法
JP4223094B2 (ja) * 1998-06-12 2009-02-12 株式会社半導体エネルギー研究所 電気光学表示装置
JP2000002872A (ja) 1998-06-16 2000-01-07 Semiconductor Energy Lab Co Ltd 液晶表示装置およびその作製方法
JP3244055B2 (ja) * 1998-07-10 2002-01-07 松下電器産業株式会社 反射型液晶表示装置
US6750836B1 (en) * 1998-09-10 2004-06-15 Seiko Epson Corporation Liquid crystal panel and manufacturing method for the same
JP3085530B2 (ja) * 1998-11-18 2000-09-11 日本電気株式会社 液晶表示装置及びその製造方法
JP2000162625A (ja) 1998-11-26 2000-06-16 Sanyo Electric Co Ltd カラー反射型液晶表示装置及びその製造方法
US6909477B1 (en) * 1998-11-26 2005-06-21 Lg. Philips Lcd Co., Ltd Liquid crystal display device with an ink-jet color filter and process for fabricating the same
JP3475101B2 (ja) 1998-11-30 2003-12-08 シャープ株式会社 液晶表示装置
JP2000187209A (ja) 1998-12-22 2000-07-04 Advanced Display Inc 反射型液晶表示装置およびその製造方法
JP3728958B2 (ja) 1998-12-28 2005-12-21 セイコーエプソン株式会社 電気光学装置及びその製造方法
JP4215905B2 (ja) * 1999-02-15 2009-01-28 シャープ株式会社 液晶表示装置
JP2000250067A (ja) 1999-03-03 2000-09-14 Sanyo Electric Co Ltd 液晶表示装置
JP2000330134A (ja) * 1999-03-16 2000-11-30 Furontekku:Kk 薄膜トランジスタ基板および液晶表示装置
JP2000284305A (ja) 1999-03-30 2000-10-13 Seiko Epson Corp 液晶パネル基板およびその製造方法ならびに液晶パネル基板を用いた液晶表示装置および電子機器
JP3559193B2 (ja) * 1999-04-30 2004-08-25 三菱電機株式会社 整流子モータ
JP4402197B2 (ja) * 1999-05-24 2010-01-20 シャープ株式会社 アクティブマトリクス型表示装置
JP4019565B2 (ja) 1999-08-18 2007-12-12 セイコーエプソン株式会社 液晶装置及び電子機器
JP3779103B2 (ja) * 1999-09-06 2006-05-24 シャープ株式会社 反射型カラー液晶表示装置
JP2001083494A (ja) * 1999-09-14 2001-03-30 Seiko Epson Corp 半透過反射型の液晶装置及びそれを用いた電子機器
JP4700156B2 (ja) * 1999-09-27 2011-06-15 株式会社半導体エネルギー研究所 半導体装置
JP2001100217A (ja) * 1999-09-29 2001-04-13 Nec Corp カラー液晶表示装置およびその製造方法
US6683666B1 (en) * 1999-11-11 2004-01-27 Samsung Electronics Co., Ltd. Reflective-transmission type thin film transistor liquid crystal display
JP2001183649A (ja) 1999-12-27 2001-07-06 Nec Corp 反射型カラー液晶表示装置
JP2001194662A (ja) * 2000-01-14 2001-07-19 Nec Corp 反射型液晶表示装置及びその製造方法
JP3626652B2 (ja) * 2000-01-21 2005-03-09 日本電気株式会社 反射型液晶表示装置及びその製造方法
US6563559B2 (en) 2000-02-02 2003-05-13 Sanyo Electric Co., Ltd. Reflective liquid crystal display having increase luminance for each display pixel
KR100351700B1 (ko) * 2000-04-17 2002-09-11 엘지.필립스 엘시디 주식회사 반투과 액정 표시장치
US6690437B2 (en) * 2000-04-18 2004-02-10 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device
JP5057613B2 (ja) * 2000-04-27 2012-10-24 株式会社半導体エネルギー研究所 半導体装置及び電子機器
US6747289B2 (en) * 2000-04-27 2004-06-08 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method of fabricating thereof
US6900084B1 (en) * 2000-05-09 2005-05-31 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device having a display device
JP4278834B2 (ja) * 2000-06-02 2009-06-17 株式会社日立製作所 液晶表示装置とその製造方法
JP2002049057A (ja) 2000-08-02 2002-02-15 Toshiba Corp 液晶表示装置
KR100641628B1 (ko) * 2000-08-21 2006-11-02 엘지.필립스 엘시디 주식회사 블랙레진을 이용한 반사형 및 반투과형 액정표시장치
JP2002090765A (ja) * 2000-09-12 2002-03-27 Seiko Epson Corp 液晶表示装置および電子機器
JP2002162645A (ja) * 2000-09-14 2002-06-07 Sony Corp 半透過型液晶表示装置
KR100627649B1 (ko) * 2000-10-30 2006-09-22 엘지.필립스 엘시디 주식회사 반투과 액정 표시 장치 및 그의 제조 방법
JP4993830B2 (ja) * 2000-11-11 2012-08-08 三星電子株式会社 反射型液晶表示装置及びその製造方法
JP4101454B2 (ja) * 2000-11-22 2008-06-18 株式会社日立製作所 液晶表示装置
CN1271567C (zh) * 2000-11-30 2006-08-23 佳能株式会社 图像处理装置、图像处理方法、存储介质及程序
US6912021B2 (en) * 2001-01-22 2005-06-28 Seiko Epson Corporation Electro-optical device, method for driving electro-optical device, electronic apparatus, and method for driving electronic apparatus
KR100397399B1 (ko) * 2001-02-22 2003-09-13 엘지.필립스 엘시디 주식회사 반투과형 액정 표시 장치 및 그의 제조 방법
JP4991052B2 (ja) * 2001-02-28 2012-08-01 株式会社ジャパンディスプレイセントラル 液晶表示パネル
JP4790937B2 (ja) * 2001-07-09 2011-10-12 ティーピーオー ホンコン ホールディング リミテッド 反射電極を形成する方法及び液晶表示装置
JP5093709B2 (ja) * 2001-08-22 2012-12-12 Nltテクノロジー株式会社 液晶表示装置
TW526615B (en) * 2001-08-24 2003-04-01 Prime View Int Co Ltd Structure and manufacturing method for thin film transistor liquid crystal display
US6872658B2 (en) * 2001-11-30 2005-03-29 Semiconductor Energy Laboratory Co., Ltd. Method of fabricating semiconductor device by exposing resist mask
KR100475110B1 (ko) * 2001-12-26 2005-03-10 엘지.필립스 엘시디 주식회사 반사형 액정표시소자 및 그 제조방법
JP2003195349A (ja) 2001-12-27 2003-07-09 Sanyo Electric Co Ltd アクティブマトリクス型表示装置
JP4101533B2 (ja) * 2002-03-01 2008-06-18 株式会社半導体エネルギー研究所 半透過型の液晶表示装置の作製方法
JP4087620B2 (ja) * 2002-03-01 2008-05-21 株式会社半導体エネルギー研究所 液晶表示装置の作製方法
JP4237442B2 (ja) * 2002-03-01 2009-03-11 株式会社半導体エネルギー研究所 半透過型液晶表示装置
CN100395607C (zh) * 2002-09-20 2008-06-18 株式会社日立显示器 半透过反射型液晶显示器件

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11258596A (ja) 1998-03-11 1999-09-24 Nec Corp 反射型液晶表示装置及びその製造方法
JP2000305099A (ja) 1999-04-23 2000-11-02 Toshiba Corp 液晶表示装置
KR20010072492A (ko) * 1999-07-07 2001-07-31 모리시타 요이찌 반투과형 액정 표시장치
JP2001108984A (ja) 1999-10-08 2001-04-20 Matsushita Electric Ind Co Ltd 反射型液晶画像表示装置と画像表示装置用半導体装置の製造方法

Also Published As

Publication number Publication date
US9448432B2 (en) 2016-09-20
JP2003255374A (ja) 2003-09-10
CN101334548A (zh) 2008-12-31
TW200307825A (en) 2003-12-16
CN1442741A (zh) 2003-09-17
US7053969B2 (en) 2006-05-30
JP4101533B2 (ja) 2008-06-18
US20060197883A1 (en) 2006-09-07
KR20030071627A (ko) 2003-09-06
US20030164910A1 (en) 2003-09-04
TWI308235B (en) 2009-04-01
CN101334548B (zh) 2013-03-27
US20160377918A1 (en) 2016-12-29
CN1442741B (zh) 2010-05-26

Similar Documents

Publication Publication Date Title
KR100967823B1 (ko) 액정표시장치
JP4237442B2 (ja) 半透過型液晶表示装置
KR100951129B1 (ko) 액정 표시장치 및 그의 제조방법
EP1128430A2 (en) Semiconductor device and method of manufacturing the same
JP4916620B2 (ja) 液晶表示装置及び電気光学装置
JP4817718B2 (ja) 表示装置用基板及びそれを備えた液晶表示装置
JP4926332B2 (ja) 半導体装置、電気光学装置及び電子機器
JP4712787B2 (ja) 半透過型の液晶表示装置及びその作製方法
KR20010048150A (ko) 반사-투과형 박막트랜지스터 액정 표시 장치 및 그 제조방법

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PN2301 Change of applicant

St.27 status event code: A-3-3-R10-R13-asn-PN2301

St.27 status event code: A-3-3-R10-R11-asn-PN2301

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

D14-X000 Search report completed

St.27 status event code: A-1-2-D10-D14-srh-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

FPAY Annual fee payment

Payment date: 20130603

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

FPAY Annual fee payment

Payment date: 20140603

Year of fee payment: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

FPAY Annual fee payment

Payment date: 20150518

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

FPAY Annual fee payment

Payment date: 20160526

Year of fee payment: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

FPAY Annual fee payment

Payment date: 20170601

Year of fee payment: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

FPAY Annual fee payment

Payment date: 20180529

Year of fee payment: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

FPAY Annual fee payment

Payment date: 20190530

Year of fee payment: 10

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 10

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20200629

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20200629