KR100910103B1 - 옥심에스테르화합물 및 상기 화합물을 함유하는 광중합 개시제 - Google Patents
옥심에스테르화합물 및 상기 화합물을 함유하는 광중합 개시제 Download PDFInfo
- Publication number
- KR100910103B1 KR100910103B1 KR1020087031367A KR20087031367A KR100910103B1 KR 100910103 B1 KR100910103 B1 KR 100910103B1 KR 1020087031367 A KR1020087031367 A KR 1020087031367A KR 20087031367 A KR20087031367 A KR 20087031367A KR 100910103 B1 KR100910103 B1 KR 100910103B1
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- South Korea
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- meth
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- acrylate
- carbon atoms
- acid
- Prior art date
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- 0 CC[n](c(ccc(*)c1)c1c1c2)c1ccc2C([C@@]1C=CC(*C(C)C)=CC1OC(C)C)=NOC(C)O Chemical compound CC[n](c(ccc(*)c1)c1c1c2)c1ccc2C([C@@]1C=CC(*C(C)C)=CC1OC(C)C)=NOC(C)O 0.000 description 8
- ZZTKKGFQMPFEPN-UHFFFAOYSA-N C=CC(OC(CC1C2C1)CC2O)=O Chemical compound C=CC(OC(CC1C2C1)CC2O)=O ZZTKKGFQMPFEPN-UHFFFAOYSA-N 0.000 description 1
- KXVXMSSTPDYJDB-UHFFFAOYSA-N CC(C)(C)C(OC1CC2OC2CC1)=O Chemical compound CC(C)(C)C(OC1CC2OC2CC1)=O KXVXMSSTPDYJDB-UHFFFAOYSA-N 0.000 description 1
- YGPGJQKESTWNEC-YCNYHXFESA-N CC[n]1c(ccc(N=O)c2)c2c2c1ccc(/C(/c(cccc1)c1OCCCOC(C=C)=O)=N/OC(C)=O)c2 Chemical compound CC[n]1c(ccc(N=O)c2)c2c2c1ccc(/C(/c(cccc1)c1OCCCOC(C=C)=O)=N/OC(C)=O)c2 YGPGJQKESTWNEC-YCNYHXFESA-N 0.000 description 1
- PUEDMOCXGGFAJZ-DQSJHHFOSA-N CC[n]1c(ccc([N+]([O-])=C)c2)c2c2c1ccc(/C(/c(cccc1)c1OC(C=C)=O)=N/OC(C)=O)c2 Chemical compound CC[n]1c(ccc([N+]([O-])=C)c2)c2c2c1ccc(/C(/c(cccc1)c1OC(C=C)=O)=N/OC(C)=O)c2 PUEDMOCXGGFAJZ-DQSJHHFOSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/82—Carbazoles; Hydrogenated carbazoles
- C07D209/88—Carbazoles; Hydrogenated carbazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the ring system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
- Indole Compounds (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006351996 | 2006-12-27 | ||
| JPJP-P-2006-351996 | 2006-12-27 | ||
| JP2007221710 | 2007-08-28 | ||
| JPJP-P-2007-221710 | 2007-08-28 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20090009991A KR20090009991A (ko) | 2009-01-23 |
| KR100910103B1 true KR100910103B1 (ko) | 2009-07-30 |
Family
ID=39562468
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020087031367A Active KR100910103B1 (ko) | 2006-12-27 | 2007-12-21 | 옥심에스테르화합물 및 상기 화합물을 함유하는 광중합 개시제 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US20090292039A1 (https=) |
| EP (1) | EP2072500B1 (https=) |
| JP (1) | JP4223071B2 (https=) |
| KR (1) | KR100910103B1 (https=) |
| CN (1) | CN101528694B (https=) |
| TW (1) | TW200844094A (https=) |
| WO (1) | WO2008078678A1 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20150040797A (ko) * | 2012-07-31 | 2015-04-15 | 가부시키가이샤 아데카 | 잠재성 첨가제 및 상기 첨가제를 함유하는 조성물 |
Families Citing this family (124)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5274132B2 (ja) * | 2007-07-17 | 2013-08-28 | 富士フイルム株式会社 | 硬化性組成物、カラーフィルタ用硬化性組成物、パターン形成方法、カラーフィルタ、及びその製造方法 |
| JP5336274B2 (ja) * | 2008-07-09 | 2013-11-06 | 東京応化工業株式会社 | 着色感光性樹脂組成物及びオキシム系光重合開始剤 |
| JP5685803B2 (ja) * | 2008-07-24 | 2015-03-18 | Jsr株式会社 | 感放射線性樹脂組成物および液晶表示素子用スペーサーとその製造法 |
| JP2010053330A (ja) * | 2008-08-01 | 2010-03-11 | Jsr Corp | 硬化性組成物、液晶シール剤及び液晶表示素子 |
| JP5391680B2 (ja) * | 2008-12-17 | 2014-01-15 | 東洋インキＳｃホールディングス株式会社 | 化合物、ラジカル重合開始剤、重合性組成物、および重合物の製造方法 |
| US8168369B2 (en) * | 2009-02-13 | 2012-05-01 | Lg Chem, Ltd. | Photoactive compound and photosensitive resin composition containing the same |
| JP5371471B2 (ja) * | 2009-02-16 | 2013-12-18 | 株式会社日本化学工業所 | オキシムエステル化合物及びこれらを用いた感光性樹脂組成物 |
| JP4344400B1 (ja) | 2009-02-16 | 2009-10-14 | 株式会社日本化学工業所 | オキシムエステル化合物及びこれらを用いた感光性樹脂組成物 |
| JP2010256891A (ja) * | 2009-04-01 | 2010-11-11 | Toyo Ink Mfg Co Ltd | 感光性着色組成物およびカラーフィルタ |
| KR101678028B1 (ko) | 2009-06-17 | 2016-11-21 | 토요잉크Sc홀딩스주식회사 | 옥심에스테르 화합물, 라디칼 중합개시제, 중합성 조성물, 네가티브형 레지스트 및 화상 패턴 |
| JP5701576B2 (ja) | 2009-11-20 | 2015-04-15 | 富士フイルム株式会社 | 分散組成物及び感光性樹脂組成物、並びに固体撮像素子 |
| KR20130019379A (ko) * | 2010-03-31 | 2013-02-26 | 다이요 홀딩스 가부시키가이샤 | 광경화성 조성물 |
| JP5641791B2 (ja) * | 2010-06-22 | 2014-12-17 | 東京応化工業株式会社 | 樹脂パターンの製造方法 |
| KR20120019619A (ko) * | 2010-08-26 | 2012-03-07 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물, 컬러 필터 및 이를 구비한 액정 표시 장치 |
| KR101830206B1 (ko) | 2010-12-28 | 2018-02-20 | 후지필름 가부시키가이샤 | 차광막 형성용 티타늄 블랙 분산 조성물과 그 제조방법, 흑색 감방사선성 조성물, 흑색 경화막, 고체촬상소자, 및 흑색 경화막의 제조방법 |
| KR101897842B1 (ko) | 2011-01-28 | 2018-09-12 | 바스프 에스이 | 열 경화제로서 옥심 술포네이트를 포함하는 중합성 조성물 |
| WO2013038974A1 (en) | 2011-09-14 | 2013-03-21 | Fujifilm Corporation | Colored radiation-sensitive composition for color filter, pattern forming method, color filter and method of producing the same, and solid-state image sensor |
| US9365515B2 (en) | 2011-12-07 | 2016-06-14 | Basf Se | Oxime ester photoinitiators |
| JP5890297B2 (ja) * | 2011-12-22 | 2016-03-22 | 東京応化工業株式会社 | 感光性樹脂組成物、それを用いたカラーフィルタ及び表示装置、オキシムエステル化合物、並びに光重合開始剤 |
| JP5922013B2 (ja) | 2011-12-28 | 2016-05-24 | 富士フイルム株式会社 | 光学部材セット及びこれを用いた固体撮像素子 |
| JP5976523B2 (ja) | 2011-12-28 | 2016-08-23 | 富士フイルム株式会社 | 光学部材セット及びこれを用いた固体撮像素子 |
| JP5934664B2 (ja) | 2012-03-19 | 2016-06-15 | 富士フイルム株式会社 | 着色感放射線性組成物、着色硬化膜、カラーフィルタ、着色パターン形成方法、カラーフィルタの製造方法、固体撮像素子、及び画像表示装置 |
| JP5775479B2 (ja) | 2012-03-21 | 2015-09-09 | 富士フイルム株式会社 | 着色感放射線性組成物、着色硬化膜、カラーフィルタ、パターン形成方法、カラーフィルタの製造方法、固体撮像素子、及び画像表示装置 |
| JP6208119B2 (ja) * | 2012-03-22 | 2017-10-04 | 株式会社Adeka | 新規化合物及び感光性樹脂組成物 |
| KR101518774B1 (ko) * | 2012-05-03 | 2015-05-11 | 한국화학연구원 | 신규한 옥심에스테르 플로렌 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
| KR101968462B1 (ko) | 2012-05-09 | 2019-04-11 | 바스프 에스이 | 옥심 에스테르 광개시제 |
| WO2013179237A1 (en) | 2012-06-01 | 2013-12-05 | Basf Se | Black colorant mixture |
| JP5934682B2 (ja) | 2012-08-31 | 2016-06-15 | 富士フイルム株式会社 | マイクロレンズ形成用又はカラーフィルターの下塗り膜形成用硬化性組成物、透明膜、マイクロレンズ、固体撮像素子、及び、硬化性組成物の製造方法 |
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| JP5890337B2 (ja) * | 2013-02-13 | 2016-03-22 | 東京応化工業株式会社 | 感放射線性樹脂組成物、絶縁膜、及び表示装置 |
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| JP5890355B2 (ja) * | 2013-07-31 | 2016-03-22 | 東京応化工業株式会社 | 感光性樹脂組成物 |
| JP2015041104A (ja) * | 2013-08-22 | 2015-03-02 | 東友ファインケム株式会社 | 着色感光性樹脂組成物、これを含むカラーフィルタおよび表示装置 |
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| US20170219923A1 (en) * | 2014-07-24 | 2017-08-03 | Hitachi Chemical Company, Ltd. | Photosensitive resin composition, photosensitive film, pattern substrate, photosensitive conductive film, and conductive pattern substrate |
| US10487050B2 (en) | 2014-08-29 | 2019-11-26 | Basf Se | Oxime sulfonate derivatives |
| KR102613079B1 (ko) * | 2015-07-17 | 2023-12-12 | 타코마테크놀러지 주식회사 | 옥심에스테르 화합물 및 이를 포함하는 감광성 수지 조성물 |
| CN106444282A (zh) * | 2015-08-13 | 2017-02-22 | 常州强力先端电子材料有限公司 | 一种含肟酯类光引发剂的感光性树脂组合物及其应用 |
| CN106565690B (zh) * | 2015-10-08 | 2019-10-18 | 常州强力先端电子材料有限公司 | 一种含杂环的硝基咔唑肟酯类光引发剂 |
| TWI731895B (zh) * | 2015-12-08 | 2021-07-01 | 日商富士軟片股份有限公司 | 感放射線性樹脂組成物、硬化膜、圖案形成方法、固體攝影元件及影像顯示裝置 |
| TWI634135B (zh) | 2015-12-25 | 2018-09-01 | 日商富士軟片股份有限公司 | 樹脂、組成物、硬化膜、硬化膜的製造方法及半導體元件 |
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| TWI736595B (zh) * | 2016-03-25 | 2021-08-21 | 日商富士軟片股份有限公司 | 感光性組成物、彩色濾光片、圖案形成方法、固體攝像元件及圖像顯示裝置 |
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| CN107325206B (zh) * | 2016-04-12 | 2018-12-18 | 常州强力先端电子材料有限公司 | 一种含硝基咔唑肟酯类光引发剂及其制备方法和应用 |
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| KR20150040797A (ko) * | 2012-07-31 | 2015-04-15 | 가부시키가이샤 아데카 | 잠재성 첨가제 및 상기 첨가제를 함유하는 조성물 |
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| US20090292039A1 (en) | 2009-11-26 |
| US20170283520A1 (en) | 2017-10-05 |
| EP2072500B1 (en) | 2012-09-26 |
| US11667730B2 (en) | 2023-06-06 |
| TW200844094A (en) | 2008-11-16 |
| WO2008078678A1 (ja) | 2008-07-03 |
| CN101528694B (zh) | 2012-03-07 |
| TWI309236B (https=) | 2009-05-01 |
| EP2072500A4 (en) | 2010-12-22 |
| CN101528694A (zh) | 2009-09-09 |
| KR20090009991A (ko) | 2009-01-23 |
| JP4223071B2 (ja) | 2009-02-12 |
| JPWO2008078678A1 (ja) | 2010-04-22 |
| EP2072500A1 (en) | 2009-06-24 |
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