ATE458010T1 - Oximester-photoinitiatoren - Google Patents
Oximester-photoinitiatorenInfo
- Publication number
- ATE458010T1 ATE458010T1 AT06807785T AT06807785T ATE458010T1 AT E458010 T1 ATE458010 T1 AT E458010T1 AT 06807785 T AT06807785 T AT 06807785T AT 06807785 T AT06807785 T AT 06807785T AT E458010 T1 ATE458010 T1 AT E458010T1
- Authority
- AT
- Austria
- Prior art keywords
- c20alkyl
- direct bond
- hydrogen
- oximester
- photoinitiators
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
- C07C251/32—Oximes
- C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
- C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
- C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/82—Carbazoles; Hydrogenated carbazoles
- C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
- C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
- C07D409/06—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D515/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen, oxygen, and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00
- C07D515/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen, oxygen, and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00 in which the condensed system contains two hetero rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Indole Compounds (AREA)
- Polymerisation Methods In General (AREA)
- Plural Heterocyclic Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Dental Preparations (AREA)
- Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP05112439 | 2005-12-20 | ||
| EP06115428 | 2006-06-14 | ||
| PCT/EP2006/068254 WO2007071497A1 (en) | 2005-12-20 | 2006-11-09 | Oxime ester photoinitiators |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE458010T1 true ATE458010T1 (de) | 2010-03-15 |
Family
ID=37561778
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT06807785T ATE458010T1 (de) | 2005-12-20 | 2006-11-09 | Oximester-photoinitiatoren |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US8586268B2 (de) |
| EP (1) | EP1963374B1 (de) |
| JP (1) | JP5117397B2 (de) |
| KR (1) | KR101351286B1 (de) |
| CN (1) | CN102199119B (de) |
| AT (1) | ATE458010T1 (de) |
| DE (1) | DE602006012366D1 (de) |
| TW (1) | TWI454446B (de) |
| WO (1) | WO2007071497A1 (de) |
Families Citing this family (80)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4874659B2 (ja) * | 2006-01-24 | 2012-02-15 | 富士フイルム株式会社 | アニリン化合物及びその製造方法、並びに、感光性組成物 |
| KR100910103B1 (ko) * | 2006-12-27 | 2009-07-30 | 가부시키가이샤 아데카 | 옥심에스테르화합물 및 상기 화합물을 함유하는 광중합 개시제 |
| DE602008004757D1 (en) * | 2007-05-11 | 2011-03-10 | Basf Se | Oximesther-fotoinitiatoren |
| KR101526618B1 (ko) * | 2007-05-11 | 2015-06-05 | 바스프 에스이 | 옥심 에스테르 광개시제 |
| CN101679394B (zh) | 2007-05-11 | 2013-10-16 | 巴斯夫欧洲公司 | 肟酯光引发剂 |
| US8632952B2 (en) * | 2007-11-20 | 2014-01-21 | Hitachi Chemical Company, Ltd. | Photosensitive resin composition, photosensitive resin cured matter, photosensitive resin film, photosensitive resin film cured matter and optical waveguide obtained by using the same |
| WO2009117670A2 (en) * | 2008-03-21 | 2009-09-24 | President And Fellows Of Harvard College | Self-aligned barrier layers for interconnects |
| KR101652680B1 (ko) * | 2008-05-29 | 2016-08-31 | 아사히 가라스 가부시키가이샤 | 광경화성 조성물 및 표면에 미세 패턴을 갖는 성형체의 제조 방법 |
| WO2009147033A1 (en) * | 2008-06-06 | 2009-12-10 | Basf Se | Photoinitiator mixtures |
| JP5566378B2 (ja) | 2008-06-06 | 2014-08-06 | ビーエーエスエフ ソシエタス・ヨーロピア | オキシムエステル光開始剤 |
| EP2342237B1 (de) | 2008-11-03 | 2014-04-23 | Basf Se | Fotoinitiatormischungen |
| WO2010071956A1 (en) | 2008-12-22 | 2010-07-01 | Canadian Bank Note Company, Limited | Improved printing of tactile marks for the visually impaired |
| EP2387598B1 (de) | 2009-01-19 | 2014-06-04 | Basf Se | Schwarze matrix für farbfilter |
| KR101712683B1 (ko) | 2009-03-23 | 2017-03-06 | 바스프 에스이 | 포토레지스트 조성물 |
| JP5236587B2 (ja) | 2009-07-15 | 2013-07-17 | 太陽ホールディングス株式会社 | 光硬化性樹脂組成物 |
| AU2010310750B2 (en) * | 2009-10-23 | 2015-02-26 | President And Fellows Of Harvard College | Self-aligned barrier and capping layers for interconnects |
| AU2010330040B2 (en) | 2009-12-07 | 2013-12-19 | Agfa Nv | UV-LED curable compositions and inks |
| US8957224B2 (en) | 2009-12-07 | 2015-02-17 | Agfa Graphics Nv | Photoinitiators for UV-LED curable compositions and inks |
| JP5640722B2 (ja) * | 2010-02-05 | 2014-12-17 | Jsr株式会社 | 新規化合物及びそれを含有する感放射線性組成物 |
| KR20130040780A (ko) * | 2010-03-31 | 2013-04-24 | 다이요 홀딩스 가부시키가이샤 | 광경화성 수지 조성물 |
| FR2960087B1 (fr) * | 2010-05-12 | 2013-08-30 | Compagnie Ind Et Financiere Dingenierie Ingenico | Dispositif portable comprenant un ecran tactile et procede d'utilisation correspondant. |
| JP5636869B2 (ja) * | 2010-10-20 | 2014-12-10 | Jsr株式会社 | 感放射線性組成物、硬化膜、及びそれらの形成方法 |
| WO2012073742A1 (ja) * | 2010-11-30 | 2012-06-07 | 日産化学工業株式会社 | マイクロレンズ用感光性樹脂組成物 |
| US9310677B2 (en) | 2011-01-28 | 2016-04-12 | Basf | Polymerizable composition comprising an oxime sulfonate as thermal curing agent |
| US8816211B2 (en) | 2011-02-14 | 2014-08-26 | Eastman Kodak Company | Articles with photocurable and photocured compositions |
| US20120208914A1 (en) | 2011-02-14 | 2012-08-16 | Deepak Shukla | Photoinitiator compositions and uses |
| US20120207935A1 (en) | 2011-02-14 | 2012-08-16 | Deepak Shukla | Photocurable inks and methods of use |
| KR101599120B1 (ko) | 2011-05-25 | 2016-03-02 | 아메리칸 다이 소스, 인코포레이티드 | 옥심 에스터 및/또는 아실 기를 갖는 화합물 |
| KR101469519B1 (ko) * | 2011-10-07 | 2014-12-08 | (주)경인양행 | 옥심 에스테르 화합물 및 그것을 포함하는 광중합 개시제 |
| JP5799799B2 (ja) * | 2011-10-20 | 2015-10-28 | 日立化成株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| US9365515B2 (en) | 2011-12-07 | 2016-06-14 | Basf Se | Oxime ester photoinitiators |
| TWI550643B (zh) * | 2012-03-30 | 2016-09-21 | Taiyo Holdings Co Ltd | Conductive paste and conductive circuit |
| WO2013167515A1 (en) | 2012-05-09 | 2013-11-14 | Basf Se | Oxime ester photoinitiators |
| US9217070B2 (en) | 2012-06-01 | 2015-12-22 | Basf Se | Black colorant mixture |
| JP2013047818A (ja) * | 2012-10-01 | 2013-03-07 | Taiyo Holdings Co Ltd | 光硬化性樹脂組成物 |
| JP5536167B2 (ja) * | 2012-10-01 | 2014-07-02 | 太陽ホールディングス株式会社 | ソルダーレジスト用光硬化性樹脂組成物 |
| JP2013047816A (ja) * | 2012-10-01 | 2013-03-07 | Taiyo Holdings Co Ltd | プリント配線板用光硬化性樹脂組成物 |
| KR101664121B1 (ko) | 2012-12-13 | 2016-10-10 | 제일모직 주식회사 | 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터 |
| KR101609634B1 (ko) | 2012-12-26 | 2016-04-06 | 제일모직 주식회사 | 감광성 수지 조성물 및 이를 이용한 차광층 |
| JP5890337B2 (ja) * | 2013-02-13 | 2016-03-22 | 東京応化工業株式会社 | 感放射線性樹脂組成物、絶縁膜、及び表示装置 |
| WO2014174601A1 (ja) * | 2013-04-24 | 2014-10-30 | 株式会社千葉合成研究所 | 新規ピリミジン誘導体 |
| KR102282647B1 (ko) | 2013-09-10 | 2021-07-28 | 바스프 에스이 | 옥심 에스테르 광개시제 |
| JP6233271B2 (ja) | 2013-12-27 | 2017-11-22 | Jsr株式会社 | 感光性樹脂組成物およびレジストパターンの製造方法 |
| KR101435652B1 (ko) | 2014-01-17 | 2014-08-28 | 주식회사 삼양사 | 신규한 β-옥심에스테르 플루오렌 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
| CN104076606B (zh) * | 2014-07-15 | 2019-12-03 | 常州强力电子新材料股份有限公司 | 一种含肟酯类光引发剂的感光性组合物及其应用 |
| US10487050B2 (en) | 2014-08-29 | 2019-11-26 | Basf Se | Oxime sulfonate derivatives |
| KR101824429B1 (ko) | 2015-01-26 | 2018-02-06 | 주식회사 삼양사 | 신규한 디옥심에스테르 화합물 및 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
| KR101828927B1 (ko) | 2015-02-06 | 2018-02-14 | 주식회사 삼양사 | 신규한 옥심에스테르 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
| KR101824443B1 (ko) | 2015-04-09 | 2018-02-05 | 주식회사 삼양사 | 신규한 플루오렌일 옥심 에스테르 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
| US10272426B2 (en) | 2015-04-21 | 2019-04-30 | Jsr Corporation | Method of producing microfluidic device, microfluidic device, and photosensitive resin composition |
| KR101777845B1 (ko) | 2015-06-08 | 2017-09-12 | 주식회사 삼양사 | 신규한 플루오란텐 옥심 에스테르 유도체, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
| KR102613079B1 (ko) | 2015-07-17 | 2023-12-12 | 타코마테크놀러지 주식회사 | 옥심에스테르 화합물 및 이를 포함하는 감광성 수지 조성물 |
| CN106565690B (zh) * | 2015-10-08 | 2019-10-18 | 常州强力先端电子材料有限公司 | 一种含杂环的硝基咔唑肟酯类光引发剂 |
| KR102509606B1 (ko) | 2015-10-30 | 2023-03-14 | 주식회사 삼양사 | 신규한 퀴놀리닐 베타 옥심에스테르 유도체 화합물, 이를 포함하는 광중합 개시제, 및 포토레지스트 조성물 |
| US10095110B2 (en) | 2015-11-26 | 2018-10-09 | Jsr Corporation | Photosensitive resin composition, method for forming resist pattern, and method for producing metallic pattern |
| JP2017149661A (ja) * | 2016-02-23 | 2017-08-31 | 株式会社Adeka | オキシムエステル化合物及び該化合物を含有する重合開始剤 |
| CN107340688B (zh) * | 2016-04-29 | 2022-05-06 | 东友精细化工有限公司 | 硬掩模用组合物 |
| KR101892086B1 (ko) | 2016-05-19 | 2018-08-27 | 주식회사 삼양사 | 옥심에스테르 유도체 화합물, 이를 포함하는 광중합 개시제, 및 감광성 조성물 |
| TWI635079B (zh) * | 2016-07-08 | 2018-09-11 | 韓國化學研究院 | 高敏感肟酯光聚合起始劑以及包含該起始劑的光聚合組合物 |
| CN106336470B (zh) * | 2016-08-23 | 2018-08-24 | 湖北和昌新材料科技股份有限公司 | 一种咔唑肟酯类光引发剂及其制备方法及应用 |
| CN106632740B (zh) * | 2016-09-28 | 2018-09-18 | 江苏博砚电子科技有限公司 | 一种用于光阻材料的光引发剂及其制备和应用 |
| KR101991838B1 (ko) | 2016-12-28 | 2019-06-24 | 주식회사 삼양사 | 신규 1,3-벤조디아졸 베타-옥심 에스테르 화합물 및 이를 포함하는 조성물 |
| KR102799810B1 (ko) | 2017-02-02 | 2025-04-28 | 주식회사 삼양사 | 신규한 옥심에스테르 비페닐 화합물, 이를 포함하는 광중합 개시제 및 감광성 조성물 |
| CN110325912B (zh) * | 2017-02-23 | 2023-07-14 | 艾曲迪微系统股份有限公司 | 感光性树脂组合物、图案的制造方法、固化物、层间绝缘膜、覆盖涂层、保护膜和电子部件 |
| KR102545326B1 (ko) * | 2017-03-16 | 2023-06-21 | 가부시키가이샤 아데카 | 옥심에스테르 화합물 및 상기 화합물을 함유하는 광중합 개시제 |
| JP6949527B2 (ja) * | 2017-03-31 | 2021-10-13 | 株式会社Ｄｎｐファインケミカル | 感光性着色樹脂組成物、硬化物、カラーフィルタ、表示装置 |
| WO2019013112A1 (ja) * | 2017-07-13 | 2019-01-17 | 株式会社Adeka | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
| KR101991903B1 (ko) | 2017-12-07 | 2019-10-01 | 주식회사 삼양사 | 카바졸 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 감광성 조성물 |
| WO2019162374A1 (en) | 2018-02-23 | 2019-08-29 | Basf Se | Organomodified metal oxide or metalloid oxide polymer film |
| WO2020002106A2 (en) | 2018-06-25 | 2020-01-02 | Basf Se | Red pigment composition for color filter |
| WO2020031240A1 (ja) | 2018-08-06 | 2020-02-13 | 日立化成デュポンマイクロシステムズ株式会社 | 感光性樹脂組成物、パターン硬化膜の製造方法、硬化膜、層間絶縁膜、カバーコート層、表面保護膜及び電子部品 |
| CN111258180B (zh) * | 2018-11-30 | 2024-03-08 | 常州正洁智造科技有限公司 | 六芳基双咪唑类混合光引发剂及应用 |
| KR102228630B1 (ko) | 2018-12-28 | 2021-03-16 | 주식회사 삼양사 | 카바졸 멀티 베타 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 포토레지스트 조성물 |
| US20220121113A1 (en) | 2019-01-23 | 2022-04-21 | Basf Se | Oxime ester photoinitiators having a special aroyl chromophore |
| WO2020179744A1 (ja) | 2019-03-05 | 2020-09-10 | 東レ株式会社 | ネガ型感光性樹脂組成物、それを用いた硬化膜の製造方法およびタッチパネル |
| WO2021175855A1 (en) | 2020-03-04 | 2021-09-10 | Basf Se | Oxime ester photoinitiators |
| US11981759B2 (en) | 2022-05-18 | 2024-05-14 | Canon Kabushiki Kaisha | Photocurable composition |
| JP2024049908A (ja) * | 2022-09-29 | 2024-04-10 | ａｒｔｉｅｎｃｅ株式会社 | 感光性組成物、光学フィルタ、固体撮像素子、画像表示装置、及び赤外線センサ |
| EP4743828A1 (de) | 2023-07-10 | 2026-05-20 | Basf Se | Photohärtbare sowie thermisch härtbare zusammensetzungen für die härtung bei niedriger temperatur |
| CN119241469B (zh) * | 2024-09-29 | 2025-08-15 | 武汉尚赛光电科技有限公司 | 一种光引发剂、光聚合组合物及其应用 |
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| GB1180846A (en) * | 1967-08-08 | 1970-02-11 | Agfa Gevaert Nv | Photopolymerisation of Ethylenically Unsaturated Organic Compounds |
| FR2393345A1 (fr) * | 1977-06-01 | 1978-12-29 | Agfa Gevaert Nv | Fabrication d'elements modifies sous forme d'images |
| GB2029423A (en) * | 1978-08-25 | 1980-03-19 | Agfa Gevaert Nv | Photo-polymerisable materials and recording method |
| US4590145A (en) * | 1985-06-28 | 1986-05-20 | Daicel Chemical Industries, Ltd. | Photopolymerization initiator comprised of thioxanthones and oxime esters |
| US5019482A (en) * | 1987-08-12 | 1991-05-28 | Asahi Kasei Kogyo Kabushiki Kaisha | Polymer/oxime ester/coumarin compound photosensitive composition |
| SG77689A1 (en) * | 1998-06-26 | 2001-01-16 | Ciba Sc Holding Ag | New o-acyloxime photoinitiators |
| SG97168A1 (en) * | 1999-12-15 | 2003-07-18 | Ciba Sc Holding Ag | Photosensitive resin composition |
| NL1016815C2 (nl) * | 1999-12-15 | 2002-05-14 | Ciba Sc Holding Ag | Oximester-fotoinitiatoren. |
| US7189489B2 (en) * | 2001-06-11 | 2007-03-13 | Ciba Specialty Chemicals Corporation | Oxime ester photoiniators having a combined structure |
| CA2505893A1 (en) | 2002-12-03 | 2004-06-17 | Ciba Specialty Chemicals Holding Inc. | Oxime ester photoinitiators with heteroaromatic groups |
| JP2004359639A (ja) * | 2003-06-06 | 2004-12-24 | Asahi Denka Kogyo Kk | オキシムエステル化合物および該化合物を含有する光重合開始剤 |
| JP4565824B2 (ja) * | 2003-09-24 | 2010-10-20 | 株式会社Adeka | 二量体オキシムエステル化合物及び該化合物を有効成分とする光重合開始剤 |
| JP2005187678A (ja) | 2003-12-26 | 2005-07-14 | Toyo Ink Mfg Co Ltd | 光重合性組成物 |
| JP2005220097A (ja) * | 2004-02-06 | 2005-08-18 | Asahi Denka Kogyo Kk | チオフェン構造を有するオキシムエステル化合物及び該化合物を含有する光重合開始剤 |
| JP4639770B2 (ja) | 2004-02-20 | 2011-02-23 | Ｊｓｒ株式会社 | 無機粉体含有樹脂組成物、転写フィルムおよびプラズマディスプレイパネルの製造方法 |
| ATE381540T1 (de) * | 2004-08-18 | 2008-01-15 | Ciba Sc Holding Ag | Oximesther-fotoinitiatoren |
| US8940464B2 (en) | 2005-12-01 | 2015-01-27 | Basf Se | Oxime ester photoinitiators |
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2006
- 2006-11-09 KR KR1020087017697A patent/KR101351286B1/ko not_active Expired - Fee Related
- 2006-11-09 US US12/086,567 patent/US8586268B2/en not_active Expired - Fee Related
- 2006-11-09 WO PCT/EP2006/068254 patent/WO2007071497A1/en not_active Ceased
- 2006-11-09 DE DE602006012366T patent/DE602006012366D1/de active Active
- 2006-11-09 CN CN201110064804.4A patent/CN102199119B/zh not_active Expired - Fee Related
- 2006-11-09 EP EP06807785A patent/EP1963374B1/de not_active Not-in-force
- 2006-11-09 JP JP2008546317A patent/JP5117397B2/ja not_active Expired - Fee Related
- 2006-11-09 AT AT06807785T patent/ATE458010T1/de active
- 2006-11-10 TW TW095141678A patent/TWI454446B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| EP1963374B1 (de) | 2010-02-17 |
| CN102199119A (zh) | 2011-09-28 |
| US20100188765A1 (en) | 2010-07-29 |
| JP5117397B2 (ja) | 2013-01-16 |
| TWI454446B (zh) | 2014-10-01 |
| KR20080080208A (ko) | 2008-09-02 |
| KR101351286B1 (ko) | 2014-02-17 |
| TW200724522A (en) | 2007-07-01 |
| US8586268B2 (en) | 2013-11-19 |
| WO2007071497A1 (en) | 2007-06-28 |
| DE602006012366D1 (en) | 2010-04-01 |
| JP2009519991A (ja) | 2009-05-21 |
| CN102199119B (zh) | 2014-07-16 |
| EP1963374A1 (de) | 2008-09-03 |
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