ATE458010T1 - Oximester-photoinitiatoren - Google Patents
Oximester-photoinitiatorenInfo
- Publication number
- ATE458010T1 ATE458010T1 AT06807785T AT06807785T ATE458010T1 AT E458010 T1 ATE458010 T1 AT E458010T1 AT 06807785 T AT06807785 T AT 06807785T AT 06807785 T AT06807785 T AT 06807785T AT E458010 T1 ATE458010 T1 AT E458010T1
- Authority
- AT
- Austria
- Prior art keywords
- c20alkyl
- direct bond
- hydrogen
- oximester
- photoinitiators
- Prior art date
Links
- 229910052739 hydrogen Inorganic materials 0.000 abstract 3
- 150000002431 hydrogen Chemical group 0.000 abstract 3
- 239000001257 hydrogen Substances 0.000 abstract 3
- 229910052760 oxygen Inorganic materials 0.000 abstract 3
- 229910052717 sulfur Inorganic materials 0.000 abstract 3
- 229910002091 carbon monoxide Inorganic materials 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 229910052736 halogen Inorganic materials 0.000 abstract 2
- 150000002367 halogens Chemical class 0.000 abstract 2
- 125000006552 (C3-C8) cycloalkyl group Chemical group 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 125000001624 naphthyl group Chemical group 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
- C07C251/32—Oximes
- C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
- C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
- C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/82—Carbazoles; Hydrogenated carbazoles
- C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
- C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
- C07D409/06—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D515/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen, oxygen, and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00
- C07D515/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen, oxygen, and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00 in which the condensed system contains two hetero rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Indole Compounds (AREA)
- Polymerisation Methods In General (AREA)
- Plural Heterocyclic Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Dental Preparations (AREA)
- Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP05112439 | 2005-12-20 | ||
| EP06115428 | 2006-06-14 | ||
| PCT/EP2006/068254 WO2007071497A1 (en) | 2005-12-20 | 2006-11-09 | Oxime ester photoinitiators |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE458010T1 true ATE458010T1 (de) | 2010-03-15 |
Family
ID=37561778
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT06807785T ATE458010T1 (de) | 2005-12-20 | 2006-11-09 | Oximester-photoinitiatoren |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US8586268B2 (de) |
| EP (1) | EP1963374B1 (de) |
| JP (1) | JP5117397B2 (de) |
| KR (1) | KR101351286B1 (de) |
| CN (1) | CN102199119B (de) |
| AT (1) | ATE458010T1 (de) |
| DE (1) | DE602006012366D1 (de) |
| TW (1) | TWI454446B (de) |
| WO (1) | WO2007071497A1 (de) |
Families Citing this family (76)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4874659B2 (ja) * | 2006-01-24 | 2012-02-15 | 富士フイルム株式会社 | アニリン化合物及びその製造方法、並びに、感光性組成物 |
| US20090292039A1 (en) * | 2006-12-27 | 2009-11-26 | Adeka Corporation | Oxime ester compound and photopolymerization initiator containing the same |
| CN101679394B (zh) | 2007-05-11 | 2013-10-16 | 巴斯夫欧洲公司 | 肟酯光引发剂 |
| CA2684931A1 (en) * | 2007-05-11 | 2008-11-20 | Basf Se | Oxime ester photoinitiators |
| EP2402315A1 (de) * | 2007-05-11 | 2012-01-04 | Basf Se | Oximester-Fotoinitiatoren |
| WO2009066638A1 (ja) * | 2007-11-20 | 2009-05-28 | Hitachi Chemical Company, Ltd. | 感光性樹脂組成物、感光性樹脂硬化物、感光性樹脂フィルム、感光性樹脂フィルム硬化物及びこれらを用いて得られる光導波路 |
| WO2009117670A2 (en) * | 2008-03-21 | 2009-09-24 | President And Fellows Of Harvard College | Self-aligned barrier layers for interconnects |
| CN102027026B (zh) * | 2008-05-29 | 2013-06-19 | 旭硝子株式会社 | 光固化性组合物及表面具有精细图案的成形体的制造方法 |
| EP2285836B1 (de) * | 2008-06-06 | 2012-01-18 | Basf Se | Fotoinitiatormischungen |
| EP2303833B1 (de) | 2008-06-06 | 2013-10-16 | Basf Se | Oximester-photoinitiatoren |
| JP5623416B2 (ja) * | 2008-11-03 | 2014-11-12 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | 光開始剤混合物 |
| WO2010071956A1 (en) | 2008-12-22 | 2010-07-01 | Canadian Bank Note Company, Limited | Improved printing of tactile marks for the visually impaired |
| EP2387598B1 (de) | 2009-01-19 | 2014-06-04 | Basf Se | Schwarze matrix für farbfilter |
| JP5642150B2 (ja) | 2009-03-23 | 2014-12-17 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | フォトレジスト組成物 |
| JP5236587B2 (ja) | 2009-07-15 | 2013-07-17 | 太陽ホールディングス株式会社 | 光硬化性樹脂組成物 |
| KR101730203B1 (ko) * | 2009-10-23 | 2017-04-25 | 프레지던트 앤드 펠로우즈 오브 하바드 칼리지 | 상호 접속부를 위한 자기―정렬 배리어 및 캡핑 층 |
| CN102640055B (zh) | 2009-12-07 | 2015-02-25 | 爱克发印艺公司 | Uv-led可固化组合物和墨水 |
| WO2011069947A1 (en) | 2009-12-07 | 2011-06-16 | Agfa-Gevaert | Photoinitiators for uv-led curable compositions and inks |
| JP5640722B2 (ja) * | 2010-02-05 | 2014-12-17 | Jsr株式会社 | 新規化合物及びそれを含有する感放射線性組成物 |
| CN102792225B (zh) * | 2010-03-31 | 2016-01-20 | 太阳控股株式会社 | 光固化性树脂组合物 |
| FR2960087B1 (fr) * | 2010-05-12 | 2013-08-30 | Compagnie Ind Et Financiere Dingenierie Ingenico | Dispositif portable comprenant un ecran tactile et procede d'utilisation correspondant. |
| JP5636869B2 (ja) * | 2010-10-20 | 2014-12-10 | Jsr株式会社 | 感放射線性組成物、硬化膜、及びそれらの形成方法 |
| CN103229101B (zh) * | 2010-11-30 | 2017-05-10 | 日产化学工业株式会社 | 微透镜用感光性树脂组合物 |
| CN103443072B (zh) | 2011-01-28 | 2016-05-18 | 巴斯夫欧洲公司 | 包含肟磺酸酯作为热固化剂的可聚合组合物 |
| US20120207935A1 (en) | 2011-02-14 | 2012-08-16 | Deepak Shukla | Photocurable inks and methods of use |
| US20120208914A1 (en) | 2011-02-14 | 2012-08-16 | Deepak Shukla | Photoinitiator compositions and uses |
| US8816211B2 (en) | 2011-02-14 | 2014-08-26 | Eastman Kodak Company | Articles with photocurable and photocured compositions |
| UA114403C2 (uk) | 2011-05-25 | 2017-06-12 | Емерікен Дай Сорс, Інк. | Похідні труксену, які містять оксим-складноефірні та/або ацильні групи |
| KR101469519B1 (ko) * | 2011-10-07 | 2014-12-08 | (주)경인양행 | 옥심 에스테르 화합물 및 그것을 포함하는 광중합 개시제 |
| JP5799799B2 (ja) * | 2011-10-20 | 2015-10-28 | 日立化成株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| CN103998427A (zh) | 2011-12-07 | 2014-08-20 | 巴斯夫欧洲公司 | 肟酯光敏引发剂 |
| TWI550643B (zh) * | 2012-03-30 | 2016-09-21 | Taiyo Holdings Co Ltd | Conductive paste and conductive circuit |
| US9864273B2 (en) * | 2012-05-09 | 2018-01-09 | Basf Se | Oxime ester photoinitiators |
| CN104350108B (zh) | 2012-06-01 | 2017-03-29 | 巴斯夫欧洲公司 | 黑色着色剂混合物 |
| JP2013047818A (ja) * | 2012-10-01 | 2013-03-07 | Taiyo Holdings Co Ltd | 光硬化性樹脂組成物 |
| JP2013047816A (ja) * | 2012-10-01 | 2013-03-07 | Taiyo Holdings Co Ltd | プリント配線板用光硬化性樹脂組成物 |
| JP5536167B2 (ja) * | 2012-10-01 | 2014-07-02 | 太陽ホールディングス株式会社 | ソルダーレジスト用光硬化性樹脂組成物 |
| KR101664121B1 (ko) | 2012-12-13 | 2016-10-10 | 제일모직 주식회사 | 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터 |
| KR101609634B1 (ko) | 2012-12-26 | 2016-04-06 | 제일모직 주식회사 | 감광성 수지 조성물 및 이를 이용한 차광층 |
| JP5890337B2 (ja) * | 2013-02-13 | 2016-03-22 | 東京応化工業株式会社 | 感放射線性樹脂組成物、絶縁膜、及び表示装置 |
| WO2014174601A1 (ja) * | 2013-04-24 | 2014-10-30 | 株式会社千葉合成研究所 | 新規ピリミジン誘導体 |
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| CN104076606B (zh) * | 2014-07-15 | 2019-12-03 | 常州强力电子新材料股份有限公司 | 一种含肟酯类光引发剂的感光性组合物及其应用 |
| US10487050B2 (en) | 2014-08-29 | 2019-11-26 | Basf Se | Oxime sulfonate derivatives |
| KR101824429B1 (ko) | 2015-01-26 | 2018-02-06 | 주식회사 삼양사 | 신규한 디옥심에스테르 화합물 및 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
| KR101824443B1 (ko) | 2015-04-09 | 2018-02-05 | 주식회사 삼양사 | 신규한 플루오렌일 옥심 에스테르 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
| KR101828927B1 (ko) | 2015-02-06 | 2018-02-14 | 주식회사 삼양사 | 신규한 옥심에스테르 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
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| KR102613079B1 (ko) | 2015-07-17 | 2023-12-12 | 타코마테크놀러지 주식회사 | 옥심에스테르 화합물 및 이를 포함하는 감광성 수지 조성물 |
| CN106565690B (zh) * | 2015-10-08 | 2019-10-18 | 常州强力先端电子材料有限公司 | 一种含杂环的硝基咔唑肟酯类光引发剂 |
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| US10095110B2 (en) | 2015-11-26 | 2018-10-09 | Jsr Corporation | Photosensitive resin composition, method for forming resist pattern, and method for producing metallic pattern |
| JP2017149661A (ja) * | 2016-02-23 | 2017-08-31 | 株式会社Adeka | オキシムエステル化合物及び該化合物を含有する重合開始剤 |
| CN107340688B (zh) * | 2016-04-29 | 2022-05-06 | 东友精细化工有限公司 | 硬掩模用组合物 |
| KR101892086B1 (ko) | 2016-05-19 | 2018-08-27 | 주식회사 삼양사 | 옥심에스테르 유도체 화합물, 이를 포함하는 광중합 개시제, 및 감광성 조성물 |
| TWI635079B (zh) * | 2016-07-08 | 2018-09-11 | 韓國化學研究院 | 高敏感肟酯光聚合起始劑以及包含該起始劑的光聚合組合物 |
| CN106336470B (zh) * | 2016-08-23 | 2018-08-24 | 湖北和昌新材料科技股份有限公司 | 一种咔唑肟酯类光引发剂及其制备方法及应用 |
| CN106632740B (zh) * | 2016-09-28 | 2018-09-18 | 江苏博砚电子科技有限公司 | 一种用于光阻材料的光引发剂及其制备和应用 |
| KR101991838B1 (ko) | 2016-12-28 | 2019-06-24 | 주식회사 삼양사 | 신규 1,3-벤조디아졸 베타-옥심 에스테르 화합물 및 이를 포함하는 조성물 |
| KR20180090135A (ko) | 2017-02-02 | 2018-08-10 | 주식회사 삼양사 | 신규한 옥심에스테르 비페닐 화합물, 이를 포함하는 광중합 개시제 및 감광성 조성물 |
| JP7095676B2 (ja) * | 2017-02-23 | 2022-07-05 | Ｈｄマイクロシステムズ株式会社 | 感光性樹脂組成物、硬化パターンの製造方法、硬化物、層間絶縁膜、カバーコート層、表面保護膜、及び電子部品 |
| CN110023307B (zh) * | 2017-03-16 | 2024-01-02 | 株式会社艾迪科 | 肟酯化合物及含有该化合物的光聚合引发剂 |
| JP6949527B2 (ja) * | 2017-03-31 | 2021-10-13 | 株式会社Ｄｎｐファインケミカル | 感光性着色樹脂組成物、硬化物、カラーフィルタ、表示装置 |
| KR20200029379A (ko) * | 2017-07-13 | 2020-03-18 | 가부시키가이샤 아데카 | 옥심에스테르 화합물 및 상기 화합물을 함유하는 광중합 개시제 |
| KR101991903B1 (ko) | 2017-12-07 | 2019-10-01 | 주식회사 삼양사 | 카바졸 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 감광성 조성물 |
| KR20200125934A (ko) | 2018-02-23 | 2020-11-05 | 바스프 에스이 | 유기 개질 금속 산화물 또는 준금속 산화물 중합체 필름 |
| US20210277251A1 (en) | 2018-06-25 | 2021-09-09 | Basf Se | Red pigment composition for color filter |
| CN111258180B (zh) * | 2018-11-30 | 2024-03-08 | 常州正洁智造科技有限公司 | 六芳基双咪唑类混合光引发剂及应用 |
| KR102228630B1 (ko) | 2018-12-28 | 2021-03-16 | 주식회사 삼양사 | 카바졸 멀티 베타 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 포토레지스트 조성물 |
| US20220121113A1 (en) | 2019-01-23 | 2022-04-21 | Basf Se | Oxime ester photoinitiators having a special aroyl chromophore |
| CN113474730B (zh) | 2019-03-05 | 2024-10-01 | 东丽株式会社 | 负型感光性树脂组合物、使用它的固化膜的制造方法及触控面板 |
| EP4114825A1 (de) | 2020-03-04 | 2023-01-11 | Basf Se | Oximester-photoinitiatoren |
| US11981759B2 (en) | 2022-05-18 | 2024-05-14 | Canon Kabushiki Kaisha | Photocurable composition |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1180846A (en) * | 1967-08-08 | 1970-02-11 | Agfa Gevaert Nv | Photopolymerisation of Ethylenically Unsaturated Organic Compounds |
| FR2393345A1 (fr) * | 1977-06-01 | 1978-12-29 | Agfa Gevaert Nv | Fabrication d'elements modifies sous forme d'images |
| GB2029423A (en) * | 1978-08-25 | 1980-03-19 | Agfa Gevaert Nv | Photo-polymerisable materials and recording method |
| US4590145A (en) * | 1985-06-28 | 1986-05-20 | Daicel Chemical Industries, Ltd. | Photopolymerization initiator comprised of thioxanthones and oxime esters |
| US5019482A (en) * | 1987-08-12 | 1991-05-28 | Asahi Kasei Kogyo Kabushiki Kaisha | Polymer/oxime ester/coumarin compound photosensitive composition |
| SG77689A1 (en) * | 1998-06-26 | 2001-01-16 | Ciba Sc Holding Ag | New o-acyloxime photoinitiators |
| SG97168A1 (en) * | 1999-12-15 | 2003-07-18 | Ciba Sc Holding Ag | Photosensitive resin composition |
| NL1016815C2 (nl) * | 1999-12-15 | 2002-05-14 | Ciba Sc Holding Ag | Oximester-fotoinitiatoren. |
| ATE446322T1 (de) * | 2001-06-11 | 2009-11-15 | Basf Se | Oxim ester photoinitiatoren mit kombinierter struktur |
| DE60325890D1 (de) | 2002-12-03 | 2009-03-05 | Ciba Holding Inc | Heteroaromatische gruppen enthaltende oximester als photointiatoren |
| JP2004359639A (ja) * | 2003-06-06 | 2004-12-24 | Asahi Denka Kogyo Kk | オキシムエステル化合物および該化合物を含有する光重合開始剤 |
| JP4565824B2 (ja) * | 2003-09-24 | 2010-10-20 | 株式会社Ａｄｅｋａ | 二量体オキシムエステル化合物及び該化合物を有効成分とする光重合開始剤 |
| JP2005187678A (ja) * | 2003-12-26 | 2005-07-14 | Toyo Ink Mfg Co Ltd | 光重合性組成物 |
| JP2005220097A (ja) * | 2004-02-06 | 2005-08-18 | Asahi Denka Kogyo Kk | チオフェン構造を有するオキシムエステル化合物及び該化合物を含有する光重合開始剤 |
| JP4639770B2 (ja) | 2004-02-20 | 2011-02-23 | Ｊｓｒ株式会社 | 無機粉体含有樹脂組成物、転写フィルムおよびプラズマディスプレイパネルの製造方法 |
| EP1778636B1 (de) * | 2004-08-18 | 2007-12-19 | Ciba SC Holding AG | Oximesther-fotoinitiatoren |
| DE602006019788D1 (de) | 2005-12-01 | 2011-03-03 | Basf Se | Oximester-Fotoinitiatoren |
-
2006
- 2006-11-09 WO PCT/EP2006/068254 patent/WO2007071497A1/en active Application Filing
- 2006-11-09 KR KR1020087017697A patent/KR101351286B1/ko active IP Right Grant
- 2006-11-09 DE DE602006012366T patent/DE602006012366D1/de active Active
- 2006-11-09 CN CN201110064804.4A patent/CN102199119B/zh not_active Expired - Fee Related
- 2006-11-09 EP EP06807785A patent/EP1963374B1/de not_active Not-in-force
- 2006-11-09 JP JP2008546317A patent/JP5117397B2/ja not_active Expired - Fee Related
- 2006-11-09 US US12/086,567 patent/US8586268B2/en not_active Expired - Fee Related
- 2006-11-09 AT AT06807785T patent/ATE458010T1/de active
- 2006-11-10 TW TW095141678A patent/TWI454446B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| WO2007071497A1 (en) | 2007-06-28 |
| KR101351286B1 (ko) | 2014-02-17 |
| KR20080080208A (ko) | 2008-09-02 |
| CN102199119A (zh) | 2011-09-28 |
| EP1963374A1 (de) | 2008-09-03 |
| US20100188765A1 (en) | 2010-07-29 |
| DE602006012366D1 (en) | 2010-04-01 |
| JP5117397B2 (ja) | 2013-01-16 |
| JP2009519991A (ja) | 2009-05-21 |
| EP1963374B1 (de) | 2010-02-17 |
| TW200724522A (en) | 2007-07-01 |
| TWI454446B (zh) | 2014-10-01 |
| CN102199119B (zh) | 2014-07-16 |
| US8586268B2 (en) | 2013-11-19 |
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