ATE458010T1 - Oximester-photoinitiatoren - Google Patents
Oximester-photoinitiatorenInfo
- Publication number
- ATE458010T1 ATE458010T1 AT06807785T AT06807785T ATE458010T1 AT E458010 T1 ATE458010 T1 AT E458010T1 AT 06807785 T AT06807785 T AT 06807785T AT 06807785 T AT06807785 T AT 06807785T AT E458010 T1 ATE458010 T1 AT E458010T1
- Authority
- AT
- Austria
- Prior art keywords
- c20alkyl
- direct bond
- hydrogen
- oximester
- photoinitiators
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
- C07C251/32—Oximes
- C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
- C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
- C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/56—Ring systems containing three or more rings
- C07D209/80—[b, c]- or [b, d]-condensed
- C07D209/82—Carbazoles; Hydrogenated carbazoles
- C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
- C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
- C07D409/06—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D515/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen, oxygen, and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00
- C07D515/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen, oxygen, and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00 in which the condensed system contains two hetero rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Indole Compounds (AREA)
- Polymerisation Methods In General (AREA)
- Plural Heterocyclic Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Dental Preparations (AREA)
- Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP05112439 | 2005-12-20 | ||
| EP06115428 | 2006-06-14 | ||
| PCT/EP2006/068254 WO2007071497A1 (en) | 2005-12-20 | 2006-11-09 | Oxime ester photoinitiators |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE458010T1 true ATE458010T1 (de) | 2010-03-15 |
Family
ID=37561778
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT06807785T ATE458010T1 (de) | 2005-12-20 | 2006-11-09 | Oximester-photoinitiatoren |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US8586268B2 (de) |
| EP (1) | EP1963374B1 (de) |
| JP (1) | JP5117397B2 (de) |
| KR (1) | KR101351286B1 (de) |
| CN (1) | CN102199119B (de) |
| AT (1) | ATE458010T1 (de) |
| DE (1) | DE602006012366D1 (de) |
| TW (1) | TWI454446B (de) |
| WO (1) | WO2007071497A1 (de) |
Families Citing this family (80)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4874659B2 (ja) * | 2006-01-24 | 2012-02-15 | 富士フイルム株式会社 | アニリン化合物及びその製造方法、並びに、感光性組成物 |
| US20090292039A1 (en) * | 2006-12-27 | 2009-11-26 | Adeka Corporation | Oxime ester compound and photopolymerization initiator containing the same |
| US8911921B2 (en) | 2007-05-11 | 2014-12-16 | Ciba Corporation | Oxime ester photoinitiators |
| WO2008138733A1 (en) * | 2007-05-11 | 2008-11-20 | Basf Se | Oxime ester photoinitiators |
| JP5535064B2 (ja) * | 2007-05-11 | 2014-07-02 | ビーエーエスエフ ソシエタス・ヨーロピア | オキシムエステル光重合開始剤 |
| CN101583908B (zh) * | 2007-11-20 | 2012-12-26 | 日立化成工业株式会社 | 感光性树脂组合物、感光性树脂固化物、感光性树脂膜、感光性树脂膜固化物和使用它们得到的光波导 |
| JP5820267B2 (ja) * | 2008-03-21 | 2015-11-24 | プレジデント アンド フェローズ オブ ハーバード カレッジ | 配線用セルフアライン（自己整合）バリア層 |
| EP2289955B1 (de) * | 2008-05-29 | 2014-10-15 | Asahi Glass Company, Limited | Lichthärtende zusammensetzung und herstellungsverfahren für einen formköper mit einem feinen muster auf der oberfläche |
| JP5553827B2 (ja) | 2008-06-06 | 2014-07-16 | ビーエーエスエフ ソシエタス・ヨーロピア | 光開始剤混合物 |
| JP5566378B2 (ja) | 2008-06-06 | 2014-08-06 | ビーエーエスエフ ソシエタス・ヨーロピア | オキシムエステル光開始剤 |
| JP5623416B2 (ja) * | 2008-11-03 | 2014-11-12 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | 光開始剤混合物 |
| WO2010071956A1 (en) | 2008-12-22 | 2010-07-01 | Canadian Bank Note Company, Limited | Improved printing of tactile marks for the visually impaired |
| CN102282215B (zh) | 2009-01-19 | 2016-03-16 | 巴斯夫欧洲公司 | 滤色器用黑色基体 |
| CN102361896B (zh) | 2009-03-23 | 2015-10-07 | 巴斯夫欧洲公司 | 光致抗蚀剂组合物 |
| JP5236587B2 (ja) | 2009-07-15 | 2013-07-17 | 太陽ホールディングス株式会社 | 光硬化性樹脂組成物 |
| AU2010310750B2 (en) * | 2009-10-23 | 2015-02-26 | President And Fellows Of Harvard College | Self-aligned barrier and capping layers for interconnects |
| CN102639501B (zh) | 2009-12-07 | 2015-04-29 | 爱克发印艺公司 | 用于uv-led可固化组合物和墨水的光引发剂 |
| AU2010330040B2 (en) | 2009-12-07 | 2013-12-19 | Agfa Nv | UV-LED curable compositions and inks |
| JP5640722B2 (ja) * | 2010-02-05 | 2014-12-17 | Jsr株式会社 | 新規化合物及びそれを含有する感放射線性組成物 |
| CN102792225B (zh) * | 2010-03-31 | 2016-01-20 | 太阳控股株式会社 | 光固化性树脂组合物 |
| FR2960087B1 (fr) * | 2010-05-12 | 2013-08-30 | Compagnie Ind Et Financiere Dingenierie Ingenico | Dispositif portable comprenant un ecran tactile et procede d'utilisation correspondant. |
| JP5636869B2 (ja) * | 2010-10-20 | 2014-12-10 | Jsr株式会社 | 感放射線性組成物、硬化膜、及びそれらの形成方法 |
| WO2012073742A1 (ja) * | 2010-11-30 | 2012-06-07 | 日産化学工業株式会社 | マイクロレンズ用感光性樹脂組成物 |
| CN103443072B (zh) | 2011-01-28 | 2016-05-18 | 巴斯夫欧洲公司 | 包含肟磺酸酯作为热固化剂的可聚合组合物 |
| US20120207935A1 (en) | 2011-02-14 | 2012-08-16 | Deepak Shukla | Photocurable inks and methods of use |
| US8816211B2 (en) * | 2011-02-14 | 2014-08-26 | Eastman Kodak Company | Articles with photocurable and photocured compositions |
| US20120208914A1 (en) | 2011-02-14 | 2012-08-16 | Deepak Shukla | Photoinitiator compositions and uses |
| US9127017B2 (en) | 2011-05-25 | 2015-09-08 | American Dye Source, Inc. | Compounds with oxime ester and/or acyl groups |
| KR101469519B1 (ko) * | 2011-10-07 | 2014-12-08 | (주)경인양행 | 옥심 에스테르 화합물 및 그것을 포함하는 광중합 개시제 |
| JP5799799B2 (ja) * | 2011-10-20 | 2015-10-28 | 日立化成株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
| EP2788325B1 (de) | 2011-12-07 | 2016-08-10 | Basf Se | Oximester-fotoinitiatoren |
| TWI550643B (zh) * | 2012-03-30 | 2016-09-21 | Taiyo Holdings Co Ltd | Conductive paste and conductive circuit |
| KR102013541B1 (ko) * | 2012-05-09 | 2019-08-22 | 바스프 에스이 | 옥심 에스테르 광개시제 |
| JP6157602B2 (ja) | 2012-06-01 | 2017-07-05 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | 黒色着色剤混合物 |
| JP2013047816A (ja) * | 2012-10-01 | 2013-03-07 | Taiyo Holdings Co Ltd | プリント配線板用光硬化性樹脂組成物 |
| JP5536167B2 (ja) * | 2012-10-01 | 2014-07-02 | 太陽ホールディングス株式会社 | ソルダーレジスト用光硬化性樹脂組成物 |
| JP2013047818A (ja) * | 2012-10-01 | 2013-03-07 | Taiyo Holdings Co Ltd | 光硬化性樹脂組成物 |
| KR101664121B1 (ko) | 2012-12-13 | 2016-10-10 | 제일모직 주식회사 | 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터 |
| KR101609634B1 (ko) | 2012-12-26 | 2016-04-06 | 제일모직 주식회사 | 감광성 수지 조성물 및 이를 이용한 차광층 |
| JP5890337B2 (ja) * | 2013-02-13 | 2016-03-22 | 東京応化工業株式会社 | 感放射線性樹脂組成物、絶縁膜、及び表示装置 |
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| CN104076606B (zh) * | 2014-07-15 | 2019-12-03 | 常州强力电子新材料股份有限公司 | 一种含肟酯类光引发剂的感光性组合物及其应用 |
| EP3186226B1 (de) | 2014-08-29 | 2020-06-17 | Basf Se | Oximsulfonatderivate |
| KR101824429B1 (ko) | 2015-01-26 | 2018-02-06 | 주식회사 삼양사 | 신규한 디옥심에스테르 화합물 및 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
| KR101824443B1 (ko) | 2015-04-09 | 2018-02-05 | 주식회사 삼양사 | 신규한 플루오렌일 옥심 에스테르 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
| KR101828927B1 (ko) | 2015-02-06 | 2018-02-14 | 주식회사 삼양사 | 신규한 옥심에스테르 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
| US10272426B2 (en) | 2015-04-21 | 2019-04-30 | Jsr Corporation | Method of producing microfluidic device, microfluidic device, and photosensitive resin composition |
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| KR102613079B1 (ko) | 2015-07-17 | 2023-12-12 | 타코마테크놀러지 주식회사 | 옥심에스테르 화합물 및 이를 포함하는 감광성 수지 조성물 |
| CN106565690B (zh) * | 2015-10-08 | 2019-10-18 | 常州强力先端电子材料有限公司 | 一种含杂环的硝基咔唑肟酯类光引发剂 |
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| US10095110B2 (en) | 2015-11-26 | 2018-10-09 | Jsr Corporation | Photosensitive resin composition, method for forming resist pattern, and method for producing metallic pattern |
| JP2017149661A (ja) * | 2016-02-23 | 2017-08-31 | 株式会社Adeka | オキシムエステル化合物及び該化合物を含有する重合開始剤 |
| CN107340688B (zh) * | 2016-04-29 | 2022-05-06 | 东友精细化工有限公司 | 硬掩模用组合物 |
| KR101892086B1 (ko) | 2016-05-19 | 2018-08-27 | 주식회사 삼양사 | 옥심에스테르 유도체 화합물, 이를 포함하는 광중합 개시제, 및 감광성 조성물 |
| TWI635079B (zh) * | 2016-07-08 | 2018-09-11 | 韓國化學研究院 | 高敏感肟酯光聚合起始劑以及包含該起始劑的光聚合組合物 |
| CN106336470B (zh) * | 2016-08-23 | 2018-08-24 | 湖北和昌新材料科技股份有限公司 | 一种咔唑肟酯类光引发剂及其制备方法及应用 |
| CN106632740B (zh) * | 2016-09-28 | 2018-09-18 | 江苏博砚电子科技有限公司 | 一种用于光阻材料的光引发剂及其制备和应用 |
| KR101991838B1 (ko) | 2016-12-28 | 2019-06-24 | 주식회사 삼양사 | 신규 1,3-벤조디아졸 베타-옥심 에스테르 화합물 및 이를 포함하는 조성물 |
| KR102799810B1 (ko) | 2017-02-02 | 2025-04-28 | 주식회사 삼양사 | 신규한 옥심에스테르 비페닐 화합물, 이를 포함하는 광중합 개시제 및 감광성 조성물 |
| KR102646304B1 (ko) * | 2017-02-23 | 2024-03-11 | 에이치디 마이크로시스템즈 가부시키가이샤 | 감광성 수지 조성물, 경화 패턴의 제조 방법, 경화물, 층간절연막, 커버 코트층, 표면 보호막, 및 전자부품 |
| KR102545326B1 (ko) * | 2017-03-16 | 2023-06-21 | 가부시키가이샤 아데카 | 옥심에스테르 화합물 및 상기 화합물을 함유하는 광중합 개시제 |
| JP6949527B2 (ja) * | 2017-03-31 | 2021-10-13 | 株式会社Ｄｎｐファインケミカル | 感光性着色樹脂組成物、硬化物、カラーフィルタ、表示装置 |
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| KR101991903B1 (ko) | 2017-12-07 | 2019-10-01 | 주식회사 삼양사 | 카바졸 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 감광성 조성물 |
| JP7416701B2 (ja) | 2018-02-23 | 2024-01-17 | ビーエーエスエフ ソシエタス・ヨーロピア | 有機修飾金属酸化物または半金属酸化物高分子膜 |
| KR102806570B1 (ko) | 2018-06-25 | 2025-05-14 | 썬 케미칼 비.브이. | 컬러 필터용 적색 안료 조성물 |
| WO2020031240A1 (ja) | 2018-08-06 | 2020-02-13 | 日立化成デュポンマイクロシステムズ株式会社 | 感光性樹脂組成物、パターン硬化膜の製造方法、硬化膜、層間絶縁膜、カバーコート層、表面保護膜及び電子部品 |
| CN111258180B (zh) * | 2018-11-30 | 2024-03-08 | 常州正洁智造科技有限公司 | 六芳基双咪唑类混合光引发剂及应用 |
| KR102228630B1 (ko) | 2018-12-28 | 2021-03-16 | 주식회사 삼양사 | 카바졸 멀티 베타 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 포토레지스트 조성물 |
| US20220121113A1 (en) | 2019-01-23 | 2022-04-21 | Basf Se | Oxime ester photoinitiators having a special aroyl chromophore |
| JP7405075B2 (ja) | 2019-03-05 | 2023-12-26 | 東レ株式会社 | ネガ型感光性樹脂組成物、それを用いた硬化膜の製造方法およびタッチパネル |
| TWI894219B (zh) | 2020-03-04 | 2025-08-21 | 德商巴地斯顏料化工廠 | 肟酯光起始劑 |
| US11981759B2 (en) | 2022-05-18 | 2024-05-14 | Canon Kabushiki Kaisha | Photocurable composition |
| JP2024049908A (ja) * | 2022-09-29 | 2024-04-10 | ａｒｔｉｅｎｃｅ株式会社 | 感光性組成物、光学フィルタ、固体撮像素子、画像表示装置、及び赤外線センサ |
| KR20260035964A (ko) | 2023-07-10 | 2026-03-13 | 바스프 에스이 | 저온 경화에 적합한 광경화성 및 열 경화성 조성물 |
| CN119241469B (zh) * | 2024-09-29 | 2025-08-15 | 武汉尚赛光电科技有限公司 | 一种光引发剂、光聚合组合物及其应用 |
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| GB1180846A (en) | 1967-08-08 | 1970-02-11 | Agfa Gevaert Nv | Photopolymerisation of Ethylenically Unsaturated Organic Compounds |
| FR2393345A1 (fr) | 1977-06-01 | 1978-12-29 | Agfa Gevaert Nv | Fabrication d'elements modifies sous forme d'images |
| GB2029423A (en) | 1978-08-25 | 1980-03-19 | Agfa Gevaert Nv | Photo-polymerisable materials and recording method |
| US4590145A (en) | 1985-06-28 | 1986-05-20 | Daicel Chemical Industries, Ltd. | Photopolymerization initiator comprised of thioxanthones and oxime esters |
| US5019482A (en) | 1987-08-12 | 1991-05-28 | Asahi Kasei Kogyo Kabushiki Kaisha | Polymer/oxime ester/coumarin compound photosensitive composition |
| SG77689A1 (en) | 1998-06-26 | 2001-01-16 | Ciba Sc Holding Ag | New o-acyloxime photoinitiators |
| NL1016815C2 (nl) | 1999-12-15 | 2002-05-14 | Ciba Sc Holding Ag | Oximester-fotoinitiatoren. |
| SG97168A1 (en) * | 1999-12-15 | 2003-07-18 | Ciba Sc Holding Ag | Photosensitive resin composition |
| US7189489B2 (en) * | 2001-06-11 | 2007-03-13 | Ciba Specialty Chemicals Corporation | Oxime ester photoiniators having a combined structure |
| KR101032582B1 (ko) | 2002-12-03 | 2011-05-06 | 시바 홀딩 인크 | 헤테로방향족 그룹을 갖는 옥심 에스테르 광개시제 |
| JP2004359639A (ja) | 2003-06-06 | 2004-12-24 | Asahi Denka Kogyo Kk | オキシムエステル化合物および該化合物を含有する光重合開始剤 |
| JP4565824B2 (ja) * | 2003-09-24 | 2010-10-20 | 株式会社Adeka | 二量体オキシムエステル化合物及び該化合物を有効成分とする光重合開始剤 |
| JP2005187678A (ja) * | 2003-12-26 | 2005-07-14 | Toyo Ink Mfg Co Ltd | 光重合性組成物 |
| JP2005220097A (ja) * | 2004-02-06 | 2005-08-18 | Asahi Denka Kogyo Kk | チオフェン構造を有するオキシムエステル化合物及び該化合物を含有する光重合開始剤 |
| JP4639770B2 (ja) | 2004-02-20 | 2011-02-23 | Ｊｓｒ株式会社 | 無機粉体含有樹脂組成物、転写フィルムおよびプラズマディスプレイパネルの製造方法 |
| WO2006018405A1 (en) | 2004-08-18 | 2006-02-23 | Ciba Specialty Chemicals Holding Inc. | Oxime ester photoinitiators |
| US8940464B2 (en) | 2005-12-01 | 2015-01-27 | Basf Se | Oxime ester photoinitiators |
-
2006
- 2006-11-09 KR KR1020087017697A patent/KR101351286B1/ko not_active Expired - Fee Related
- 2006-11-09 CN CN201110064804.4A patent/CN102199119B/zh not_active Expired - Fee Related
- 2006-11-09 JP JP2008546317A patent/JP5117397B2/ja not_active Expired - Fee Related
- 2006-11-09 US US12/086,567 patent/US8586268B2/en not_active Expired - Fee Related
- 2006-11-09 EP EP06807785A patent/EP1963374B1/de not_active Not-in-force
- 2006-11-09 AT AT06807785T patent/ATE458010T1/de active
- 2006-11-09 WO PCT/EP2006/068254 patent/WO2007071497A1/en not_active Ceased
- 2006-11-09 DE DE602006012366T patent/DE602006012366D1/de active Active
- 2006-11-10 TW TW095141678A patent/TWI454446B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009519991A (ja) | 2009-05-21 |
| DE602006012366D1 (en) | 2010-04-01 |
| KR20080080208A (ko) | 2008-09-02 |
| US20100188765A1 (en) | 2010-07-29 |
| US8586268B2 (en) | 2013-11-19 |
| EP1963374B1 (de) | 2010-02-17 |
| KR101351286B1 (ko) | 2014-02-17 |
| CN102199119A (zh) | 2011-09-28 |
| JP5117397B2 (ja) | 2013-01-16 |
| CN102199119B (zh) | 2014-07-16 |
| WO2007071497A1 (en) | 2007-06-28 |
| EP1963374A1 (de) | 2008-09-03 |
| TWI454446B (zh) | 2014-10-01 |
| TW200724522A (en) | 2007-07-01 |
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