DE602006012366D1 - Oximester-photoinitiatoren - Google Patents

Oximester-photoinitiatoren

Info

Publication number
DE602006012366D1
DE602006012366D1 DE602006012366T DE602006012366T DE602006012366D1 DE 602006012366 D1 DE602006012366 D1 DE 602006012366D1 DE 602006012366 T DE602006012366 T DE 602006012366T DE 602006012366 T DE602006012366 T DE 602006012366T DE 602006012366 D1 DE602006012366 D1 DE 602006012366D1
Authority
DE
Germany
Prior art keywords
c20alkyl
direct bond
hydrogen
halogen
compounds
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006012366T
Other languages
English (en)
Inventor
Akira Matsumoto
Junichi Tanabe
Hisatoshi Kura
Masaki Ohwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Publication of DE602006012366D1 publication Critical patent/DE602006012366D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32—Oximes
    • C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
    • C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
    • C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D209/56—Ring systems containing three or more rings
    • C07D209/80—[b, c]- or [b, d]-condensed
    • C07D209/82—Carbazoles; Hydrogenated carbazoles
    • C07D209/86—Carbazoles; Hydrogenated carbazoles with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the ring system
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/06—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D515/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen, oxygen, and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00
    • C07D515/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen, oxygen, and sulfur atoms as the only ring hetero atoms, not provided for in groups C07D463/00, C07D477/00 or C07D499/00 - C07D507/00 in which the condensed system contains two hetero rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Indole Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Dental Preparations (AREA)
  • Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
DE602006012366T 2005-12-20 2006-11-09 Oximester-photoinitiatoren Active DE602006012366D1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP05112439 2005-12-20
EP06115428 2006-06-14
PCT/EP2006/068254 WO2007071497A1 (en) 2005-12-20 2006-11-09 Oxime ester photoinitiators

Publications (1)

Publication Number Publication Date
DE602006012366D1 true DE602006012366D1 (en) 2010-04-01

Family

ID=37561778

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006012366T Active DE602006012366D1 (en) 2005-12-20 2006-11-09 Oximester-photoinitiatoren

Country Status (9)

Country Link
US (1) US8586268B2 (de)
EP (1) EP1963374B1 (de)
JP (1) JP5117397B2 (de)
KR (1) KR101351286B1 (de)
CN (1) CN102199119B (de)
AT (1) ATE458010T1 (de)
DE (1) DE602006012366D1 (de)
TW (1) TWI454446B (de)
WO (1) WO2007071497A1 (de)

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CN107340688B (zh) * 2016-04-29 2022-05-06 东友精细化工有限公司 硬掩模用组合物
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KR20180090135A (ko) 2017-02-02 2018-08-10 주식회사 삼양사 신규한 옥심에스테르 비페닐 화합물, 이를 포함하는 광중합 개시제 및 감광성 조성물
JP7095676B2 (ja) * 2017-02-23 2022-07-05 Ｈｄマイクロシステムズ株式会社 感光性樹脂組成物、硬化パターンの製造方法、硬化物、層間絶縁膜、カバーコート層、表面保護膜、及び電子部品
JP7482628B2 (ja) * 2017-03-16 2024-05-14 株式会社Adeka オキシムエステル化合物及び該化合物を含有する光重合開始剤
JP6949527B2 (ja) * 2017-03-31 2021-10-13 株式会社Ｄｎｐファインケミカル 感光性着色樹脂組成物、硬化物、カラーフィルタ、表示装置
KR20200029379A (ko) * 2017-07-13 2020-03-18 가부시키가이샤 아데카 옥심에스테르 화합물 및 상기 화합물을 함유하는 광중합 개시제
KR101991903B1 (ko) 2017-12-07 2019-10-01 주식회사 삼양사 카바졸 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 감광성 조성물
CN111770905A (zh) 2018-02-23 2020-10-13 巴斯夫欧洲公司 有机改性的金属氧化物或准金属氧化物聚合物膜
EP3922681A1 (de) 2018-06-25 2021-12-15 Basf Se Rote pigmentzusammensetzung für farbfilter
CN111258180B (zh) * 2018-11-30 2024-03-08 常州正洁智造科技有限公司 六芳基双咪唑类混合光引发剂及应用
KR102228630B1 (ko) 2018-12-28 2021-03-16 주식회사 삼양사 카바졸 멀티 베타 옥심에스테르 유도체 화합물 및 이를 포함하는 광중합 개시제와 포토레지스트 조성물
US20220121113A1 (en) 2019-01-23 2022-04-21 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
KR102675832B1 (ko) 2019-03-05 2024-06-14 도레이 카부시키가이샤 네가티브형 감광성 수지 조성물, 이것을 사용한 경화막의 제조 방법 및 터치패널
JP2023517304A (ja) 2020-03-04 2023-04-25 ベーアーエスエフ・エスエー オキシムエステル光開始剤
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JP2009519991A (ja) 2009-05-21
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US8586268B2 (en) 2013-11-19
CN102199119B (zh) 2014-07-16
TWI454446B (zh) 2014-10-01
WO2007071497A1 (en) 2007-06-28
ATE458010T1 (de) 2010-03-15
CN102199119A (zh) 2011-09-28
EP1963374A1 (de) 2008-09-03
TW200724522A (en) 2007-07-01
KR20080080208A (ko) 2008-09-02
EP1963374B1 (de) 2010-02-17
US20100188765A1 (en) 2010-07-29

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