DE602008004757D1 - Oximesther-fotoinitiatoren - Google Patents

Oximesther-fotoinitiatoren

Info

Publication number
DE602008004757D1
DE602008004757D1 DE200860004757 DE602008004757T DE602008004757D1 DE 602008004757 D1 DE602008004757 D1 DE 602008004757D1 DE 200860004757 DE200860004757 DE 200860004757 DE 602008004757 T DE602008004757 T DE 602008004757T DE 602008004757 D1 DE602008004757 D1 DE 602008004757D1
Authority
DE
Germany
Prior art keywords
oximesther
fotoinitiatoren
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE200860004757
Inventor
Akira Matsumoto
Junichi Tanabe
Hisatoshi Kura
Masaki Ohwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to EP07108030 priority Critical
Priority to EP07110649 priority
Application filed by BASF SE filed Critical BASF SE
Priority to PCT/EP2008/055127 priority patent/WO2008138733A1/en
Publication of DE602008004757D1 publication Critical patent/DE602008004757D1/en
Application status is Active legal-status Critical
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D401/00Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
    • C07D401/02Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
    • C07D401/12Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a chain containing hetero atoms as chain links
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D417/00Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00
    • C07D417/02Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings
    • C07D417/06Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultra-violet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultra-violet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; MISCELLANEOUS COMPOSITIONS; MISCELLANEOUS APPLICATIONS OF MATERIALS
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B15/00Acridine dyes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; MISCELLANEOUS COMPOSITIONS; MISCELLANEOUS APPLICATIONS OF MATERIALS
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B55/00Azomethine dyes
    • C09B55/002Monoazomethine dyes
    • C09B55/003Monoazomethine dyes with the -C=N- group attached to an heteroring
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; MISCELLANEOUS COMPOSITIONS; MISCELLANEOUS APPLICATIONS OF MATERIALS
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B55/00Azomethine dyes
    • C09B55/005Disazomethine dyes
    • C09B55/006Disazomethine dyes containing at least one heteroring
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; MISCELLANEOUS COMPOSITIONS; MISCELLANEOUS APPLICATIONS OF MATERIALS
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B55/00Azomethine dyes
    • C09B55/008Tri or polyazomethine dyes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; MISCELLANEOUS COMPOSITIONS; MISCELLANEOUS APPLICATIONS OF MATERIALS
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00Other synthetic dyes of known constitution
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B33ADDITIVE MANUFACTURING TECHNOLOGY
    • B33YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00Materials specially adapted for additive manufacturing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31855Of addition polymer from unsaturated monomers
DE200860004757 2007-05-11 2008-04-28 Oximesther-fotoinitiatoren Active DE602008004757D1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP07108030 2007-05-11
EP07110649 2007-06-20
PCT/EP2008/055127 WO2008138733A1 (en) 2007-05-11 2008-04-28 Oxime ester photoinitiators

Publications (1)

Publication Number Publication Date
DE602008004757D1 true DE602008004757D1 (en) 2011-03-10

Family

ID=39620202

Family Applications (1)

Application Number Title Priority Date Filing Date
DE200860004757 Active DE602008004757D1 (en) 2007-05-11 2008-04-28 Oximesther-fotoinitiatoren

Country Status (10)

Country Link
US (1) US8349548B2 (en)
EP (1) EP2144894B1 (en)
JP (1) JP5535065B2 (en)
KR (1) KR101604873B1 (en)
CN (1) CN101687846B (en)
AT (1) AT496910T (en)
CA (1) CA2684931A1 (en)
DE (1) DE602008004757D1 (en)
TW (1) TWI465433B (en)
WO (1) WO2008138733A1 (en)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5455898B2 (en) 2008-05-30 2014-03-26 アドバンスト・ソフトマテリアルズ株式会社 Polyrotaxane, aqueous polyrotaxane dispersion composition, and crosslinking of the polyrotaxane and the polymer, and methods for their preparation
US9624171B2 (en) * 2008-06-06 2017-04-18 Basf Se Photoinitiator mixtures
WO2009147031A2 (en) * 2008-06-06 2009-12-10 Basf Se Oxime ester photoinitiators
WO2010060702A1 (en) * 2008-11-03 2010-06-03 Basf Se Photoinitiator mixtures
EP2411430B1 (en) 2009-03-23 2015-10-14 Basf Se Photoresist composition
WO2010146883A1 (en) * 2009-06-17 2010-12-23 東洋インキ製造株式会社 Oxime ester compound, radical polymerization initiator, polymerizable composition, negative resist and image pattern
WO2011069943A1 (en) 2009-12-07 2011-06-16 Agfa-Gevaert Uv-led curable compositions and inks
WO2011069947A1 (en) 2009-12-07 2011-06-16 Agfa-Gevaert Photoinitiators for uv-led curable compositions and inks
JP5640722B2 (en) * 2010-02-05 2014-12-17 Jsr株式会社 The novel compounds and a radiation-sensitive composition containing the same
WO2011122025A1 (en) * 2010-03-31 2011-10-06 太陽ホールディングス株式会社 Photocurable resin composition
JP2011252065A (en) * 2010-06-01 2011-12-15 Fujifilm Corp Pigment dispersion composition, colored curable composition, color filter for solid state imaging device, its manufacturing method, and solid state imaging device
JP6113181B2 (en) 2011-12-07 2017-04-12 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se Oxime ester photoinitiator
JP5976523B2 (en) * 2011-12-28 2016-08-23 富士フイルム株式会社 An optical member set and a solid-state imaging device using the same
US9864273B2 (en) * 2012-05-09 2018-01-09 Basf Se Oxime ester photoinitiators
KR20130139106A (en) * 2012-06-12 2013-12-20 삼성디스플레이 주식회사 Method for processing cover glass
KR20150035523A (en) * 2012-07-09 2015-04-06 도레이 카부시키가이샤 Photosensitive resin composition, conductive wire protection film, and touch panel member
CN105358527B (en) * 2013-07-08 2018-09-25 巴斯夫欧洲公司 Oxime ester photoinitiator
US9957258B2 (en) 2013-09-10 2018-05-01 Basf Se Oxime ester photoinitiators
KR101435652B1 (en) 2014-01-17 2014-08-28 주식회사 삼양사 NOVEL FLUORENYL β-OXIME ESTER COMPOUNDS, PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION CONTAINING THE SAME
JP6464764B2 (en) * 2015-01-16 2019-02-06 Jsr株式会社 Radiation sensitive colored composition, a spacer, the forming method and a liquid crystal display device
KR101824429B1 (en) 2015-01-26 2018-02-06 주식회사 삼양사 Novel di-oxime ester compounds and photopolymerization initiator and photoresist composition containing the same
KR101828927B1 (en) 2015-02-06 2018-02-14 주식회사 삼양사 Novel oxime ester compounds, photopolymerization initiator and photoresist composition containing the same
KR101824443B1 (en) 2015-04-09 2018-02-05 주식회사 삼양사 Novel fluorenyl oxime ester compounds, photopolymerization initiator and photoresist composition containing the same
KR101777845B1 (en) 2015-06-08 2017-09-12 주식회사 삼양사 Novel fluoranthene oxime ester derivates, photopolymerization initiator and photoresist composition containing the same
KR20170009794A (en) 2015-07-17 2017-01-25 타코마테크놀러지 주식회사 Oxime ester compound and photosensitive resin composition containing the compound
WO2018168714A1 (en) * 2017-03-16 2018-09-20 株式会社Adeka Oxime ester compound and photopolymerization initiator containing said compound
JP6486571B1 (en) * 2017-06-06 2019-03-20 日本化薬株式会社 The adhesive for electronic components

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1180846A (en) * 1967-08-08 1970-02-11 Agfa Gevaert Nv Photopolymerisation of Ethylenically Unsaturated Organic Compounds
FR2393345B1 (en) * 1977-06-01 1980-04-25 Agfa Gevaert Nv
GB2029423A (en) * 1978-08-25 1980-03-19 Agfa Gevaert Nv Photo-polymerisable materials and recording method
US4590145A (en) * 1985-06-28 1986-05-20 Daicel Chemical Industries, Ltd. Photopolymerization initiator comprised of thioxanthones and oxime esters
US5019482A (en) * 1987-08-12 1991-05-28 Asahi Kasei Kogyo Kabushiki Kaisha Polymer/oxime ester/coumarin compound photosensitive composition
SG77689A1 (en) * 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
US7189489B2 (en) * 2001-06-11 2007-03-13 Ciba Specialty Chemicals Corporation Oxime ester photoiniators having a combined structure
WO2004050653A2 (en) * 2002-12-03 2004-06-17 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators with heteroaromatic groups
JP4342886B2 (en) * 2003-09-24 2009-10-14 凸版印刷株式会社 Photosensitive compositions and photosensitive coloring composition
JP4565824B2 (en) * 2003-09-24 2010-10-20 株式会社Adeka Dimeric oxime ester compound and a photopolymerization initiator as an active ingredient the compound
JP2005121940A (en) * 2003-10-17 2005-05-12 Toyo Ink Mfg Co Ltd Polymerizable composition, negative resist using same, and method for forming image pattern by using the resist
JP2005154494A (en) * 2003-11-21 2005-06-16 Toyo Ink Mfg Co Ltd Radical photopolymerization initiator and radical photopolymerizing composition using the same
CN1922142B (en) 2004-02-23 2012-05-02 三菱化学株式会社 Oxime ester compound, photopolymerizable composition and color filter utilizing the same
US7759043B2 (en) * 2004-08-18 2010-07-20 Ciba Specialty Chemicals Corp. Oxime ester photoinitiators
CN101321727B (en) * 2005-12-01 2013-03-27 西巴控股有限公司 Oxime ester photoinitiator
US8586268B2 (en) * 2005-12-20 2013-11-19 Basf Se Oxime ester photoinitiators

Also Published As

Publication number Publication date
JP5535065B2 (en) 2014-07-02
US20100086881A1 (en) 2010-04-08
CN101687846B (en) 2015-12-02
CA2684931A1 (en) 2008-11-20
WO2008138733A1 (en) 2008-11-20
KR101604873B1 (en) 2016-03-18
JP2010527339A (en) 2010-08-12
KR20100017755A (en) 2010-02-16
CN101687846A (en) 2010-03-31
TWI465433B (en) 2014-12-21
AT496910T (en) 2011-02-15
EP2144894B1 (en) 2011-01-26
TW200904801A (en) 2009-02-01
EP2144894A1 (en) 2010-01-20
US8349548B2 (en) 2013-01-08

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