DE602008004757D1 - Oximesther-fotoinitiatoren - Google Patents

Oximesther-fotoinitiatoren

Info

Publication number
DE602008004757D1
DE602008004757D1 DE200860004757 DE602008004757T DE602008004757D1 DE 602008004757 D1 DE602008004757 D1 DE 602008004757D1 DE 200860004757 DE200860004757 DE 200860004757 DE 602008004757 T DE602008004757 T DE 602008004757T DE 602008004757 D1 DE602008004757 D1 DE 602008004757D1
Authority
DE
Germany
Prior art keywords
oximesther
fotoinitiatoren
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE200860004757
Inventor
Akira Matsumoto
Junichi Tanabe
Hisatoshi Kura
Masaki Ohwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to EP07108030 priority Critical
Priority to EP07110649 priority
Application filed by BASF SE filed Critical BASF SE
Priority to PCT/EP2008/055127 priority patent/WO2008138733A1/en
Publication of DE602008004757D1 publication Critical patent/DE602008004757D1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D401/00Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
    • C07D401/02Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
    • C07D401/12Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a chain containing hetero atoms as chain links
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D417/00Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00
    • C07D417/02Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings
    • C07D417/06Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultra-violet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultra-violet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B15/00Acridine dyes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B55/00Azomethine dyes
    • C09B55/002Monoazomethine dyes
    • C09B55/003Monoazomethine dyes with the -C=N- group attached to an heteroring
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B55/00Azomethine dyes
    • C09B55/005Disazomethine dyes
    • C09B55/006Disazomethine dyes containing at least one heteroring
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B55/00Azomethine dyes
    • C09B55/008Tri or polyazomethine dyes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00Other synthetic dyes of known constitution
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B33ADDITIVE MANUFACTURING TECHNOLOGY
    • B33YADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00Materials specially adapted for additive manufacturing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31855Of addition polymer from unsaturated monomers
DE200860004757 2007-05-11 2008-04-28 Oximesther-fotoinitiatoren Active DE602008004757D1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP07108030 2007-05-11
EP07110649 2007-06-20
PCT/EP2008/055127 WO2008138733A1 (en) 2007-05-11 2008-04-28 Oxime ester photoinitiators

Publications (1)

Publication Number Publication Date
DE602008004757D1 true DE602008004757D1 (en) 2011-03-10

Family

ID=39620202

Family Applications (1)

Application Number Title Priority Date Filing Date
DE200860004757 Active DE602008004757D1 (en) 2007-05-11 2008-04-28 Oximesther-fotoinitiatoren

Country Status (10)

Country Link
US (1) US8349548B2 (en)
EP (1) EP2144894B1 (en)
JP (1) JP5535065B2 (en)
KR (1) KR101604873B1 (en)
CN (1) CN101687846B (en)
AT (1) AT496910T (en)
CA (1) CA2684931A1 (en)
DE (1) DE602008004757D1 (en)
TW (1) TWI465433B (en)
WO (1) WO2008138733A1 (en)

Families Citing this family (30)

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Publication number Priority date Publication date Assignee Title
US8580906B2 (en) 2008-05-30 2013-11-12 Advanced Softmaterials Inc. Polyrotaxane, aqueous polyrotaxane dispersion composition, crosslinked body of polyrotaxane and polymer and method for producing the same
US8507725B2 (en) * 2008-06-06 2013-08-13 Basf Se Oxime ester photoinitiators
WO2009147033A1 (en) * 2008-06-06 2009-12-10 Basf Se Photoinitiator mixtures
JP5623416B2 (en) * 2008-11-03 2014-11-12 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se Photoinitiator mixture
JP5642150B2 (en) 2009-03-23 2014-12-17 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se Photoresist composition
KR101678028B1 (en) * 2009-06-17 2016-11-21 토요잉크Sc홀딩스주식회사 Oxime ester compound, radical polymerization initiator, polymerizable composition, negative resist and image pattern
US8569393B2 (en) 2009-12-07 2013-10-29 Agfa-Gevaert N.V. UV-LED curable compositions and inks
US8957224B2 (en) 2009-12-07 2015-02-17 Agfa Graphics Nv Photoinitiators for UV-LED curable compositions and inks
JP5640722B2 (en) * 2010-02-05 2014-12-17 Jsr株式会社 Novel compound and radiation-sensitive composition containing the same
KR20130040780A (en) * 2010-03-31 2013-04-24 다이요 홀딩스 가부시키가이샤 Photocurable resin composition
JP2011252065A (en) * 2010-06-01 2011-12-15 Fujifilm Corp Pigment dispersion composition, colored curable composition, color filter for solid state imaging device, its manufacturing method, and solid state imaging device
JP6113181B2 (en) 2011-12-07 2017-04-12 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se Oxime ester photoinitiator
JP5976523B2 (en) * 2011-12-28 2016-08-23 富士フイルム株式会社 Optical member set and solid-state imaging device using the same
JP5978670B2 (en) * 2012-03-15 2016-08-24 住友化学株式会社 Colored curable resin composition
EP3354641B1 (en) * 2012-05-09 2019-07-17 Basf Se Oxime ester photoinitiators
KR20130139106A (en) * 2012-06-12 2013-12-20 삼성디스플레이 주식회사 Method for processing cover glass
CN104428713B (en) * 2012-07-09 2019-06-07 东丽株式会社 Photosensitive polymer combination, conductive wires protective film and touch panel component
US10234761B2 (en) 2013-07-08 2019-03-19 Basf Se Oxime ester photoinitiators
KR20160053927A (en) 2013-09-10 2016-05-13 바스프 에스이 Oxime ester photoinitiators
KR101435652B1 (en) 2014-01-17 2014-08-28 주식회사 삼양사 NOVEL FLUORENYL β-OXIME ESTER COMPOUNDS, PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION CONTAINING THE SAME
JP6464764B2 (en) * 2015-01-16 2019-02-06 Jsr株式会社 Radiation-sensitive coloring composition, spacer, method for forming the same, and liquid crystal display device
KR101824429B1 (en) 2015-01-26 2018-02-06 주식회사 삼양사 Novel di-oxime ester compounds and photopolymerization initiator and photoresist composition containing the same
KR101828927B1 (en) 2015-02-06 2018-02-14 주식회사 삼양사 Novel oxime ester compounds, photopolymerization initiator and photoresist composition containing the same
KR101824443B1 (en) 2015-04-09 2018-02-05 주식회사 삼양사 Novel fluorenyl oxime ester compounds, photopolymerization initiator and photoresist composition containing the same
KR101777845B1 (en) 2015-06-08 2017-09-12 주식회사 삼양사 Novel fluoranthene oxime ester derivates, photopolymerization initiator and photoresist composition containing the same
KR20170009794A (en) 2015-07-17 2017-01-25 타코마테크놀러지 주식회사 Oxime ester compound and photosensitive resin composition containing the compound
KR101991838B1 (en) 2016-12-28 2019-06-24 주식회사 삼양사 Novel 1,3-benzodiazole beta-oxime ester compound and composition comprising the same
CN110023307A (en) * 2017-03-16 2019-07-16 株式会社艾迪科 Oxime ester compound and Photoepolymerizationinitiater initiater containing the compound
KR20200015487A (en) * 2017-06-06 2020-02-12 닛뽄 가야쿠 가부시키가이샤 Photocurable Compositions and Adhesives for Electronic Components
KR20200041908A (en) 2017-09-15 2020-04-22 후지필름 가부시키가이샤 Composition, membrane, laminate, infrared transmission filter, solid-state imaging element and infrared sensor

Family Cites Families (16)

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Publication number Priority date Publication date Assignee Title
GB1180846A (en) * 1967-08-08 1970-02-11 Agfa Gevaert Nv Photopolymerisation of Ethylenically Unsaturated Organic Compounds
FR2393345B1 (en) * 1977-06-01 1980-04-25 Agfa Gevaert Nv
GB2029423A (en) * 1978-08-25 1980-03-19 Agfa Gevaert Nv Photo-polymerisable materials and recording method
US4590145A (en) * 1985-06-28 1986-05-20 Daicel Chemical Industries, Ltd. Photopolymerization initiator comprised of thioxanthones and oxime esters
US5019482A (en) * 1987-08-12 1991-05-28 Asahi Kasei Kogyo Kabushiki Kaisha Polymer/oxime ester/coumarin compound photosensitive composition
SG77689A1 (en) * 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
KR100801457B1 (en) * 2001-06-11 2008-02-11 시바 스페셜티 케미칼스 홀딩 인크. Oxime ester photoinitiators having a combined structure
MXPA05005817A (en) * 2002-12-03 2005-08-29 Ciba Sc Holding Ag Oxime ester photoinitiators with heteroaromatic groups.
JP4565824B2 (en) * 2003-09-24 2010-10-20 株式会社Adeka Dimer oxime ester compound and photopolymerization initiator containing the compound as an active ingredient
JP4342886B2 (en) * 2003-09-24 2009-10-14 凸版印刷株式会社 Photosensitive composition and photosensitive coloring composition
JP2005121940A (en) * 2003-10-17 2005-05-12 Toyo Ink Mfg Co Ltd Polymerizable composition, negative resist using same, and method for forming image pattern by using the resist
JP2005154494A (en) 2003-11-21 2005-06-16 Toyo Ink Mfg Co Ltd Radical photopolymerization initiator and radical photopolymerizing composition using the same
KR100897224B1 (en) 2004-02-23 2009-05-14 미쓰비시 가가꾸 가부시키가이샤 Oxime ester compound, photopolymerizable composition and color filter utilizing the same
KR101282834B1 (en) * 2004-08-18 2013-07-08 시바 홀딩 인크 Oxime ester photoinitiators
JP5680274B2 (en) * 2005-12-01 2015-03-04 チバ ホールディング インコーポレーテッドCiba Holding Inc. Oxime ester photoinitiator
JP5117397B2 (en) * 2005-12-20 2013-01-16 チバ ホールディング インコーポレーテッドCiba Holding Inc. Oxime ester photoinitiator

Also Published As

Publication number Publication date
CA2684931A1 (en) 2008-11-20
US20100086881A1 (en) 2010-04-08
TW200904801A (en) 2009-02-01
JP2010527339A (en) 2010-08-12
TWI465433B (en) 2014-12-21
KR20100017755A (en) 2010-02-16
AT496910T (en) 2011-02-15
EP2144894B1 (en) 2011-01-26
CN101687846B (en) 2015-12-02
KR101604873B1 (en) 2016-03-18
CN101687846A (en) 2010-03-31
EP2144894A1 (en) 2010-01-20
JP5535065B2 (en) 2014-07-02
WO2008138733A1 (en) 2008-11-20
US8349548B2 (en) 2013-01-08

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