DE602008004757D1 - Oximesther-fotoinitiatoren - Google Patents

Oximesther-fotoinitiatoren

Info

Publication number
DE602008004757D1
DE602008004757D1 DE602008004757T DE602008004757T DE602008004757D1 DE 602008004757 D1 DE602008004757 D1 DE 602008004757D1 DE 602008004757 T DE602008004757 T DE 602008004757T DE 602008004757 T DE602008004757 T DE 602008004757T DE 602008004757 D1 DE602008004757 D1 DE 602008004757D1
Authority
DE
Germany
Prior art keywords
formula
c20alkyl
hydrogen
direct bond
phenyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602008004757T
Other languages
German (de)
Inventor
Akira Matsumoto
Junichi Tanabe
Hisatoshi Kura
Masaki Ohwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Publication of DE602008004757D1 publication Critical patent/DE602008004757D1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
    • C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
    • C07D401/12—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a chain containing hetero atoms as chain links
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D417/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00
    • C07D417/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings
    • C07D417/06—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B15/00—Acridine dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B55/00—Azomethine dyes
    • C09B55/002—Monoazomethine dyes
    • C09B55/003—Monoazomethine dyes with the -C=N- group attached to an heteroring
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B55/00—Azomethine dyes
    • C09B55/005—Disazomethine dyes
    • C09B55/006—Disazomethine dyes containing at least one heteroring
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B55/00—Azomethine dyes
    • C09B55/008—Tri or polyazomethine dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00—Other synthetic dyes of known constitution
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Polymerisation Methods In General (AREA)
  • Indole Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)

Abstract

Compounds of the formula (I), wherein A1 is formula (II); A2 is formula (III); A3 is formula (IV); A4 is formula (V); w, x, y and z independently of each other are an integer from 0-4, provided that the sum of x+y+z is an integer from 2-4, corresponding to the valency of Q; M1, M2, M3 and M4 for example are a direct bond, CO or O; Y for example is a direct bond or S; Q is a (x+y)-valent linking group; R1 is for example hydrogen, C1-C20alkyl or phenyl or naphthyl; R2 and R″2 for example are is hydrogen or C1-C20alkyl; R3, R4, R′3, R′4, R″3 and R″4 for example are hydrogen, halogen, phenyl, or C1-C20alkyl; and R24 is for example a direct bond; exhibit an unexpectedly good performance in photopolymerization reactions.
DE602008004757T 2007-05-11 2008-04-28 Oximesther-fotoinitiatoren Active DE602008004757D1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP07108030 2007-05-11
EP07110649 2007-06-20
PCT/EP2008/055127 WO2008138733A1 (en) 2007-05-11 2008-04-28 Oxime ester photoinitiators

Publications (1)

Publication Number Publication Date
DE602008004757D1 true DE602008004757D1 (en) 2011-03-10

Family

ID=39620202

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602008004757T Active DE602008004757D1 (en) 2007-05-11 2008-04-28 Oximesther-fotoinitiatoren

Country Status (10)

Country Link
US (1) US8349548B2 (en)
EP (1) EP2144894B1 (en)
JP (1) JP5535065B2 (en)
KR (1) KR101604873B1 (en)
CN (1) CN101687846B (en)
AT (1) ATE496910T1 (en)
CA (1) CA2684931A1 (en)
DE (1) DE602008004757D1 (en)
TW (1) TWI465433B (en)
WO (1) WO2008138733A1 (en)

Families Citing this family (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101585279B1 (en) 2008-05-30 2016-01-13 아도반스토 소후토 마테리아루즈 가부시키가이샤 Polyrotaxane, aqueous polyrotaxane dispersion composition, crosslinked body of polyrotaxane and polymer and method for producing the same
WO2009147031A2 (en) * 2008-06-06 2009-12-10 Basf Se Oxime ester photoinitiators
EP2285836B1 (en) * 2008-06-06 2012-01-18 Basf Se Photoinitiator mixtures
EP2342237B1 (en) * 2008-11-03 2014-04-23 Basf Se Photoinitiator mixtures
CN105175315B (en) 2009-03-23 2018-08-28 巴斯夫欧洲公司 Photo-corrosion-resisting agent composition
CN102459171B (en) * 2009-06-17 2014-07-09 东洋油墨Sc控股株式会社 Oxime ester compound, radical polymerization initiator, polymerizable composition, negative resist and image pattern
CN102640055B (en) 2009-12-07 2015-02-25 爱克发印艺公司 UV-LED curable compositions and inks
CN102639501B (en) 2009-12-07 2015-04-29 爱克发印艺公司 Photoinitiators for UV-LED curable compositions and inks
JP5640722B2 (en) * 2010-02-05 2014-12-17 Jsr株式会社 Novel compound and radiation-sensitive composition containing the same
CN102792225B (en) * 2010-03-31 2016-01-20 太阳控股株式会社 Photocurable resin composition
JP2011252065A (en) * 2010-06-01 2011-12-15 Fujifilm Corp Pigment dispersion composition, colored curable composition, color filter for solid state imaging device, its manufacturing method, and solid state imaging device
JP6113181B2 (en) 2011-12-07 2017-04-12 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ Oxime ester photoinitiator
JP5976523B2 (en) * 2011-12-28 2016-08-23 富士フイルム株式会社 Optical member set and solid-state imaging device using the same
JP5978670B2 (en) * 2012-03-15 2016-08-24 住友化学株式会社 Colored curable resin composition
CN104284888B (en) 2012-05-09 2017-10-27 巴斯夫欧洲公司 Oxime ester photoinitiators
KR20130139106A (en) * 2012-06-12 2013-12-20 삼성디스플레이 주식회사 Method for processing cover glass
CN104428713B (en) * 2012-07-09 2019-06-07 东丽株式会社 Photosensitive polymer combination, conductive wires protective film and touch panel component
WO2015004565A1 (en) 2013-07-08 2015-01-15 Basf Se Oxime ester photoinitiators
JP6530410B2 (en) 2013-09-10 2019-06-12 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ Oxime ester photoinitiator
KR101435652B1 (en) 2014-01-17 2014-08-28 주식회사 삼양사 NOVEL FLUORENYL β-OXIME ESTER COMPOUNDS, PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION CONTAINING THE SAME
JP6464764B2 (en) * 2015-01-16 2019-02-06 Jsr株式会社 Radiation-sensitive coloring composition, spacer, method for forming the same, and liquid crystal display device
KR101824429B1 (en) 2015-01-26 2018-02-06 주식회사 삼양사 Novel di-oxime ester compounds and photopolymerization initiator and photoresist composition containing the same
KR101828927B1 (en) 2015-02-06 2018-02-14 주식회사 삼양사 Novel oxime ester compounds, photopolymerization initiator and photoresist composition containing the same
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KR101777845B1 (en) 2015-06-08 2017-09-12 주식회사 삼양사 Novel fluoranthene oxime ester derivates, photopolymerization initiator and photoresist composition containing the same
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KR102509606B1 (en) 2015-10-30 2023-03-14 주식회사 삼양사 Novel quinolinyl beta oxime ester derivative compound, photopolymerization initiator, and photoresist composition containing the same
JP6858591B2 (en) * 2016-03-01 2021-04-14 株式会社Ｄｎｐファインケミカル Coloring compositions for color filters, color filters and display devices
KR101991838B1 (en) 2016-12-28 2019-06-24 주식회사 삼양사 Novel 1,3-benzodiazole beta-oxime ester compound and composition comprising the same
WO2018155547A1 (en) * 2017-02-23 2018-08-30 日立化成デュポンマイクロシステムズ株式会社 Photosensitive resin composition, cured pattern production method, cured product, interlayer insulating film, cover coat layer, surface protective layer, and electronic component
JP7482628B2 (en) * 2017-03-16 2024-05-14 株式会社Adeka Oxime ester compound and photopolymerization initiator containing said compound
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CN112852284A (en) * 2021-02-25 2021-05-28 管善月 Organosilicon modified urethane acrylate photocureable coating and preparation method thereof
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TW202248755A (en) 2021-03-22 2022-12-16 日商富士軟片股份有限公司 Negative photosensitive resin composition, cured product, laminate, method for producing cured product, and semiconductor device
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WO2023120037A1 (en) 2021-12-23 2023-06-29 富士フイルム株式会社 Joined body production method, joined body, laminate production method, laminate, device production method, device, and composition for forming polyimide-containing precursor part

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1180846A (en) 1967-08-08 1970-02-11 Agfa Gevaert Nv Photopolymerisation of Ethylenically Unsaturated Organic Compounds
FR2393345A1 (en) 1977-06-01 1978-12-29 Agfa Gevaert Nv MANUFACTURE OF MODIFIED ELEMENTS IN THE FORM OF IMAGES
GB2029423A (en) 1978-08-25 1980-03-19 Agfa Gevaert Nv Photo-polymerisable materials and recording method
US4590145A (en) 1985-06-28 1986-05-20 Daicel Chemical Industries, Ltd. Photopolymerization initiator comprised of thioxanthones and oxime esters
US5019482A (en) 1987-08-12 1991-05-28 Asahi Kasei Kogyo Kabushiki Kaisha Polymer/oxime ester/coumarin compound photosensitive composition
SG77689A1 (en) 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
EP1395615B1 (en) 2001-06-11 2009-10-21 Basf Se Oxime ester photoinitiators having a combined structure
WO2004050653A2 (en) 2002-12-03 2004-06-17 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators with heteroaromatic groups
JP4565824B2 (en) * 2003-09-24 2010-10-20 株式会社Ａｄｅｋａ Dimer oxime ester compound and photopolymerization initiator containing the compound as an active ingredient
JP4342886B2 (en) * 2003-09-24 2009-10-14 凸版印刷株式会社 Photosensitive composition and photosensitive coloring composition
JP2005121940A (en) * 2003-10-17 2005-05-12 Toyo Ink Mfg Co Ltd Polymerizable composition, negative resist using same, and method for forming image pattern by using the resist
JP2005154494A (en) 2003-11-21 2005-06-16 Toyo Ink Mfg Co Ltd Radical photopolymerization initiator and radical photopolymerizing composition using the same
WO2005080337A1 (en) 2004-02-23 2005-09-01 Mitsubishi Chemical Corporation Oxime ester compound, photopolymerizable composition and color filter utilizing the same
CA2575046A1 (en) 2004-08-18 2006-02-23 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators
JP5680274B2 (en) 2005-12-01 2015-03-04 チバ ホールディング インコーポレーテッドＣｉｂａ Ｈｏｌｄｉｎｇ Ｉｎｃ． Oxime ester photoinitiator
EP1963374B1 (en) * 2005-12-20 2010-02-17 Basf Se Oxime ester photoinitiators

Also Published As

Publication number Publication date
EP2144894B1 (en) 2011-01-26
US8349548B2 (en) 2013-01-08
KR101604873B1 (en) 2016-03-18
EP2144894A1 (en) 2010-01-20
CN101687846B (en) 2015-12-02
TWI465433B (en) 2014-12-21
WO2008138733A1 (en) 2008-11-20
CN101687846A (en) 2010-03-31
CA2684931A1 (en) 2008-11-20
JP2010527339A (en) 2010-08-12
US20100086881A1 (en) 2010-04-08
JP5535065B2 (en) 2014-07-02
KR20100017755A (en) 2010-02-16
ATE496910T1 (en) 2011-02-15
TW200904801A (en) 2009-02-01

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