JP4941302B2 - 被膜形成用塗布液の製造方法 - Google Patents

被膜形成用塗布液の製造方法 Download PDF

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JP4941302B2
JP4941302B2 JP2007530931A JP2007530931A JP4941302B2 JP 4941302 B2 JP4941302 B2 JP 4941302B2 JP 2007530931 A JP2007530931 A JP 2007530931A JP 2007530931 A JP2007530931 A JP 2007530931A JP 4941302 B2 JP4941302 B2 JP 4941302B2
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film
coating
solvent
solution
liquid crystal
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Japanese (ja)
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JPWO2007020781A1 (ja
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悟 沼尻
賢一 元山
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Nissan Chemical Corp
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Nissan Chemical Corp
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D185/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon; Coating compositions based on derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/14—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02205—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition
    • H01L21/02208—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si
    • H01L21/02214—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound comprising silicon and oxygen
    • H01L21/02216—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound comprising silicon and oxygen the compound being a molecule comprising at least one silicon-oxygen bond and the compound having hydrogen or an organic group attached to the silicon or oxygen, e.g. a siloxane
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
JP2007530931A 2005-08-19 2006-07-27 被膜形成用塗布液の製造方法 Active JP4941302B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007530931A JP4941302B2 (ja) 2005-08-19 2006-07-27 被膜形成用塗布液の製造方法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2005239057 2005-08-19
JP2005239057 2005-08-19
JP2007530931A JP4941302B2 (ja) 2005-08-19 2006-07-27 被膜形成用塗布液の製造方法
PCT/JP2006/314923 WO2007020781A1 (ja) 2005-08-19 2006-07-27 被膜形成用塗布液の製造方法

Publications (2)

Publication Number Publication Date
JPWO2007020781A1 JPWO2007020781A1 (ja) 2009-02-19
JP4941302B2 true JP4941302B2 (ja) 2012-05-30

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JP2007530931A Active JP4941302B2 (ja) 2005-08-19 2006-07-27 被膜形成用塗布液の製造方法

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JP (1) JP4941302B2 (zh)
KR (1) KR101266728B1 (zh)
CN (1) CN101243149B (zh)
TW (1) TWI409308B (zh)
WO (1) WO2007020781A1 (zh)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9303124B2 (en) 2008-02-22 2016-04-05 Nippon Soda Co., Ltd. Solution for formation of organic thin film, and method for production thereof
WO2011068128A1 (ja) * 2009-12-02 2011-06-09 日産化学工業株式会社 電極保護膜形成剤
PL2582764T3 (pl) * 2010-06-18 2015-08-31 Dsm Ip Assets Bv Nieorganiczna powłoka tlenkowa
TW201209109A (en) * 2010-08-30 2012-03-01 jun-jie Wang Wear-resistant optical film, preparation method thereof, wear-resistant optical coating composition and liquid crystal display
WO2012099253A1 (ja) * 2011-01-20 2012-07-26 日産化学工業株式会社 タッチパネル用コーティング組成物、コート膜およびタッチパネル
CN104011260B (zh) * 2011-10-31 2018-02-13 日产化学工业株式会社 金属氧化物被膜用涂布液的制造方法、金属氧化物被膜用涂布液以及金属氧化物被膜
CN104204293A (zh) * 2012-02-01 2014-12-10 日产化学工业株式会社 金属氧化物被膜用涂布液以及金属氧化物被膜
WO2013187450A1 (ja) * 2012-06-14 2013-12-19 日産化学工業株式会社 金属酸化物被膜用塗布液及び金属酸化物被膜
TWI599624B (zh) * 2012-10-03 2017-09-21 Nissan Chemical Ind Ltd A method for producing a finely-coated inorganic oxide film-forming coating solution and a fine inorganic oxide film
TWI617520B (zh) * 2013-01-31 2018-03-11 Nissan Chemical Ind Ltd Glass substrate and device using the same
JP2016530344A (ja) * 2013-06-06 2016-09-29 ハネウェル・インターナショナル・インコーポレーテッド 液体酸化チタン組成物、それを形成するための方法、およびそれを用いて基材の、または基材を被覆する物質層をエッチングするための方法
JP2016155882A (ja) * 2013-07-11 2016-09-01 日産化学工業株式会社 高屈折率膜形成組成物
TWI485211B (zh) * 2013-09-24 2015-05-21 Chi Mei Corp 電極保護膜用組成物、電極保護膜、電子裝置及液晶顯示元件
TWI500703B (zh) * 2013-12-26 2015-09-21 Chi Mei Corp 光硬化性塗佈組成物、光硬化塗佈膜及觸控面板
JP6398847B2 (ja) * 2014-04-16 2018-10-03 信越化学工業株式会社 酸化チタン固溶体有機溶剤分散液、その製造方法、及びコーティング剤
KR102462034B1 (ko) * 2014-05-29 2022-11-01 닛산 가가쿠 가부시키가이샤 산화알루미늄 또는 알루미늄 기판용의 밀착 피막 형성제
TWI512058B (zh) * 2014-12-25 2015-12-11 Chi Mei Corp 光硬化性塗佈組成物、光硬化塗佈膜及觸控面板
TWI615601B (zh) * 2017-01-25 2018-02-21 華邦電子股份有限公司 透明壓力感測器及其製造方法
KR102184439B1 (ko) * 2019-03-15 2020-11-30 주식회사 디케이티 투명전극 디바이스 제조방법

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02672A (ja) * 1988-01-14 1990-01-05 Sumitomo Electric Ind Ltd 塗料組成物及び絶縁電線
JPH02258646A (ja) * 1988-12-15 1990-10-19 Nissan Chem Ind Ltd コーティング用組成物及びその製造法
JPH0497103A (ja) * 1990-08-09 1992-03-30 Nissan Motor Co Ltd 紫外線カットフィルターの製造方法
JPH0633000A (ja) * 1992-07-17 1994-02-08 Nissan Chem Ind Ltd 液晶表示素子用高屈折率絶縁被膜形成用塗布液
JPH10204323A (ja) * 1997-01-23 1998-08-04 Nissan Motor Co Ltd 親水性被膜形成用コーティング液およびその製造方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL84025A0 (en) * 1986-10-03 1988-02-29 Ppg Industries Inc Organosiloxane/metal oxide coating compositions and their production
JP3517890B2 (ja) * 1993-02-18 2004-04-12 日産化学工業株式会社 液晶表示素子用絶縁膜形成用塗布液
JP2001335745A (ja) * 2000-05-29 2001-12-04 Jsr Corp 膜形成用組成物、膜の形成方法およびシリカ系膜
JP2002363490A (ja) * 2001-06-11 2002-12-18 Jsr Corp 絶縁膜形成用組成物、膜の形成方法およびシリカ系絶縁膜

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02672A (ja) * 1988-01-14 1990-01-05 Sumitomo Electric Ind Ltd 塗料組成物及び絶縁電線
JPH02258646A (ja) * 1988-12-15 1990-10-19 Nissan Chem Ind Ltd コーティング用組成物及びその製造法
JPH0497103A (ja) * 1990-08-09 1992-03-30 Nissan Motor Co Ltd 紫外線カットフィルターの製造方法
JPH0633000A (ja) * 1992-07-17 1994-02-08 Nissan Chem Ind Ltd 液晶表示素子用高屈折率絶縁被膜形成用塗布液
JPH10204323A (ja) * 1997-01-23 1998-08-04 Nissan Motor Co Ltd 親水性被膜形成用コーティング液およびその製造方法

Also Published As

Publication number Publication date
KR20080034887A (ko) 2008-04-22
WO2007020781A1 (ja) 2007-02-22
TW200712146A (en) 2007-04-01
CN101243149B (zh) 2011-01-26
CN101243149A (zh) 2008-08-13
KR101266728B1 (ko) 2013-05-28
TWI409308B (zh) 2013-09-21
JPWO2007020781A1 (ja) 2009-02-19

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