JP4871264B2 - 顕微鏡画像撮像装置 - Google Patents
顕微鏡画像撮像装置 Download PDFInfo
- Publication number
- JP4871264B2 JP4871264B2 JP2007508232A JP2007508232A JP4871264B2 JP 4871264 B2 JP4871264 B2 JP 4871264B2 JP 2007508232 A JP2007508232 A JP 2007508232A JP 2007508232 A JP2007508232 A JP 2007508232A JP 4871264 B2 JP4871264 B2 JP 4871264B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- objective lens
- stage
- imaging unit
- imaging
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000001000 micrograph Methods 0.000 title claims description 47
- 238000003384 imaging method Methods 0.000 claims description 127
- 230000007246 mechanism Effects 0.000 claims description 46
- 230000003287 optical effect Effects 0.000 claims description 29
- 239000011521 glass Substances 0.000 description 68
- 238000000034 method Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000001575 pathological effect Effects 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/24—Base structure
- G02B21/241—Devices for focusing
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/24—Base structure
- G02B21/26—Stages; Adjusting means therefor
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/36—Microscopes arranged for photographic purposes or projection purposes or digital imaging or video purposes including associated control and data processing arrangements
- G02B21/365—Control or image processing arrangements for digital or video microscopes
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Microscoopes, Condenser (AREA)
- Automatic Focus Adjustment (AREA)
- Lens Barrels (AREA)
- Image Input (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007508232A JP4871264B2 (ja) | 2005-03-17 | 2006-03-17 | 顕微鏡画像撮像装置 |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005077990 | 2005-03-17 | ||
| JP2005077990 | 2005-03-17 | ||
| PCT/JP2006/305434 WO2006098443A1 (ja) | 2005-03-17 | 2006-03-17 | 顕微鏡画像撮像装置 |
| JP2007508232A JP4871264B2 (ja) | 2005-03-17 | 2006-03-17 | 顕微鏡画像撮像装置 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011217896A Division JP5209103B2 (ja) | 2005-03-17 | 2011-09-30 | 顕微鏡画像撮像装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2006098443A1 JPWO2006098443A1 (ja) | 2008-08-28 |
| JP4871264B2 true JP4871264B2 (ja) | 2012-02-08 |
Family
ID=36991787
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007508232A Active JP4871264B2 (ja) | 2005-03-17 | 2006-03-17 | 顕微鏡画像撮像装置 |
| JP2011217896A Active JP5209103B2 (ja) | 2005-03-17 | 2011-09-30 | 顕微鏡画像撮像装置 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011217896A Active JP5209103B2 (ja) | 2005-03-17 | 2011-09-30 | 顕微鏡画像撮像装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US8422127B2 (enExample) |
| EP (1) | EP1865354B1 (enExample) |
| JP (2) | JP4871264B2 (enExample) |
| WO (1) | WO2006098443A1 (enExample) |
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7825488B2 (en) * | 2006-05-31 | 2010-11-02 | Advanced Analogic Technologies, Inc. | Isolation structures for integrated circuits and modular methods of forming the same |
| MX2007016046A (es) * | 2005-06-13 | 2008-03-10 | Tripath Imaging Inc | Sistema y metodo para re-ubicar un objeto en una muestra en un portaobjetos con un dispositivo de imagen de microscopio. |
| WO2010122547A1 (en) * | 2009-04-20 | 2010-10-28 | Bio-Rad Laboratories Inc. | Non-scanning surface plasmon resonance ( spr) system |
| JP5443096B2 (ja) * | 2009-08-12 | 2014-03-19 | 株式会社ニューフレアテクノロジー | 半導体製造装置および半導体製造方法 |
| JP5732284B2 (ja) * | 2010-08-27 | 2015-06-10 | 株式会社ニューフレアテクノロジー | 成膜装置および成膜方法 |
| GB2494734B (en) * | 2011-09-14 | 2016-04-06 | Malvern Instr Ltd | Apparatus and method for measuring particle size distribution by light scattering |
| JP6136085B2 (ja) * | 2011-10-05 | 2017-05-31 | ソニー株式会社 | 画像取得装置、画像取得方法、およびコンピュータプログラム |
| JP5981241B2 (ja) | 2012-06-25 | 2016-08-31 | 浜松ホトニクス株式会社 | 顕微鏡撮像装置及び顕微鏡撮像方法 |
| JP6027875B2 (ja) * | 2012-12-07 | 2016-11-16 | オリンパス株式会社 | 撮像装置及び顕微鏡システム |
| JP6010450B2 (ja) | 2012-12-20 | 2016-10-19 | 浜松ホトニクス株式会社 | 光観察装置及び光観察方法 |
| JP6147006B2 (ja) | 2013-01-09 | 2017-06-14 | オリンパス株式会社 | 撮像装置、顕微鏡システム及び撮像方法 |
| JP6086366B2 (ja) | 2013-04-05 | 2017-03-01 | 国立研究開発法人理化学研究所 | 顕微鏡、焦準器具、流体保持器具、及び光学ユニット |
| WO2014174919A1 (ja) | 2013-04-26 | 2014-10-30 | 浜松ホトニクス株式会社 | 画像取得装置及び画像取得装置のフォーカス方法 |
| JP6433888B2 (ja) | 2013-04-26 | 2018-12-05 | 浜松ホトニクス株式会社 | 画像取得装置、試料の合焦点情報を取得する方法及びシステム |
| HUE052489T2 (hu) * | 2013-04-26 | 2021-04-28 | Hamamatsu Photonics Kk | Képfelvevõ berendezés és eljárás és rendszer fókusztérkép elõállítására minta számára |
| JP6134249B2 (ja) * | 2013-11-01 | 2017-05-24 | 浜松ホトニクス株式会社 | 画像取得装置及び画像取得装置の画像取得方法 |
| WO2015077819A1 (en) | 2013-11-26 | 2015-06-04 | Ansell Limited | Effervescent texturing |
| EP3100298B1 (en) * | 2014-01-27 | 2020-07-15 | Veeco Instruments Inc. | Wafer carrier having retention pockets with compound radii for chemical vapor deposition systems |
| KR102449103B1 (ko) | 2014-03-12 | 2022-09-28 | 어플라이드 머티어리얼스, 인코포레이티드 | 반도체 챔버에서의 웨이퍼 회전 |
| EP3239691B1 (en) * | 2014-12-26 | 2021-11-17 | Sysmex Corporation | Cell imaging device, cell imaging method, and sample cell |
| HU231246B1 (hu) * | 2015-08-31 | 2022-05-28 | 3Dhistech Kft | Konfokális elvû tárgylemez szkenner |
| US11402200B2 (en) * | 2016-03-09 | 2022-08-02 | Hamamatsu Photonics K.K. | Measuring device, observing device and measuring method |
| DE102016107336B4 (de) * | 2016-04-20 | 2017-11-02 | Carl Zeiss Industrielle Messtechnik Gmbh | Koordinatenmessgerät, Verfahren zur Herstellung eines Koordinatenmessgeräts und Verfahren zur Messung eines optischen Filters |
| CN106094194B (zh) * | 2016-08-17 | 2019-06-14 | 江浩 | 显微镜下样本图片的获取方法、成像装置及其获取样本图片的方法 |
| US10636628B2 (en) | 2017-09-11 | 2020-04-28 | Applied Materials, Inc. | Method for cleaning a process chamber |
| WO2020020148A1 (zh) * | 2018-07-23 | 2020-01-30 | 深圳市真迈生物科技有限公司 | 成像方法、装置及系统 |
| CN214848503U (zh) | 2018-08-29 | 2021-11-23 | 应用材料公司 | 注入器设备、基板处理设备及在机器可读介质中实现的结构 |
| JP7312020B2 (ja) * | 2019-05-30 | 2023-07-20 | 株式会社Screenホールディングス | 熱処理方法および熱処理装置 |
| US11523046B2 (en) * | 2019-06-03 | 2022-12-06 | Molecular Devices, Llc | System and method to correct for variation of in-focus plane across a field of view of a microscope objective |
| US11499817B2 (en) * | 2020-05-29 | 2022-11-15 | Mitutoyo Corporation | Coordinate measuring machine with vision probe for performing points-from-focus type measurement operations |
| TW202212620A (zh) * | 2020-06-02 | 2022-04-01 | 荷蘭商Asm Ip私人控股有限公司 | 處理基板之設備、形成膜之方法、及控制用於處理基板之設備之方法 |
| WO2022123944A1 (ja) * | 2020-12-08 | 2022-06-16 | ソニーグループ株式会社 | スライドガラス搬送装置及びスライドガラス撮影システム |
| CN113686857B (zh) * | 2021-08-31 | 2024-07-19 | 杭州智微信息科技有限公司 | 一种用于骨髓涂片扫描仪的玻片盒旋转升降结构 |
| IL298509B2 (en) * | 2022-11-23 | 2024-04-01 | Applied Materials Israel Ltd | Optical systems and a method for their calibration |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04110960U (ja) * | 1991-01-25 | 1992-09-25 | 日本分光株式会社 | 顕微赤外スペクトル測定装置 |
| JPH06309035A (ja) * | 1993-04-21 | 1994-11-04 | Hitachi Ltd | 試料ステージ |
| JPH11264937A (ja) * | 1998-03-18 | 1999-09-28 | Olympus Optical Co Ltd | 顕微鏡 |
| JP2002365234A (ja) * | 2001-06-06 | 2002-12-18 | Silicon Technology Co Ltd | 表面評価装置及び表面評価方法 |
Family Cites Families (63)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3826558A (en) * | 1972-07-21 | 1974-07-30 | Us Air Force | Mechanical rotary tilt stage |
| US4328553A (en) * | 1976-12-07 | 1982-05-04 | Computervision Corporation | Method and apparatus for targetless wafer alignment |
| JPS60134117U (ja) * | 1984-02-16 | 1985-09-06 | アルプス電気株式会社 | 光学式ロ−タリエンコ−ダ |
| US4819167A (en) * | 1987-04-20 | 1989-04-04 | Applied Materials, Inc. | System and method for detecting the center of an integrated circuit wafer |
| US4833790A (en) * | 1987-05-11 | 1989-05-30 | Lam Research | Method and system for locating and positioning circular workpieces |
| JPH0658795B2 (ja) * | 1989-05-09 | 1994-08-03 | 日本電子株式会社 | ダイナミックフォーカス回路 |
| US5155336A (en) * | 1990-01-19 | 1992-10-13 | Applied Materials, Inc. | Rapid thermal heating apparatus and method |
| JPH04110960A (ja) | 1990-08-31 | 1992-04-13 | Sharp Corp | 電子写真装置の帯電装置 |
| US5337178A (en) * | 1992-12-23 | 1994-08-09 | International Business Machines Corporation | Titlable optical microscope stage |
| JPH0756093A (ja) * | 1993-08-19 | 1995-03-03 | Fujitsu Ltd | 顕微鏡のステージ装置 |
| JPH07174980A (ja) | 1993-12-17 | 1995-07-14 | Olympus Optical Co Ltd | 顕微鏡ステージ |
| JPH0821961A (ja) * | 1994-07-08 | 1996-01-23 | Matsushita Electric Ind Co Ltd | 顕微鏡の自動焦点装置 |
| US5755511A (en) * | 1994-12-19 | 1998-05-26 | Applied Materials, Inc. | Method and apparatus for measuring substrate temperatures |
| US5660472A (en) * | 1994-12-19 | 1997-08-26 | Applied Materials, Inc. | Method and apparatus for measuring substrate temperatures |
| US5822213A (en) * | 1996-03-29 | 1998-10-13 | Lam Research Corporation | Method and apparatus for determining the center and orientation of a wafer-like object |
| JPH09304703A (ja) | 1996-05-16 | 1997-11-28 | Olympus Optical Co Ltd | フォーカシング装置 |
| US5781693A (en) * | 1996-07-24 | 1998-07-14 | Applied Materials, Inc. | Gas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetween |
| US6395363B1 (en) * | 1996-11-05 | 2002-05-28 | Applied Materials, Inc. | Sloped substrate support |
| US6123766A (en) * | 1997-05-16 | 2000-09-26 | Applied Materials, Inc. | Method and apparatus for achieving temperature uniformity of a substrate |
| US6157106A (en) * | 1997-05-16 | 2000-12-05 | Applied Materials, Inc. | Magnetically-levitated rotor system for an RTP chamber |
| US6226453B1 (en) * | 1997-09-16 | 2001-05-01 | Applied Materials, Inc. | Temperature probe with fiber optic core |
| DE19748088A1 (de) * | 1997-10-30 | 1999-05-12 | Wacker Siltronic Halbleitermat | Verfahren und Vorrichtung zum Erkennen einer Fehllage einer Halbleiterscheibe |
| US6185030B1 (en) * | 1998-03-20 | 2001-02-06 | James W. Overbeck | Wide field of view and high speed scanning microscopy |
| US6164816A (en) * | 1998-08-14 | 2000-12-26 | Applied Materials, Inc. | Tuning a substrate temperature measurement system |
| JP2000241713A (ja) | 1999-02-16 | 2000-09-08 | Leica Microsystems Wetzler Gmbh | 試料担持体用ホールダ |
| US6654668B1 (en) * | 1999-02-16 | 2003-11-25 | Tokyo Electron Limited | Processing apparatus, processing system, distinguishing method, and detecting method |
| US6275742B1 (en) * | 1999-04-16 | 2001-08-14 | Berkeley Process Control, Inc. | Wafer aligner system |
| JP3437118B2 (ja) * | 1999-04-23 | 2003-08-18 | 東芝機械株式会社 | ウエーハ加熱装置及びその制御方法 |
| US6423949B1 (en) * | 1999-05-19 | 2002-07-23 | Applied Materials, Inc. | Multi-zone resistive heater |
| US6586343B1 (en) * | 1999-07-09 | 2003-07-01 | Applied Materials, Inc. | Method and apparatus for directing constituents through a processing chamber |
| US6500266B1 (en) * | 2000-01-18 | 2002-12-31 | Applied Materials, Inc. | Heater temperature uniformity qualification tool |
| US7518652B2 (en) | 2000-05-03 | 2009-04-14 | Aperio Technologies, Inc. | Method and apparatus for pre-focus in a linear array based slide scanner |
| US6610968B1 (en) * | 2000-09-27 | 2003-08-26 | Axcelis Technologies | System and method for controlling movement of a workpiece in a thermal processing system |
| US6350964B1 (en) * | 2000-11-09 | 2002-02-26 | Applied Materials, Inc. | Power distribution printed circuit board for a semiconductor processing system |
| US20020131167A1 (en) | 2000-11-09 | 2002-09-19 | Nguyen Francis T. | Sample holder for an imaging system |
| US6634882B2 (en) * | 2000-12-22 | 2003-10-21 | Asm America, Inc. | Susceptor pocket profile to improve process performance |
| JP4603177B2 (ja) * | 2001-02-02 | 2010-12-22 | オリンパス株式会社 | 走査型レーザ顕微鏡 |
| KR100416292B1 (ko) * | 2001-02-24 | 2004-01-31 | (주)지우텍 | 위치 불량 감지 장치 및 방법 |
| JP4631218B2 (ja) | 2001-06-21 | 2011-02-16 | 株式会社ニコン | 顕微鏡装置 |
| US6924929B2 (en) * | 2002-03-29 | 2005-08-02 | National Institute Of Radiological Sciences | Microscope apparatus |
| US6900877B2 (en) * | 2002-06-12 | 2005-05-31 | Asm American, Inc. | Semiconductor wafer position shift measurement and correction |
| US7778533B2 (en) * | 2002-09-12 | 2010-08-17 | Applied Materials, Inc. | Semiconductor thermal process control |
| JP4110960B2 (ja) | 2002-11-17 | 2008-07-02 | 株式会社セガ | タッチパネル付き情報端末 |
| WO2004064134A1 (ja) * | 2003-01-09 | 2004-07-29 | Dainippon Screen Mfg. Co., Ltd | 基板処理システム、基板処理装置、プログラムおよび記録媒体 |
| US6950774B2 (en) * | 2003-01-16 | 2005-09-27 | Asm America, Inc. | Out-of-pocket detection system using wafer rotation as an indicator |
| US7505832B2 (en) * | 2003-05-12 | 2009-03-17 | Applied Materials, Inc. | Method and apparatus for determining a substrate exchange position in a processing system |
| US6855916B1 (en) * | 2003-12-10 | 2005-02-15 | Axcelis Technologies, Inc. | Wafer temperature trajectory control method for high temperature ramp rate applications using dynamic predictive thermal modeling |
| US8500916B2 (en) * | 2004-11-05 | 2013-08-06 | HGST Netherlands B.V. | Method for aligning wafers within wafer processing equipment |
| US7364922B2 (en) * | 2005-01-24 | 2008-04-29 | Tokyo Electron Limited | Automated semiconductor wafer salvage during processing |
| TW200802552A (en) * | 2006-03-30 | 2008-01-01 | Sumco Techxiv Corp | Method of manufacturing epitaxial silicon wafer and apparatus thereof |
| US8104951B2 (en) * | 2006-07-31 | 2012-01-31 | Applied Materials, Inc. | Temperature uniformity measurements during rapid thermal processing |
| US8162584B2 (en) * | 2006-08-23 | 2012-04-24 | Cognex Corporation | Method and apparatus for semiconductor wafer alignment |
| JP4870604B2 (ja) * | 2007-03-29 | 2012-02-08 | 株式会社ニューフレアテクノロジー | 気相成長装置 |
| US8057602B2 (en) * | 2007-05-09 | 2011-11-15 | Applied Materials, Inc. | Apparatus and method for supporting, positioning and rotating a substrate in a processing chamber |
| US8057601B2 (en) * | 2007-05-09 | 2011-11-15 | Applied Materials, Inc. | Apparatus and method for supporting, positioning and rotating a substrate in a processing chamber |
| SG195592A1 (en) * | 2007-12-27 | 2013-12-30 | Lam Res Corp | Arrangements and methods for determining positions and offsets in plasma processing system |
| TWI395272B (zh) * | 2008-05-02 | 2013-05-01 | Applied Materials Inc | 用於旋轉基板之非徑向溫度控制系統 |
| US8581153B2 (en) * | 2008-09-30 | 2013-11-12 | Tokyo Electron Limited | Method of detecting abnormal placement of substrate, substrate processing method, computer-readable storage medium, and substrate processing apparatus |
| US8150242B2 (en) * | 2008-10-31 | 2012-04-03 | Applied Materials, Inc. | Use of infrared camera for real-time temperature monitoring and control |
| US8109669B2 (en) * | 2008-11-19 | 2012-02-07 | Applied Materials, Inc. | Temperature uniformity measurement during thermal processing |
| DE102009010555A1 (de) * | 2009-02-25 | 2010-09-02 | Siltronic Ag | Verfahren zum Erkennen einer Fehllage einer Halbleiterscheibe während einer thermischen Behandlung |
| JP5384220B2 (ja) * | 2009-06-22 | 2014-01-08 | 東京応化工業株式会社 | アライメント装置およびアライメント方法 |
| JP5038381B2 (ja) * | 2009-11-20 | 2012-10-03 | 株式会社東芝 | サセプタおよび成膜装置 |
-
2006
- 2006-03-17 US US11/886,255 patent/US8422127B2/en active Active
- 2006-03-17 JP JP2007508232A patent/JP4871264B2/ja active Active
- 2006-03-17 EP EP06729423.1A patent/EP1865354B1/en active Active
- 2006-03-17 WO PCT/JP2006/305434 patent/WO2006098443A1/ja not_active Ceased
-
2011
- 2011-09-30 JP JP2011217896A patent/JP5209103B2/ja active Active
-
2012
- 2012-09-12 US US13/611,227 patent/US20130084390A1/en not_active Abandoned
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04110960U (ja) * | 1991-01-25 | 1992-09-25 | 日本分光株式会社 | 顕微赤外スペクトル測定装置 |
| JPH06309035A (ja) * | 1993-04-21 | 1994-11-04 | Hitachi Ltd | 試料ステージ |
| JPH11264937A (ja) * | 1998-03-18 | 1999-09-28 | Olympus Optical Co Ltd | 顕微鏡 |
| JP2002365234A (ja) * | 2001-06-06 | 2002-12-18 | Silicon Technology Co Ltd | 表面評価装置及び表面評価方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012042970A (ja) | 2012-03-01 |
| US20130084390A1 (en) | 2013-04-04 |
| US8422127B2 (en) | 2013-04-16 |
| EP1865354B1 (en) | 2016-03-16 |
| EP1865354A4 (en) | 2011-01-26 |
| EP1865354A1 (en) | 2007-12-12 |
| WO2006098443A1 (ja) | 2006-09-21 |
| JPWO2006098443A1 (ja) | 2008-08-28 |
| US20090002811A1 (en) | 2009-01-01 |
| JP5209103B2 (ja) | 2013-06-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5209103B2 (ja) | 顕微鏡画像撮像装置 | |
| US9575301B2 (en) | Device for a microscope stage | |
| JP5923026B2 (ja) | 画像取得装置及び画像取得方法 | |
| JP4156851B2 (ja) | マイクロダイセクション装置 | |
| US7864414B2 (en) | Microscope and virtual slide forming system | |
| KR100954360B1 (ko) | 자동 외관검사장치 | |
| CN102109673A (zh) | 镜台控制装置、镜台控制方法、镜台控制程序和显微镜 | |
| JP5307221B2 (ja) | 画像取得装置及び画像取得装置のフォーカス方法 | |
| JP4831972B2 (ja) | マイクロマニピュレーションシステム | |
| JP6027875B2 (ja) | 撮像装置及び顕微鏡システム | |
| JP2021502552A (ja) | スライドラックカルーセル | |
| JP2009223164A (ja) | 顕微鏡画像撮影装置 | |
| JP2010256530A (ja) | 顕微鏡装置 | |
| CN104412147A (zh) | 显微镜摄像装置和显微镜摄像方法 | |
| JP5662223B2 (ja) | 形状測定装置 | |
| JP5301642B2 (ja) | 画像取得装置及び画像取得装置のフォーカス方法 | |
| JP6802636B2 (ja) | 顕微鏡システムおよび標本観察方法 | |
| JP2006284965A (ja) | 顕微鏡装置及び拡大画像生成方法 | |
| EP2947489A1 (en) | Image acquisition device and focus method for image acquisition device | |
| JP2007155412A (ja) | 外観検査装置及び外観検査方法 | |
| JP6023012B2 (ja) | 画像取得装置及び画像取得装置のフォーカス方法 | |
| WO2014112083A1 (ja) | 画像取得装置及び画像取得装置のフォーカス方法 | |
| KR20090107814A (ko) | 기판 검사 장치 및 이를 사용하는 기판 검사 방법 | |
| JP2008045894A (ja) | 撮像装置及び計測装置 | |
| JP2024064354A (ja) | 拡大観察装置、拡大観察方法、拡大観察プログラムおよび記録媒体 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20090305 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110809 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110930 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20111115 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20111118 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 4871264 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20141125 Year of fee payment: 3 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |