JP4600284B2 - 透明導電積層体とその製造方法及び透明導電積層体を用いたデバイス - Google Patents
透明導電積層体とその製造方法及び透明導電積層体を用いたデバイス Download PDFInfo
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- JP4600284B2 JP4600284B2 JP2005515037A JP2005515037A JP4600284B2 JP 4600284 B2 JP4600284 B2 JP 4600284B2 JP 2005515037 A JP2005515037 A JP 2005515037A JP 2005515037 A JP2005515037 A JP 2005515037A JP 4600284 B2 JP4600284 B2 JP 4600284B2
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- 239000012965 benzophenone Substances 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
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- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- YWEUIGNSBFLMFL-UHFFFAOYSA-N diphosphonate Chemical compound O=P(=O)OP(=O)=O YWEUIGNSBFLMFL-UHFFFAOYSA-N 0.000 description 1
- KWKXNDCHNDYVRT-UHFFFAOYSA-N dodecylbenzene Chemical compound CCCCCCCCCCCCC1=CC=CC=C1 KWKXNDCHNDYVRT-UHFFFAOYSA-N 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000007850 fluorescent dye Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- BDVZHDCXCXJPSO-UHFFFAOYSA-N indium(3+) oxygen(2-) titanium(4+) Chemical compound [O-2].[Ti+4].[In+3] BDVZHDCXCXJPSO-UHFFFAOYSA-N 0.000 description 1
- HJZPJSFRSAHQNT-UHFFFAOYSA-N indium(3+) oxygen(2-) zirconium(4+) Chemical compound [O-2].[Zr+4].[In+3] HJZPJSFRSAHQNT-UHFFFAOYSA-N 0.000 description 1
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- DLYUQMMRRRQYAE-UHFFFAOYSA-N phosphorus pentoxide Inorganic materials O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920000767 polyaniline Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002098 polyfluorene Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229940005642 polystyrene sulfonic acid Drugs 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- YGSDEFSMJLZEOE-UHFFFAOYSA-M salicylate Chemical compound OC1=CC=CC=C1C([O-])=O YGSDEFSMJLZEOE-UHFFFAOYSA-M 0.000 description 1
- 229960001860 salicylate Drugs 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000009210 therapy by ultrasound Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
Images
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Description
平均粒径0.03μmのITO微粒子[住友金属鉱山(株)製、商品名:SUFP−HX、]60gを、溶剤としてのイソホロン40gと混合した後、分散処理を行い、平均分散粒径110nmのITO微粒子が分散した透明導電層形成用塗布液を得た。一方、平滑な基板として、PETフィルム[東レ(株)製、商品名:ルミラー、厚さ:100μm]を使用した。
透明導電層の透過率(%)=[(透明導電層が形成された平滑な基板ごと測定した透過率)/(平滑な基板の透過率)]×100
透明導電層のヘイズ値(%)=(透明導電層が形成された平滑な基板ごと測定したヘイズ値)−(平滑な基板のヘイズ値)
パターン状の補助電極層を有する透明導電層の透過率(%)=
[(パターン状の補助電極層及び透明導電層を具備する透明基材ごと測定した透過率)/(透明基材の透過率)]×100
パターン状の補助電極層を有する透明導電層のヘイズ値(%)=
(パターン状の補助電極層及び透明導電層を具備する透明基材ごと測定したヘイズ値)−(透明基材のヘイズ値)
平滑な基板に参考例1と同一の透明導電層形成用塗布液をワイヤーバーコーティング(線径:0.15mm)し、40℃で15分間、及び120℃で10分間乾燥した後、直径150mmのハードクロムめっきしたスチールロールによる圧延処理(線圧:147N/mm=150Kgf/cm、ニップ幅:1mm)を行い、平滑な基板上に緻密に充填されたITO微粒子で構成される透明導電層(膜厚:1.8μm)を形成した。この透明導電層の膜特性は、可視光透過率:90.9%、ヘイズ値:2.1%、表面抵抗値:200Ω/□であった。
参考例1と同様に、平滑な基板としてのPETフィルム上に、ITO微粒子から構成される透明導電層を形成した。この透明導電層上に、まず、カーボン微粒子がフェノール系樹脂バインダーと共に溶剤中に分散された補助電極層形成用ペースト[藤倉化成(株)製、XC−223]を格子状(線幅:0.3mm、線間隔:2.7mm)にスクリーン印刷(版:250mesh)し、90℃で5分間加熱処理して、カーボン微粒子からなるパターン状の第1補助電極層(膜厚:15μm)を形成した。
銀微粒子からなるパターン状の第2補助電極層を2倍の膜厚(30μm)にした以外は実施例3と同様にして、透明導電積層体を得た。即ち、参考例1と同様に、平滑な基板としてのPETフィルム上にITO微粒子から構成される透明導電層を形成し、この透明導電層上にカーボン微粒子からなる格子状(線幅:0.3mm、線間隔:2.7mm)の第1補助電極層(膜厚:15μm)を形成した。
参考例1において、接着剤に脱水剤としてシリカゲル微粒子を添加した以外は、参考例1と同様に行い、透明導電積層体を得た。
透明基材としてのプライマー処理したPETフィルム[帝人デュポンフィルム(株)製、テトロン−HLEW、厚さ100μm]に、参考例1の透明導電層形成用塗布液をワイヤーバーコーティング(線径:0.3mm)し、40℃で15分間、続いて120℃で30分間加熱処理して、透明基材にITO微粒子で構成される透明導電層を形成した。この透明導電層の膜特性は、可視光透過率:80.2%、ヘイズ値:3.5%、表面抵抗値:4700Ω/□であった。
2 透明導電層(透明電極層)
3 補助電極層
3a 第1補助電極層
3b 第2補助電極層
4 接着剤層
5 透明基材
Claims (14)
- 平滑な基板と、該平滑な基板上に塗布法により形成された透明導電層と、該透明導電層上にパターン状に形成された補助電極層と、該透明導電層及び補助電極層に接着剤層により接合された透明基材とを備え、前記平滑な基板が透明導電層から剥離可能である透明導電積層体であって、
前記補助電極層が、透明導電層上に形成された第1補助電極層と、該第1補助電極層上に形成された第2補助電極層とからなり、該第1補助電極層がカーボン微粒子、ルテニウム微粒子、酸化ルテニウム微粒子から選ばれた少なくとも1種とバインダー成分とからなり、該第2補助電極層が金属微粒子とバインダー成分とからなることを特徴とする透明導電積層体。 - 前記補助電極層が、格子状、網目状、ハニカム状、平行ライン状、又は櫛歯状のパターンを有することを特徴とする請求項1に記載の透明導電積層体。
- 前記補助電極層及び該補助電極層間に露出した透明導電層と前記接着剤層との間に、塗布法により形成された透明コート層を備えることを特徴とする請求項1または2に記載の透明導電積層体。
- 前記透明導電層が、平均粒径1〜100nmの導電性酸化物微粒子とバインダー成分で構成されていることを特徴とする請求項1〜3のいずれかに記載の透明導電積層体。
- 前記透明導電層が、圧延処理により導電性酸化物微粒子の緻密化がはかられていることを特徴とする請求項1〜4のいずれかに記載の透明導電積層体。
- 前記接着剤層に、紫外線吸収剤、脱水剤、脱酸素剤から選択された少なくとも1種類の添加剤が配合されていることを特徴とする請求項1〜5のいずれかに記載の透明導電積層体。
- 平滑な基板上に、溶媒中に導電性酸化物微粒子を分散させた透明導電層形成用塗布液を塗布・乾燥し、必要により硬化させて透明導電層を形成すると共に、該平滑な基板として透明導電層から剥離可能な基板を用い、該透明導電層上にパターン状に補助電極層を形成し、得られた補助電極層及び該補助電極層間に露出した透明導電層に、接着剤を用いて透明基材を接合する透明導電積層体の製造方法であって、
前記補助電極層を、透明導電層上に形成した第1補助電極層と該第1補助電極層上に形成した第2補助電極層とで構成し、該第1補助電極層を、バインダーを含む溶媒中にカーボン微粒子、ルテニウム微粒子、酸化ルテニウム微粒子から選ばれた少なくとも1種が分散された補助電極層形成用ペーストを印刷・硬化させて形成し、該第2補助電極層を、バインダーを含む溶媒中に金属微粒子が分散された補助電極層形成用ペーストを印刷・硬化させて形成することを特徴とする透明導電積層体の製造方法。 - 前記透明導電層形成用塗布液を塗布・乾燥した後、圧延処理を施すことを特徴とする請求項7に記載の透明導電積層体の製造方法。
- 前記補助電極層及び該補助電極層間に露出した透明導電層上に、バインダーを含有する透明コート層形成用塗布液を塗布・硬化させて透明コート層を形成した後、該透明コート層に接着剤を用いて透明基材を接合することを特徴とする請求項7または8に記載の透明導電積層体の製造方法。
- 前記透明導電層形成用塗布液の導電性酸化物微粒子が、平均粒径1〜100nmの粒径を有していることを特徴とする請求項7〜9のいずれかに記載の透明導電積層体の製造方法。
- 前記透明導電層形成用塗布液がバインダーを含むことを特徴とする請求項7〜10のいずれかに記載の透明導電積層体の製造方法。
- 前記接着剤に、紫外線吸収剤、脱水剤、脱酸素剤から選択された少なくとも1種類の添加剤が配合されていることを特徴とする請求項7〜11のいずれかに記載の透明導電積層体の製造方法。
- 請求項1〜6のいずれかに記載の透明導電積層体から平滑な基板を剥離した後の、接着剤層により接合された透明導電層と補助電極層とを備える透明基材が組み込まれていることを特徴とするデバイス。
- 色素増感型太陽電池、あるいは有機エレクトロルミネッセンス素子であることを特徴とする請求項13に記載のデバイス。
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Also Published As
Publication number | Publication date |
---|---|
US7638807B2 (en) | 2009-12-29 |
CN1875433A (zh) | 2006-12-06 |
US20080271843A1 (en) | 2008-11-06 |
US7901538B2 (en) | 2011-03-08 |
JPWO2005041217A1 (ja) | 2007-04-26 |
CN100578688C (zh) | 2010-01-06 |
WO2005041217A1 (ja) | 2005-05-06 |
US20070079869A1 (en) | 2007-04-12 |
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