JP4531557B2 - 半導体処理ツール内チャンバ間の相互汚染の減少 - Google Patents
半導体処理ツール内チャンバ間の相互汚染の減少 Download PDFInfo
- Publication number
- JP4531557B2 JP4531557B2 JP2004508393A JP2004508393A JP4531557B2 JP 4531557 B2 JP4531557 B2 JP 4531557B2 JP 2004508393 A JP2004508393 A JP 2004508393A JP 2004508393 A JP2004508393 A JP 2004508393A JP 4531557 B2 JP4531557 B2 JP 4531557B2
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- Prior art keywords
- chamber
- gate valve
- transfer
- processing
- inert gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/907—Continuous processing
- Y10S438/908—Utilizing cluster apparatus
Description
Claims (11)
- 半導体処理装置内で加工物を搬送する方法であって、
前記半導体処理装置の第1チャンバを排気して、前記第1チャンバ内を第1圧力にするステップと、
前記半導体処理装置の第2チャンバを排気して、前記第2チャンバ内を第2圧力にするステップと、
前記第1チャンバ内及び前記第2チャンバ内に不活性ガスを流すステップと、
前記第1チャンバと前記第2チャンバとの間に配置したゲートバルブを開くステップと、
前記ゲートバルブを開く前には、前記第1チャンバの排気を中断し、前記第2チャンバの前記不活性ガスの流れを中断すると共に、前記ゲートバルブが開いている間には、前記第1チャンバの排気の中断を継続し、前記第2チャンバへの前記不活性ガスの流れの中断を継続するステップと、
前記第1チャンバと前記第2チャンバとの間で前記加工物を搬送するステップとを含むことを特徴とする加工物搬送方法。 - 前記第1圧力は、前記第2圧力よりも高いことを特徴とする請求項1に記載の加工物搬送方法。
- 前記第2圧力は、前記加工物の処理中の前記第2チャンバ内の動作圧よりも低いことを特徴とする請求項2に記載の加工物搬送方法。
- 前記ゲートバルブの前記第1チャンバに隣接する側で、不活性ガスのカーテンを生成するステップをさらに含むことを特徴とする請求項1に記載の加工物搬送方法。
- 前記不活性ガスのカーテンは、前記ゲートバルブの外壁に沿って前記第2チャンバに向けられている不活性ガスジェットによって生成されることを特徴とする請求項4に記載の加工物搬送方法。
- 前記第1チャンバは、搬送チャンバであることを特徴とする請求項1に記載の加工物搬送方法。
- 搬送チャンバ、処理チャンバ、及び前記搬送チャンバと前記処理チャンバとの間にゲートバルブを備える半導体処理装置内で加工物を搬送する方法であって、
前記搬送チャンバ内よりも前記処理チャンバ内を低圧にするために前記処理チャンバ及び前記搬送チャンバを真空排気するステップと、
前記搬送チャンバ内に不活性ガスを流すステップと、
前記処理チャンバ内に不活性ガスを流すステップと、
前記ゲートバルブを開く前に前記搬送チャンバ内の排気を中断するステップと、
前記処理チャンバを継続して排気しながら、前記ゲートバルブを開くステップと、
前記ゲートバルブが開いている間、前記処理チャンバ内への前記不活性ガスの流れの中断及び前記搬送チャンバの真空排気の中断を継続するステップと、
開かれた前記ゲートバルブを通じて、前記搬送チャンバと前記処理チャンバとの間で前記加工物を搬送するステップとを含むことを特徴とする加工物搬送方法。 - 前記半導体処理装置は、前記搬送チャンバに連結された少なくとも2つの処理チャンバを備えることを特徴とする請求項7に記載の加工物搬送方法。
- 前記ゲートバルブを開くステップにおいて、前記ゲートバルブを開く直前の前記処理チャンバ内の圧力は、前記搬送チャンバ内の圧力よりも100mTorr〜5Torr低いことを特徴とする請求項7に記載の加工物搬送方法。
- 前記ゲートバルブを開くステップにおいて、前記ゲートバルブを開く直前の前記処理チャンバ内の圧力は、前記搬送チャンバ内の圧力よりも100mTorr〜300mTorr低いことを特徴とする請求項7に記載の加工物搬送方法。
- 前記処理チャンバ内への前記不活性ガスの流れの中断及び前記搬送チャンバの真空排気の中断を継続するステップは、前記ゲートバルブを開く少なくとも1秒前に、前記処理チャンバ内への前記不活性ガスの流れを中断することを含むことを特徴とする請求項7に記載の加工物搬送方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US38220402P | 2002-05-21 | 2002-05-21 | |
PCT/US2003/015843 WO2003100836A1 (en) | 2002-05-21 | 2003-05-20 | Reduced cross-contamination between chambers in a semiconductor processing tool |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005527120A JP2005527120A (ja) | 2005-09-08 |
JP4531557B2 true JP4531557B2 (ja) | 2010-08-25 |
Family
ID=29584374
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004508393A Expired - Lifetime JP4531557B2 (ja) | 2002-05-21 | 2003-05-20 | 半導体処理ツール内チャンバ間の相互汚染の減少 |
Country Status (5)
Country | Link |
---|---|
US (2) | US6797617B2 (ja) |
EP (1) | EP1506570A1 (ja) |
JP (1) | JP4531557B2 (ja) |
KR (1) | KR101050275B1 (ja) |
WO (1) | WO2003100836A1 (ja) |
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-
2003
- 2003-05-20 EP EP03731261A patent/EP1506570A1/en not_active Withdrawn
- 2003-05-20 US US10/441,642 patent/US6797617B2/en not_active Expired - Lifetime
- 2003-05-20 JP JP2004508393A patent/JP4531557B2/ja not_active Expired - Lifetime
- 2003-05-20 WO PCT/US2003/015843 patent/WO2003100836A1/en active Application Filing
- 2003-05-20 KR KR1020047018471A patent/KR101050275B1/ko active IP Right Grant
-
2004
- 2004-02-24 US US10/786,779 patent/US7022613B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US20030219977A1 (en) | 2003-11-27 |
KR20050013105A (ko) | 2005-02-02 |
US6797617B2 (en) | 2004-09-28 |
JP2005527120A (ja) | 2005-09-08 |
EP1506570A1 (en) | 2005-02-16 |
US20040166683A1 (en) | 2004-08-26 |
KR101050275B1 (ko) | 2011-07-19 |
US7022613B2 (en) | 2006-04-04 |
WO2003100836A1 (en) | 2003-12-04 |
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