JP3731207B2 - X線分析装置 - Google Patents

X線分析装置 Download PDF

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Publication number
JP3731207B2
JP3731207B2 JP2003324609A JP2003324609A JP3731207B2 JP 3731207 B2 JP3731207 B2 JP 3731207B2 JP 2003324609 A JP2003324609 A JP 2003324609A JP 2003324609 A JP2003324609 A JP 2003324609A JP 3731207 B2 JP3731207 B2 JP 3731207B2
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JP
Japan
Prior art keywords
ray
semiconductor
detection means
sample
ray detection
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Expired - Fee Related
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JP2003324609A
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English (en)
Japanese (ja)
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JP2005091142A (ja
Inventor
武慶 田口
武雄 田島
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Rigaku Corp
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Rigaku Corp
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Publication date
Application filed by Rigaku Corp filed Critical Rigaku Corp
Priority to JP2003324609A priority Critical patent/JP3731207B2/ja
Priority to US10/911,564 priority patent/US7145983B2/en
Priority to EP04254894.1A priority patent/EP1517137B1/en
Priority to CN2004100748606A priority patent/CN1598554B/zh
Publication of JP2005091142A publication Critical patent/JP2005091142A/ja
Application granted granted Critical
Publication of JP3731207B2 publication Critical patent/JP3731207B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
JP2003324609A 2003-09-17 2003-09-17 X線分析装置 Expired - Fee Related JP3731207B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2003324609A JP3731207B2 (ja) 2003-09-17 2003-09-17 X線分析装置
US10/911,564 US7145983B2 (en) 2003-09-17 2004-08-05 X-ray analysis apparatus
EP04254894.1A EP1517137B1 (en) 2003-09-17 2004-08-13 X-ray analysis apparatus
CN2004100748606A CN1598554B (zh) 2003-09-17 2004-08-30 X光分析设备

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003324609A JP3731207B2 (ja) 2003-09-17 2003-09-17 X線分析装置

Publications (2)

Publication Number Publication Date
JP2005091142A JP2005091142A (ja) 2005-04-07
JP3731207B2 true JP3731207B2 (ja) 2006-01-05

Family

ID=34191308

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003324609A Expired - Fee Related JP3731207B2 (ja) 2003-09-17 2003-09-17 X線分析装置

Country Status (4)

Country Link
US (1) US7145983B2 (zh)
EP (1) EP1517137B1 (zh)
JP (1) JP3731207B2 (zh)
CN (1) CN1598554B (zh)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3759524B2 (ja) * 2003-10-17 2006-03-29 株式会社リガク X線分析装置
CN100485373C (zh) * 2004-07-14 2009-05-06 西南技术工程研究所 短波长x射线衍射测量装置和方法
JP4074874B2 (ja) 2005-06-30 2008-04-16 株式会社リガク X線回折装置
EP1925932B1 (en) * 2005-08-29 2017-02-22 Rigaku Corporation Vertical/horizontal small-angle x-ray scattering device and measuring method for small-angle x-ray scattering
JP4908119B2 (ja) * 2005-10-19 2012-04-04 株式会社リガク 蛍光x線分析装置
JP4909154B2 (ja) * 2007-03-30 2012-04-04 株式会社リガク 結晶粒の極点図測定方法およびその装置
JP4823125B2 (ja) * 2007-03-30 2011-11-24 株式会社リガク X線結晶方位測定装置及びx線結晶方位測定方法
US7801272B2 (en) * 2007-09-28 2010-09-21 Rigaku Corporation X-ray diffraction apparatus and X-ray diffraction method
US8903043B2 (en) * 2011-10-24 2014-12-02 Bruker Axs, Inc. Method for correcting timing skew in X-ray data read out of an X-ray detector in a rolling shutter mode
JP6685078B2 (ja) * 2013-03-15 2020-04-22 プロト マニュファクチャリング リミテッド X線回折装置およびx線回折装置駆動方法
JP5920593B2 (ja) * 2013-04-15 2016-05-18 パルステック工業株式会社 X線回折測定システム
JP6033160B2 (ja) * 2013-04-17 2016-11-30 株式会社リガク X線回折装置、x線回折測定方法および制御プログラム
JP6182758B2 (ja) * 2013-11-15 2017-08-23 株式会社リガク 放射線検出器、これを用いたx線分析装置および放射線検出方法
JP6266574B2 (ja) * 2015-09-10 2018-01-24 株式会社日立ハイテクサイエンス X線検査方法及びx線検査装置
JP6497784B2 (ja) * 2016-05-24 2019-04-10 株式会社リガク 結晶相同定方法、結晶相同定装置、及びx線回折測定システム
EP3605074A4 (en) * 2017-03-30 2021-03-10 Rigaku Corporation X-RAY ANALYSIS ASSISTANCE DEVICE AND X-RAY ANALYSIS PROCESS
CN106908462A (zh) * 2017-04-28 2017-06-30 重庆理工大学 一种高精度较大载荷同心双轴分度测角转台装置
JP6775777B2 (ja) * 2017-08-29 2020-10-28 株式会社リガク X線回折測定における測定結果の表示方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2077546U (zh) * 1990-05-24 1991-05-22 中国科学院物理研究所 两用x-射线双晶衍射仪
JP3291406B2 (ja) * 1995-02-09 2002-06-10 株式会社モリタ製作所 パノラマx線撮影装置
US5742658A (en) * 1996-05-23 1998-04-21 Advanced Micro Devices, Inc. Apparatus and method for determining the elemental compositions and relative locations of particles on the surface of a semiconductor wafer
JP3687243B2 (ja) * 1997-01-08 2005-08-24 株式会社ニコン パターン検査装置
US5998802A (en) * 1997-01-31 1999-12-07 Agfa-Gevaert Method for obtaining an electrical representation of a radiation image using CCD sensors
DE59813247D1 (de) * 1997-02-17 2006-01-05 Sirona Dental Systems Gmbh Verfahren und Einrichtung zur Erstellung von Röntgenaufnahmen von Körperteilen eines Menschen
JP3561738B2 (ja) * 1998-06-02 2004-09-02 株式会社リガク Bragg反射自動選出方法および装置並びに結晶方位自動決定方法およびシステム
JPH11345585A (ja) * 1998-06-03 1999-12-14 Nikon Corp 電子ビームによる検査装置および検査方法
CN1245895A (zh) * 1998-08-25 2000-03-01 北京师范大学 使用整体x光透镜的位置灵敏x射线谱仪
JP3387834B2 (ja) 1998-10-29 2003-03-17 キヤノン株式会社 X線露光方法およびデバイス製造方法
JP4239350B2 (ja) * 2000-03-13 2009-03-18 株式会社ニコン 荷電粒子ビーム装置
GB0014587D0 (en) * 2000-06-14 2000-08-09 Europ Economic Community X-ray reflectivity apparatus and method
JP2002116158A (ja) 2000-10-05 2002-04-19 Rigaku Corp X線測定方法及びx線装置
NL1019287C1 (nl) 2000-11-08 2002-01-23 Koninkl Philips Electronics Nv R÷ntgenanalysetoestel met een vaste stof plaatsgevoelige r÷ntgendetector.
JP2003149180A (ja) * 2001-11-13 2003-05-21 Japan Synchrotron Radiation Research Inst 1次元または2次元検出器を用いた粉末x線回折データ測定方法
JP3759524B2 (ja) * 2003-10-17 2006-03-29 株式会社リガク X線分析装置

Also Published As

Publication number Publication date
EP1517137B1 (en) 2013-10-02
US7145983B2 (en) 2006-12-05
CN1598554A (zh) 2005-03-23
US20050058247A1 (en) 2005-03-17
EP1517137A2 (en) 2005-03-23
JP2005091142A (ja) 2005-04-07
CN1598554B (zh) 2011-08-10
EP1517137A3 (en) 2005-04-13

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