JP2016046418A - 電子部品装置及びその製造方法 - Google Patents
電子部品装置及びその製造方法 Download PDFInfo
- Publication number
- JP2016046418A JP2016046418A JP2014170410A JP2014170410A JP2016046418A JP 2016046418 A JP2016046418 A JP 2016046418A JP 2014170410 A JP2014170410 A JP 2014170410A JP 2014170410 A JP2014170410 A JP 2014170410A JP 2016046418 A JP2016046418 A JP 2016046418A
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- Prior art keywords
- layer
- electronic component
- wiring board
- wiring
- component device
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
Description
前記下側配線基板の上に電子部品を搭載する工程と、支持体の上に、前記電子部品に対応する領域に補強層を含むコアレス基板からなる上側配線基板を形成して、上側配線部材を得る工程と、前記下側配線基板の上に、前記電子部品を収容するように、接続端子を介して前記支持体を上側にして前記上側配線部材を配置する工程と、前記下側配線基板と前記上側配線部材との間に封止樹脂を充填する工程と、前記上側配線部材から前記支持体を除去する工程とを有する電子部品装置の製造方法が提供される。
図3〜図19は第1実施形態の電子部品装置の製造方法を示す図、図20は第1実施形態の電子部品装置を示す図である。本実施形態では、電子部品装置の製造方法を説明しながら、電子部品装置の構造について説明する。
金属めっき層30bをマスクにしてシード層30aをウェットエッチングにより除去する。これにより、シード層30a及び金属めっき層30bから配線層30が形成される。配線層30の厚みは、例えば、10μm〜20μm程度に設定される。また、配線層30のライン(幅):スペース(間隔)は15μm:15μm程度か、それよりも微細に形成することができる。
そして、下側コア有配線基板1の中央部のパッドPに2つの半導体チップ70のバンプ電極72がフリップチップ接続されている。さらに、半導体チップ70の下側にアンダーフィル樹脂74が充填されている。
図21の例では、四角状のガス抜き孔Gによって補強層Rが格子状に形成されているが、円形や六角形などの各種の形状を採用することができる。
図30〜図33は第2実施形態の電子部品装置の製造方法を示す図、図34は第2実施形態の電子部品装置を示す図である。
図35〜図39は第3実施形態の電子部品装置の製造方法を示す図、図40は第3実施形態の電子部品装置を示す図である。
これにより、第3実施形態で使用される上側コア有配線基板2aが得られる。あるいは、前述した第1実施形態の図13のような多層配線層MR(図20)を有する下側コア有配線基板1を用い、その多層配線層MRのパッドPに金属柱34を設けて、上側コア有配線基板2aとしてもよい。
Claims (14)
- コア層を有する下側配線基板と、
前記下側配線基板の上に搭載された電子部品と、
前記下側配線基板及び前記電子部品の上に配置され、コアレス基板からなる上側配線基板と、
前記電子部品に対応する領域の前記上側配線基板に備えられた補強層と、
前記下側配線基板と前記上側配線基板とを接続する接続端子と、
前記下側配線基板と前記上側配線基板との間に充填された封止樹脂と
を有することを特徴とする電子部品装置。 - コアレス基板からなる下側配線基板と、
前記下側配線基板の上に搭載された電子部品と、
前記電子部品に対応する領域の前記下側配線基板に備えられた第1補強層と、
前記下側配線基板及び前記電子部品の上に配置され、コアレス基板からなる上側配線基板と、
前記電子部品に対応する領域の前記上側配線基板に備えられた第2補強層と、
前記下側配線基板と前記上側配線基板とを接続する接続端子と、
前記下側配線基板と前記上側配線基板との間に充填された封止樹脂と
を有することを特徴とする電子部品装置。 - コアレス基板からなる下側配線基板と、
前記下側配線基板の上に搭載された電子部品と、
前記電子部品に対応する領域の前記下側配線基板に備えられた補強層と、
前記下側配線基板及び前記電子部品の上に配置され、前記コア層を有する上側配線基板と、
前記下側配線基板と前記上側配線基板とを接続する接続端子と、
前記下側配線基板と前記上側配線基板との間に充填された封止樹脂と
を有することを特徴とする電子部品装置。 - 前記コア層は、繊維補強材含有樹脂層から形成されることを特徴とする請求項1又は3に記載の電子部品装置。
- 前記コアレス基板は、絶縁層と配線層とが積層されて形成され、
前記絶縁層内に形成された全てのビア導体は、前記電子部品装置の外面側の直径が前記電子部品装置の内方側の直径よりも小さい円錐台形状であることを特徴とする請求項1乃至3のいずれか一項に記載の電子部品装置。 - 前記接続端子は、金属柱であることを特徴とする請求項1乃至3のいずれか一項に記載の電子部品装置。
- 前記コアレス基板からなる配線基板は配線層と絶縁層とを備え、前記補強層は前記配線層と同一層から形成され、前記補強層及び前記配線層が前記絶縁層に埋め込まれていることを特徴とする請求項1乃至3のいずれか一項に記載の電子部品装置。
- 前記コア層の厚みは、前記コアレス基板からなる配線基板の1層の絶縁層の厚みよりも厚いことを特徴とする請求項1又は3に記載の電子部品装置。
- コア層を有する下側配線基板を用意する工程と、
前記下側配線基板の上に電子部品を搭載する工程と、
支持体の上に、前記電子部品に対応する領域に補強層を含むコアレス基板からなる上側配線基板を形成して、上側配線部材を得る工程と、
前記下側配線基板の上に、前記電子部品を収容するように、接続端子を介して前記支持体を上側にして前記上側配線部材を配置する工程と、
前記下側配線基板と前記上側配線部材との間に封止樹脂を充填する工程と、
前記上側配線部材から前記支持体を除去する工程と
を有することを特徴とする電子部品装置の製造方法。 - 第1支持体の上に、第1補強層を含むコアレス基板からなる下側配線基板を形成して、下側配線部材を得る工程と、
前記下側配線部材の上に電子部品を搭載する工程と、
第2支持体の上に、第2補強層を含むコアレス基板からなる上側配線基板を形成して、上側配線部材を得る工程と、
前記下側配線部材の上に、電子部品を収容するように、接続端子を介して前記第2支持体を上側にして前記上側配線部材を配置する工程と、
前記下側配線部材と前記上側配線部材との間に封止樹脂を充填する工程と、
前記下側配線部材から前記第1支持体を除去すると共に、前記上側配線部材から前記第2支持体を除去する工程と
を有し、
前記第1補強層及び前記第2補強層は、前記電子部品に対応する領域に配置されることを特徴とする電子部品装置の製造方法。 - 支持体の上に、補強層を含むコアレス基板からなる下側配線基板を形成して、下側配線部材を得る工程と、
前記下側配線部材の上に電子部品を搭載する工程と、
前記下側配線部材の上に、電子部品を収容するように、接続端子を介して前記コア層を有する上側配線基板を配置する工程と、
前記下側配線部材と前記上側配線基板との間に封止樹脂を充填する工程と、
前記下側配線部材から前記支持体を除去する工程と
を有し、
前記補強層は、前記電子部品に対応する領域に配置されることを特徴とする電子部品装置の製造方法。 - 前記コア層は、繊維補強材含有樹脂層から形成されることを特徴とする請求項9又は11に記載の電子部品装置の製造方法。
- 前記コアレス基板は、絶縁層と配線層とが積層されて形成され、
前記絶縁層内に形成された全てのビア導体は、前記電子部品装置の外面側の直径が前記電子部品装置の内方側の直径よりも小さい円錐台形状であることを特徴とする請求項9乃至11のいずれか一項に記載の電子部品装置の製造方法。 - 前記接続端子は、金属柱であることを特徴とする請求項9乃至11のいずれか一項に記載の電子部品装置の製造方法。
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JP6358431B2 (ja) | 2018-07-18 |
US20190029113A1 (en) | 2019-01-24 |
US10383228B2 (en) | 2019-08-13 |
US10098228B2 (en) | 2018-10-09 |
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