JP2013018706A5 - - Google Patents
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- JP2013018706A5 JP2013018706A5 JP2012228190A JP2012228190A JP2013018706A5 JP 2013018706 A5 JP2013018706 A5 JP 2013018706A5 JP 2012228190 A JP2012228190 A JP 2012228190A JP 2012228190 A JP2012228190 A JP 2012228190A JP 2013018706 A5 JP2013018706 A5 JP 2013018706A5
- Authority
- JP
- Japan
- Prior art keywords
- crystal
- seed crystal
- axis
- semiconductor
- plane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000013078 crystal Substances 0.000 claims 52
- 239000004065 semiconductor Substances 0.000 claims 24
- 235000012431 wafers Nutrition 0.000 claims 23
- 238000000034 method Methods 0.000 claims 10
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims 9
- 229910010271 silicon carbide Inorganic materials 0.000 claims 9
- 150000004767 nitrides Chemical class 0.000 claims 2
- 230000002093 peripheral effect Effects 0.000 claims 2
- 239000000463 material Substances 0.000 claims 1
- 238000005130 seeded sublimation method Methods 0.000 claims 1
- 238000005092 sublimation method Methods 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/428,954 US8980445B2 (en) | 2006-07-06 | 2006-07-06 | One hundred millimeter SiC crystal grown on off-axis seed |
| US11/428,954 | 2006-07-06 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009518424A Division JP2009542571A (ja) | 2006-07-06 | 2007-05-30 | 軸オフの種結晶上での100ミリメートル炭化ケイ素結晶の成長 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2013018706A JP2013018706A (ja) | 2013-01-31 |
| JP2013018706A5 true JP2013018706A5 (enExample) | 2013-03-14 |
Family
ID=38616288
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009518424A Pending JP2009542571A (ja) | 2006-07-06 | 2007-05-30 | 軸オフの種結晶上での100ミリメートル炭化ケイ素結晶の成長 |
| JP2012228190A Pending JP2013018706A (ja) | 2006-07-06 | 2012-10-15 | 軸オフの種結晶上での100ミリメートル炭化ケイ素結晶の成長 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009518424A Pending JP2009542571A (ja) | 2006-07-06 | 2007-05-30 | 軸オフの種結晶上での100ミリメートル炭化ケイ素結晶の成長 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8980445B2 (enExample) |
| EP (1) | EP2038455B1 (enExample) |
| JP (2) | JP2009542571A (enExample) |
| CN (1) | CN101484616B (enExample) |
| RU (1) | RU2418891C9 (enExample) |
| WO (1) | WO2008005636A1 (enExample) |
Families Citing this family (45)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8980445B2 (en) | 2006-07-06 | 2015-03-17 | Cree, Inc. | One hundred millimeter SiC crystal grown on off-axis seed |
| JP2010076967A (ja) * | 2008-09-25 | 2010-04-08 | Sumitomo Electric Ind Ltd | 炭化ケイ素基板の製造方法および炭化ケイ素基板 |
| JP5480169B2 (ja) | 2011-01-13 | 2014-04-23 | 浜松ホトニクス株式会社 | レーザ加工方法 |
| DE202012013581U1 (de) | 2011-07-20 | 2018-01-08 | Sumitomo Electric Industries, Ltd. | Siliziumkarbidsubstrat und Halbleitervorrichtung |
| JP5803786B2 (ja) | 2012-04-02 | 2015-11-04 | 住友電気工業株式会社 | 炭化珪素基板、半導体装置およびこれらの製造方法 |
| US8860040B2 (en) | 2012-09-11 | 2014-10-14 | Dow Corning Corporation | High voltage power semiconductor devices on SiC |
| US9018639B2 (en) | 2012-10-26 | 2015-04-28 | Dow Corning Corporation | Flat SiC semiconductor substrate |
| US9017804B2 (en) | 2013-02-05 | 2015-04-28 | Dow Corning Corporation | Method to reduce dislocations in SiC crystal growth |
| US9797064B2 (en) | 2013-02-05 | 2017-10-24 | Dow Corning Corporation | Method for growing a SiC crystal by vapor deposition onto a seed crystal provided on a support shelf which permits thermal expansion |
| US9738991B2 (en) * | 2013-02-05 | 2017-08-22 | Dow Corning Corporation | Method for growing a SiC crystal by vapor deposition onto a seed crystal provided on a supporting shelf which permits thermal expansion |
| US8940614B2 (en) | 2013-03-15 | 2015-01-27 | Dow Corning Corporation | SiC substrate with SiC epitaxial film |
| US11091370B2 (en) | 2013-05-02 | 2021-08-17 | Pallidus, Inc. | Polysilocarb based silicon carbide materials, applications and devices |
| US9657409B2 (en) | 2013-05-02 | 2017-05-23 | Melior Innovations, Inc. | High purity SiOC and SiC, methods compositions and applications |
| US9919972B2 (en) | 2013-05-02 | 2018-03-20 | Melior Innovations, Inc. | Pressed and self sintered polymer derived SiC materials, applications and devices |
| US10322936B2 (en) | 2013-05-02 | 2019-06-18 | Pallidus, Inc. | High purity polysilocarb materials, applications and processes |
| JP6183010B2 (ja) * | 2013-07-03 | 2017-08-23 | 住友電気工業株式会社 | 炭化珪素単結晶基板およびその製造方法 |
| US9279192B2 (en) | 2014-07-29 | 2016-03-08 | Dow Corning Corporation | Method for manufacturing SiC wafer fit for integration with power device manufacturing technology |
| JP6395632B2 (ja) | 2015-02-09 | 2018-09-26 | 株式会社ディスコ | ウエーハの生成方法 |
| JP6395633B2 (ja) | 2015-02-09 | 2018-09-26 | 株式会社ディスコ | ウエーハの生成方法 |
| JP6425606B2 (ja) | 2015-04-06 | 2018-11-21 | 株式会社ディスコ | ウエーハの生成方法 |
| JP6429715B2 (ja) | 2015-04-06 | 2018-11-28 | 株式会社ディスコ | ウエーハの生成方法 |
| JP6494382B2 (ja) | 2015-04-06 | 2019-04-03 | 株式会社ディスコ | ウエーハの生成方法 |
| JP6472333B2 (ja) | 2015-06-02 | 2019-02-20 | 株式会社ディスコ | ウエーハの生成方法 |
| JP6482423B2 (ja) | 2015-07-16 | 2019-03-13 | 株式会社ディスコ | ウエーハの生成方法 |
| JP6482425B2 (ja) | 2015-07-21 | 2019-03-13 | 株式会社ディスコ | ウエーハの薄化方法 |
| JP6472347B2 (ja) | 2015-07-21 | 2019-02-20 | 株式会社ディスコ | ウエーハの薄化方法 |
| JP6690983B2 (ja) | 2016-04-11 | 2020-04-28 | 株式会社ディスコ | ウエーハ生成方法及び実第2のオリエンテーションフラット検出方法 |
| CN106435732B (zh) * | 2016-08-30 | 2019-08-30 | 河北同光晶体有限公司 | 一种快速制备大尺寸SiC单晶晶棒的方法 |
| JP6858587B2 (ja) | 2017-02-16 | 2021-04-14 | 株式会社ディスコ | ウエーハ生成方法 |
| JP7035377B2 (ja) * | 2017-03-27 | 2022-03-15 | ウシオ電機株式会社 | 半導体レーザ装置 |
| US11114817B2 (en) * | 2017-03-27 | 2021-09-07 | Ushio Denki Kabushiki Kaisha | Semiconductor laser device |
| KR102850888B1 (ko) | 2017-03-29 | 2025-08-26 | 팔리두스, 인크. | SiC 용적측정 형태 및 보올을 형성하는 방법 |
| JP6748613B2 (ja) * | 2017-07-20 | 2020-09-02 | 住友電気工業株式会社 | 炭化珪素単結晶基板 |
| US10679898B2 (en) * | 2018-04-27 | 2020-06-09 | Semiconductor Components Industries, Llc | Semiconductor substrate die sawing singulation systems and methods |
| US10576585B1 (en) | 2018-12-29 | 2020-03-03 | Cree, Inc. | Laser-assisted method for parting crystalline material |
| US11024501B2 (en) | 2018-12-29 | 2021-06-01 | Cree, Inc. | Carrier-assisted method for parting crystalline material along laser damage region |
| US10562130B1 (en) | 2018-12-29 | 2020-02-18 | Cree, Inc. | Laser-assisted method for parting crystalline material |
| US10611052B1 (en) | 2019-05-17 | 2020-04-07 | Cree, Inc. | Silicon carbide wafers with relaxed positive bow and related methods |
| US12054850B2 (en) | 2019-12-27 | 2024-08-06 | Wolfspeed, Inc. | Large diameter silicon carbide wafers |
| CN113122914B (zh) * | 2020-06-09 | 2023-02-28 | 北京世纪金光半导体有限公司 | 一种维持大尺寸碳化硅晶型稳定的装置及生长方法 |
| US12125701B2 (en) | 2020-12-15 | 2024-10-22 | Wolfspeed, Inc. | Large dimension silicon carbide single crystalline materials with reduced crystallographic stress |
| US12024794B2 (en) | 2021-06-17 | 2024-07-02 | Wolfspeed, Inc. | Reduced optical absorption for silicon carbide crystalline materials |
| CN114347277B (zh) * | 2021-11-30 | 2024-04-19 | 中国电子科技集团公司第十一研究所 | 一种InSb晶片制备方法 |
| US12173428B2 (en) | 2022-10-07 | 2024-12-24 | Mainstream Engineering Corporation | Controlled surface chemistry for polytypic and microstructural selective growth on hexagonal SiC substrates |
| CN118461146B (zh) * | 2024-07-12 | 2024-09-24 | 析氢新能源科技发展(山东)有限公司 | 一种具有高效析氢催化性能的合金单晶的制备方法和应用 |
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| US4866005A (en) | 1987-10-26 | 1989-09-12 | North Carolina State University | Sublimation of silicon carbide to produce large, device quality single crystals of silicon carbide |
| US4912064A (en) | 1987-10-26 | 1990-03-27 | North Carolina State University | Homoepitaxial growth of alpha-SiC thin films and semiconductor devices fabricated thereon |
| US4918497A (en) | 1988-12-14 | 1990-04-17 | Cree Research, Inc. | Blue light emitting diode formed in silicon carbide |
| JPH0416597A (ja) | 1990-05-09 | 1992-01-21 | Sharp Corp | 炭化珪素単結晶の製造方法 |
| US5958132A (en) | 1991-04-18 | 1999-09-28 | Nippon Steel Corporation | SiC single crystal and method for growth thereof |
| US5248385A (en) * | 1991-06-12 | 1993-09-28 | The United States Of America, As Represented By The Administrator, National Aeronautics And Space Administration | Process for the homoepitaxial growth of single-crystal silicon carbide films on silicon carbide wafers |
| US5592501A (en) | 1994-09-20 | 1997-01-07 | Cree Research, Inc. | Low-strain laser structures with group III nitride active layers |
| JPH08245299A (ja) | 1995-03-10 | 1996-09-24 | Sanyo Electric Co Ltd | 炭化ケイ素の結晶成長方法 |
| JP3599896B2 (ja) | 1995-05-19 | 2004-12-08 | 三洋電機株式会社 | 半導体レーザ素子および半導体レーザ素子の製造方法 |
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| FR2852974A1 (fr) | 2003-03-31 | 2004-10-01 | Soitec Silicon On Insulator | Procede de fabrication de cristaux monocristallins |
| JP3764462B2 (ja) * | 2003-04-10 | 2006-04-05 | 株式会社豊田中央研究所 | 炭化ケイ素単結晶の製造方法 |
| JP4407188B2 (ja) * | 2003-07-23 | 2010-02-03 | 信越半導体株式会社 | シリコンウェーハの製造方法およびシリコンウェーハ |
| JP4219800B2 (ja) | 2003-12-22 | 2009-02-04 | 株式会社豊田中央研究所 | SiC単結晶の製造方法 |
| JP3888374B2 (ja) * | 2004-03-17 | 2007-02-28 | 住友電気工業株式会社 | GaN単結晶基板の製造方法 |
| JP4694144B2 (ja) | 2004-05-14 | 2011-06-08 | 住友電気工業株式会社 | SiC単結晶の成長方法およびそれにより成長したSiC単結晶 |
| EP1619276B1 (en) | 2004-07-19 | 2017-01-11 | Norstel AB | Homoepitaxial growth of SiC on low off-axis SiC wafers |
| US7192482B2 (en) | 2004-08-10 | 2007-03-20 | Cree, Inc. | Seed and seedholder combinations for high quality growth of large silicon carbide single crystals |
| JP4733485B2 (ja) | 2004-09-24 | 2011-07-27 | 昭和電工株式会社 | 炭化珪素単結晶成長用種結晶の製造方法、炭化珪素単結晶成長用種結晶、炭化珪素単結晶の製造方法、および炭化珪素単結晶 |
| US7314520B2 (en) | 2004-10-04 | 2008-01-01 | Cree, Inc. | Low 1c screw dislocation 3 inch silicon carbide wafer |
| US7314521B2 (en) | 2004-10-04 | 2008-01-01 | Cree, Inc. | Low micropipe 100 mm silicon carbide wafer |
| JP5068423B2 (ja) | 2004-10-13 | 2012-11-07 | 新日本製鐵株式会社 | 炭化珪素単結晶インゴット、炭化珪素単結晶ウェハ及びその製造方法 |
| US8980445B2 (en) | 2006-07-06 | 2015-03-17 | Cree, Inc. | One hundred millimeter SiC crystal grown on off-axis seed |
-
2006
- 2006-07-06 US US11/428,954 patent/US8980445B2/en active Active
-
2007
- 2007-05-30 RU RU2008152451/05A patent/RU2418891C9/ru active
- 2007-05-30 CN CN200780025613.9A patent/CN101484616B/zh active Active
- 2007-05-30 JP JP2009518424A patent/JP2009542571A/ja active Pending
- 2007-05-30 WO PCT/US2007/069946 patent/WO2008005636A1/en not_active Ceased
- 2007-05-30 EP EP07797873.2A patent/EP2038455B1/en active Active
-
2012
- 2012-10-15 JP JP2012228190A patent/JP2013018706A/ja active Pending
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