JP2010541236A5 - - Google Patents

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Publication number
JP2010541236A5
JP2010541236A5 JP2010526893A JP2010526893A JP2010541236A5 JP 2010541236 A5 JP2010541236 A5 JP 2010541236A5 JP 2010526893 A JP2010526893 A JP 2010526893A JP 2010526893 A JP2010526893 A JP 2010526893A JP 2010541236 A5 JP2010541236 A5 JP 2010541236A5
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JP
Japan
Prior art keywords
deposition
substrate
phase material
section
vapor phase
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Pending
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JP2010526893A
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English (en)
Japanese (ja)
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JP2010541236A (ja
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Priority claimed from US11/861,359 external-priority patent/US8398770B2/en
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Publication of JP2010541236A publication Critical patent/JP2010541236A/ja
Publication of JP2010541236A5 publication Critical patent/JP2010541236A5/ja
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JP2010526893A 2007-09-26 2008-09-16 反応性ガスを空間的に分離するガス配送ヘッドを用い、配送ヘッドを通過する基板の移動を伴う、薄膜形成のための方法及び堆積装置 Pending JP2010541236A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/861,359 US8398770B2 (en) 2007-09-26 2007-09-26 Deposition system for thin film formation
PCT/US2008/010752 WO2009042044A1 (en) 2007-09-26 2008-09-16 Process and deposition system for thin film formation with gas delivery head having spatial separation of reactive gases and movement of the substrate passed the delivery head

Publications (2)

Publication Number Publication Date
JP2010541236A JP2010541236A (ja) 2010-12-24
JP2010541236A5 true JP2010541236A5 (enExample) 2011-11-10

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010526893A Pending JP2010541236A (ja) 2007-09-26 2008-09-16 反応性ガスを空間的に分離するガス配送ヘッドを用い、配送ヘッドを通過する基板の移動を伴う、薄膜形成のための方法及び堆積装置

Country Status (6)

Country Link
US (1) US8398770B2 (enExample)
EP (1) EP2191037A1 (enExample)
JP (1) JP2010541236A (enExample)
CN (1) CN101809193A (enExample)
TW (1) TW200934886A (enExample)
WO (1) WO2009042044A1 (enExample)

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