MX378928B - Tobera de inyeccion de aerosoles y su metodo de utilizacion para depositar diferentes recubrimientos mediante deposito quimico de vapor asistido por aerosol. - Google Patents

Tobera de inyeccion de aerosoles y su metodo de utilizacion para depositar diferentes recubrimientos mediante deposito quimico de vapor asistido por aerosol.

Info

Publication number
MX378928B
MX378928B MX2014013233A MX2014013233A MX378928B MX 378928 B MX378928 B MX 378928B MX 2014013233 A MX2014013233 A MX 2014013233A MX 2014013233 A MX2014013233 A MX 2014013233A MX 378928 B MX378928 B MX 378928B
Authority
MX
Mexico
Prior art keywords
aerosol
injection nozzle
materials
vapor deposition
chemical vapor
Prior art date
Application number
MX2014013233A
Other languages
English (en)
Other versions
MX2014013233A (es
Inventor
Miki Yoshida Mario
Vega Becerra Oscar
Amezaga Madrid Patricia
Piza Ruiz Pedro
Original Assignee
Centro De Investigacion En Mat Avanzados S C
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centro De Investigacion En Mat Avanzados S C filed Critical Centro De Investigacion En Mat Avanzados S C
Priority to MX2014013233A priority Critical patent/MX378928B/es
Priority to US14/925,299 priority patent/US20160145741A1/en
Publication of MX2014013233A publication Critical patent/MX2014013233A/es
Publication of MX378928B publication Critical patent/MX378928B/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/4557—Heated nozzles

Landscapes

  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Esta invención se refiere a una tobera de inyección de aerosoles diseñada con una geometría especifica para depositar materiales de manera vertical "hacia arriba", es decir, en sentido contrario a la gravedad y su método de uso. Con esta tobera es posible depositar recubrimientos, multicapas, materiales compuestos, nanopins, nanovarillas, nanoracimos, nanoplatos, nanohilos, nanoparticulas, "quantum dots" o semiconductores confinados, de diversos materiales, no limitados a los ejemplos mencionados: óxidos TIO2, ZnO, ZrO2, SnO2, CuO, NiO, CrOx, AlOx, PbZrTiO3, LiNbO3; metales nobles Ag, Au, Pt; polímeros PANI, PEDOT. El proceso se puede repetir en etapas sucesivas con el mismo dispositivo y con el mismo método para obtener uno o varios recubrimientos o materiales en etapas sucesivas.
MX2014013233A 2014-10-30 2014-10-30 Tobera de inyeccion de aerosoles y su metodo de utilizacion para depositar diferentes recubrimientos mediante deposito quimico de vapor asistido por aerosol. MX378928B (es)

Priority Applications (2)

Application Number Priority Date Filing Date Title
MX2014013233A MX378928B (es) 2014-10-30 2014-10-30 Tobera de inyeccion de aerosoles y su metodo de utilizacion para depositar diferentes recubrimientos mediante deposito quimico de vapor asistido por aerosol.
US14/925,299 US20160145741A1 (en) 2014-10-30 2015-10-28 Injection nozzle for aerosols and their method of use to deposit different coatings via vapor chemical deposition assisted by aerosol

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
MX2014013233A MX378928B (es) 2014-10-30 2014-10-30 Tobera de inyeccion de aerosoles y su metodo de utilizacion para depositar diferentes recubrimientos mediante deposito quimico de vapor asistido por aerosol.

Publications (2)

Publication Number Publication Date
MX2014013233A MX2014013233A (es) 2016-05-02
MX378928B true MX378928B (es) 2025-03-11

Family

ID=56009605

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2014013233A MX378928B (es) 2014-10-30 2014-10-30 Tobera de inyeccion de aerosoles y su metodo de utilizacion para depositar diferentes recubrimientos mediante deposito quimico de vapor asistido por aerosol.

Country Status (2)

Country Link
US (1) US20160145741A1 (es)
MX (1) MX378928B (es)

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CN116732494A (zh) * 2023-07-20 2023-09-12 重庆理工大学 一种立式雾化辅助cvd薄膜制备装置

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Also Published As

Publication number Publication date
US20160145741A1 (en) 2016-05-26
MX2014013233A (es) 2016-05-02

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