MX2014013233A - Tobera de inyeccion de aerosoles y su metodo de utilizacion para depositar diferentes recubrimientos mediante deposito quimico de vapor asistido por aerosol. - Google Patents
Tobera de inyeccion de aerosoles y su metodo de utilizacion para depositar diferentes recubrimientos mediante deposito quimico de vapor asistido por aerosol.Info
- Publication number
- MX2014013233A MX2014013233A MX2014013233A MX2014013233A MX2014013233A MX 2014013233 A MX2014013233 A MX 2014013233A MX 2014013233 A MX2014013233 A MX 2014013233A MX 2014013233 A MX2014013233 A MX 2014013233A MX 2014013233 A MX2014013233 A MX 2014013233A
- Authority
- MX
- Mexico
- Prior art keywords
- injection nozzle
- aerosol
- aerosols
- materials
- chemical deposition
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/4557—Heated nozzles
Abstract
Esta invención se refiere a una tobera de inyección de aerosoles diseñada con una geometría especifica para depositar materiales de manera vertical "hacia arriba", es decir, en sentido contrario a la gravedad y su método de uso. Con esta tobera es posible depositar recubrimientos, multicapas, materiales compuestos, nanopins, nanovarillas, nanoracimos, nanoplatos, nanohilos, nanoparticulas, "quantum dots" o semiconductores confinados, de diversos materiales, no limitados a los ejemplos mencionados: óxidos TIO2, ZnO, ZrO2, SnO2, CuO, NiO, CrOx, AlOx, PbZrTiO3, LiNbO3; metales nobles Ag, Au, Pt; polímeros PANI, PEDOT. El proceso se puede repetir en etapas sucesivas con el mismo dispositivo y con el mismo método para obtener uno o varios recubrimientos o materiales en etapas sucesivas.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
MX2014013233A MX2014013233A (es) | 2014-10-30 | 2014-10-30 | Tobera de inyeccion de aerosoles y su metodo de utilizacion para depositar diferentes recubrimientos mediante deposito quimico de vapor asistido por aerosol. |
US14/925,299 US20160145741A1 (en) | 2014-10-30 | 2015-10-28 | Injection nozzle for aerosols and their method of use to deposit different coatings via vapor chemical deposition assisted by aerosol |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
MX2014013233A MX2014013233A (es) | 2014-10-30 | 2014-10-30 | Tobera de inyeccion de aerosoles y su metodo de utilizacion para depositar diferentes recubrimientos mediante deposito quimico de vapor asistido por aerosol. |
Publications (1)
Publication Number | Publication Date |
---|---|
MX2014013233A true MX2014013233A (es) | 2016-05-02 |
Family
ID=56009605
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2014013233A MX2014013233A (es) | 2014-10-30 | 2014-10-30 | Tobera de inyeccion de aerosoles y su metodo de utilizacion para depositar diferentes recubrimientos mediante deposito quimico de vapor asistido por aerosol. |
Country Status (2)
Country | Link |
---|---|
US (1) | US20160145741A1 (es) |
MX (1) | MX2014013233A (es) |
Families Citing this family (3)
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US9711108B2 (en) | 2013-06-10 | 2017-07-18 | Intel Corporation | Low power high frequency digital pulse frequency modulator |
US11742151B2 (en) * | 2019-05-29 | 2023-08-29 | King Fahd University Of Petroleum And Minerals | Aerosol assisted chemical vapor deposition methods useful for making dye-sensitized solar cells with platinum dialkyldithiocarbamate complexes |
ES2937071T3 (es) * | 2020-03-24 | 2023-03-23 | Akzenta Paneele Profile Gmbh | Recubrimiento del borde de un panel con un medio de recubrimiento |
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-
2014
- 2014-10-30 MX MX2014013233A patent/MX2014013233A/es unknown
-
2015
- 2015-10-28 US US14/925,299 patent/US20160145741A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20160145741A1 (en) | 2016-05-26 |
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