JP2010532400A5 - - Google Patents

Info

Publication number

JP2010532400A5

JP2010532400A5 JP2010513911A JP2010513911A JP2010532400A5 JP 2010532400 A5 JP2010532400 A5 JP 2010532400A5 JP 2010513911 A JP2010513911 A JP 2010513911A JP 2010513911 A JP2010513911 A JP 2010513911A JP 2010532400 A5 JP2010532400 A5 JP 2010532400A5

Authority

JP

Japan

Prior art keywords

substituted

unsubstituted

group

groups

aryl

Prior art date

2008-06-25

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Granted

Links

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• 150000001875 compounds Chemical class 0.000 claims description 38
• 125000001424 substituent group Chemical group 0.000 claims description 25
• 125000001072 heteroaryl group Chemical group 0.000 claims description 23
• 125000006413 ring segment Chemical group 0.000 claims description 20
• 125000003118 aryl group Chemical group 0.000 claims description 17
• 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 17
• 229910052739 hydrogen Inorganic materials 0.000 claims description 14
• 239000001257 hydrogen Substances 0.000 claims description 14
• 239000003446 ligand Substances 0.000 claims description 14
• 230000000007 visual effect Effects 0.000 claims description 10
• -1 carbonylthio Chemical group 0.000 claims description 7
• 125000005842 heteroatom Chemical group 0.000 claims description 7
• 238000002347 injection Methods 0.000 claims description 7
• 239000007924 injection Substances 0.000 claims description 7
• 229910052757 nitrogen Inorganic materials 0.000 claims description 7
• 125000003277 amino group Chemical group 0.000 claims description 6
• 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 5
• 229910052751 metal Inorganic materials 0.000 claims description 5
• 238000000034 method Methods 0.000 claims description 5
• 229910052698 phosphorus Inorganic materials 0.000 claims description 5
• 229910052736 halogen Inorganic materials 0.000 claims description 4
• 238000004519 manufacturing process Methods 0.000 claims description 4
• 229910052707 ruthenium Inorganic materials 0.000 claims description 4
• 150000002367 halogens Chemical class 0.000 claims description 3
• 239000011159 matrix material Substances 0.000 claims description 2
• HZVOZRGWRWCICA-UHFFFAOYSA-N methanediyl Chemical compound [CH2] HZVOZRGWRWCICA-UHFFFAOYSA-N 0.000 claims 9
• 230000000903 blocking effect Effects 0.000 claims 6
• 239000004020 conductor Substances 0.000 claims 6
• 239000000463 material Substances 0.000 claims 6
• 102000005962 receptors Human genes 0.000 claims 6
• 108020003175 receptors Proteins 0.000 claims 6
• XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 claims 4
• 230000000694 effects Effects 0.000 claims 4
• 239000002184 metal Substances 0.000 claims 4
• 239000002243 precursor Substances 0.000 claims 4
• 125000000129 anionic group Chemical group 0.000 claims 3
• 125000004429 atom Chemical group 0.000 claims 3
• 125000005549 heteroarylene group Chemical group 0.000 claims 3
• 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims 2
• 125000003860 C1-C20 alkoxy group Chemical group 0.000 claims 2
• 229910019142 PO4 Inorganic materials 0.000 claims 2
• QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims 2
• 229910000086 alane Inorganic materials 0.000 claims 2
• AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical compound [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 claims 2
• 150000001408 amides Chemical class 0.000 claims 2
• UORVGPXVDQYIDP-BJUDXGSMSA-N borane Chemical group [10BH3] UORVGPXVDQYIDP-BJUDXGSMSA-N 0.000 claims 2
• BGECDVWSWDRFSP-UHFFFAOYSA-N borazine Chemical compound B1NBNBN1 BGECDVWSWDRFSP-UHFFFAOYSA-N 0.000 claims 2
• 125000005708 carbonyloxy group Chemical group [*:2]OC([*:1])=O 0.000 claims 2
• 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 claims 2
• 229910000078 germane Inorganic materials 0.000 claims 2
• OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine group Chemical group NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims 2
• 150000007857 hydrazones Chemical class 0.000 claims 2
• 125000001841 imino group Chemical group [H]N=* 0.000 claims 2
• 125000000018 nitroso group Chemical group N(=O)* 0.000 claims 2
• 230000003647 oxidation Effects 0.000 claims 2
• 238000007254 oxidation reaction Methods 0.000 claims 2
• 125000003544 oxime group Chemical group 0.000 claims 2
• AUONHKJOIZSQGR-UHFFFAOYSA-N oxophosphane Chemical compound P=O AUONHKJOIZSQGR-UHFFFAOYSA-N 0.000 claims 2
• 125000005740 oxycarbonyl group Chemical group [*:1]OC([*:2])=O 0.000 claims 2
• NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims 2
• 239000010452 phosphate Substances 0.000 claims 2
• UEZVMMHDMIWARA-UHFFFAOYSA-M phosphonate Chemical compound [O-]P(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-M 0.000 claims 2
• 229910000073 phosphorus hydride Inorganic materials 0.000 claims 2
• 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims 2
• 125000002577 pseudohalo group Chemical group 0.000 claims 2
• KXCAEQNNTZANTK-UHFFFAOYSA-N stannane Chemical group [SnH4] KXCAEQNNTZANTK-UHFFFAOYSA-N 0.000 claims 2
• 229940124530 sulfonamide Drugs 0.000 claims 2
• 150000003456 sulfonamides Chemical class 0.000 claims 2
• BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 claims 2
• 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims 2
• 150000003462 sulfoxides Chemical class 0.000 claims 2
• 125000005555 sulfoximide group Chemical group 0.000 claims 2
• 125000002813 thiocarbonyl group Chemical group *C(*)=S 0.000 claims 2
• 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 2
• 229910052747 lanthanoid Inorganic materials 0.000 claims 1
• 150000002602 lanthanoids Chemical class 0.000 claims 1
• 150000002739 metals Chemical class 0.000 claims 1
• 230000004048 modification Effects 0.000 claims 1
• 238000012986 modification Methods 0.000 claims 1
• 230000000737 periodic effect Effects 0.000 claims 1
• 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 11
• 229910052731 fluorine Inorganic materials 0.000 description 8
• 229910052760 oxygen Inorganic materials 0.000 description 8
• 229910052717 sulfur Inorganic materials 0.000 description 8
• 125000000217 alkyl group Chemical group 0.000 description 7
• 229910005965 SO 2 Inorganic materials 0.000 description 5
• 229910052794 bromium Inorganic materials 0.000 description 5
• 229910052801 chlorine Inorganic materials 0.000 description 5
• CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
• WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
• YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
• YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
• 125000003342 alkenyl group Chemical group 0.000 description 3
• 125000003545 alkoxy group Chemical group 0.000 description 3
• 125000003368 amide group Chemical group 0.000 description 3
• 125000004104 aryloxy group Chemical group 0.000 description 3
• 125000004149 thio group Chemical group *S* 0.000 description 3
• CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
• IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
• KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
• CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
• 239000011248 coating agent Substances 0.000 description 2
• 238000000576 coating method Methods 0.000 description 2
• 238000009833 condensation Methods 0.000 description 2
• 230000005494 condensation Effects 0.000 description 2
• 150000002148 esters Chemical class 0.000 description 2
• 125000005843 halogen group Chemical group 0.000 description 2
• 229910052740 iodine Inorganic materials 0.000 description 2
• 238000000816 matrix-assisted laser desorption--ionisation Methods 0.000 description 2
• 239000000203 mixture Substances 0.000 description 2
• 229940078552 o-xylene Drugs 0.000 description 2
• 230000003287 optical effect Effects 0.000 description 2
• 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
• 239000004926 polymethyl methacrylate Substances 0.000 description 2
• NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 2
• 239000002904 solvent Substances 0.000 description 2
• 238000004611 spectroscopical analysis Methods 0.000 description 2
• 239000000758 substrate Substances 0.000 description 2
• HAKJPFBYGDBEEA-UHFFFAOYSA-N triphenyl-(9-phenyl-6-triphenylsilylcarbazol-3-yl)silane Chemical compound C1=CC=CC=C1N1C2=CC=C([Si](C=3C=CC=CC=3)(C=3C=CC=CC=3)C=3C=CC=CC=3)C=C2C2=CC([Si](C=3C=CC=CC=3)(C=3C=CC=CC=3)C=3C=CC=CC=3)=CC=C21 HAKJPFBYGDBEEA-UHFFFAOYSA-N 0.000 description 2
• 238000007740 vapor deposition Methods 0.000 description 2
• 239000002253 acid Substances 0.000 description 1
• 150000001350 alkyl halides Chemical class 0.000 description 1
• 150000001502 aryl halides Chemical class 0.000 description 1
• 230000031709 bromination Effects 0.000 description 1
• 238000005893 bromination reaction Methods 0.000 description 1
• 229910052799 carbon Inorganic materials 0.000 description 1
• 125000004432 carbon atom Chemical group C* 0.000 description 1
• 238000006243 chemical reaction Methods 0.000 description 1
• 239000003795 chemical substances by application Substances 0.000 description 1
• 238000004440 column chromatography Methods 0.000 description 1
• 238000001816 cooling Methods 0.000 description 1
• 229940043397 deconex Drugs 0.000 description 1
• 239000003599 detergent Substances 0.000 description 1
• 239000003480 eluent Substances 0.000 description 1
• 125000004185 ester group Chemical group 0.000 description 1
• 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
• 230000001815 facial effect Effects 0.000 description 1
• 239000000706 filtrate Substances 0.000 description 1
• YUCFVHQCAFKDQG-UHFFFAOYSA-N fluoromethane Chemical compound F[CH] YUCFVHQCAFKDQG-UHFFFAOYSA-N 0.000 description 1
• 230000026030 halogenation Effects 0.000 description 1
• 238000005658 halogenation reaction Methods 0.000 description 1
• 150000004693 imidazolium salts Chemical class 0.000 description 1
• 230000026045 iodination Effects 0.000 description 1
• 238000006192 iodination reaction Methods 0.000 description 1
• 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
• 230000003472 neutralizing effect Effects 0.000 description 1
• 125000004433 nitrogen atom Chemical group N* 0.000 description 1
• 239000000843 powder Substances 0.000 description 1
• 238000000746 purification Methods 0.000 description 1
• 239000011541 reaction mixture Substances 0.000 description 1
• 238000010992 reflux Methods 0.000 description 1
• 229910052710 silicon Inorganic materials 0.000 description 1
• 229910001923 silver oxide Inorganic materials 0.000 description 1
• 239000000243 solution Substances 0.000 description 1
• 239000000725 suspension Substances 0.000 description 1
• 229910006400 μ-Cl Inorganic materials 0.000 description 1