|
US4131782A
(en)
|
1976-05-03 |
1978-12-26 |
Lasag Ag |
Method of and apparatus for machining large numbers of holes of precisely controlled size by coherent radiation
|
|
LU80792A1
(fr)
*
|
1979-01-15 |
1980-08-08 |
Ntre De Rech Metallurg Ct Voor |
Dispsitif et procede pour effectuer des perforations a la surface des cylindres de laminoirs
|
|
US4322260A
(en)
|
1979-04-04 |
1982-03-30 |
Monsanto Company |
Process for the continuous extrusion forming of a plastic double-walled foam-core conduit
|
|
US4377736A
(en)
*
|
1981-08-14 |
1983-03-22 |
General Electric Company |
Method and apparatus for removing material from a surface
|
|
US4429211A
(en)
*
|
1982-08-02 |
1984-01-31 |
United Technologies Corporation |
Laser pipe welding system for nonstationary pipe
|
|
LU84687A1
(fr)
*
|
1983-03-11 |
1984-11-14 |
Centre Rech Metallurgique |
Procede pour ameliorer l'etat de surface d'un cylindre
|
|
US4533813A
(en)
|
1983-09-06 |
1985-08-06 |
Illinois Tool Works Inc. |
Optical selective demetallization apparatus
|
|
US4652722A
(en)
*
|
1984-04-05 |
1987-03-24 |
Videojet Systems International, Inc. |
Laser marking apparatus
|
|
US4758705A
(en)
*
|
1985-08-06 |
1988-07-19 |
Eastman Kodak Company |
Method and apparatus for texturing a roller
|
|
DE3881906T2
(de)
*
|
1987-02-23 |
1994-01-20 |
Centre Rech Metallurgique |
Verfahren zur Oberflächenmarkierung von Walzwerkswalzen.
|
|
US4905025A
(en)
*
|
1988-06-20 |
1990-02-27 |
Dainippon Screen Mfg. Co., Ltd. |
Method of and apparatus for recording image on photosensitive material with a plurality of photobeams
|
|
JPH02125417A
(ja)
*
|
1988-07-20 |
1990-05-14 |
Matsushita Electric Ind Co Ltd |
電子ビーム露光方法
|
|
US4977458A
(en)
|
1988-11-16 |
1990-12-11 |
Eastman Kodak Company |
Apparatus for addressing a font to suppress Moire patterns occurring thereby and a method for use therein
|
|
JPH02308291A
(ja)
*
|
1989-05-24 |
1990-12-21 |
Onoda Cement Co Ltd |
複写機用熱定着ロール及びその製造方法
|
|
FR2657219B1
(fr)
|
1990-01-11 |
1994-02-18 |
Gim Industrie Sa |
Procede de fabrication de circuits imprimes souples, circuit imprime fabrique par ce procede, et dispositif pour la mise en óoeuvre de ce procede.
|
|
GB2246733A
(en)
|
1990-08-09 |
1992-02-12 |
Cmb Foodcan Plc |
Apparatus and method for monitoring laser material processing
|
|
US5147680A
(en)
|
1990-11-13 |
1992-09-15 |
Paul Slysh |
Laser assisted masking process
|
|
JP2810532B2
(ja)
|
1990-11-29 |
1998-10-15 |
キヤノン株式会社 |
堆積膜形成方法及び堆積膜形成装置
|
|
JPH04322891A
(ja)
*
|
1991-04-24 |
1992-11-12 |
Brother Ind Ltd |
レーザ加工装置
|
|
JP2918366B2
(ja)
*
|
1991-09-04 |
1999-07-12 |
大日本スクリーン製造株式会社 |
円筒内面走査型画像記録装置
|
|
EP0558781B1
(en)
*
|
1992-03-05 |
1998-08-05 |
Micronic Laser Systems Ab |
Method and apparatus for exposure of substrates
|
|
US5668588A
(en)
*
|
1993-04-01 |
1997-09-16 |
Dainippon Screen Mfg. Co., Ltd. |
Spiral scanning image recording apparatus and image recording method
|
|
IL106188A
(en)
*
|
1993-06-30 |
1996-10-31 |
Scitex Corp Ltd |
Internal drum indicator
|
|
JPH07101032A
(ja)
*
|
1993-09-30 |
1995-04-18 |
Sony Corp |
レーザ製版装置及び刷版
|
|
JPH0927447A
(ja)
*
|
1995-07-11 |
1997-01-28 |
Nikon Corp |
ステージ駆動制御装置
|
|
JPH0952186A
(ja)
*
|
1995-08-09 |
1997-02-25 |
Mitsubishi Heavy Ind Ltd |
レーザオービタル溶接装置
|
|
JP3220634B2
(ja)
|
1996-01-08 |
2001-10-22 |
松下電送システム株式会社 |
画像記録装置
|
|
US5868075A
(en)
|
1997-02-26 |
1999-02-09 |
Presstek, Inc. |
Method and apparatus for imaging a seamless print medium
|
|
JPH10256476A
(ja)
|
1997-03-12 |
1998-09-25 |
Canon Inc |
柱状デバイス及び露光装置及びデバイス製造方法
|
|
US5982795A
(en)
*
|
1997-12-22 |
1999-11-09 |
Cymer, Inc. |
Excimer laser having power supply with fine digital regulation
|
|
SE508228C2
(sv)
*
|
1997-05-07 |
1998-09-14 |
Inst Verkstadstek Forsk Ivf |
Anordning för detektering och beräkning av en laserstråles fokusläge, form och effektfördelning
|
|
JP2001524893A
(ja)
*
|
1997-05-14 |
2001-12-04 |
ルエシエル,ウルスラ |
データを転写するシステム、および、その用途
|
|
US6018383A
(en)
*
|
1997-08-20 |
2000-01-25 |
Anvik Corporation |
Very large area patterning system for flexible substrates
|
|
US6586702B2
(en)
|
1997-09-25 |
2003-07-01 |
Laser Electro Optic Application Technology Company |
High density pixel array and laser micro-milling method for fabricating array
|
|
JP3040372B2
(ja)
*
|
1998-03-10 |
2000-05-15 |
ファナック株式会社 |
加工ツール付ロボット及び加工方法
|
|
US6066830A
(en)
|
1998-06-04 |
2000-05-23 |
Astronics Corporation |
Laser etching of electroluminescent lamp electrode structures, and electroluminescent lamps produced thereby
|
|
DE69921739T2
(de)
*
|
1998-07-03 |
2005-11-03 |
Fuji Photo Film Co., Ltd., Minami-Ashigara |
Bildaufzeichnungsgerät
|
|
US6130405A
(en)
|
1998-09-10 |
2000-10-10 |
Chromalloy Gas Turbine Corporation |
Laser drilling holes in a cylindrical workpiece
|
|
US6424879B1
(en)
|
1999-04-13 |
2002-07-23 |
Applied Materials, Inc. |
System and method to correct for distortion caused by bulk heating in a substrate
|
|
AU4715300A
(en)
*
|
1999-05-03 |
2000-11-17 |
Etec Systems, Inc. |
Microfabricated template for multiple charged particle beam calibrations and shielded charged particle beam lithography
|
|
US6765945B2
(en)
*
|
1999-09-27 |
2004-07-20 |
Cymer, Inc. |
Injection seeded F2 laser with pre-injection filter
|
|
DE19923679C1
(de)
*
|
1999-05-22 |
2001-03-08 |
Krause Biagosch Gmbh |
Belichtungsvorrichtung
|
|
IL130340A0
(en)
*
|
1999-06-07 |
2000-06-01 |
Scitex Corp Ltd |
Multibeam multi-wavelength internal drum recording apparatus
|
|
DE19926479A1
(de)
*
|
1999-06-10 |
2000-12-14 |
Heidelberger Druckmasch Ag |
Innentrommelbelichter
|
|
US6180325B1
(en)
*
|
1999-06-23 |
2001-01-30 |
Creo Srl |
Method for masking and exposing photosensitive printing plates
|
|
US6441908B1
(en)
*
|
1999-08-06 |
2002-08-27 |
Metron Systems, Inc. |
Profiling of a component having reduced sensitivity to anomalous off-axis reflections
|
|
US6262825B1
(en)
*
|
1999-08-24 |
2001-07-17 |
Napp Systems, Inc. |
Apparatus and method for the enhanced imagewise exposure of a photosensitive material
|
|
JP3854761B2
(ja)
|
1999-09-17 |
2006-12-06 |
天龍工業株式会社 |
ドラム及びその製造方法並びにドラム端壁部材の形成方法
|
|
JP4493134B2
(ja)
|
1999-12-28 |
2010-06-30 |
旭化成イーマテリアルズ株式会社 |
シームレスシリンダー印刷版の製造方法、及び製造装置
|
|
US6985261B2
(en)
|
2000-03-08 |
2006-01-10 |
Esko-Graphics A/S |
Method and apparatus for seamless imaging of sleeves as used in flexography
|
|
JP2004510129A
(ja)
*
|
2000-05-17 |
2004-04-02 |
ザイゴ コーポレイション |
干渉装置および干渉方法
|
|
US6914919B2
(en)
*
|
2000-06-19 |
2005-07-05 |
Cymer, Inc. |
Six to ten KHz, or greater gas discharge laser system
|
|
JP3738178B2
(ja)
|
2000-09-21 |
2006-01-25 |
パナソニック コミュニケーションズ株式会社 |
画像記録方法
|
|
US6625181B1
(en)
*
|
2000-10-23 |
2003-09-23 |
U.C. Laser Ltd. |
Method and apparatus for multi-beam laser machining
|
|
TW556044B
(en)
|
2001-02-15 |
2003-10-01 |
Sipix Imaging Inc |
Process for roll-to-roll manufacture of a display by synchronized photolithographic exposure on a substrate web
|
|
JP2002351086A
(ja)
|
2001-03-22 |
2002-12-04 |
Fuji Photo Film Co Ltd |
露光装置
|
|
US6772854B2
(en)
|
2001-03-27 |
2004-08-10 |
Shure Incorporated |
Device and method for inserting acoustic dampers into earphones
|
|
JP2002311597A
(ja)
*
|
2001-04-13 |
2002-10-23 |
Mitsubishi Heavy Ind Ltd |
製版装置
|
|
US6847433B2
(en)
*
|
2001-06-01 |
2005-01-25 |
Agere Systems, Inc. |
Holder, system, and process for improving overlay in lithography
|
|
JP3714894B2
(ja)
|
2001-09-13 |
2005-11-09 |
大日本スクリーン製造株式会社 |
画像記録装置および画像記録装置を含む画像記録システム
|
|
US7564596B2
(en)
|
2001-10-12 |
2009-07-21 |
Dainippon Screen Mfg. Co., Ltd. |
Image recording apparatus
|
|
WO2003040830A2
(en)
*
|
2001-11-07 |
2003-05-15 |
Applied Materials, Inc. |
Optical spot grid array printer
|
|
SE0104131D0
(sv)
*
|
2001-12-10 |
2001-12-10 |
Micronic Laser Systems Ab |
Improved method and apparatus for image formation
|
|
JP4083427B2
(ja)
*
|
2001-12-27 |
2008-04-30 |
旭化成ケミカルズ株式会社 |
高精細グリッド線パターン作成プログラム
|
|
JP4064676B2
(ja)
|
2002-01-31 |
2008-03-19 |
株式会社 液晶先端技術開発センター |
露光装置及び露光方法
|
|
US6900826B2
(en)
*
|
2002-02-19 |
2005-05-31 |
Presstek, Inc. |
Multiple resolution helical imaging system and method
|
|
JP2003241395A
(ja)
|
2002-02-21 |
2003-08-27 |
Konica Corp |
画像露光装置
|
|
US6709962B2
(en)
|
2002-03-19 |
2004-03-23 |
N. Edward Berg |
Process for manufacturing printed circuit boards
|
|
DE10238420B4
(de)
*
|
2002-08-22 |
2005-04-07 |
Heidelberger Druckmaschinen Ag |
Vorrichtung zur Qualitätssteigerung einer Druckformbelichtung
|
|
JP2004098559A
(ja)
|
2002-09-11 |
2004-04-02 |
Fuji Photo Film Co Ltd |
画像記録方法と画像記録装置
|
|
JP2004175078A
(ja)
*
|
2002-11-29 |
2004-06-24 |
Fuji Photo Film Co Ltd |
画像露光方法および画像露光装置
|
|
CA2448193A1
(en)
*
|
2002-12-09 |
2004-06-09 |
Heidelberger Druckmaschinen Aktiengesellschaft |
Method and device for imaging a printing form
|
|
JP2004317545A
(ja)
|
2003-04-11 |
2004-11-11 |
Fuji Photo Film Co Ltd |
画像露光装置における光量設定方法
|
|
JP4343586B2
(ja)
|
2003-05-28 |
2009-10-14 |
パナソニック株式会社 |
画像記録装置
|
|
EP1486826A3
(en)
*
|
2003-06-10 |
2006-12-13 |
Fuji Photo Film Co., Ltd. |
Pixel position specifying method, method of correcting image offset, and image forming device
|
|
CN1780935B
(zh)
|
2003-07-16 |
2010-05-05 |
柯尼卡美能达控股株式会社 |
薄膜制造方法以及具有由此薄膜制造方法形成的薄膜的基材
|
|
JP2005055881A
(ja)
*
|
2003-07-22 |
2005-03-03 |
Fuji Photo Film Co Ltd |
描画方法および描画装置
|
|
JP4348476B2
(ja)
*
|
2003-07-25 |
2009-10-21 |
株式会社オーク製作所 |
パターン描画装置
|
|
JP4312535B2
(ja)
|
2003-08-06 |
2009-08-12 |
シャープ株式会社 |
パターン露光装置
|
|
JP4203649B2
(ja)
|
2003-09-05 |
2009-01-07 |
株式会社オーク製作所 |
多重露光描画方法及び多重露光描画装置
|
|
US20050104953A1
(en)
|
2003-09-16 |
2005-05-19 |
Fuji Photo Film Co., Ltd. |
Image exposure method and image exposure apparatus
|
|
US20050088664A1
(en)
*
|
2003-10-27 |
2005-04-28 |
Lars Stiblert |
Method for writing a pattern on a surface intended for use in exposure equipment and for measuring the physical properties of the surface
|
|
DE10353029B3
(de)
*
|
2003-11-13 |
2004-08-19 |
Heidelberger Druckmaschinen Ag |
Vorrichtung und Verfahren zur Messung der Längenänderung der Vorschubspindel in einem Belichter für Druckvorlagen
|
|
KR100550560B1
(ko)
|
2003-12-16 |
2006-02-10 |
전자부품연구원 |
패턴 제작 장치 및 그 방법
|
|
DE102004008074A1
(de)
*
|
2004-02-19 |
2005-09-15 |
Heidelberger Druckmaschinen Ag |
Verfahren und Testform zum Abgleichen der Belichtungsköpfe in einem Belichter für Druckvorlagen
|
|
US7561251B2
(en)
|
2004-03-29 |
2009-07-14 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
JP2005292214A
(ja)
|
2004-03-31 |
2005-10-20 |
Choshu Sangyo Kk |
円筒面露光装置とそのシステム
|
|
US6822192B1
(en)
|
2004-04-19 |
2004-11-23 |
Acme Services Company, Llp |
Laser engraving of ceramic articles
|
|
JP2004351938A
(ja)
*
|
2004-07-20 |
2004-12-16 |
Mitsubishi Heavy Ind Ltd |
製版装置
|
|
US7556334B2
(en)
*
|
2004-11-04 |
2009-07-07 |
Applied Materials, Inc. |
Methods and apparatus for aligning print heads
|
|
JP4501798B2
(ja)
|
2005-07-08 |
2010-07-14 |
王子製紙株式会社 |
インクジェット記録体
|
|
US20070182808A1
(en)
|
2005-10-26 |
2007-08-09 |
Lars Stiblert |
Writing apparatuses and methods
|
|
US7806731B2
(en)
|
2005-12-29 |
2010-10-05 |
Sandisk Corporation |
Rounded contact fingers on substrate/PCB for crack prevention
|