JP2009514012A5 - - Google Patents

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Publication number
JP2009514012A5
JP2009514012A5 JP2008537641A JP2008537641A JP2009514012A5 JP 2009514012 A5 JP2009514012 A5 JP 2009514012A5 JP 2008537641 A JP2008537641 A JP 2008537641A JP 2008537641 A JP2008537641 A JP 2008537641A JP 2009514012 A5 JP2009514012 A5 JP 2009514012A5
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workpiece
pattern
pixel
pixel grid
axis
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JP2008537641A
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JP4938784B2 (ja
JP2009514012A (ja
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Priority claimed from PCT/SE2006/001214 external-priority patent/WO2007050023A1/en
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JP2008537641A 2005-10-26 2006-10-26 書込み装置および方法 Active JP4938784B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US73000905P 2005-10-26 2005-10-26
US60/730,009 2005-10-26
US77691906P 2006-02-28 2006-02-28
US60/776,919 2006-02-28
PCT/SE2006/001214 WO2007050023A1 (en) 2005-10-26 2006-10-26 Writing apparatuses and methods

Publications (3)

Publication Number Publication Date
JP2009514012A JP2009514012A (ja) 2009-04-02
JP2009514012A5 true JP2009514012A5 (https=) 2009-11-12
JP4938784B2 JP4938784B2 (ja) 2012-05-23

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JP2008537641A Active JP4938784B2 (ja) 2005-10-26 2006-10-26 書込み装置および方法
JP2008537640A Active JP4938783B2 (ja) 2005-10-26 2006-10-26 書き込み装置及び書き込み方法

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JP2008537640A Active JP4938783B2 (ja) 2005-10-26 2006-10-26 書き込み装置及び書き込み方法

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US (3) US8102410B2 (https=)
EP (1) EP1987397A4 (https=)
JP (2) JP4938784B2 (https=)
KR (2) KR101407754B1 (https=)
WO (2) WO2007050022A2 (https=)

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US9715183B2 (en) 2012-02-23 2017-07-25 Asml Netherlands B.V. Device, lithographic apparatus, method for guiding radiation and device manufacturing method
TWI638241B (zh) 2012-03-26 2018-10-11 日商尼康股份有限公司 基板處理裝置、處理裝置及元件製造方法
NL2012052A (en) 2013-01-29 2014-08-04 Asml Netherlands Bv A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method.
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