JP2009514012A5 - - Google Patents

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JP2009514012A5
JP2009514012A5 JP2008537641A JP2008537641A JP2009514012A5 JP 2009514012 A5 JP2009514012 A5 JP 2009514012A5 JP 2008537641 A JP2008537641 A JP 2008537641A JP 2008537641 A JP2008537641 A JP 2008537641A JP 2009514012 A5 JP2009514012 A5 JP 2009514012A5
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workpiece
pattern
pixel
pixel grid
axis
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JP2008537641A
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JP4938784B2 (ja
JP2009514012A (ja
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Priority claimed from PCT/SE2006/001214 external-priority patent/WO2007050023A1/en
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JP2008537641A 2005-10-26 2006-10-26 書込み装置および方法 Active JP4938784B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US73000905P 2005-10-26 2005-10-26
US60/730,009 2005-10-26
US77691906P 2006-02-28 2006-02-28
US60/776,919 2006-02-28
PCT/SE2006/001214 WO2007050023A1 (en) 2005-10-26 2006-10-26 Writing apparatuses and methods

Publications (3)

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JP2009514012A JP2009514012A (ja) 2009-04-02
JP2009514012A5 true JP2009514012A5 (https=) 2009-11-12
JP4938784B2 JP4938784B2 (ja) 2012-05-23

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JP2008537641A Active JP4938784B2 (ja) 2005-10-26 2006-10-26 書込み装置および方法
JP2008537640A Active JP4938783B2 (ja) 2005-10-26 2006-10-26 書き込み装置及び書き込み方法

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JP2008537640A Active JP4938783B2 (ja) 2005-10-26 2006-10-26 書き込み装置及び書き込み方法

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US (3) US20070182808A1 (https=)
EP (1) EP1987397A4 (https=)
JP (2) JP4938784B2 (https=)
KR (2) KR101407754B1 (https=)
WO (2) WO2007050022A2 (https=)

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NL2009902A (en) 2011-12-27 2013-07-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
US9354502B2 (en) 2012-01-12 2016-05-31 Asml Netherlands B.V. Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program
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NL2010176A (en) 2012-02-23 2013-08-26 Asml Netherlands Bv Device, lithographic apparatus, method for guiding radiation and device manufacturing method.
CN106597816B (zh) 2012-03-26 2019-08-27 株式会社尼康 基板处理装置
NL2012052A (en) 2013-01-29 2014-08-04 Asml Netherlands Bv A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method.
KR102253995B1 (ko) 2013-03-12 2021-05-18 마이크로닉 아베 기계적으로 생성된 정렬 표식 방법 및 정렬 시스템
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