JP2009055028A - 貫通配線基板及びその製造方法 - Google Patents
貫通配線基板及びその製造方法 Download PDFInfo
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- JP2009055028A JP2009055028A JP2008213182A JP2008213182A JP2009055028A JP 2009055028 A JP2009055028 A JP 2009055028A JP 2008213182 A JP2008213182 A JP 2008213182A JP 2008213182 A JP2008213182 A JP 2008213182A JP 2009055028 A JP2009055028 A JP 2009055028A
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- wiring
- hole
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- wiring board
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49811—Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
- H01L23/49816—Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/481—Internal lead connections, e.g. via connections, feedthrough structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49827—Via connections through the substrates, e.g. pins going through the substrate, coaxial cables
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/11—Printed elements for providing electric connections to or between printed circuits
- H05K1/111—Pads for surface mounting, e.g. lay-out
- H05K1/112—Pads for surface mounting, e.g. lay-out directly combined with via connections
- H05K1/114—Pad being close to via, but not surrounding the via
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09209—Shape and layout details of conductors
- H05K2201/095—Conductive through-holes or vias
- H05K2201/09563—Metal filled via
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3457—Solder materials or compositions; Methods of application thereof
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/423—Plated through-holes or plated via connections characterised by electroplating method
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
- Y10T29/49165—Manufacturing circuit on or in base by forming conductive walled aperture in base
Abstract
【解決手段】基板に設けられた貫通孔に貫通配線を備える貫通配線基板において、基板部材7に設けられた貫通孔3と、基板部材7の貫通孔3を除く両面および貫通孔3の内周面に形成された絶縁層9と、少なくとも前記貫通配線基板の一方の面において、基板部材7の貫通孔3を除く部分の絶縁層9上に形成される絶縁樹脂層14と、貫通孔3内周面の絶縁層9上に設けられたバリアメタルシード層12と、貫通孔3に充填されると共に、貫通孔3から所定距離離れた位置まで前記貫通配線基板の一方の面上の絶縁樹脂層14上に伸延して形成される貫通伸延配線13と、貫通孔3の位置を除く貫通伸延配線13上に形成された導電性を有するバンプ15と、を具備している。
【選択図】図7
Description
3…貫通孔
5…貫通電極
7…基板部材
9…絶縁層
10…貫通配線基板
11…貫通配線
12…シード層
13…貫通伸延配線
14…樹脂層
15…バンプ
16…再配線
17…貫通配線基板
21…応力緩和層
31…コアポスト
Claims (3)
- 基板に設けられた貫通孔に貫通配線を備える貫通配線基板において、
基板部材に設けられた貫通孔と、
前記基板部材の前記貫通孔を除く両面および前記貫通孔の内周面に形成された絶縁層と、
少なくとも前記貫通配線基板の一方の面において、前記基板部材の前記貫通孔を除く部分の前記絶縁層上に形成される絶縁樹脂層と、
前記貫通孔内周面の前記絶縁層上に設けられたバリアメタルシード層と、
前記貫通孔に充填されると共に、前記貫通孔から所定距離離れた位置まで前記貫通配線基板の一方の面上の前記絶縁樹脂層上に伸延して形成される貫通伸延配線と、
前記貫通孔の位置を除く前記貫通伸延配線上に形成された導電性を有するバンプと、を具備していることを特徴とする貫通配線基板。 - 前記絶縁樹脂層はポリイミドであることを特徴とする請求項1記載の貫通配線基板。
- 基板に設けられた貫通孔に貫通配線を備える貫通配線基板の製造方法において、
基板部材の両面に絶縁層を形成する工程と、
前記基板部材下面の絶縁層の窓開けを行い、前記基板をエッチングし前記基板部材に貫通孔を形成する工程と、
前記貫通孔の内周面に絶縁層を形成する工程と、
前記貫通孔における前記基板部材の上面側の絶縁層の窓開けを行う工程と、
少なくとも前記貫通配線基板の一方の面に、前記貫通配線基板面上の前記貫通孔を除く部分の前記絶縁層上に絶縁樹脂層を形成する工程と、
前記貫通孔内周面の前記絶縁層上および前記絶縁樹脂層上にバリアメタルシード層を形成する工程と、
前記貫通孔を充填すると共に、前記貫通孔から所定距離離れた位置まで前記貫通配線基板の一方の面上の前記絶縁樹脂層上に伸延した貫通伸延配線を形成する工程と、
前記貫通孔の位置を除く前記貫通伸延配線上に導電性を有するバンプを形成する工程とを備えることを特徴とする貫通配線基板の製造方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008213182A JP2009055028A (ja) | 2004-03-26 | 2008-08-21 | 貫通配線基板及びその製造方法 |
Applications Claiming Priority (2)
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JP2004092667 | 2004-03-26 | ||
JP2008213182A JP2009055028A (ja) | 2004-03-26 | 2008-08-21 | 貫通配線基板及びその製造方法 |
Related Parent Applications (1)
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JP2005518737A Division JPWO2005093827A1 (ja) | 2004-03-26 | 2004-10-05 | 貫通配線基板及びその製造方法 |
Publications (1)
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JP2009055028A true JP2009055028A (ja) | 2009-03-12 |
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Family Applications (3)
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JP2005518737A Withdrawn JPWO2005093827A1 (ja) | 2004-03-26 | 2004-10-05 | 貫通配線基板及びその製造方法 |
JP2008213182A Pending JP2009055028A (ja) | 2004-03-26 | 2008-08-21 | 貫通配線基板及びその製造方法 |
JP2008213177A Pending JP2009044161A (ja) | 2004-03-26 | 2008-08-21 | 貫通配線基板の製造方法 |
Family Applications Before (1)
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JP2005518737A Withdrawn JPWO2005093827A1 (ja) | 2004-03-26 | 2004-10-05 | 貫通配線基板及びその製造方法 |
Family Applications After (1)
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JP2008213177A Pending JP2009044161A (ja) | 2004-03-26 | 2008-08-21 | 貫通配線基板の製造方法 |
Country Status (4)
Country | Link |
---|---|
US (2) | US20070176294A1 (ja) |
EP (1) | EP1739739A4 (ja) |
JP (3) | JPWO2005093827A1 (ja) |
WO (1) | WO2005093827A1 (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011023719A (ja) * | 2009-07-13 | 2011-02-03 | Internatl Business Mach Corp <Ibm> | 鉛フリーc4相互接続の信頼性を改善するための構造体及び方法 |
WO2012005352A1 (ja) * | 2010-07-09 | 2012-01-12 | ローム株式会社 | 半導体装置 |
JP2013068511A (ja) * | 2011-09-22 | 2013-04-18 | Denso Corp | 角度検出センサおよびその製造方法 |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4564342B2 (ja) * | 2004-11-24 | 2010-10-20 | 大日本印刷株式会社 | 多層配線基板およびその製造方法 |
JP4795677B2 (ja) * | 2004-12-02 | 2011-10-19 | ルネサスエレクトロニクス株式会社 | 半導体装置およびそれを用いた半導体モジュール、ならびに半導体装置の製造方法 |
JP5069410B2 (ja) * | 2005-11-25 | 2012-11-07 | パナソニック株式会社 | センサエレメント |
JP2007180529A (ja) * | 2005-12-02 | 2007-07-12 | Nec Electronics Corp | 半導体装置およびその製造方法 |
US20070126085A1 (en) | 2005-12-02 | 2007-06-07 | Nec Electronics Corporation | Semiconductor device and method of manufacturing the same |
JP2010040862A (ja) * | 2008-08-06 | 2010-02-18 | Fujikura Ltd | 半導体装置 |
KR101002680B1 (ko) * | 2008-10-21 | 2010-12-21 | 삼성전기주식회사 | 반도체 패키지 및 그 제조 방법 |
JP5323637B2 (ja) * | 2009-09-30 | 2013-10-23 | 京セラ株式会社 | 弾性波装置及びその製造方法 |
JP5730654B2 (ja) * | 2010-06-24 | 2015-06-10 | 新光電気工業株式会社 | 配線基板及びその製造方法 |
SE538058C2 (sv) | 2012-03-30 | 2016-02-23 | Silex Microsystems Ab | Metod att tillhandahålla ett viahål och en routing-struktur |
US9431370B2 (en) * | 2013-12-19 | 2016-08-30 | Broadcom Corporation | Compliant dielectric layer for semiconductor device |
JP6551301B2 (ja) * | 2016-05-19 | 2019-07-31 | 株式会社デンソー | 電子装置、および電子装置の製造方法 |
US10420255B2 (en) * | 2016-09-14 | 2019-09-17 | Jtekt Corporation | Electronic control device |
WO2019077866A1 (ja) * | 2017-10-19 | 2019-04-25 | 富士電機株式会社 | 半導体装置及び半導体装置の製造方法 |
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2004
- 2004-10-05 WO PCT/JP2004/014637 patent/WO2005093827A1/ja active Application Filing
- 2004-10-05 EP EP04792048A patent/EP1739739A4/en not_active Withdrawn
- 2004-10-05 JP JP2005518737A patent/JPWO2005093827A1/ja not_active Withdrawn
- 2004-10-05 US US10/594,040 patent/US20070176294A1/en not_active Abandoned
-
2008
- 2008-08-21 JP JP2008213182A patent/JP2009055028A/ja active Pending
- 2008-08-21 JP JP2008213177A patent/JP2009044161A/ja active Pending
-
2011
- 2011-08-12 US US13/208,373 patent/US20110290545A1/en not_active Abandoned
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JPH0529537A (ja) * | 1991-07-19 | 1993-02-05 | Fujitsu Ltd | 半導体モジユール構造 |
JP2001015633A (ja) * | 1999-06-29 | 2001-01-19 | Hitachi Ltd | 半導体装置 |
JP2002016212A (ja) * | 2000-06-27 | 2002-01-18 | Seiko Epson Corp | 半導体装置及びその製造方法 |
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011023719A (ja) * | 2009-07-13 | 2011-02-03 | Internatl Business Mach Corp <Ibm> | 鉛フリーc4相互接続の信頼性を改善するための構造体及び方法 |
WO2012005352A1 (ja) * | 2010-07-09 | 2012-01-12 | ローム株式会社 | 半導体装置 |
JP2012019121A (ja) * | 2010-07-09 | 2012-01-26 | Rohm Co Ltd | 半導体装置 |
US9070673B2 (en) | 2010-07-09 | 2015-06-30 | Rohm Co., Ltd. | Semiconductor device |
US9508672B2 (en) | 2010-07-09 | 2016-11-29 | Rohm Co., Ltd. | Semiconductor device |
US10068823B2 (en) | 2010-07-09 | 2018-09-04 | Rohm Co., Ltd. | Semiconductor device |
JP2013068511A (ja) * | 2011-09-22 | 2013-04-18 | Denso Corp | 角度検出センサおよびその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
EP1739739A1 (en) | 2007-01-03 |
US20110290545A1 (en) | 2011-12-01 |
JP2009044161A (ja) | 2009-02-26 |
EP1739739A4 (en) | 2010-02-24 |
WO2005093827A1 (ja) | 2005-10-06 |
US20070176294A1 (en) | 2007-08-02 |
JPWO2005093827A1 (ja) | 2008-02-14 |
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