JP2008239995A5 - - Google Patents
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- Publication number
- JP2008239995A5 JP2008239995A5 JP2008130940A JP2008130940A JP2008239995A5 JP 2008239995 A5 JP2008239995 A5 JP 2008239995A5 JP 2008130940 A JP2008130940 A JP 2008130940A JP 2008130940 A JP2008130940 A JP 2008130940A JP 2008239995 A5 JP2008239995 A5 JP 2008239995A5
- Authority
- JP
- Japan
- Prior art keywords
- fluorine
- alkyl
- group
- carbon atoms
- containing alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052731 fluorine Inorganic materials 0.000 claims 87
- 239000011737 fluorine Substances 0.000 claims 87
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 86
- 125000000217 alkyl group Chemical group 0.000 claims 72
- 125000004432 carbon atom Chemical group C* 0.000 claims 27
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 12
- 229920000089 Cyclic olefin copolymer Polymers 0.000 claims 12
- 229910052801 chlorine Inorganic materials 0.000 claims 12
- 239000000460 chlorine Substances 0.000 claims 12
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims 11
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims 11
- 229910052794 bromium Inorganic materials 0.000 claims 11
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims 9
- 229910052740 iodine Inorganic materials 0.000 claims 9
- 239000011630 iodine Substances 0.000 claims 9
- -1 C2-C20 alkylcarbonyl Chemical group 0.000 claims 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 8
- 239000000178 monomer Substances 0.000 claims 8
- 229910052710 silicon Inorganic materials 0.000 claims 8
- 239000010703 silicon Substances 0.000 claims 8
- 229910052739 hydrogen Inorganic materials 0.000 claims 6
- 239000001257 hydrogen Substances 0.000 claims 6
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims 6
- 125000003860 C1-C20 alkoxy group Chemical group 0.000 claims 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 5
- 229910052799 carbon Inorganic materials 0.000 claims 5
- 125000004093 cyano group Chemical group *C#N 0.000 claims 5
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims 4
- ORTFAQDWJHRMNX-UHFFFAOYSA-N hydroxidooxidocarbon(.) Chemical group O[C]=O ORTFAQDWJHRMNX-UHFFFAOYSA-N 0.000 claims 4
- 125000004356 hydroxy functional group Chemical group O* 0.000 claims 4
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 claims 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 3
- 125000003545 alkoxy group Chemical group 0.000 claims 3
- 125000001153 fluoro group Chemical group F* 0.000 claims 3
- 239000002994 raw material Substances 0.000 claims 3
- 125000001033 ether group Chemical group 0.000 claims 2
- 238000005227 gel permeation chromatography Methods 0.000 claims 2
- 150000002431 hydrogen Chemical class 0.000 claims 2
- 229920000642 polymer Polymers 0.000 claims 2
- 238000007152 ring opening metathesis polymerisation reaction Methods 0.000 claims 2
- 125000006755 (C2-C20) alkyl group Chemical group 0.000 claims 1
- 239000004793 Polystyrene Substances 0.000 claims 1
- 238000010521 absorption reaction Methods 0.000 claims 1
- 238000007792 addition Methods 0.000 claims 1
- 150000001336 alkenes Chemical class 0.000 claims 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 1
- 125000004122 cyclic group Chemical group 0.000 claims 1
- 125000004185 ester group Chemical group 0.000 claims 1
- 238000004770 highest occupied molecular orbital Methods 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 238000001459 lithography Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 238000004776 molecular orbital Methods 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 claims 1
- 229920002223 polystyrene Polymers 0.000 claims 1
- 239000010409 thin film Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008130940A JP2008239995A (ja) | 2001-04-27 | 2008-05-19 | フッ素含有環状オレフィンポリマー、その環状オレフィン系単量体および該ポリマーの製造方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001132434 | 2001-04-27 | ||
| JP2002064653 | 2002-03-11 | ||
| JP2008130940A JP2008239995A (ja) | 2001-04-27 | 2008-05-19 | フッ素含有環状オレフィンポリマー、その環状オレフィン系単量体および該ポリマーの製造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002585513A Division JP4236935B2 (ja) | 2001-04-27 | 2002-04-25 | フッ素含有環状オレフィンポリマー、その環状オレフィン系単量体、ポリマーの製造方法およびその用途 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008239995A JP2008239995A (ja) | 2008-10-09 |
| JP2008239995A5 true JP2008239995A5 (https=) | 2009-03-05 |
Family
ID=26614474
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002585513A Expired - Fee Related JP4236935B2 (ja) | 2001-04-27 | 2002-04-25 | フッ素含有環状オレフィンポリマー、その環状オレフィン系単量体、ポリマーの製造方法およびその用途 |
| JP2008130940A Pending JP2008239995A (ja) | 2001-04-27 | 2008-05-19 | フッ素含有環状オレフィンポリマー、その環状オレフィン系単量体および該ポリマーの製造方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002585513A Expired - Fee Related JP4236935B2 (ja) | 2001-04-27 | 2002-04-25 | フッ素含有環状オレフィンポリマー、その環状オレフィン系単量体、ポリマーの製造方法およびその用途 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US6875819B2 (https=) |
| EP (1) | EP1298156B1 (https=) |
| JP (2) | JP4236935B2 (https=) |
| KR (1) | KR100583297B1 (https=) |
| CN (1) | CN1233685C (https=) |
| DE (1) | DE60205555T2 (https=) |
| TW (1) | TW575596B (https=) |
| WO (1) | WO2002088216A1 (https=) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE60205555T2 (de) * | 2001-04-27 | 2006-03-30 | Mitsui Chemicals, Inc. | Fluorinierte cycloolefinpolymere und verfahren zu deren herstellung, sowie deren verwendung |
| US7316869B2 (en) * | 2003-08-26 | 2008-01-08 | Intel Corporation | Mounting a pellicle to a frame |
| US7264853B2 (en) * | 2003-08-26 | 2007-09-04 | Intel Corporation | Attaching a pellicle frame to a reticle |
| EP1680458A2 (en) * | 2003-09-25 | 2006-07-19 | Ciba SC Holding AG | Romp with fluorinated groups |
| US7314667B2 (en) * | 2004-03-12 | 2008-01-01 | Intel Corporation | Process to optimize properties of polymer pellicles and resist for lithography applications |
| US20050202252A1 (en) * | 2004-03-12 | 2005-09-15 | Alexander Tregub | Use of alternative polymer materials for "soft" polymer pellicles |
| US20060008730A1 (en) * | 2004-07-09 | 2006-01-12 | Puy Michael V D | Monomers for photoresists bearing acid-labile groups of reduced optical density |
| US20060008731A1 (en) * | 2004-07-09 | 2006-01-12 | Michael Van Der Puy | Novel photoresist monomers and polymers |
| US20100221495A1 (en) * | 2005-09-12 | 2010-09-02 | Tadahiro Ohmi | Method of Manufacturing a Transparent Member and Plastic Member |
| EP1827674B1 (en) | 2005-11-08 | 2012-09-12 | LG Chem, Ltd. | Colloidal photonic crystals using colloidal nanoparticles and method for preparation thereof |
| JP4866086B2 (ja) * | 2005-12-27 | 2012-02-01 | 三井化学株式会社 | 組み合わせレンズ、色収差の補正方法 |
| CN102123837B (zh) | 2008-06-20 | 2014-07-09 | 3M创新有限公司 | 聚合物模具和由其制成的制品 |
| EP2294110B1 (en) * | 2008-06-20 | 2016-07-27 | 3M Innovative Properties Company | Molded microstructured articles and method of making same |
| JP2010113315A (ja) * | 2008-10-10 | 2010-05-20 | Jsr Corp | フォトマスク |
| KR101336532B1 (ko) * | 2009-02-27 | 2013-12-03 | 미쓰이 가가쿠 가부시키가이샤 | 전사체 및 그의 제조방법 |
| JP2010210974A (ja) * | 2009-03-11 | 2010-09-24 | Shin-Etsu Chemical Co Ltd | ペリクルの製造方法及びペリクル |
| CN102482364B (zh) * | 2009-08-26 | 2013-08-28 | 三井化学株式会社 | 含氟环状烯烃聚合物组合物、由该组合物获得的转印体及其制造方法 |
| JP5366740B2 (ja) * | 2009-09-28 | 2013-12-11 | 富士フイルム株式会社 | 含エーテル環状構造含有ポリマー、光学材料用樹脂組成物、並びにその成形体、光学部品及びレンズ |
| EP2555052B1 (en) * | 2010-04-02 | 2024-10-16 | Shin-Etsu Chemical Co., Ltd. | Photomask unit and method of manufacturing same |
| US8795390B2 (en) * | 2010-11-11 | 2014-08-05 | Stahl International B.V. | Non metal tanning |
| CN103201396B (zh) * | 2010-11-11 | 2014-12-03 | 克拉里安特国际有限公司 | 非金属鞣制 |
| BR112013011752B1 (pt) * | 2010-11-12 | 2020-03-03 | Stahl International B.V. | Processo para a produção de couro, peles ou peliças curtidos, por meio de curtimento não metálico, uso da composição de curtimento (t1) e couro, peles ou peliças curtidos e seu uso |
| KR101699635B1 (ko) * | 2012-08-02 | 2017-01-24 | 미쓰이 가가쿠 가부시키가이샤 | 펠리클 |
| CN105164559B (zh) * | 2013-04-03 | 2018-03-23 | 三井化学株式会社 | 光学膜 |
| JP2016105131A (ja) * | 2014-12-01 | 2016-06-09 | ウシオ電機株式会社 | 表面が改質された基板の製造方法、パターン形成体、基板表面の改質方法、および光照射装置 |
| JP6593351B2 (ja) * | 2015-02-09 | 2019-10-23 | Ａｇｃ株式会社 | 含フッ素重合体の製造方法 |
| EP3257885A4 (en) * | 2015-02-09 | 2018-05-09 | Asahi Glass Company, Limited | Method for producing fluorine-containing polymer |
| BR112017020280B1 (pt) * | 2015-03-26 | 2022-11-08 | Mitsui Chemicals, Inc | Composição de coxim de trilho para estrada de ferro, coxim de trilho para estrada de ferro, processo para sua produção e produto reticulado e de espuma compreendendo tal composição |
| JP6840844B2 (ja) | 2017-05-31 | 2021-03-10 | 三井化学株式会社 | 下層膜形成用材料、レジスト下層膜、レジスト下層膜の製造方法および積層体 |
| CN107216444B (zh) * | 2017-07-20 | 2019-06-21 | 中国科学院长春应用化学研究所 | 一种透明、高耐热环烯烃共聚物及其制备方法 |
| JP7253340B2 (ja) * | 2018-09-04 | 2023-04-06 | アークレイ株式会社 | 光学素子及び光学素子の製造方法 |
| CN121343135A (zh) * | 2025-12-17 | 2026-01-16 | 拓烯科技(衢州)有限公司 | 一种环烯烃聚合物、有色环烯烃聚合物薄膜及其制备方法与应用 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63238111A (ja) | 1987-03-27 | 1988-10-04 | Asahi Glass Co Ltd | 環状構造を有する含フツ素重合体の製造方法 |
| JP2526641B2 (ja) | 1987-08-14 | 1996-08-21 | 旭硝子株式会社 | 新規含フッ素環状重合体 |
| JP2581182B2 (ja) | 1987-08-14 | 1997-02-12 | 旭硝子株式会社 | 環化重合方法 |
| JPH024722A (ja) * | 1988-06-23 | 1990-01-09 | Mitsui Petrochem Ind Ltd | 弗素含有環状オレフィン化合物及びその製法 |
| JP2951337B2 (ja) | 1989-04-17 | 1999-09-20 | 古河電気工業株式会社 | ペリクル |
| JP2952962B2 (ja) | 1989-05-31 | 1999-09-27 | 旭硝子株式会社 | 汚染防止保護器具 |
| JPH04104155A (ja) | 1990-08-23 | 1992-04-06 | Shin Etsu Chem Co Ltd | リソグラフィー用ペリクル |
| JPH06199997A (ja) * | 1993-01-06 | 1994-07-19 | Japan Synthetic Rubber Co Ltd | 重合体の製造法 |
| JPH06206985A (ja) * | 1993-01-08 | 1994-07-26 | Japan Synthetic Rubber Co Ltd | （水添）ノルボルネン系重合体 |
| JPH06256477A (ja) * | 1993-03-02 | 1994-09-13 | Japan Synthetic Rubber Co Ltd | 重合体の製造法 |
| US5854299A (en) * | 1993-09-10 | 1998-12-29 | Ciba Specialty Chemicals Corporation | Process for the polymerization of cyclic olefins and polymerizable composition |
| US5677405A (en) * | 1995-05-24 | 1997-10-14 | The B.F. Goodrich Company | Homopolymers and copolymers of cationically polymerizable monomers and method of their preparation |
| WO1998020394A1 (en) * | 1996-11-04 | 1998-05-14 | The B.F. Goodrich Company | Photodefinable dielectric compositions |
| EP0907106A4 (en) | 1997-02-13 | 2000-04-05 | Mitsui Chemicals Inc | FILM MEMBRANE FOR ULTRAVIOLET RAYS AND FILM |
| US6593058B1 (en) * | 1998-09-23 | 2003-07-15 | E. I. Du Pont De Nemours And Company | Photoresists, polymers and processes for microlithography |
| WO2000067072A1 (en) | 1999-05-04 | 2000-11-09 | E.I. Du Pont De Nemours And Company | Fluorinated polymers, photoresists and processes for microlithography |
| JP3901401B2 (ja) * | 1999-07-13 | 2007-04-04 | 三井化学株式会社 | ポジ型フォトレジスト組成物およびパターン形成方法 |
| JP2001226467A (ja) * | 2000-02-17 | 2001-08-21 | Hitachi Chem Co Ltd | フッ素含有ノルボルネン系重合体およびその製造方法 |
| JP2001328964A (ja) * | 2000-05-19 | 2001-11-27 | Tokyo Ohka Kogyo Co Ltd | 新規多環式不飽和炭化水素誘導体及びその製造方法 |
| DE60205555T2 (de) * | 2001-04-27 | 2006-03-30 | Mitsui Chemicals, Inc. | Fluorinierte cycloolefinpolymere und verfahren zu deren herstellung, sowie deren verwendung |
-
2002
- 2002-04-25 DE DE60205555T patent/DE60205555T2/de not_active Expired - Lifetime
- 2002-04-25 CN CNB028014243A patent/CN1233685C/zh not_active Expired - Lifetime
- 2002-04-25 KR KR1020027017694A patent/KR100583297B1/ko not_active Expired - Lifetime
- 2002-04-25 EP EP02722782A patent/EP1298156B1/en not_active Expired - Lifetime
- 2002-04-25 WO PCT/JP2002/004140 patent/WO2002088216A1/ja not_active Ceased
- 2002-04-25 US US10/312,506 patent/US6875819B2/en not_active Expired - Lifetime
- 2002-04-25 JP JP2002585513A patent/JP4236935B2/ja not_active Expired - Fee Related
- 2002-04-26 TW TW091108668A patent/TW575596B/zh not_active IP Right Cessation
-
2008
- 2008-05-19 JP JP2008130940A patent/JP2008239995A/ja active Pending
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