CN1233685C - 含氟环烯聚合物,其环烯单体,聚合物制备方法及聚合物的应用 - Google Patents

含氟环烯聚合物,其环烯单体,聚合物制备方法及聚合物的应用 Download PDF

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Publication number
CN1233685C
CN1233685C CNB028014243A CN02801424A CN1233685C CN 1233685 C CN1233685 C CN 1233685C CN B028014243 A CNB028014243 A CN B028014243A CN 02801424 A CN02801424 A CN 02801424A CN 1233685 C CN1233685 C CN 1233685C
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fluorine
alkyl
carbon atom
carbon atoms
group
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Expired - Lifetime
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Chinese (zh)
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CN1462286A (zh
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须永忠弘
河野宽
河村宪守
落合贵志
重松茂人
中野隆志
森田智行
井尾博文
山本喜博
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Mitsui Chemicals Inc
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Mitsui Chemicals Inc
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
    • C08G61/04—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms
    • C08G61/06—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms prepared by ring-opening of carbocyclic compounds
    • C08G61/08—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms prepared by ring-opening of carbocyclic compounds of carbocyclic compounds containing one or more carbon-to-carbon double bonds in the ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
    • C08G61/04—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms
    • C08G61/06—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms prepared by ring-opening of carbocyclic compounds

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Materials For Photolithography (AREA)
CNB028014243A 2001-04-27 2002-04-25 含氟环烯聚合物,其环烯单体,聚合物制备方法及聚合物的应用 Expired - Lifetime CN1233685C (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP132434/2001 2001-04-27
JP132434/01 2001-04-27
JP2001132434 2001-04-27
JP2002064653 2002-03-11
JP64653/02 2002-03-11
JP64653/2002 2002-03-11

Publications (2)

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CN1462286A CN1462286A (zh) 2003-12-17
CN1233685C true CN1233685C (zh) 2005-12-28

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US (1) US6875819B2 (https=)
EP (1) EP1298156B1 (https=)
JP (2) JP4236935B2 (https=)
KR (1) KR100583297B1 (https=)
CN (1) CN1233685C (https=)
DE (1) DE60205555T2 (https=)
TW (1) TW575596B (https=)
WO (1) WO2002088216A1 (https=)

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CN103189527A (zh) * 2010-11-12 2013-07-03 科莱恩金融(Bvi)有限公司 非金属鞣制
CN103201396A (zh) * 2010-11-11 2013-07-10 科莱恩金融(Bvi)有限公司 非金属鞣制
CN103210096A (zh) * 2010-11-11 2013-07-17 科莱恩金融(Bvi)有限公司 非金属鞣制

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US7314667B2 (en) * 2004-03-12 2008-01-01 Intel Corporation Process to optimize properties of polymer pellicles and resist for lithography applications
US20050202252A1 (en) * 2004-03-12 2005-09-15 Alexander Tregub Use of alternative polymer materials for "soft" polymer pellicles
US20060008730A1 (en) * 2004-07-09 2006-01-12 Puy Michael V D Monomers for photoresists bearing acid-labile groups of reduced optical density
US20060008731A1 (en) * 2004-07-09 2006-01-12 Michael Van Der Puy Novel photoresist monomers and polymers
US20100221495A1 (en) * 2005-09-12 2010-09-02 Tadahiro Ohmi Method of Manufacturing a Transparent Member and Plastic Member
EP1827674B1 (en) 2005-11-08 2012-09-12 LG Chem, Ltd. Colloidal photonic crystals using colloidal nanoparticles and method for preparation thereof
JP4866086B2 (ja) * 2005-12-27 2012-02-01 三井化学株式会社 組み合わせレンズ、色収差の補正方法
CN102123837B (zh) 2008-06-20 2014-07-09 3M创新有限公司 聚合物模具和由其制成的制品
EP2294110B1 (en) * 2008-06-20 2016-07-27 3M Innovative Properties Company Molded microstructured articles and method of making same
JP2010113315A (ja) * 2008-10-10 2010-05-20 Jsr Corp フォトマスク
KR101336532B1 (ko) * 2009-02-27 2013-12-03 미쓰이 가가쿠 가부시키가이샤 전사체 및 그의 제조방법
JP2010210974A (ja) * 2009-03-11 2010-09-24 Shin-Etsu Chemical Co Ltd ペリクルの製造方法及びペリクル
CN102482364B (zh) * 2009-08-26 2013-08-28 三井化学株式会社 含氟环状烯烃聚合物组合物、由该组合物获得的转印体及其制造方法
JP5366740B2 (ja) * 2009-09-28 2013-12-11 富士フイルム株式会社 含エーテル環状構造含有ポリマー、光学材料用樹脂組成物、並びにその成形体、光学部品及びレンズ
EP2555052B1 (en) * 2010-04-02 2024-10-16 Shin-Etsu Chemical Co., Ltd. Photomask unit and method of manufacturing same
KR101699635B1 (ko) * 2012-08-02 2017-01-24 미쓰이 가가쿠 가부시키가이샤 펠리클
CN105164559B (zh) * 2013-04-03 2018-03-23 三井化学株式会社 光学膜
JP2016105131A (ja) * 2014-12-01 2016-06-09 ウシオ電機株式会社 表面が改質された基板の製造方法、パターン形成体、基板表面の改質方法、および光照射装置
JP6593351B2 (ja) * 2015-02-09 2019-10-23 Ａｇｃ株式会社 含フッ素重合体の製造方法
EP3257885A4 (en) * 2015-02-09 2018-05-09 Asahi Glass Company, Limited Method for producing fluorine-containing polymer
BR112017020280B1 (pt) * 2015-03-26 2022-11-08 Mitsui Chemicals, Inc Composição de coxim de trilho para estrada de ferro, coxim de trilho para estrada de ferro, processo para sua produção e produto reticulado e de espuma compreendendo tal composição
JP6840844B2 (ja) 2017-05-31 2021-03-10 三井化学株式会社 下層膜形成用材料、レジスト下層膜、レジスト下層膜の製造方法および積層体
CN107216444B (zh) * 2017-07-20 2019-06-21 中国科学院长春应用化学研究所 一种透明、高耐热环烯烃共聚物及其制备方法
JP7253340B2 (ja) * 2018-09-04 2023-04-06 アークレイ株式会社 光学素子及び光学素子の製造方法
CN121343135A (zh) * 2025-12-17 2026-01-16 拓烯科技(衢州)有限公司 一种环烯烃聚合物、有色环烯烃聚合物薄膜及其制备方法与应用

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US6593058B1 (en) * 1998-09-23 2003-07-15 E. I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography
WO2000067072A1 (en) 1999-05-04 2000-11-09 E.I. Du Pont De Nemours And Company Fluorinated polymers, photoresists and processes for microlithography
JP3901401B2 (ja) * 1999-07-13 2007-04-04 三井化学株式会社 ポジ型フォトレジスト組成物およびパターン形成方法
JP2001226467A (ja) * 2000-02-17 2001-08-21 Hitachi Chem Co Ltd フッ素含有ノルボルネン系重合体およびその製造方法
JP2001328964A (ja) * 2000-05-19 2001-11-27 Tokyo Ohka Kogyo Co Ltd 新規多環式不飽和炭化水素誘導体及びその製造方法
DE60205555T2 (de) * 2001-04-27 2006-03-30 Mitsui Chemicals, Inc. Fluorinierte cycloolefinpolymere und verfahren zu deren herstellung, sowie deren verwendung

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103201396A (zh) * 2010-11-11 2013-07-10 科莱恩金融(Bvi)有限公司 非金属鞣制
CN103210096A (zh) * 2010-11-11 2013-07-17 科莱恩金融(Bvi)有限公司 非金属鞣制
CN103201396B (zh) * 2010-11-11 2014-12-03 克拉里安特国际有限公司 非金属鞣制
CN103210096B (zh) * 2010-11-11 2014-12-17 克拉里安特国际有限公司 非金属鞣制
CN103189527A (zh) * 2010-11-12 2013-07-03 科莱恩金融(Bvi)有限公司 非金属鞣制
CN103189527B (zh) * 2010-11-12 2014-12-17 克拉里安特国际有限公司 非金属鞣制

Also Published As

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EP1298156A4 (en) 2003-09-10
JP2008239995A (ja) 2008-10-09
EP1298156A1 (en) 2003-04-02
US6875819B2 (en) 2005-04-05
WO2002088216A1 (fr) 2002-11-07
EP1298156B1 (en) 2005-08-17
TW575596B (en) 2004-02-11
KR100583297B1 (ko) 2006-05-24
JPWO2002088216A1 (ja) 2004-08-19
CN1462286A (zh) 2003-12-17
DE60205555D1 (de) 2005-09-22
US20030187168A1 (en) 2003-10-02
DE60205555T2 (de) 2006-03-30
KR20040002398A (ko) 2004-01-07
JP4236935B2 (ja) 2009-03-11

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Granted publication date: 20051228