CN1233685C - 含氟环烯聚合物,其环烯单体,聚合物制备方法及聚合物的应用 - Google Patents

含氟环烯聚合物,其环烯单体,聚合物制备方法及聚合物的应用 Download PDF

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Publication number
CN1233685C
CN1233685C CNB028014243A CN02801424A CN1233685C CN 1233685 C CN1233685 C CN 1233685C CN B028014243 A CNB028014243 A CN B028014243A CN 02801424 A CN02801424 A CN 02801424A CN 1233685 C CN1233685 C CN 1233685C
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fluorine
alkyl
carbon atom
carbon atoms
group
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CN1462286A (zh
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须永忠弘
河野宽
河村宪守
落合贵志
重松茂人
中野隆志
森田智行
井尾博文
山本喜博
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Mitsui Chemicals Inc
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Mitsui Chemicals Inc
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
    • C08G61/04—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms
    • C08G61/06—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms prepared by ring-opening of carbocyclic compounds
    • C08G61/08—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms prepared by ring-opening of carbocyclic compounds of carbocyclic compounds containing one or more carbon-to-carbon double bonds in the ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/02—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes
    • C08G61/04—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms
    • C08G61/06—Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes only aliphatic carbon atoms prepared by ring-opening of carbocyclic compounds

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Materials For Photolithography (AREA)
CNB028014243A 2001-04-27 2002-04-25 含氟环烯聚合物,其环烯单体,聚合物制备方法及聚合物的应用 Expired - Lifetime CN1233685C (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2001132434 2001-04-27
JP132434/2001 2001-04-27
JP132434/01 2001-04-27
JP64653/02 2002-03-11
JP64653/2002 2002-03-11
JP2002064653 2002-03-11

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CN1462286A CN1462286A (zh) 2003-12-17
CN1233685C true CN1233685C (zh) 2005-12-28

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US (1) US6875819B2 (https=)
EP (1) EP1298156B1 (https=)
JP (2) JP4236935B2 (https=)
KR (1) KR100583297B1 (https=)
CN (1) CN1233685C (https=)
DE (1) DE60205555T2 (https=)
TW (1) TW575596B (https=)
WO (1) WO2002088216A1 (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103189527A (zh) * 2010-11-12 2013-07-03 科莱恩金融(Bvi)有限公司 非金属鞣制
CN103201396A (zh) * 2010-11-11 2013-07-10 科莱恩金融(Bvi)有限公司 非金属鞣制
CN103210096A (zh) * 2010-11-11 2013-07-17 科莱恩金融(Bvi)有限公司 非金属鞣制

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100583297B1 (ko) * 2001-04-27 2006-05-24 미쓰이 가가쿠 가부시키가이샤 불소 함유 시클로올레핀 중합체, 이들의 시클로올레핀단량체, 이 중합체의 제조방법 및 이 중합체의 용도
US7264853B2 (en) * 2003-08-26 2007-09-04 Intel Corporation Attaching a pellicle frame to a reticle
US7316869B2 (en) 2003-08-26 2008-01-08 Intel Corporation Mounting a pellicle to a frame
EP1680458A2 (en) * 2003-09-25 2006-07-19 Ciba SC Holding AG Romp with fluorinated groups
US20050202252A1 (en) * 2004-03-12 2005-09-15 Alexander Tregub Use of alternative polymer materials for "soft" polymer pellicles
US7314667B2 (en) * 2004-03-12 2008-01-01 Intel Corporation Process to optimize properties of polymer pellicles and resist for lithography applications
US20060008730A1 (en) * 2004-07-09 2006-01-12 Puy Michael V D Monomers for photoresists bearing acid-labile groups of reduced optical density
US20060008731A1 (en) * 2004-07-09 2006-01-12 Michael Van Der Puy Novel photoresist monomers and polymers
WO2007032048A1 (ja) * 2005-09-12 2007-03-22 Tadahiro Ohmi 透明部材の製造方法およびプラスチック部材
EP1827674B1 (en) * 2005-11-08 2012-09-12 LG Chem, Ltd. Colloidal photonic crystals using colloidal nanoparticles and method for preparation thereof
JP4866086B2 (ja) * 2005-12-27 2012-02-01 三井化学株式会社 組み合わせレンズ、色収差の補正方法
WO2009154879A2 (en) 2008-06-20 2009-12-23 3M Innovative Properties Company Polymeric molds and articles made therefrom
KR20110033202A (ko) * 2008-06-20 2011-03-30 쓰리엠 이노베이티브 프로퍼티즈 컴파니 성형된 미세구조화된 용품 및 그 제조 방법
JP2010113315A (ja) * 2008-10-10 2010-05-20 Jsr Corp フォトマスク
WO2010098102A1 (ja) * 2009-02-27 2010-09-02 三井化学株式会社 転写体およびその製造方法
JP2010210974A (ja) * 2009-03-11 2010-09-24 Shin-Etsu Chemical Co Ltd ペリクルの製造方法及びペリクル
KR101470710B1 (ko) * 2009-08-26 2014-12-08 미쓰이 가가쿠 가부시키가이샤 불소 함유 환상 올레핀 폴리머 조성물, 이 조성물로부터 수득된 전사체 및 그의 제조방법
JP5366740B2 (ja) * 2009-09-28 2013-12-11 富士フイルム株式会社 含エーテル環状構造含有ポリマー、光学材料用樹脂組成物、並びにその成形体、光学部品及びレンズ
WO2011125407A1 (ja) * 2010-04-02 2011-10-13 信越化学工業株式会社 フォトマスクユニット及びその製造方法
EP2881792B1 (en) * 2012-08-02 2017-04-26 Mitsui Chemicals, Inc. Pellicle
CN105164559B (zh) * 2013-04-03 2018-03-23 三井化学株式会社 光学膜
JP2016105131A (ja) * 2014-12-01 2016-06-09 ウシオ電機株式会社 表面が改質された基板の製造方法、パターン形成体、基板表面の改質方法、および光照射装置
JP6593351B2 (ja) * 2015-02-09 2019-10-23 Ａｇｃ株式会社 含フッ素重合体の製造方法
JPWO2016129608A1 (ja) * 2015-02-09 2017-11-16 旭硝子株式会社 含フッ素重合体の製造方法
US10570572B2 (en) * 2015-03-26 2020-02-25 Mitsui Chemicals, Inc. Railroad rail track pad composition and railroad rail track pad
JP6840844B2 (ja) 2017-05-31 2021-03-10 三井化学株式会社 下層膜形成用材料、レジスト下層膜、レジスト下層膜の製造方法および積層体
CN107216444B (zh) * 2017-07-20 2019-06-21 中国科学院长春应用化学研究所 一种透明、高耐热环烯烃共聚物及其制备方法
JP7253340B2 (ja) * 2018-09-04 2023-04-06 アークレイ株式会社 光学素子及び光学素子の製造方法
CN121343135A (zh) * 2025-12-17 2026-01-16 拓烯科技(衢州)有限公司 一种环烯烃聚合物、有色环烯烃聚合物薄膜及其制备方法与应用

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63238111A (ja) 1987-03-27 1988-10-04 Asahi Glass Co Ltd 環状構造を有する含フツ素重合体の製造方法
JP2581182B2 (ja) 1987-08-14 1997-02-12 旭硝子株式会社 環化重合方法
JP2526641B2 (ja) 1987-08-14 1996-08-21 旭硝子株式会社 新規含フッ素環状重合体
JPH024722A (ja) * 1988-06-23 1990-01-09 Mitsui Petrochem Ind Ltd 弗素含有環状オレフィン化合物及びその製法
JP2951337B2 (ja) 1989-04-17 1999-09-20 古河電気工業株式会社 ペリクル
JP2952962B2 (ja) 1989-05-31 1999-09-27 旭硝子株式会社 汚染防止保護器具
JPH04104155A (ja) 1990-08-23 1992-04-06 Shin Etsu Chem Co Ltd リソグラフィー用ペリクル
JPH06199997A (ja) * 1993-01-06 1994-07-19 Japan Synthetic Rubber Co Ltd 重合体の製造法
JPH06206985A (ja) * 1993-01-08 1994-07-26 Japan Synthetic Rubber Co Ltd （水添）ノルボルネン系重合体
JPH06256477A (ja) * 1993-03-02 1994-09-13 Japan Synthetic Rubber Co Ltd 重合体の製造法
EP0722468A1 (en) * 1993-09-10 1996-07-24 Ciba SC Holding AG Process for the polymerization of cyclic olefins and a polymerizable composition
US5677405A (en) * 1995-05-24 1997-10-14 The B.F. Goodrich Company Homopolymers and copolymers of cationically polymerizable monomers and method of their preparation
WO1998020394A1 (en) * 1996-11-04 1998-05-14 The B.F. Goodrich Company Photodefinable dielectric compositions
WO1998036324A1 (en) 1997-02-13 1998-08-20 Mitsui Chemicals, Inc. Pellicle membrane for ultraviolet rays and pellicle
IL141803A0 (en) * 1998-09-23 2002-03-10 Du Pont Photoresists, polymers and processes for microlithography
HK1047797B (zh) 1999-05-04 2006-07-28 纳幕尔杜邦公司 氟化聚合物，光刻胶和用於显微光刻的方法
JP3901401B2 (ja) * 1999-07-13 2007-04-04 三井化学株式会社 ポジ型フォトレジスト組成物およびパターン形成方法
JP2001226467A (ja) * 2000-02-17 2001-08-21 Hitachi Chem Co Ltd フッ素含有ノルボルネン系重合体およびその製造方法
JP2001328964A (ja) * 2000-05-19 2001-11-27 Tokyo Ohka Kogyo Co Ltd 新規多環式不飽和炭化水素誘導体及びその製造方法
KR100583297B1 (ko) * 2001-04-27 2006-05-24 미쓰이 가가쿠 가부시키가이샤 불소 함유 시클로올레핀 중합체, 이들의 시클로올레핀단량체, 이 중합체의 제조방법 및 이 중합체의 용도

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103201396A (zh) * 2010-11-11 2013-07-10 科莱恩金融(Bvi)有限公司 非金属鞣制
CN103210096A (zh) * 2010-11-11 2013-07-17 科莱恩金融(Bvi)有限公司 非金属鞣制
CN103201396B (zh) * 2010-11-11 2014-12-03 克拉里安特国际有限公司 非金属鞣制
CN103210096B (zh) * 2010-11-11 2014-12-17 克拉里安特国际有限公司 非金属鞣制
CN103189527A (zh) * 2010-11-12 2013-07-03 科莱恩金融(Bvi)有限公司 非金属鞣制
CN103189527B (zh) * 2010-11-12 2014-12-17 克拉里安特国际有限公司 非金属鞣制

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EP1298156A4 (en) 2003-09-10
WO2002088216A1 (fr) 2002-11-07
TW575596B (en) 2004-02-11
KR100583297B1 (ko) 2006-05-24
DE60205555T2 (de) 2006-03-30
CN1462286A (zh) 2003-12-17
JPWO2002088216A1 (ja) 2004-08-19
JP4236935B2 (ja) 2009-03-11
KR20040002398A (ko) 2004-01-07
EP1298156A1 (en) 2003-04-02
US20030187168A1 (en) 2003-10-02
US6875819B2 (en) 2005-04-05
JP2008239995A (ja) 2008-10-09
DE60205555D1 (de) 2005-09-22
EP1298156B1 (en) 2005-08-17

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Granted publication date: 20051228