JP2007171812A - ソルダーレジストインキ組成物、その組成物を硬化してなるソルダーレジスト及びソルダーレジストの製造方法 - Google Patents
ソルダーレジストインキ組成物、その組成物を硬化してなるソルダーレジスト及びソルダーレジストの製造方法 Download PDFInfo
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- JP2007171812A JP2007171812A JP2005372439A JP2005372439A JP2007171812A JP 2007171812 A JP2007171812 A JP 2007171812A JP 2005372439 A JP2005372439 A JP 2005372439A JP 2005372439 A JP2005372439 A JP 2005372439A JP 2007171812 A JP2007171812 A JP 2007171812A
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- solder resist
- ink composition
- resist ink
- compound
- carboxyl group
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- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 10
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- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 6
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- PTBDIHRZYDMNKB-UHFFFAOYSA-N 2,2-Bis(hydroxymethyl)propionic acid Chemical compound OCC(C)(CO)C(O)=O PTBDIHRZYDMNKB-UHFFFAOYSA-N 0.000 description 5
- JVYDLYGCSIHCMR-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)butanoic acid Chemical compound CCC(CO)(CO)C(O)=O JVYDLYGCSIHCMR-UHFFFAOYSA-N 0.000 description 5
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Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Epoxy Resins (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
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| JP2010150464A (ja) * | 2008-12-26 | 2010-07-08 | Toyo Ink Mfg Co Ltd | Ｕｖ−ｌｅｄ用活性エネルギー線硬化型スクリーンインキおよび印刷物 |
| WO2011004756A1 (ja) * | 2009-07-06 | 2011-01-13 | 昭和電工株式会社 | 配線板の保護膜用熱硬化性組成物 |
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