JP2005524100A5 - - Google Patents
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- Publication number
- JP2005524100A5 JP2005524100A5 JP2004500109A JP2004500109A JP2005524100A5 JP 2005524100 A5 JP2005524100 A5 JP 2005524100A5 JP 2004500109 A JP2004500109 A JP 2004500109A JP 2004500109 A JP2004500109 A JP 2004500109A JP 2005524100 A5 JP2005524100 A5 JP 2005524100A5
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- conductive thin
- substrate
- forming
- film structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 claims 117
- 239000000758 substrate Substances 0.000 claims 100
- 239000000463 material Substances 0.000 claims 79
- 238000000034 method Methods 0.000 claims 67
- 239000004020 conductor Substances 0.000 claims 21
- 238000007639 printing Methods 0.000 claims 18
- 238000000151 deposition Methods 0.000 claims 13
- 239000012790 adhesive layer Substances 0.000 claims 12
- 239000000853 adhesive Substances 0.000 claims 10
- 230000001070 adhesive effect Effects 0.000 claims 10
- 229910052751 metal Inorganic materials 0.000 claims 8
- 239000002184 metal Substances 0.000 claims 8
- 239000010410 layer Substances 0.000 claims 6
- 239000002904 solvent Substances 0.000 claims 6
- 230000001737 promoting effect Effects 0.000 claims 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 4
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims 3
- 239000004033 plastic Substances 0.000 claims 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims 2
- 239000000654 additive Substances 0.000 claims 2
- 230000000996 additive effect Effects 0.000 claims 2
- 230000001680 brushing effect Effects 0.000 claims 2
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 238000001962 electrophoresis Methods 0.000 claims 2
- 239000010408 film Substances 0.000 claims 2
- 239000002245 particle Substances 0.000 claims 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 2
- 229920000642 polymer Polymers 0.000 claims 2
- 239000007921 spray Substances 0.000 claims 2
- 239000004215 Carbon black (E152) Substances 0.000 claims 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- MUBKMWFYVHYZAI-UHFFFAOYSA-N [Al].[Cu].[Zn] Chemical compound [Al].[Cu].[Zn] MUBKMWFYVHYZAI-UHFFFAOYSA-N 0.000 claims 1
- 150000004996 alkyl benzenes Chemical class 0.000 claims 1
- 239000000956 alloy Substances 0.000 claims 1
- 229910045601 alloy Inorganic materials 0.000 claims 1
- 150000001408 amides Chemical class 0.000 claims 1
- 239000007864 aqueous solution Substances 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 229910052804 chromium Inorganic materials 0.000 claims 1
- 239000011651 chromium Substances 0.000 claims 1
- 229910017052 cobalt Inorganic materials 0.000 claims 1
- 239000010941 cobalt Substances 0.000 claims 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims 1
- JAONJTDQXUSBGG-UHFFFAOYSA-N dialuminum;dizinc;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Al+3].[Al+3].[Zn+2].[Zn+2] JAONJTDQXUSBGG-UHFFFAOYSA-N 0.000 claims 1
- 230000009977 dual effect Effects 0.000 claims 1
- 238000005323 electroforming Methods 0.000 claims 1
- 238000007772 electroless plating Methods 0.000 claims 1
- 238000009713 electroplating Methods 0.000 claims 1
- 238000004049 embossing Methods 0.000 claims 1
- 150000002148 esters Chemical class 0.000 claims 1
- 239000000945 filler Substances 0.000 claims 1
- GGHJPYSCFMCCFG-UHFFFAOYSA-N gadolinium(3+) indium(3+) oxygen(2-) Chemical compound [O--].[O--].[O--].[In+3].[Gd+3] GGHJPYSCFMCCFG-UHFFFAOYSA-N 0.000 claims 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 238000007646 gravure printing Methods 0.000 claims 1
- 229930195733 hydrocarbon Natural products 0.000 claims 1
- 150000002430 hydrocarbons Chemical class 0.000 claims 1
- 229910052738 indium Inorganic materials 0.000 claims 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims 1
- 229910003437 indium oxide Inorganic materials 0.000 claims 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims 1
- 238000007641 inkjet printing Methods 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- 150000002576 ketones Chemical class 0.000 claims 1
- 238000010030 laminating Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 230000000873 masking effect Effects 0.000 claims 1
- 239000011159 matrix material Substances 0.000 claims 1
- 229910044991 metal oxide Inorganic materials 0.000 claims 1
- 150000004706 metal oxides Chemical class 0.000 claims 1
- 150000002739 metals Chemical class 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 239000011733 molybdenum Substances 0.000 claims 1
- 239000011185 multilayer composite material Substances 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 229910052763 palladium Inorganic materials 0.000 claims 1
- 239000000049 pigment Substances 0.000 claims 1
- 239000004014 plasticizer Substances 0.000 claims 1
- 229910052697 platinum Inorganic materials 0.000 claims 1
- 239000002987 primer (paints) Substances 0.000 claims 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 229910052703 rhodium Inorganic materials 0.000 claims 1
- 239000010948 rhodium Substances 0.000 claims 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims 1
- 238000007650 screen-printing Methods 0.000 claims 1
- 238000007789 sealing Methods 0.000 claims 1
- 229910052709 silver Inorganic materials 0.000 claims 1
- 239000004332 silver Substances 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
- 150000003457 sulfones Chemical class 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
- 229910052715 tantalum Inorganic materials 0.000 claims 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 1
- 229910052716 thallium Inorganic materials 0.000 claims 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 claims 1
- 238000007651 thermal printing Methods 0.000 claims 1
- 229920001187 thermosetting polymer Polymers 0.000 claims 1
- 239000011135 tin Substances 0.000 claims 1
- 229910052718 tin Inorganic materials 0.000 claims 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims 1
- 229910001887 tin oxide Inorganic materials 0.000 claims 1
- 239000010936 titanium Substances 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 1
- 229910052721 tungsten Inorganic materials 0.000 claims 1
- 239000010937 tungsten Substances 0.000 claims 1
- 238000001771 vacuum deposition Methods 0.000 claims 1
- 238000007740 vapor deposition Methods 0.000 claims 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US37590202P | 2002-04-24 | 2002-04-24 | |
| PCT/US2003/012692 WO2003091788A2 (en) | 2002-04-24 | 2003-04-23 | Process for forming a patterned thin film conductive structure on a substrate |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005524100A JP2005524100A (ja) | 2005-08-11 |
| JP2005524100A5 true JP2005524100A5 (https=) | 2006-06-15 |
| JP4508863B2 JP4508863B2 (ja) | 2010-07-21 |
Family
ID=29270720
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004500109A Expired - Lifetime JP4508863B2 (ja) | 2002-04-24 | 2003-04-23 | パターン形成された薄膜導体を基材上に形成する方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20030203101A1 (https=) |
| EP (1) | EP1497692A2 (https=) |
| JP (1) | JP4508863B2 (https=) |
| CN (2) | CN1256620C (https=) |
| AU (1) | AU2003231077A1 (https=) |
| TW (1) | TWI268813B (https=) |
| WO (1) | WO2003091788A2 (https=) |
Families Citing this family (97)
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|---|---|---|---|---|
| US8002948B2 (en) * | 2002-04-24 | 2011-08-23 | Sipix Imaging, Inc. | Process for forming a patterned thin film structure on a substrate |
| US7261920B2 (en) | 2002-04-24 | 2007-08-28 | Sipix Imaging, Inc. | Process for forming a patterned thin film structure on a substrate |
| US7156945B2 (en) * | 2002-04-24 | 2007-01-02 | Sipix Imaging, Inc. | Process for forming a patterned thin film structure for in-mold decoration |
| US6900876B2 (en) * | 2003-02-13 | 2005-05-31 | Eastman Kodak Company | Process and structures for selective deposition of liquid-crystal emulsion |
| WO2005002305A2 (en) * | 2003-06-06 | 2005-01-06 | Sipix Imaging, Inc. | In mold manufacture of an object with embedded display panel |
| US7175876B2 (en) * | 2003-06-27 | 2007-02-13 | 3M Innovative Properties Company | Patterned coating method employing polymeric coatings |
| US8068186B2 (en) * | 2003-10-15 | 2011-11-29 | 3M Innovative Properties Company | Patterned conductor touch screen having improved optics |
| CA2551957A1 (en) * | 2003-12-30 | 2005-08-18 | 3M Innovative Properties Company | Acousto-mechanical detection systems and methods of use |
| JP4880478B2 (ja) * | 2003-12-30 | 2012-02-22 | スリーエム イノベイティブ プロパティズ カンパニー | 弾性表面波センサアセンブリ |
| US7575979B2 (en) * | 2004-06-22 | 2009-08-18 | Hewlett-Packard Development Company, L.P. | Method to form a film |
| US20060033676A1 (en) * | 2004-08-10 | 2006-02-16 | Kenneth Faase | Display device |
| US7301693B2 (en) | 2004-08-13 | 2007-11-27 | Sipix Imaging, Inc. | Direct drive display with a multi-layer backplane and process for its manufacture |
| US7042614B1 (en) | 2004-11-17 | 2006-05-09 | Hewlett-Packard Development Company, L.P. | Spatial light modulator |
| US7304780B2 (en) * | 2004-12-17 | 2007-12-04 | Sipix Imaging, Inc. | Backplane design for display panels and processes for their manufacture |
| JP2006269599A (ja) * | 2005-03-23 | 2006-10-05 | Sony Corp | パターン形成方法、有機電界効果型トランジスタの製造方法、及び、フレキシブルプリント回路板の製造方法 |
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- 2003-04-23 AU AU2003231077A patent/AU2003231077A1/en not_active Abandoned
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