JP2002518593A5 - - Google Patents

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Publication number
JP2002518593A5
JP2002518593A5 JP2000554901A JP2000554901A JP2002518593A5 JP 2002518593 A5 JP2002518593 A5 JP 2002518593A5 JP 2000554901 A JP2000554901 A JP 2000554901A JP 2000554901 A JP2000554901 A JP 2000554901A JP 2002518593 A5 JP2002518593 A5 JP 2002518593A5
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JP
Japan
Prior art keywords
sputtering target
tantalum
metal product
grain size
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000554901A
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English (en)
Japanese (ja)
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JP2002518593A (ja
Filing date
Publication date
Priority claimed from US09/098,760 external-priority patent/US6348139B1/en
Application filed filed Critical
Publication of JP2002518593A publication Critical patent/JP2002518593A/ja
Publication of JP2002518593A5 publication Critical patent/JP2002518593A5/ja
Pending legal-status Critical Current

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JP2000554901A 1998-06-17 1998-09-08 微細で一様な構造とテキスチュアを有する金属製品及びその製造方法 Pending JP2002518593A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/098,760 1998-06-17
US09/098,760 US6348139B1 (en) 1998-06-17 1998-06-17 Tantalum-comprising articles
PCT/US1998/018676 WO1999066100A1 (en) 1998-06-17 1998-09-08 Metal article with fine uniform structures and textures and process of making same

Publications (2)

Publication Number Publication Date
JP2002518593A JP2002518593A (ja) 2002-06-25
JP2002518593A5 true JP2002518593A5 (https=) 2005-03-03

Family

ID=22270767

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000554901A Pending JP2002518593A (ja) 1998-06-17 1998-09-08 微細で一様な構造とテキスチュアを有する金属製品及びその製造方法

Country Status (7)

Country Link
US (3) US6348139B1 (https=)
EP (1) EP1088115A4 (https=)
JP (1) JP2002518593A (https=)
KR (1) KR100512295B1 (https=)
CN (1) CN1283830C (https=)
TW (1) TW515848B (https=)
WO (1) WO1999066100A1 (https=)

Families Citing this family (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6569270B2 (en) 1997-07-11 2003-05-27 Honeywell International Inc. Process for producing a metal article
US6323055B1 (en) * 1998-05-27 2001-11-27 The Alta Group, Inc. Tantalum sputtering target and method of manufacture
US6348139B1 (en) 1998-06-17 2002-02-19 Honeywell International Inc. Tantalum-comprising articles
US6348113B1 (en) * 1998-11-25 2002-02-19 Cabot Corporation High purity tantalum, products containing the same, and methods of making the same
US6878250B1 (en) 1999-12-16 2005-04-12 Honeywell International Inc. Sputtering targets formed from cast materials
US20040072009A1 (en) * 1999-12-16 2004-04-15 Segal Vladimir M. Copper sputtering targets and methods of forming copper sputtering targets
US6331233B1 (en) 2000-02-02 2001-12-18 Honeywell International Inc. Tantalum sputtering target with fine grains and uniform texture and method of manufacture
US7517417B2 (en) * 2000-02-02 2009-04-14 Honeywell International Inc. Tantalum PVD component producing methods
JP2001303240A (ja) * 2000-04-26 2001-10-31 Toshiba Corp スパッタリングターゲット
DE60136351D1 (de) * 2000-05-22 2008-12-11 Cabot Corp Hochreines niobmetall und erzeugnisse daraus und verfahren zu dessen herstellung
AU2001265309A1 (en) * 2000-06-02 2001-12-17 Honeywell International, Inc. Fine grain size material, sputtering target, methods of forming, and micro-arc reduction method
JP4825345B2 (ja) * 2000-08-24 2011-11-30 株式会社東芝 スパッタリングターゲットとそれを用いたバリア層および電子デバイスの形成方法
IL156802A0 (en) 2001-01-11 2004-02-08 Cabot Corp Tantalum and niobium billets and methods of producing same
CA2438819A1 (en) * 2001-02-20 2002-09-12 Peter R. Jepson Refractory metal plates with uniform texture and methods of making the same
US6770154B2 (en) 2001-09-18 2004-08-03 Praxair S.T. Technology, Inc. Textured-grain-powder metallurgy tantalum sputter target
US20040016635A1 (en) * 2002-07-19 2004-01-29 Ford Robert B. Monolithic sputtering target assembly
JP4883546B2 (ja) * 2002-09-20 2012-02-22 Ｊｘ日鉱日石金属株式会社 タンタルスパッタリングターゲットの製造方法
JP4263900B2 (ja) * 2002-11-13 2009-05-13 日鉱金属株式会社 Ｔａスパッタリングターゲット及びその製造方法
US6921470B2 (en) * 2003-02-13 2005-07-26 Cabot Corporation Method of forming metal blanks for sputtering targets
US20040186810A1 (en) * 2003-02-14 2004-09-23 Michaluk Christopher A. Method of supplying sputtering targets to fabricators and other users
CN1771350A (zh) * 2003-04-01 2006-05-10 株式会社日矿材料 钽溅射靶及其制造方法
US7228722B2 (en) * 2003-06-09 2007-06-12 Cabot Corporation Method of forming sputtering articles by multidirectional deformation
EP1639620A2 (en) * 2003-06-20 2006-03-29 Cabot Corporation Method and design for sputter target attachment to a backing plate
EP1681368B1 (en) * 2003-11-06 2021-06-30 JX Nippon Mining & Metals Corporation Method to produce a tantalum sputtering target
EP1704266A2 (en) * 2003-12-22 2006-09-27 Cabot Corporation High integrity sputtering target material and method for producing bulk quantities of same
US20070144623A1 (en) * 2004-02-18 2007-06-28 Wickersham Charles E Jr Ultrasonic method for detecting banding in metals
MXPA06010835A (es) * 2004-03-26 2006-12-15 Starck H C Inc Crisoles de metales refractarios.
US8252126B2 (en) * 2004-05-06 2012-08-28 Global Advanced Metals, Usa, Inc. Sputter targets and methods of forming same by rotary axial forging
US7998287B2 (en) 2005-02-10 2011-08-16 Cabot Corporation Tantalum sputtering target and method of fabrication
CN101171362B (zh) * 2005-04-28 2010-06-09 日矿金属株式会社 溅射靶
CN101278071B (zh) * 2005-10-04 2010-08-11 日矿金属株式会社 溅射靶
US20070084527A1 (en) * 2005-10-19 2007-04-19 Stephane Ferrasse High-strength mechanical and structural components, and methods of making high-strength components
CN101374611B (zh) 2006-03-07 2015-04-08 卡伯特公司 制备变形金属制品的方法
US20070251818A1 (en) * 2006-05-01 2007-11-01 Wuwen Yi Copper physical vapor deposition targets and methods of making copper physical vapor deposition targets
US20080110746A1 (en) * 2006-11-09 2008-05-15 Kardokus Janine K Novel manufacturing design and processing methods and apparatus for sputtering targets
US9279178B2 (en) * 2007-04-27 2016-03-08 Honeywell International Inc. Manufacturing design and processing methods and apparatus for sputtering targets
US8250895B2 (en) * 2007-08-06 2012-08-28 H.C. Starck Inc. Methods and apparatus for controlling texture of plates and sheets by tilt rolling
EP2185300B1 (en) * 2007-08-06 2018-10-24 H. C. Starck, Inc. Refractory metal plates with improved uniformity of texture
KR101626286B1 (ko) * 2008-11-03 2016-06-01 토소우 에스엠디, 인크 스퍼터 타겟 제조 방법 및 이에 의해 제조된 스퍼터 타겟
JP4675421B2 (ja) 2009-03-27 2011-04-20 Ｔｈｋ株式会社 シリンジ駆動ユニット
SG173141A1 (en) 2009-05-22 2011-08-29 Jx Nippon Mining & Metals Corp Tantalum sputtering target
US9845528B2 (en) 2009-08-11 2017-12-19 Jx Nippon Mining & Metals Corporation Tantalum sputtering target
JP5681368B2 (ja) * 2010-02-26 2015-03-04 株式会社神戸製鋼所 Ａｌ基合金スパッタリングターゲット
CN103052733B (zh) 2010-08-09 2015-08-12 吉坤日矿日石金属株式会社 钽溅射靶
KR20130037215A (ko) 2010-08-09 2013-04-15 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 탄탈 스퍼터링 타깃
JP5731770B2 (ja) * 2010-08-23 2015-06-10 株式会社東芝 スパッタリングターゲットの製造方法及びスパッタリングターゲット
JP5291754B2 (ja) * 2011-04-15 2013-09-18 三井金属鉱業株式会社 太陽電池用スパッタリングターゲット
CN102517550B (zh) * 2011-12-20 2014-07-09 宁波江丰电子材料有限公司 高纯钽靶材的制备方法和高纯钽靶材
CN104204282B (zh) 2012-03-21 2017-05-24 吉坤日矿日石金属株式会社 钽溅射靶及其制造方法以及使用该靶形成的半导体布线用阻挡膜
CN103572223B (zh) * 2012-08-01 2016-01-27 宁波江丰电子材料股份有限公司 钽靶材及钽靶材组件的制造方法
KR20170036121A (ko) 2012-12-19 2017-03-31 제이엑스금속주식회사 탄탈 스퍼터링 타깃 및 그 제조 방법
WO2014097897A1 (ja) * 2012-12-19 2014-06-26 Jx日鉱日石金属株式会社 タンタルスパッタリングターゲット及びその製造方法
CN104937133A (zh) 2013-03-04 2015-09-23 吉坤日矿日石金属株式会社 钽溅射靶及其制造方法
CN104128740A (zh) * 2013-05-02 2014-11-05 宁波江丰电子材料股份有限公司 一种铜靶材的制备方法
CN105593399B (zh) 2013-10-01 2018-05-25 吉坤日矿日石金属株式会社 钽溅射靶
JP2018519413A (ja) 2015-04-10 2018-07-19 トーソー エスエムディー，インク． タンタルスパッターターゲットの製造方法及びこれにより製造されたスパッターターゲット
WO2016190159A1 (ja) 2015-05-22 2016-12-01 Ｊｘ金属株式会社 タンタルスパッタリングターゲット及びその製造方法
JP6293929B2 (ja) 2015-05-22 2018-03-14 Ｊｘ金属株式会社 タンタルスパッタリングターゲット及びその製造方法
CN108026634A (zh) 2015-08-03 2018-05-11 霍尼韦尔国际公司 具有改善性质的无摩擦锻造铝合金溅射靶
TW201738395A (zh) * 2015-11-06 2017-11-01 塔沙Ｓｍｄ公司 具有提高的沉積速率的製備鉭濺鍍靶材的方法
US10900102B2 (en) 2016-09-30 2021-01-26 Honeywell International Inc. High strength aluminum alloy backing plate and methods of making
KR102445159B1 (ko) * 2020-12-21 2022-09-22 한국재료연구원 정적 재결정법을 이용한 금속의 강도 강화방법

Family Cites Families (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3268328A (en) * 1964-11-03 1966-08-23 Nat Res Corp Metallurgy
US3497402A (en) * 1966-02-03 1970-02-24 Nat Res Corp Stabilized grain-size tantalum alloy
US3616282A (en) * 1968-11-14 1971-10-26 Hewlett Packard Co Method of producing thin-film circuit elements
US4000055A (en) * 1972-01-14 1976-12-28 Western Electric Company, Inc. Method of depositing nitrogen-doped beta tantalum
DE2429434B2 (de) * 1974-06-19 1979-10-04 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zur Herstellung von Widerständen und Kondensatoren in Dunnschichtschaltungen
DE3246361A1 (de) 1982-02-27 1983-09-08 Philips Patentverwaltung Gmbh, 2000 Hamburg Kohlenstoff enthaltende gleitschicht
US4589932A (en) * 1983-02-03 1986-05-20 Aluminum Company Of America Aluminum 6XXX alloy products of high strength and toughness having stable response to high temperature artificial aging treatments and method for producing
JPS6066425A (ja) * 1983-09-22 1985-04-16 Nippon Telegr & Teleph Corp <Ntt> Ｌｓｉ電極用の高純度モリブデンタ−ゲツトならびに高純度モリブデンシリサイドタ−ゲツトおよびその製造方法
US4663120A (en) 1985-04-15 1987-05-05 Gte Products Corporation Refractory metal silicide sputtering target
JPH0621346B2 (ja) * 1986-06-11 1994-03-23 日本鉱業株式会社 高純度金属タンタル製ターゲットの製造方法
US4889745A (en) 1986-11-28 1989-12-26 Japan As Represented By Director General Of Agency Of Industrial Science And Technology Method for reactive preparation of a shaped body of inorganic compound of metal
JPS63216966A (ja) 1987-03-06 1988-09-09 Toshiba Corp スパツタタ−ゲツト
DE3712281A1 (de) * 1987-04-10 1988-10-27 Heraeus Gmbh W C Verfahren zur herstellung von hochduktilem tantal-halbzeug
US4762558A (en) 1987-05-15 1988-08-09 Rensselaer Polytechnic Institute Production of reactive sintered nickel aluminide material
US4960163A (en) 1988-11-21 1990-10-02 Aluminum Company Of America Fine grain casting by mechanical stirring
US5468401A (en) 1989-06-16 1995-11-21 Chem-Trend, Incorporated Carrier-free metalworking lubricant and method of making and using same
US5074907A (en) 1989-08-16 1991-12-24 General Electric Company Method for developing enhanced texture in titanium alloys, and articles made thereby
EP0483375B1 (en) 1990-05-15 1996-03-13 Kabushiki Kaisha Toshiba Sputtering target and production thereof
WO1992001080A1 (en) * 1990-07-03 1992-01-23 Tosoh Smd, Inc. Improved sputter target for coating compact discs, methods of use thereof, and methods of manufacture of the targets
US5087297A (en) 1991-01-17 1992-02-11 Johnson Matthey Inc. Aluminum target for magnetron sputtering and method of making same
EP0535314A1 (en) 1991-08-30 1993-04-07 Mitsubishi Materials Corporation Platinum-cobalt alloy sputtering target and method for manufacturing same
JPH05214523A (ja) 1992-02-05 1993-08-24 Toshiba Corp スパッタリングターゲットおよびその製造方法
US5330701A (en) 1992-02-28 1994-07-19 Xform, Inc. Process for making finely divided intermetallic
JP3338476B2 (ja) 1992-06-29 2002-10-28 住友チタニウム株式会社 スパッタリング用の金属Ｔｉターゲットの製造方法
JPH0693400A (ja) 1992-09-16 1994-04-05 Nkk Corp チタン製電着ドラムの製造方法
US5693203A (en) * 1992-09-29 1997-12-02 Japan Energy Corporation Sputtering target assembly having solid-phase bonded interface
TW234767B (zh) * 1992-09-29 1994-11-21 Nippon En Kk 擴散接合之噴濺靶組立體及其製法
US5415829A (en) * 1992-12-28 1995-05-16 Nikko Kyodo Co., Ltd. Sputtering target
JPH06256919A (ja) 1993-03-01 1994-09-13 Seiko Instr Inc チタン合金の加工方法
JPH06264232A (ja) * 1993-03-12 1994-09-20 Nikko Kinzoku Kk Ｔａ製スパッタリングタ−ゲットとその製造方法
US5400633A (en) 1993-09-03 1995-03-28 The Texas A&M University System Apparatus and method for deformation processing of metals, ceramics, plastics and other materials
US5772860A (en) 1993-09-27 1998-06-30 Japan Energy Corporation High purity titanium sputtering targets
KR950034588A (ko) * 1994-03-17 1995-12-28 오가 노리오 탄탈계 고유전체재료 및 고유전체막의 형성방법 및 반도체장치
US5513512A (en) 1994-06-17 1996-05-07 Segal; Vladimir Plastic deformation of crystalline materials
US5590389A (en) 1994-12-23 1996-12-31 Johnson Matthey Electronics, Inc. Sputtering target with ultra-fine, oriented grains and method of making same
JP2984778B2 (ja) 1995-02-27 1999-11-29 株式会社住友シチックス尼崎 高純度チタン材の鍛造方法
JP3413782B2 (ja) 1995-03-31 2003-06-09 日立金属株式会社 スパッタリング用チタンタ−ゲットおよびその製造方法
US5600989A (en) 1995-06-14 1997-02-11 Segal; Vladimir Method of and apparatus for processing tungsten heavy alloys for kinetic energy penetrators
US5673581A (en) 1995-10-03 1997-10-07 Segal; Vladimir Method and apparatus for forming thin parts of large length and width
US5766380A (en) 1996-11-05 1998-06-16 Sony Corporation Method for fabricating randomly oriented aluminum alloy sputtering targets with fine grains and fine precipitates
US5994181A (en) * 1997-05-19 1999-11-30 United Microelectronics Corp. Method for forming a DRAM cell electrode
US6569270B2 (en) * 1997-07-11 2003-05-27 Honeywell International Inc. Process for producing a metal article
US5993621A (en) 1997-07-11 1999-11-30 Johnson Matthey Electronics, Inc. Titanium sputtering target
US20030052000A1 (en) * 1997-07-11 2003-03-20 Vladimir Segal Fine grain size material, sputtering target, methods of forming, and micro-arc reduction method
JPH1180942A (ja) * 1997-09-10 1999-03-26 Japan Energy Corp Ｔａスパッタターゲットとその製造方法及び組立体
US6139701A (en) * 1997-11-26 2000-10-31 Applied Materials, Inc. Copper target for sputter deposition
US6348139B1 (en) 1998-06-17 2002-02-19 Honeywell International Inc. Tantalum-comprising articles
US6348113B1 (en) 1998-11-25 2002-02-19 Cabot Corporation High purity tantalum, products containing the same, and methods of making the same
US6192989B1 (en) * 1999-03-02 2001-02-27 Barbara A. Tooman Temporary horseshoe
US6113761A (en) * 1999-06-02 2000-09-05 Johnson Matthey Electronics, Inc. Copper sputtering target assembly and method of making same
US6478902B2 (en) * 1999-07-08 2002-11-12 Praxair S.T. Technology, Inc. Fabrication and bonding of copper sputter targets
US6521173B2 (en) * 1999-08-19 2003-02-18 H.C. Starck, Inc. Low oxygen refractory metal powder for powder metallurgy
US6391163B1 (en) * 1999-09-27 2002-05-21 Applied Materials, Inc. Method of enhancing hardness of sputter deposited copper films
US6454994B1 (en) * 2000-08-28 2002-09-24 Honeywell International Inc. Solids comprising tantalum, strontium and silicon
US6896748B2 (en) * 2002-07-18 2005-05-24 Praxair S.T. Technology, Inc. Ultrafine-grain-copper-base sputter targets

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