KR100512295B1 - 미세균일 구조 및 조직을 갖는 금속재 및 그 제조방법 - Google Patents

미세균일 구조 및 조직을 갖는 금속재 및 그 제조방법 Download PDF

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Publication number
KR100512295B1
KR100512295B1 KR10-2000-7014206A KR20007014206A KR100512295B1 KR 100512295 B1 KR100512295 B1 KR 100512295B1 KR 20007014206 A KR20007014206 A KR 20007014206A KR 100512295 B1 KR100512295 B1 KR 100512295B1
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KR
South Korea
Prior art keywords
metal material
billet
forging
grain size
microns
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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KR10-2000-7014206A
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English (en)
Korean (ko)
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KR20010071476A (ko
Inventor
샤리테쉬피
세갈브래디미르
Original Assignee
존슨 마테이 일렉트로닉스, 인코포레이티드
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Publication of KR20010071476A publication Critical patent/KR20010071476A/ko
Application granted granted Critical
Publication of KR100512295B1 publication Critical patent/KR100512295B1/ko
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/02—Alloys based on vanadium, niobium, or tantalum
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21J—FORGING; HAMMERING; PRESSING METAL; RIVETING; FORGE FURNACES
    • B21J5/00—Methods for forging, hammering, or pressing; Special equipment or accessories therefor
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Forging (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
KR10-2000-7014206A 1998-06-17 1998-09-08 미세균일 구조 및 조직을 갖는 금속재 및 그 제조방법 Expired - Lifetime KR100512295B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/098,760 1998-06-17
US09/098,760 US6348139B1 (en) 1998-06-17 1998-06-17 Tantalum-comprising articles

Publications (2)

Publication Number Publication Date
KR20010071476A KR20010071476A (ko) 2001-07-28
KR100512295B1 true KR100512295B1 (ko) 2005-09-05

Family

ID=22270767

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2000-7014206A Expired - Lifetime KR100512295B1 (ko) 1998-06-17 1998-09-08 미세균일 구조 및 조직을 갖는 금속재 및 그 제조방법

Country Status (7)

Country Link
US (3) US6348139B1 (https=)
EP (1) EP1088115A4 (https=)
JP (1) JP2002518593A (https=)
KR (1) KR100512295B1 (https=)
CN (1) CN1283830C (https=)
TW (1) TW515848B (https=)
WO (1) WO1999066100A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220090356A (ko) * 2020-12-21 2022-06-29 한국재료연구원 정적 재결정법을 이용한 금속의 강도 강화방법

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CA2438819A1 (en) * 2001-02-20 2002-09-12 Peter R. Jepson Refractory metal plates with uniform texture and methods of making the same
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JP4263900B2 (ja) * 2002-11-13 2009-05-13 日鉱金属株式会社 Ｔａスパッタリングターゲット及びその製造方法
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EP1681368B1 (en) * 2003-11-06 2021-06-30 JX Nippon Mining & Metals Corporation Method to produce a tantalum sputtering target
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CN102517550B (zh) * 2011-12-20 2014-07-09 宁波江丰电子材料有限公司 高纯钽靶材的制备方法和高纯钽靶材
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CN103572223B (zh) * 2012-08-01 2016-01-27 宁波江丰电子材料股份有限公司 钽靶材及钽靶材组件的制造方法
KR20170036121A (ko) 2012-12-19 2017-03-31 제이엑스금속주식회사 탄탈 스퍼터링 타깃 및 그 제조 방법
WO2014097897A1 (ja) * 2012-12-19 2014-06-26 Jx日鉱日石金属株式会社 タンタルスパッタリングターゲット及びその製造方法
CN104937133A (zh) 2013-03-04 2015-09-23 吉坤日矿日石金属株式会社 钽溅射靶及其制造方法
CN104128740A (zh) * 2013-05-02 2014-11-05 宁波江丰电子材料股份有限公司 一种铜靶材的制备方法
CN105593399B (zh) 2013-10-01 2018-05-25 吉坤日矿日石金属株式会社 钽溅射靶
JP2018519413A (ja) 2015-04-10 2018-07-19 トーソー エスエムディー，インク． タンタルスパッターターゲットの製造方法及びこれにより製造されたスパッターターゲット
WO2016190159A1 (ja) 2015-05-22 2016-12-01 Ｊｘ金属株式会社 タンタルスパッタリングターゲット及びその製造方法
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Cited By (2)

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Publication number Priority date Publication date Assignee Title
KR20220090356A (ko) * 2020-12-21 2022-06-29 한국재료연구원 정적 재결정법을 이용한 금속의 강도 강화방법
KR102445159B1 (ko) 2020-12-21 2022-09-22 한국재료연구원 정적 재결정법을 이용한 금속의 강도 강화방법

Also Published As

Publication number Publication date
US6348139B1 (en) 2002-02-19
TW515848B (en) 2003-01-01
KR20010071476A (ko) 2001-07-28
EP1088115A1 (en) 2001-04-04
CN1283830C (zh) 2006-11-08
EP1088115A4 (en) 2005-03-30
US20020153248A1 (en) 2002-10-24
CN1307646A (zh) 2001-08-08
US20020063056A1 (en) 2002-05-30
WO1999066100A1 (en) 1999-12-23
JP2002518593A (ja) 2002-06-25

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