DE60136351D1 - Hochreines niobmetall und erzeugnisse daraus und verfahren zu dessen herstellung - Google Patents

Hochreines niobmetall und erzeugnisse daraus und verfahren zu dessen herstellung

Info

Publication number
DE60136351D1
DE60136351D1 DE60136351T DE60136351T DE60136351D1 DE 60136351 D1 DE60136351 D1 DE 60136351D1 DE 60136351 T DE60136351 T DE 60136351T DE 60136351 T DE60136351 T DE 60136351T DE 60136351 D1 DE60136351 D1 DE 60136351D1
Authority
DE
Germany
Prior art keywords
niobium
metal
reaction container
high purity
salt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60136351T
Other languages
English (en)
Inventor
Christopher A Michaluk
Louis E Huber
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cabot Corp
Original Assignee
Cabot Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Corp filed Critical Cabot Corp
Application granted granted Critical
Publication of DE60136351D1 publication Critical patent/DE60136351D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B34/00—Obtaining refractory metals
    • C22B34/20—Obtaining niobium, tantalum or vanadium
    • C22B34/24—Obtaining niobium or tantalum
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B5/00—General methods of reducing to metals
    • C22B5/02—Dry methods smelting of sulfides or formation of mattes
    • C22B5/04—Dry methods smelting of sulfides or formation of mattes by aluminium, other metals or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/004—Details
    • H01G9/04—Electrodes or formation of dielectric layers thereon
    • H01G9/048—Electrodes or formation of dielectric layers thereon characterised by their structure
    • H01G9/052—Sintered electrodes
    • H01G9/0525—Powder therefor
DE60136351T 2000-05-22 2001-05-21 Hochreines niobmetall und erzeugnisse daraus und verfahren zu dessen herstellung Expired - Lifetime DE60136351D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US20615900P 2000-05-22 2000-05-22
PCT/US2001/016438 WO2001096620A2 (en) 2000-05-22 2001-05-21 High purity niobium and products containing the same, and methods of making the same

Publications (1)

Publication Number Publication Date
DE60136351D1 true DE60136351D1 (de) 2008-12-11

Family

ID=22765229

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60136351T Expired - Lifetime DE60136351D1 (de) 2000-05-22 2001-05-21 Hochreines niobmetall und erzeugnisse daraus und verfahren zu dessen herstellung

Country Status (11)

Country Link
US (2) US6863750B2 (de)
EP (1) EP1287172B1 (de)
JP (1) JP5341292B2 (de)
KR (1) KR100815034B1 (de)
CN (1) CN1328409C (de)
AT (1) ATE412782T1 (de)
AU (1) AU2001296213A1 (de)
DE (1) DE60136351D1 (de)
MY (1) MY134162A (de)
TW (1) TW587101B (de)
WO (1) WO2001096620A2 (de)

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US7210641B2 (en) 2001-02-28 2007-05-01 Cabot Corporation Methods of making a niobium metal oxide
JP2004143477A (ja) * 2002-10-22 2004-05-20 Cabot Supermetal Kk ニオブ粉末およびその製造方法、並びにそれを用いた固体電解コンデンサ
JP4928706B2 (ja) * 2002-12-03 2012-05-09 株式会社東芝 光学薄膜形成用Ｎｂスパッタリングターゲットの製造方法
TWI341337B (en) 2003-01-07 2011-05-01 Cabot Corp Powder metallurgy sputtering targets and methods of producing same
US7515397B2 (en) 2003-05-19 2009-04-07 Cabot Corporation Methods of making a niobium metal oxide and oxygen reduced niobium oxides
US7228722B2 (en) * 2003-06-09 2007-06-12 Cabot Corporation Method of forming sputtering articles by multidirectional deformation
JP2007523993A (ja) * 2003-06-20 2007-08-23 キャボット　コーポレイション スパッタターゲットをバッキングプレートに結合させるための方法及び設計
US20070144623A1 (en) * 2004-02-18 2007-06-28 Wickersham Charles E Jr Ultrasonic method for detecting banding in metals
US8252126B2 (en) * 2004-05-06 2012-08-28 Global Advanced Metals, Usa, Inc. Sputter targets and methods of forming same by rotary axial forging
US7666243B2 (en) 2004-10-27 2010-02-23 H.C. Starck Inc. Fine grain niobium sheet via ingot metallurgy
JP2006161066A (ja) * 2004-12-02 2006-06-22 Seiko Epson Corp スパッタリングターゲットとその製造方法及びスパッタリング装置並びに液体噴射ヘッド
US7998287B2 (en) * 2005-02-10 2011-08-16 Cabot Corporation Tantalum sputtering target and method of fabrication
US8128765B2 (en) * 2005-04-05 2012-03-06 Jefferson Science Associates, Llc Large grain cavities from pure niobium ingot
JP5126742B2 (ja) * 2005-04-28 2013-01-23 Ｊｘ日鉱日石金属株式会社 スパッタリングターゲット
US20070044873A1 (en) * 2005-08-31 2007-03-01 H. C. Starck Inc. Fine grain niobium sheet via ingot metallurgy
JP4034802B2 (ja) * 2005-11-22 2008-01-16 株式会社神戸製鋼所 超電導線材製造用ＮｂまたはＮｂ基合金棒およびＮｂ３Ｓｎ超電導線材の製造方法
KR101466996B1 (ko) * 2006-03-07 2014-12-01 캐보트 코포레이션 변형된 금속 물품을 제조하는 방법
CN100357464C (zh) * 2006-06-03 2007-12-26 郭青蔚 草酸体系萃取法制取无氟氧化铌工艺
CN100529150C (zh) * 2007-12-17 2009-08-19 西部金属材料股份有限公司 一种制备金属铌带材的方法
JP5308683B2 (ja) * 2008-01-29 2013-10-09 株式会社神戸製鋼所 ブロンズ法Ｎｂ３Ｓｎ超電導線材製造用ＮｂまたはＮｂ基合金棒、Ｎｂ３Ｓｎ超電導線材製造用前駆体およびその製造方法、並びにＮｂ３Ｓｎ超電導線材
US20110008201A1 (en) * 2009-07-07 2011-01-13 H.C. Starck Inc. Niobium based alloy that is resistant to aqueous corrosion
US9834829B1 (en) 2009-07-07 2017-12-05 H.C. Starck Inc. Niobium-based alloy that is resistant to aqueous corrosion
WO2013115401A1 (ja) * 2012-02-02 2013-08-08 しのはらプレスサービス株式会社 超伝導加速空洞の純ニオブ製エンドグループ部品の製造方法
JP5837214B2 (ja) * 2013-03-27 2015-12-24 Jx日鉱日石金属株式会社 ニオブスパッタリングターゲット
CN103316912B (zh) * 2013-07-09 2014-12-17 武汉科技大学 一种极薄铌带的轧制方法
EP3870382A1 (de) 2018-12-12 2021-09-01 Global Advanced Metals USA, Inc. Kugelförmiges niob-legierungspulver, produkte damit und verfahren zur herstellung davon
US11885009B2 (en) * 2019-02-12 2024-01-30 Uchicago Argonne, Llc Method of making thin films
KR20210134759A (ko) * 2019-03-26 2021-11-10 제이엑스금속주식회사 니오븀 스퍼터링 타깃
CN110983218B (zh) * 2019-12-25 2021-09-03 西部超导材料科技股份有限公司 一种组织均匀的小规格纯铌棒材的制备方法

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Also Published As

Publication number Publication date
US20050263217A1 (en) 2005-12-01
MY134162A (en) 2007-11-30
CN1328409C (zh) 2007-07-25
EP1287172B1 (de) 2008-10-29
AU2001296213A1 (en) 2001-12-24
CN1449452A (zh) 2003-10-15
KR100815034B1 (ko) 2008-03-18
JP2004511651A (ja) 2004-04-15
WO2001096620A3 (en) 2002-08-08
US20020072475A1 (en) 2002-06-13
KR20030001543A (ko) 2003-01-06
WO2001096620A2 (en) 2001-12-20
EP1287172A2 (de) 2003-03-05
TW587101B (en) 2004-05-11
JP5341292B2 (ja) 2013-11-13
US6863750B2 (en) 2005-03-08
ATE412782T1 (de) 2008-11-15

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