IL138374A - An ultraviolet laser device and an exposure device that includes such a device - Google Patents

An ultraviolet laser device and an exposure device that includes such a device

Info

Publication number
IL138374A
IL138374A IL13837498A IL13837498A IL138374A IL 138374 A IL138374 A IL 138374A IL 13837498 A IL13837498 A IL 13837498A IL 13837498 A IL13837498 A IL 13837498A IL 138374 A IL138374 A IL 138374A
Authority
IL
Israel
Prior art keywords
light
wavelength
laser
fiber
ultraviolet
Prior art date
Application number
IL13837498A
Other languages
English (en)
Hebrew (he)
Other versions
IL138374A0 (en
Inventor
Tomoko Ohtsuki
Soichi Owa
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of IL138374A0 publication Critical patent/IL138374A0/xx
Publication of IL138374A publication Critical patent/IL138374A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
    • H01S3/067—Fibre lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H01S3/108—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using non-linear optical devices, e.g. exhibiting Brillouin or Raman scattering
    • H01S3/109—Frequency multiplication, e.g. harmonic generation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/14—Mode converters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/24—Coupling light guides
    • G02B6/26—Optical coupling means
    • G02B6/32—Optical coupling means having lens focusing means positioned between opposed fibre ends
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/3501—Constructional details or arrangements of non-linear optical devices, e.g. shape of non-linear crystals
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
    • H01S3/067—Fibre lasers
    • H01S3/06754—Fibre amplifiers
    • H01S3/06758—Tandem amplifiers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2383—Parallel arrangements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/3501—Constructional details or arrangements of non-linear optical devices, e.g. shape of non-linear crystals
    • G02F1/3503—Structural association of optical elements, e.g. lenses, with the non-linear optical device
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
    • G02F1/354—Third or higher harmonic generation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/37—Non-linear optics for second-harmonic generation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
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    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0064—Anti-reflection devices, e.g. optical isolaters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0078—Frequency filtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0085—Modulating the output, i.e. the laser beam is modulated outside the laser cavity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
    • H01S3/067—Fibre lasers
    • H01S3/06708—Constructional details of the fibre, e.g. compositions, cross-section, shape or tapering
    • H01S3/06716—Fibre compositions or doping with active elements
    • H—ELECTRICITY
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    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
    • H01S3/067—Fibre lasers
    • H01S3/06708—Constructional details of the fibre, e.g. compositions, cross-section, shape or tapering
    • H01S3/06729—Peculiar transverse fibre profile
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    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
    • H01S3/067—Fibre lasers
    • H01S3/06708—Constructional details of the fibre, e.g. compositions, cross-section, shape or tapering
    • H01S3/06745—Tapering of the fibre, core or active region
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    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
    • H01S3/067—Fibre lasers
    • H01S3/06754—Fibre amplifiers
    • H01S3/06762—Fibre amplifiers having a specific amplification band
    • H01S3/06766—C-band amplifiers, i.e. amplification in the range of about 1530 nm to 1560 nm
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    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • H01S3/094003—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light the pumped medium being a fibre
    • H01S3/094011—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light the pumped medium being a fibre with bidirectional pumping, i.e. with injection of the pump light from both two ends of the fibre
    • H—ELECTRICITY
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    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
    • H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
    • H01S3/0941—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode
    • H01S3/09415—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light of a laser diode the pumping beam being parallel to the lasing mode of the pumped medium, e.g. end-pumping
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/16—Solid materials
    • H01S3/1601—Solid materials characterised by an active (lasing) ion
    • H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
    • H01S3/1608—Solid materials characterised by an active (lasing) ion rare earth erbium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Lasers (AREA)
IL13837498A 1998-03-11 1998-11-30 An ultraviolet laser device and an exposure device that includes such a device IL138374A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP5945398 1998-03-11
JP13058098 1998-05-13
JP22733398 1998-08-11
JP31114798 1998-10-30
PCT/JP1998/005367 WO1999046835A1 (fr) 1998-03-11 1998-11-30 Dispositif a laser ultraviolet et appareil d'exposition comportant un tel dispositif a laser ultraviolet

Publications (2)

Publication Number Publication Date
IL138374A0 IL138374A0 (en) 2001-10-31
IL138374A true IL138374A (en) 2004-07-25

Family

ID=27463766

Family Applications (1)

Application Number Title Priority Date Filing Date
IL13837498A IL138374A (en) 1998-03-11 1998-11-30 An ultraviolet laser device and an exposure device that includes such a device

Country Status (7)

Country Link
US (4) US6590698B1 (ja)
EP (1) EP1063742A4 (ja)
KR (2) KR100841147B1 (ja)
CN (1) CN100578876C (ja)
AU (1) AU1262499A (ja)
IL (1) IL138374A (ja)
WO (1) WO1999046835A1 (ja)

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WO2005022705A2 (en) * 1997-03-21 2005-03-10 Imra America, Inc. High energy optical fiber amplifier for picosecond-nanosecond pulses for advanced material processing applications
KR100841147B1 (ko) * 1998-03-11 2008-06-24 가부시키가이샤 니콘 레이저 장치, 자외광 조사 장치 및 방법, 물체의 패턴 검출장치 및 방법
JP2001353176A (ja) * 2000-04-13 2001-12-25 Nikon Corp レーザ治療装置
JP2000260684A (ja) * 1999-03-08 2000-09-22 Nikon Corp 露光装置、及び照明装置
US6901090B1 (en) 1999-09-10 2005-05-31 Nikon Corporation Exposure apparatus with laser device
WO2001020397A1 (fr) 1999-09-10 2001-03-22 Nikon Corporation Dispositif laser et procede d'exposition
EP1139521A4 (en) 1999-09-10 2006-03-22 Nikon Corp LIGHT SOURCE AND WAVELENGTH STABILIZATION CONTROL METHOD, EXPOSURE APPARATUS AND METHOD, METHOD FOR PRODUCING EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD, AND DEVICE THEREOF
US6947123B1 (en) 1999-09-10 2005-09-20 Nikon Corporation Exposure device with laser device
US6369888B1 (en) * 1999-11-17 2002-04-09 Applied Materials, Inc. Method and apparatus for article inspection including speckle reduction
DE60127891T2 (de) * 2000-03-24 2008-01-17 British Telecommunications P.L.C. Optisches Kommunikationssystem und Verfahren zum Schützen eines optischen Wegs
WO2002005038A2 (en) * 2000-07-10 2002-01-17 Corporation For Laser Optics Research Systems and methods for speckle reduction through bandwidth enhancement
WO2002065597A1 (fr) * 2001-02-14 2002-08-22 Nikon Corporation Source lumineuse et dispositif de rayonnement optique et production de ces dispositifs
WO2002071143A1 (fr) * 2001-03-02 2002-09-12 Nikon Corporation Dispositif de source lumineuse, dispositifs d'illumination et d'exposition, et procede de production de dispositif
JP4123791B2 (ja) * 2001-03-05 2008-07-23 富士ゼロックス株式会社 発光素子駆動装置および発光素子駆動システム
JP2002280324A (ja) * 2001-03-16 2002-09-27 Sony Corp レーザ装置
EP1245973A1 (en) * 2001-03-30 2002-10-02 University Of Southampton Optical fiber terminations, optical couplers and optical coupling methods
US6931179B2 (en) * 2001-10-29 2005-08-16 Harris Corporation Lossless optical splitter
KR20040052468A (ko) * 2001-11-12 2004-06-23 소니 가부시끼 가이샤 레이저 어닐 장치 및 박막 트랜지스터의 제조 방법
US7105048B2 (en) * 2001-11-30 2006-09-12 Semiconductor Energy Laboratory Co., Ltd. Laser irradiation apparatus
CN1248287C (zh) * 2001-11-30 2006-03-29 株式会社半导体能源研究所 半导体设备的制造方法
US7133737B2 (en) 2001-11-30 2006-11-07 Semiconductor Energy Laboratory Co., Ltd. Program for controlling laser apparatus and recording medium for recording program for controlling laser apparatus and capable of being read out by computer
US7214573B2 (en) * 2001-12-11 2007-05-08 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing a semiconductor device that includes patterning sub-islands
AU2003221350A1 (en) * 2002-03-13 2003-09-22 Nikon Corporation Light amplifying device and method of manufacturing the device, light source device using the light amplifying device, light treatment device using the light source device, and exposure device using the light source device
US6984573B2 (en) * 2002-06-14 2006-01-10 Semiconductor Energy Laboratory Co., Ltd. Laser irradiation method and apparatus
JP4347545B2 (ja) * 2002-06-28 2009-10-21 株式会社 液晶先端技術開発センター 結晶化装置および結晶化方法
JP4347546B2 (ja) * 2002-06-28 2009-10-21 株式会社 液晶先端技術開発センター 結晶化装置、結晶化方法および光学系
TWI301295B (en) * 2002-07-24 2008-09-21 Adv Lcd Tech Dev Ct Co Ltd Crystallization apparatus, crystallization method, thim film transistor and display apparatus
KR100479078B1 (ko) * 2002-08-14 2005-03-25 엘지전자 주식회사 노광장치의 이송식 기판 스테이지
US7196744B1 (en) * 2002-10-18 2007-03-27 Finisar Corporation Optical transceiver package with a liquid crystal variable optical attenuator
JP2004335937A (ja) * 2002-11-25 2004-11-25 Nikon Corp 露光装置の製造方法、光源ユニット、露光装置、露光方法及び露光装置の調整方法
KR100992471B1 (ko) * 2002-12-10 2010-11-08 가부시키가이샤 니콘 자외 광원, 자외 광원을 이용한 레이저 치료 장치 및 자외 광원을 이용한 노광 장치
US6935444B2 (en) * 2003-02-24 2005-08-30 Baker Hughes Incorporated Superabrasive cutting elements with cutting edge geometry having enhanced durability, method of producing same, and drill bits so equipped
KR20060014359A (ko) 2003-03-24 2006-02-15 가부시키가이샤 니콘 광학 소자, 광학계, 레이저 장치, 노광 장치, 마스크 검사장치 및 고분자 결정 가공 장치
KR100531416B1 (ko) * 2003-09-17 2005-11-29 엘지.필립스 엘시디 주식회사 Ｓｌｓ 장비 및 이를 이용한 실리콘 결정화 방법
US7738514B2 (en) * 2003-12-04 2010-06-15 Optical Air Data Systems, Llc Very high power pulsed fiber laser
DE102004013886A1 (de) 2004-03-16 2005-10-06 Carl Zeiss Smt Ag Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem
EP1772771A4 (en) * 2004-07-15 2008-06-25 Matsushita Electric Ind Co Ltd COHERENT LIGHT SOURCE AND OPTICAL APPARATUS USING THE SAME
DE102004037781A1 (de) * 2004-08-03 2006-02-23 Carl Zeiss Nts Gmbh Elektronenstrahlgerät
US7397598B2 (en) * 2004-08-20 2008-07-08 Nikon Corporation Light source unit and light irradiation unit
US7602822B2 (en) * 2004-09-28 2009-10-13 Hitachi Via Mechanics, Ltd Fiber laser based production of laser drilled microvias for multi-layer drilling, dicing, trimming of milling applications
JP2006189587A (ja) * 2005-01-05 2006-07-20 Nidek Co Ltd 医療用レーザ装置
US7593440B2 (en) * 2005-03-29 2009-09-22 Coherent, Inc. MOPA laser apparatus with two master oscillators for generating ultraviolet radiation
US7889422B2 (en) * 2005-06-02 2011-02-15 Panasonic Corporation Two-dimensional image display device
US20060274404A1 (en) * 2005-06-06 2006-12-07 Francois Brunet Optical fiber amplifier system and method
CN100526992C (zh) 2005-07-01 2009-08-12 株式会社尼康 曝光装置、曝光方法及设备制造方法
CN101263421A (zh) * 2005-09-14 2008-09-10 松下电器产业株式会社 图像形成装置
US7692848B2 (en) * 2005-10-12 2010-04-06 Panasonic Corporation Wavelength conversion module, laser light source device, two-dimensional image display device, backlight light source, liquid crystal display device and laser processing device
GB0520853D0 (en) * 2005-10-14 2005-11-23 Gsi Lumonics Ltd Optical fibre laser
US7630424B2 (en) * 2005-11-01 2009-12-08 Cymer, Inc. Laser system
US7920616B2 (en) * 2005-11-01 2011-04-05 Cymer, Inc. Laser system
JP5506194B2 (ja) * 2005-11-01 2014-05-28 サイマー インコーポレイテッド レーザシステム
US20090296755A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7715459B2 (en) * 2005-11-01 2010-05-11 Cymer, Inc. Laser system
US7778302B2 (en) * 2005-11-01 2010-08-17 Cymer, Inc. Laser system
US7999915B2 (en) * 2005-11-01 2011-08-16 Cymer, Inc. Laser system
US20090296758A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7885309B2 (en) 2005-11-01 2011-02-08 Cymer, Inc. Laser system
US7643529B2 (en) 2005-11-01 2010-01-05 Cymer, Inc. Laser system
US7746913B2 (en) 2005-11-01 2010-06-29 Cymer, Inc. Laser system
US20070127002A1 (en) * 2005-11-09 2007-06-07 Nikon Corporation Exposure apparatus and method, and device manufacturing method
US7471705B2 (en) * 2005-11-09 2008-12-30 Lockheed Martin Corporation Ultraviolet laser system and method having wavelength in the 200-nm range
JPWO2007055199A1 (ja) 2005-11-09 2009-04-30 株式会社ニコン 露光装置及び方法、並びにデバイス製造方法
WO2007058188A1 (ja) 2005-11-15 2007-05-24 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
CN101278375B (zh) 2005-11-16 2010-12-22 株式会社尼康 基板处理方法、光掩膜的制造方法及光掩膜、以及元件制造方法
US20070127005A1 (en) * 2005-12-02 2007-06-07 Asml Holding N.V. Illumination system
US7782442B2 (en) 2005-12-06 2010-08-24 Nikon Corporation Exposure apparatus, exposure method, projection optical system and device producing method
WO2007066679A1 (ja) 2005-12-06 2007-06-14 Nikon Corporation 露光装置、露光方法、投影光学系及びデバイス製造方法
US8411271B2 (en) 2005-12-28 2013-04-02 Nikon Corporation Pattern forming method, pattern forming apparatus, and device manufacturing method
EP1978546A4 (en) 2005-12-28 2010-08-04 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENT MANUFACTURING METHOD
US8953148B2 (en) 2005-12-28 2015-02-10 Nikon Corporation Exposure apparatus and making method thereof
EP1975982A1 (en) 2005-12-28 2008-10-01 Nikon Corporation Pattern formation method and pattern formation apparatus, exposure metho and exposure apparatus, and device manufacturing method
TWI457977B (zh) 2005-12-28 2014-10-21 尼康股份有限公司 A pattern forming method and a pattern forming apparatus, and an element manufacturing method
EP3171220A1 (en) 2006-01-19 2017-05-24 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
GB2434483A (en) 2006-01-20 2007-07-25 Fianium Ltd High-Power Short Optical Pulse Source
WO2007094414A1 (ja) 2006-02-16 2007-08-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
EP1990828A4 (en) * 2006-02-16 2010-09-15 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD AND METHOD FOR PRODUCING COMPONENTS
EP1986224A4 (en) 2006-02-16 2012-01-25 Nikon Corp EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
EP1986222A4 (en) 2006-02-16 2010-09-01 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENT MANUFACTURING METHOD
JP5195417B2 (ja) 2006-02-21 2013-05-08 株式会社ニコン パターン形成装置、露光装置、露光方法及びデバイス製造方法
US8027021B2 (en) 2006-02-21 2011-09-27 Nikon Corporation Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure apparatus and method, and device manufacturing method
WO2007097380A1 (ja) 2006-02-21 2007-08-30 Nikon Corporation パターン形成装置及びパターン形成方法、移動体駆動システム及び移動体駆動方法、露光装置及び露光方法、並びにデバイス製造方法
KR20080114691A (ko) 2006-03-13 2008-12-31 가부시키가이샤 니콘 노광 장치, 메인터넌스 방법, 노광 방법 및 디바이스 제조 방법
US7443903B2 (en) * 2006-04-19 2008-10-28 Mobius Photonics, Inc. Laser apparatus having multiple synchronous amplifiers tied to one master oscillator
US7593437B2 (en) 2006-05-15 2009-09-22 Coherent, Inc. MOPA laser apparatus with two master oscillators for generating ultraviolet radiation
CN101410948B (zh) 2006-05-18 2011-10-26 株式会社尼康 曝光方法及装置、维护方法、以及组件制造方法
EP2034514A4 (en) 2006-05-22 2012-01-11 Nikon Corp EXPOSURE METHOD AND APPARATUS, MAINTENANCE METHOD, AND METHOD OF MANUFACTURING THE DEVICE THEREFOR
CN102156389A (zh) 2006-05-23 2011-08-17 株式会社尼康 维修方法、曝光方法及装置、以及组件制造方法
JPWO2007135998A1 (ja) 2006-05-24 2009-10-01 株式会社ニコン 保持装置及び露光装置
WO2007142350A1 (ja) 2006-06-09 2007-12-13 Nikon Corporation パターン形成方法及びパターン形成装置、露光方法及び露光装置、並びにデバイス製造方法
TWI425318B (zh) 2006-06-09 2014-02-01 尼康股份有限公司 移動體裝置、曝光裝置和曝光方法以及元件製造方法
KR20090033170A (ko) 2006-06-30 2009-04-01 가부시키가이샤 니콘 메인터넌스 방법, 노광 방법 및 장치 및 디바이스 제조 방법
WO2008004664A1 (fr) 2006-07-06 2008-01-10 Nikon Corporation Micro-actionneur, unité optique, dispositif d'exposition et procédé de fabrication
US7529281B2 (en) 2006-07-11 2009-05-05 Mobius Photonics, Inc. Light source with precisely controlled wavelength-converted average power
CN103645608B (zh) 2006-08-31 2016-04-20 株式会社尼康 曝光装置及方法、组件制造方法以及决定方法
TWI572995B (zh) 2006-08-31 2017-03-01 尼康股份有限公司 Exposure method and exposure apparatus, and component manufacturing method
TWI653511B (zh) 2006-08-31 2019-03-11 日商尼康股份有限公司 Exposure apparatus, exposure method, and component manufacturing method
TWI652720B (zh) 2006-09-01 2019-03-01 日商尼康股份有限公司 Exposure method and device and component manufacturing method
US7469081B2 (en) * 2006-09-01 2008-12-23 Mobius Photonics, Inc. Reducing thermal load on optical head
KR101660668B1 (ko) 2006-09-01 2016-09-27 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
KR101360507B1 (ko) * 2006-09-29 2014-02-07 가부시키가이샤 니콘 이동체 시스템, 패턴 형성 장치, 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
WO2008056735A1 (fr) 2006-11-09 2008-05-15 Nikon Corporation Unité de support, système de détection de position et système d'exposition, procédé de déplacement, procédé de détection de position, procédé d'exposition, procédé d'ajustement du système de détection, et procédé de prod
US20090323739A1 (en) * 2006-12-22 2009-12-31 Uv Tech Systems Laser optical system
US8004651B2 (en) 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US20080204687A1 (en) * 2007-02-23 2008-08-28 Nikon Corporation Exposing method, exposure apparatus, device fabricating method, and substrate for immersion exposure
US8953647B1 (en) 2007-03-21 2015-02-10 Lockheed Martin Corporation High-power laser using thulium-doped fiber amplifier and frequency quadrupling for blue output
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US8300207B2 (en) 2007-05-17 2012-10-30 Nikon Corporation Exposure apparatus, immersion system, exposing method, and device fabricating method
US20090122282A1 (en) * 2007-05-21 2009-05-14 Nikon Corporation Exposure apparatus, liquid immersion system, exposing method, and device fabricating method
JP2009033111A (ja) * 2007-05-28 2009-02-12 Nikon Corp 露光装置、デバイス製造方法、洗浄装置、及びクリーニング方法並びに露光方法
US8164736B2 (en) * 2007-05-29 2012-04-24 Nikon Corporation Exposure method, exposure apparatus, and method for producing device
US8098362B2 (en) 2007-05-30 2012-01-17 Nikon Corporation Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method
CN101325376B (zh) * 2007-06-15 2012-05-02 力博特公司 开关器件的驱动电路
US8009705B2 (en) * 2007-07-05 2011-08-30 Mobius Photonics, Inc. Fiber MOPA system without stimulated brillouin scattering
WO2009011119A1 (ja) 2007-07-13 2009-01-22 Nikon Corporation パターン形成方法及び装置、露光方法及び装置、並びにデバイス製造方法及びデバイス
US8194232B2 (en) 2007-07-24 2012-06-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method
KR101427071B1 (ko) 2007-07-24 2014-08-07 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
US8547527B2 (en) 2007-07-24 2013-10-01 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and pattern formation apparatus, and device manufacturing method
US8243257B2 (en) 2007-07-24 2012-08-14 Nikon Corporation Position measurement system, exposure apparatus, position measuring method, exposure method and device manufacturing method, and tool and measuring method
US9025126B2 (en) * 2007-07-31 2015-05-05 Nikon Corporation Exposure apparatus adjusting method, exposure apparatus, and device fabricating method
US9304412B2 (en) 2007-08-24 2016-04-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and measuring method
US8867022B2 (en) 2007-08-24 2014-10-21 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, and device manufacturing method
US8218129B2 (en) 2007-08-24 2012-07-10 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, measuring method, and position measurement system
US8023106B2 (en) 2007-08-24 2011-09-20 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US8237919B2 (en) 2007-08-24 2012-08-07 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads
US20090051895A1 (en) * 2007-08-24 2009-02-26 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, device manufacturing method, and processing system
WO2009028494A1 (ja) * 2007-08-28 2009-03-05 Nikon Corporation 位置検出装置、位置検出方法、露光装置、およびデバイス製造方法
US8421994B2 (en) 2007-09-27 2013-04-16 Nikon Corporation Exposure apparatus
US8279399B2 (en) 2007-10-22 2012-10-02 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP2011503774A (ja) * 2007-10-26 2011-01-27 コーポレーション フォー レーザー オプティックス リサーチ フラットパネル表示装置用のレーザ照明バックライト
US9013681B2 (en) * 2007-11-06 2015-04-21 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
WO2009060585A1 (ja) * 2007-11-07 2009-05-14 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
US9256140B2 (en) * 2007-11-07 2016-02-09 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method with measurement device to measure movable body in Z direction
US8665455B2 (en) * 2007-11-08 2014-03-04 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
TWI418850B (zh) 2007-11-09 2013-12-11 尼康股份有限公司 微致動器、光學設備、顯示裝置、曝光裝置及設備製造方法
US8422015B2 (en) * 2007-11-09 2013-04-16 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
US8760622B2 (en) * 2007-12-11 2014-06-24 Nikon Corporation Movable body apparatus, exposure apparatus and pattern formation apparatus, and device manufacturing method
US8711327B2 (en) * 2007-12-14 2014-04-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8115906B2 (en) * 2007-12-14 2012-02-14 Nikon Corporation Movable body system, pattern formation apparatus, exposure apparatus and measurement device, and device manufacturing method
US8964166B2 (en) * 2007-12-17 2015-02-24 Nikon Corporation Stage device, exposure apparatus and method of producing device
SG183058A1 (en) * 2007-12-17 2012-08-30 Nikon Corp Exposure apparatus, exposure method and device manufacturing method
US20090174873A1 (en) * 2007-12-17 2009-07-09 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
US8237916B2 (en) * 2007-12-28 2012-08-07 Nikon Corporation Movable body drive system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method
US8451425B2 (en) * 2007-12-28 2013-05-28 Nikon Corporation Exposure apparatus, exposure method, cleaning apparatus, and device manufacturing method
US8269945B2 (en) * 2007-12-28 2012-09-18 Nikon Corporation Movable body drive method and apparatus, exposure method and apparatus, pattern formation method and apparatus, and device manufacturing method
US8792079B2 (en) * 2007-12-28 2014-07-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method having encoders to measure displacement between optical member and measurement mount and between measurement mount and movable body
CN102566320B (zh) 2007-12-28 2015-01-28 株式会社尼康 曝光装置、曝光方法以及器件制造方法
KR100944959B1 (ko) * 2008-01-17 2010-03-02 주식회사 와이텔포토닉스 파장변환 레이저 시스템
JP5369443B2 (ja) 2008-02-05 2013-12-18 株式会社ニコン ステージ装置、露光装置、露光方法、及びデバイス製造方法
US8208128B2 (en) * 2008-02-08 2012-06-26 Nikon Corporation Position measuring system and position measuring method, Movable body apparatus, movable body drive method, exposure apparatus and exposure method, pattern forming apparatus, and device manufacturing method
US20090218743A1 (en) * 2008-02-29 2009-09-03 Nikon Corporation Substrate holding apparatus, exposure apparatus, exposing method, device fabricating method, plate member, and wall
US20100039628A1 (en) * 2008-03-19 2010-02-18 Nikon Corporation Cleaning tool, cleaning method, and device fabricating method
US8233139B2 (en) * 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method
CA2720261C (en) * 2008-04-08 2020-09-22 Massachusetts Institute Of Technology Three-dimensional microfluidic platforms and methods of use thereof
TW200947149A (en) * 2008-04-11 2009-11-16 Nikon Corp Stage device, exposure device and device production method
US8654306B2 (en) * 2008-04-14 2014-02-18 Nikon Corporation Exposure apparatus, cleaning method, and device fabricating method
TWI437373B (zh) 2008-04-30 2014-05-11 尼康股份有限公司 A mounting apparatus, a pattern forming apparatus, an exposure apparatus, a stage driving method, an exposure method, and an element manufacturing method
US8228482B2 (en) * 2008-05-13 2012-07-24 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8786829B2 (en) * 2008-05-13 2014-07-22 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8817236B2 (en) 2008-05-13 2014-08-26 Nikon Corporation Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method
US7580609B1 (en) * 2008-06-20 2009-08-25 Gooch & Housego Plc Fiber intensity reducing devices and related systems
US20110116520A1 (en) 2008-07-07 2011-05-19 Koninklijke Philips Electronics N.V. Eye-safe laser-based lighting
TW201003053A (en) * 2008-07-10 2010-01-16 Nikon Corp Deformation measuring apparatus, exposure apparatus, jig for deformation measuring apparatus, position measuring method and device manufacturing method
TW201009895A (en) * 2008-08-11 2010-03-01 Nikon Corp Exposure apparatus, maintaining method and device fabricating method
US8994923B2 (en) * 2008-09-22 2015-03-31 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
US8508735B2 (en) 2008-09-22 2013-08-13 Nikon Corporation Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method
US8325325B2 (en) * 2008-09-22 2012-12-04 Nikon Corporation Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method
US8384875B2 (en) 2008-09-29 2013-02-26 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US8599359B2 (en) 2008-12-19 2013-12-03 Nikon Corporation Exposure apparatus, exposure method, device manufacturing method, and carrier method
US8902402B2 (en) 2008-12-19 2014-12-02 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
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US8339573B2 (en) * 2009-05-27 2012-12-25 3M Innovative Properties Company Method and apparatus for photoimaging a substrate
JP5294283B2 (ja) * 2009-05-28 2013-09-18 シチズンホールディングス株式会社 光源装置
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WO2011016254A1 (ja) 2009-08-07 2011-02-10 株式会社ニコン 移動体装置、露光装置及び露光方法、並びにデバイス製造方法
US20110032495A1 (en) * 2009-08-07 2011-02-10 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
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US20110096312A1 (en) * 2009-09-28 2011-04-28 Nikon Corporation Exposure apparatus and device fabricating method
US20110096318A1 (en) 2009-09-28 2011-04-28 Nikon Corporation Exposure apparatus and device fabricating method
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US20110085150A1 (en) 2009-09-30 2011-04-14 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20110075120A1 (en) 2009-09-30 2011-03-31 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20110086315A1 (en) 2009-09-30 2011-04-14 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20110102762A1 (en) * 2009-10-30 2011-05-05 Nikon Corporation Exposure apparatus and device manufacturing method
JP5861642B2 (ja) 2009-11-09 2016-02-16 株式会社ニコン 露光装置、露光方法、露光装置のメンテナンス方法、露光装置の調整方法、デバイス製造方法、及びダミー基板
US20110123913A1 (en) 2009-11-19 2011-05-26 Nikon Corporation Exposure apparatus, exposing method, and device fabricating method
US20110128523A1 (en) * 2009-11-19 2011-06-02 Nikon Corporation Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method
US20110164238A1 (en) 2009-12-02 2011-07-07 Nikon Corporation Exposure apparatus and device fabricating method
US20110134400A1 (en) 2009-12-04 2011-06-09 Nikon Corporation Exposure apparatus, liquid immersion member, and device manufacturing method
US8488106B2 (en) * 2009-12-28 2013-07-16 Nikon Corporation Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method
US8841065B2 (en) 2010-02-12 2014-09-23 Nikon Corporation Manufacturing method of exposure apparatus and device manufacturing method
JP5842808B2 (ja) 2010-02-20 2016-01-13 株式会社ニコン 瞳強度分布を調整する方法
JP5240526B2 (ja) * 2010-03-15 2013-07-17 オムロン株式会社 レーザ加工装置、レーザ光源装置、および、レーザ光源装置の制御方法
JPWO2012081234A1 (ja) 2010-12-14 2014-05-22 株式会社ニコン 露光方法及び露光装置、並びにデバイス製造方法
DE102011004375B3 (de) * 2011-02-18 2012-05-31 Carl Zeiss Smt Gmbh Vorrichtung zur Führung von elektromagnetischer Strahlung in eine Projektionsbelichtungsanlage
WO2012115002A1 (ja) 2011-02-22 2012-08-30 株式会社ニコン 保持装置、露光装置、及びデバイスの製造方法
JP5715234B2 (ja) * 2011-02-28 2015-05-07 東芝三菱電機産業システム株式会社 金属材の特性測定装置
JP5790040B2 (ja) * 2011-03-11 2015-10-07 ソニー株式会社 照明装置および表示装置
US8792762B2 (en) * 2011-05-31 2014-07-29 Corning Incorporated Low loss aluminum doped optical fiber for UV applications
WO2012169089A1 (ja) 2011-06-07 2012-12-13 株式会社ニコン 照明光学系、露光装置、デバイス製造方法、および偏光ユニット
TWI652508B (zh) 2011-06-13 2019-03-01 尼康股份有限公司 照明方法
US8873596B2 (en) 2011-07-22 2014-10-28 Kla-Tencor Corporation Laser with high quality, stable output beam, and long life high conversion efficiency non-linear crystal
JP5398804B2 (ja) * 2011-09-16 2014-01-29 株式会社東芝 ファイバレーザ装置
US20130077086A1 (en) * 2011-09-23 2013-03-28 Kla-Tencor Corporation Solid-State Laser And Inspection System Using 193nm Laser
US9250178B2 (en) 2011-10-07 2016-02-02 Kla-Tencor Corporation Passivation of nonlinear optical crystals
US9207549B2 (en) 2011-12-29 2015-12-08 Nikon Corporation Exposure apparatus and exposure method, and device manufacturing method with encoder of higher reliability for position measurement
US9360772B2 (en) 2011-12-29 2016-06-07 Nikon Corporation Carrier method, exposure method, carrier system and exposure apparatus, and device manufacturing method
JPWO2013133278A1 (ja) * 2012-03-05 2015-07-30 株式会社ニコン レーザ装置、このレーザ装置を備えた露光装置及び検査装置
US9678350B2 (en) 2012-03-20 2017-06-13 Kla-Tencor Corporation Laser with integrated multi line or scanning beam capability
JP6222480B2 (ja) 2012-04-26 2017-11-01 株式会社ニコン 光学系、エンコーダ装置、露光装置、及びデバイス製造方法
KR102170864B1 (ko) 2012-05-02 2020-10-28 가부시키가이샤 니콘 동공 휘도 분포의 평가 방법 및 개선 방법, 조명 광학계 및 그 조정 방법, 노광 장치, 노광 방법, 및 디바이스 제조 방법
US20130313440A1 (en) * 2012-05-22 2013-11-28 Kla-Tencor Corporation Solid-State Laser And Inspection System Using 193nm Laser
US8993974B2 (en) 2012-06-12 2015-03-31 Nikon Corporation Color time domain integration camera having a single charge coupled device and fringe projection auto-focus system
US9243896B2 (en) 2012-08-15 2016-01-26 Nikon Corporation Two axis encoder head assembly
US9042006B2 (en) * 2012-09-11 2015-05-26 Kla-Tencor Corporation Solid state illumination source and inspection system
EP2905804B1 (en) 2012-10-02 2019-05-01 Nikon Corporation Mobile body device, exposure device, and device manufacturing method
EP3723111B1 (en) 2012-10-02 2021-09-08 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
US9772564B2 (en) 2012-11-12 2017-09-26 Nikon Corporation Exposure apparatus and exposure method, and device manufacturing method
EP2947679A4 (en) 2012-11-20 2017-02-08 Nikon Corporation Exposure device, mobile device, and device manufacturing method
EP4009356A1 (en) 2012-11-30 2022-06-08 Nikon Corporation Carrier system, exposure apparatus, carrier method, exposure method, device manufacturing method, and suction device
EP2950328A4 (en) 2012-11-30 2017-01-25 Nikon Corporation Suction apparatus, carry-in method, conveyance system, light exposure device, and device production method
US8929406B2 (en) 2013-01-24 2015-01-06 Kla-Tencor Corporation 193NM laser and inspection system
US9529182B2 (en) 2013-02-13 2016-12-27 KLA—Tencor Corporation 193nm laser and inspection system
US9608399B2 (en) 2013-03-18 2017-03-28 Kla-Tencor Corporation 193 nm laser and an inspection system using a 193 nm laser
TWI630463B (zh) 2013-06-28 2018-07-21 日商尼康股份有限公司 移動體裝置及曝光裝置、以及元件製造方法
US20160336101A1 (en) 2013-09-04 2016-11-17 Ckd Corporation Armature coil for electromagnetic actuator, electromagnetic actuator, exposure apparatus, and device manufacturing method
CN105830208B (zh) 2013-10-30 2019-07-16 株式会社尼康 基板保持装置、曝光装置及器件制造方法
US9703085B2 (en) 2013-11-22 2017-07-11 Nikon Corporation Catadioptric imaging systems for digital scanner
US9638906B2 (en) 2013-11-22 2017-05-02 Nikon Corporation Catadioptric imaging systems for digital scanner
JP6380412B2 (ja) 2014-01-16 2018-08-29 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
JP6291875B2 (ja) * 2014-01-31 2018-03-14 セイコーエプソン株式会社 血糖値計測装置及び血糖値計測方法
CN104897280B (zh) * 2014-03-05 2017-05-03 北京大学深圳研究生院 一种紫外光传感电路及感应系统
US9804101B2 (en) 2014-03-20 2017-10-31 Kla-Tencor Corporation System and method for reducing the bandwidth of a laser and an inspection system and method using a laser
US9419407B2 (en) 2014-09-25 2016-08-16 Kla-Tencor Corporation Laser assembly and inspection system using monolithic bandwidth narrowing apparatus
US9748729B2 (en) 2014-10-03 2017-08-29 Kla-Tencor Corporation 183NM laser and inspection system
EP3239776B1 (en) 2014-12-24 2021-07-07 Nikon Corporation Measurement device and measurement method, exposure device and exposure method, and device production method
CN117631484A (zh) 2014-12-24 2024-03-01 株式会社尼康 测量系统、测量方法及曝光装置
EP3291011A4 (en) 2015-03-25 2019-02-27 Nikon Corporation LAYOUT METHOD, BRAND DETECTION METHOD, LIGHT EXPOSURE METHOD, MEASURING APPARATUS, LIGHT EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
CN105186279B (zh) * 2015-09-30 2018-02-13 北京大学 一种激光脉冲开关装置及其控制方法
US10078269B2 (en) 2015-10-02 2018-09-18 Nikon Corporation Array of encoders for alignment measurement
US10488228B2 (en) 2016-04-11 2019-11-26 Nikon Corporation Transparent-block encoder head with isotropic wedged elements
JP7081490B2 (ja) 2016-09-27 2022-06-07 株式会社ニコン レイアウト情報提供方法、レイアウト情報、決定方法、プログラム、並びに情報記録媒体
JP6306659B1 (ja) * 2016-10-19 2018-04-04 ファナック株式会社 ビーム分配器
US10175555B2 (en) 2017-01-03 2019-01-08 KLA—Tencor Corporation 183 nm CW laser and inspection system
US10451890B2 (en) 2017-01-16 2019-10-22 Cymer, Llc Reducing speckle in an excimer light source
WO2018168923A1 (ja) 2017-03-16 2018-09-20 株式会社ニコン 制御装置及び制御方法、露光装置及び露光方法、デバイス製造方法、データ生成方法、並びに、プログラム
CN107463070B (zh) * 2017-09-22 2019-08-30 深圳市华星光电技术有限公司 曝光用光源系统
CN108287455B (zh) * 2018-02-12 2020-06-26 京东方科技集团股份有限公司 曝光装置中的光线转换结构、曝光装置及曝光方法
DE102020202317A1 (de) * 2019-03-28 2020-10-01 Advantest Corporation Vorrichtung zur messung photoakustischer wellen
US11581696B2 (en) * 2019-08-14 2023-02-14 Open Water Internet Inc. Multi-channel laser
WO2022061040A1 (en) * 2020-09-21 2022-03-24 Optonomous Technologies, Inc. Laser light sources and methods
WO2022076943A1 (en) * 2020-10-11 2022-04-14 Pavilion Integration Corporation Uv laser systems, devices, and methods
CN114488714A (zh) * 2022-02-18 2022-05-13 西湖大学 一种光纤阵列光刻机
CN114442440A (zh) * 2022-02-18 2022-05-06 西湖大学 一种光刻机
WO2023158720A1 (en) * 2022-02-18 2023-08-24 Uviquity, Inc. Nonlinear solid state devices for optical radiation in far-uvc spectrum
CN114488715B (zh) * 2022-02-18 2023-09-29 西湖大学 一种光纤阵列光刻机
KR102620196B1 (ko) * 2023-05-11 2024-01-02 람다이노비전 주식회사 발진할 레이저의 주파수 특성을 안정화시킬 수 있는 레이저 발진 장치
CN116819908B (zh) * 2023-08-31 2023-11-21 光科芯图(北京)科技有限公司 一种激光系统及控制方法

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02107034A (ja) * 1988-10-17 1990-04-19 Hitachi Ltd 光時分割多重方式
JPH03102898A (ja) 1989-09-18 1991-04-30 Fujitsu Ltd 丸型パッケージ用キャリア
US5137026A (en) 1990-01-04 1992-08-11 Glaxo Australia Pty., Ltd. Personal spirometer
JP2612080B2 (ja) 1990-01-19 1997-05-21 日本電信電話株式会社 光ソリトン発生方法およびソリトン伝送方法
US5050949A (en) 1990-06-22 1991-09-24 At&T Bell Laboratories Multi-stage optical fiber amplifier
JPH04111484A (ja) 1990-08-31 1992-04-13 Ishikawajima Harima Heavy Ind Co Ltd Ｎｄ：ＹＡＧレーザーの第４高調波発生方法
JPH04196280A (ja) * 1990-11-27 1992-07-16 Matsushita Electric Ind Co Ltd 照明装置
JPH04347945A (ja) * 1991-01-25 1992-12-03 Hitachi Ltd Ｃｄｍａ光受信器
JPH053455A (ja) * 1991-06-21 1993-01-08 Nippon Telegr & Teleph Corp <Ntt> 光増幅装置
JPH05102565A (ja) * 1991-10-09 1993-04-23 Kimmon Electric Co Ltd レーザーシステム
JP2566120Y2 (ja) * 1991-11-19 1998-03-25 日本電気株式会社 光パルスのパルス幅可変回路
US5341445A (en) * 1992-03-27 1994-08-23 General Electric Company Polygonal-shaped optical coupling member for use with a high brightness light source
JPH05275793A (ja) * 1992-03-27 1993-10-22 Seiko Epson Corp レーザーガラス及びレーザー装置
CN1026955C (zh) 1992-05-20 1994-12-14 天津市激光技术研究所 聚集式大功率氦氖激光治疗仪
CN1027348C (zh) * 1992-06-08 1995-01-11 杨继萍 健坤袋及其制作方法
JPH0677572A (ja) * 1992-08-28 1994-03-18 Sumitomo Electric Ind Ltd 光パルス増幅器
JPH06110102A (ja) 1992-09-30 1994-04-22 Nippon Telegr & Teleph Corp <Ntt> 光周波数掃引装置
JPH07161625A (ja) * 1993-12-02 1995-06-23 Sony Corp 半導体露光装置及び露光方法
JPH08116122A (ja) * 1994-10-18 1996-05-07 Sony Corp 連続発振紫外線レーザー光発生装置
JPH08248455A (ja) * 1995-03-09 1996-09-27 Fujitsu Ltd 波長多重用光増幅器
US5694408A (en) * 1995-06-07 1997-12-02 Mcdonnell Douglas Corporation Fiber optic laser system and associated lasing method
US5838709A (en) * 1995-06-07 1998-11-17 Nikon Corporation Ultraviolet laser source
JPH09265A (ja) 1995-06-22 1997-01-07 Eisai Co Ltd 新規ヒトｓｍａｌｌ ＴＩＭＰ２遺伝子
JP3594384B2 (ja) * 1995-12-08 2004-11-24 ソニー株式会社 半導体露光装置、投影露光装置及び回路パターン製造方法
US5745284A (en) 1996-02-23 1998-04-28 President And Fellows Of Harvard College Solid-state laser source of tunable narrow-bandwidth ultraviolet radiation
US5909306A (en) * 1996-02-23 1999-06-01 President And Fellows Of Harvard College Solid-state spectrally-pure linearly-polarized pulsed fiber amplifier laser system useful for ultraviolet radiation generation
JPH09256060A (ja) 1996-03-22 1997-09-30 Nippon Steel Corp 表面特性及びイアリング特性が良好な低炭素薄鋼板の製造方法
JP3154396B2 (ja) * 1996-03-29 2001-04-09 日本電信電話株式会社 光ｃｄｍ回路
KR100841147B1 (ko) * 1998-03-11 2008-06-24 가부시키가이샤 니콘 레이저 장치, 자외광 조사 장치 및 방법, 물체의 패턴 검출장치 및 방법
JP2000260684A (ja) * 1999-03-08 2000-09-22 Nikon Corp 露光装置、及び照明装置
JP2007086101A (ja) * 2005-09-20 2007-04-05 Megaopto Co Ltd 深紫外レーザー装置

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US7023610B2 (en) 2006-04-04
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US20060098269A1 (en) 2006-05-11
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